KR840006448A - 전계장치와 그 제조방법 및 그 전계장치를 사용하는 물질의 정전적 처리장치 - Google Patents

전계장치와 그 제조방법 및 그 전계장치를 사용하는 물질의 정전적 처리장치 Download PDF

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KR840006448A
KR840006448A KR1019830004207A KR830004207A KR840006448A KR 840006448 A KR840006448 A KR 840006448A KR 1019830004207 A KR1019830004207 A KR 1019830004207A KR 830004207 A KR830004207 A KR 830004207A KR 840006448 A KR840006448 A KR 840006448A
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electrode
electric device
raw material
electric field
material sheet
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KR1019830004207A
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KR920007084B1 (ko
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센이찌(외1) 마쓰다
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센이찌(외1) 마쓰다
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05FSTATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
    • H05F3/00Carrying-off electrostatic charges
    • H05F3/04Carrying-off electrostatic charges by means of spark gaps or other discharge devices
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/02Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements ultrasonic or sonic; Corona discharge
    • D06M10/025Corona discharge or low temperature plasma
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03CMAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C7/00Separating solids from solids by electrostatic effect
    • B03C7/02Separators
    • B03C7/04Separators with material carriers in the form of trays, troughs, or tables
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/025Discharge apparatus, e.g. electrostatic spray guns
    • B05B5/03Discharge apparatus, e.g. electrostatic spray guns characterised by the use of gas, e.g. electrostatically assisted pneumatic spraying
    • B05B5/032Discharge apparatus, e.g. electrostatic spray guns characterised by the use of gas, e.g. electrostatically assisted pneumatic spraying for spraying particulate materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/025Discharge apparatus, e.g. electrostatic spray guns
    • B05B5/043Discharge apparatus, e.g. electrostatic spray guns using induction-charging
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/08Plant for applying liquids or other fluent materials to objects
    • B05B5/087Arrangements of electrodes, e.g. of charging, shielding, collecting electrodes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/08Plant for applying liquids or other fluent materials to objects
    • B05B5/087Arrangements of electrodes, e.g. of charging, shielding, collecting electrodes
    • B05B5/088Arrangements of electrodes, e.g. of charging, shielding, collecting electrodes for creating electric field curtains
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G54/00Non-mechanical conveyors not otherwise provided for
    • B65G54/02Non-mechanical conveyors not otherwise provided for electrostatic, electric, or magnetic
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00Apparatus for electrographic processes using a charge pattern
    • G03G15/06Apparatus for electrographic processes using a charge pattern for developing
    • G03G15/08Apparatus for electrographic processes using a charge pattern for developing using a solid developer, e.g. powder developer
    • G03G15/0822Arrangements for preparing, mixing, supplying or dispensing developer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01TSPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
    • H01T19/00Devices providing for corona discharge

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Textile Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Dot-Matrix Printers And Others (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Electrostatic Separation (AREA)
  • Elimination Of Static Electricity (AREA)
  • Compositions Of Oxide Ceramics (AREA)

Abstract

내용 없음

Description

전계장치와 그 제조방법 및 그 전계장치를 사용하는 물질의 정전적 처리장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1A도는 본 발명의 전계장치의 제조과정에 있어서 원료시이트의 상면을 표시하는 사면도.
제1B도는 같은 원료시이트의 하면을 표시하는 사면도.
제1C도는 다른 원료시이트의 상면을 표시하는 사면도.
제1D도는 다른 원료시이트의 하면을 표시하는 사면도.
제1E도는 제1A도와 제1C도의 원료시이트를 두장 종합하여 일부분을 걸여시킨 상쾌의 사면도.
제1F도는 제1E도의 횡단면도.
제2도는 본 발명의 물체의 정전적 처리 장치의 실시에의 단면도.
제3도는 각각 다른 실시에의 사면도.

Claims (3)

  1. 파인 세라믹으로 적당한 두께로 형성된 유전체와 이유전체에 대해서 일체적으로 설치된 전기형성용 전극으로 이루어지는 전계장치.
  2. 알루미나 미분말등의 파인 세라믹 유전체 재료로 원료시이트를 형성하고, 이 원료 시이트의 면에 적당한 형상의 전개 형성용 전극을 형성하고 이 상태의 원료 시이트를 상기의 전계형성용 전극과 같이 소성(燒成)하는 전개장치의 제조방법.
  3. 파인 세라믹으로 적당한 형상으로 형성된 유전체에 면상 전극과 성상전극, 일체적으로 설치한 전계장치의 플라즈마 발생면을 피처리 물체로 향하여 설치하고, 상기 면상 전극과 선상전극(3)의 사이에 고주파교류전원을 접속시킨 물체의 정전적 처리장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019830004207A 1982-09-07 1983-09-07 전계장치 및 그 제조방법 KR920007084B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019910021086A KR920011007B1 (ko) 1982-09-07 1991-11-25 전계장치를사용하는물체의정전적처리장치

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP?155618 1982-09-07
JP155618 1982-09-07
JP57155618A JPS5944797A (ja) 1982-09-07 1982-09-07 物体の静電的処理装置

Publications (2)

Publication Number Publication Date
KR840006448A true KR840006448A (ko) 1984-11-30
KR920007084B1 KR920007084B1 (ko) 1992-08-24

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Application Number Title Priority Date Filing Date
KR1019830004207A KR920007084B1 (ko) 1982-09-07 1983-09-07 전계장치 및 그 제조방법

Country Status (5)

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US (2) US4652318A (ko)
EP (1) EP0102569B1 (ko)
JP (1) JPS5944797A (ko)
KR (1) KR920007084B1 (ko)
DE (1) DE3380890D1 (ko)

Families Citing this family (97)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5944797A (ja) * 1982-09-07 1984-03-13 増田 閃一 物体の静電的処理装置
DE3422400A1 (de) * 1984-03-26 1985-10-03 Canon K.K., Tokio/Tokyo Verfahren und vorrichtung zur ladung oder entladung eines bauteils
DE3422401A1 (de) * 1984-03-26 1985-09-26 Canon K.K., Tokio/Tokyo Verfahren und vorrichtung zur ladung oder entladung eines bauteils
US4666679A (en) * 1984-07-18 1987-05-19 Ngk Spark Plug Co., Ltd. Ceramic ozonizer
US4783716A (en) * 1986-01-30 1988-11-08 Canon Kabushiki Kaisha Charging or discharging device
GB8611035D0 (en) * 1986-05-06 1986-11-26 British Aerospace Protecting articles from particle bombardment
US4745520A (en) * 1986-10-10 1988-05-17 Ransburg Corporation Power supply
US4803593A (en) * 1986-10-14 1989-02-07 Ricoh Company, Ltd. Flat solid discharging device
US4963738A (en) * 1986-12-22 1990-10-16 Xerox Corporation Flat comb-like scorotron charging device
JP2581066B2 (ja) * 1987-03-31 1997-02-12 富士通株式会社 ウエ−ハ搬送方法及び装置
US4794254A (en) * 1987-05-28 1988-12-27 Xerox Corporation Distributed resistance corona charging device
DE3731168C2 (de) * 1987-09-14 1994-05-26 Trailigaz Ozonisator zur Erzeugung von Ozon durch kaltes Plasma für Wechselspannungsanregung im kHz-Bereich und Verfahren zur Herstellung der Vorrichtung
JPH01117240A (ja) * 1987-10-30 1989-05-10 Masao Iwanaga 放電素子およびその応用装置
CA1316980C (en) * 1988-12-27 1993-04-27 Daniel C. Hughey Power supply
US4896174A (en) * 1989-03-20 1990-01-23 Xerox Corporation Transport of suspended charged particles using traveling electrostatic surface waves
GB8922602D0 (en) * 1989-10-06 1989-11-22 British Aerospace A surface discharge plasma cathode electron beam generating assembly
GB2243725A (en) * 1990-05-02 1991-11-06 Peng Yu Hshiang A low thermal shock plate type corona generator
JPH0414784A (ja) * 1990-05-08 1992-01-20 Masao Iwanaga 放電素子、その製造方法および応用装置
US5272414A (en) * 1990-05-08 1993-12-21 I.T.M. Corporation Discharge element, method of producing the same and apparatus comprising the same
US5452177A (en) * 1990-06-08 1995-09-19 Varian Associates, Inc. Electrostatic wafer clamp
EP0500937A4 (en) * 1990-06-28 1993-09-15 Daihen Corporation Method of electrically joining ceramics, device used therefor and adhesive agent therefor
DE4035272A1 (de) * 1990-11-02 1992-05-07 Sorbios Gmbh Vorrichtung zur erzeugung von ozon aus sauerstoff
US5407639A (en) * 1991-10-14 1995-04-18 Toto, Ltd. Method of manufacturing a corona discharge device
WO1994011944A1 (en) * 1992-11-06 1994-05-26 Varian Associates, Inc. Electrostatic wafer clamp
DE4241927C2 (de) * 1992-12-11 1994-09-22 Max Planck Gesellschaft Zur Anordnung in einem Vakuumgefäß geeignete selbsttragende isolierte Elektrodenanordnung, insbesondere Antennenspule für einen Hochfrequenz-Plasmagenerator
US5384681A (en) * 1993-03-01 1995-01-24 Toto Ltd. Electrostatic chuck
US6018471A (en) 1995-02-02 2000-01-25 Integrated Environmental Technologies Methods and apparatus for treating waste
US5666891A (en) * 1995-02-02 1997-09-16 Battelle Memorial Institute ARC plasma-melter electro conversion system for waste treatment and resource recovery
US5798497A (en) * 1995-02-02 1998-08-25 Battelle Memorial Institute Tunable, self-powered integrated arc plasma-melter vitrification system for waste treatment and resource recovery
US5847353A (en) * 1995-02-02 1998-12-08 Integrated Environmental Technologies, Llc Methods and apparatus for low NOx emissions during the production of electricity from waste treatment systems
US5665604A (en) * 1995-08-18 1997-09-09 The Regents Of The University Of California, Office Of Technology Transfer Method and apparatus for detecting halogenated hydrocarbons
US5858099A (en) 1996-04-09 1999-01-12 Sarnoff Corporation Electrostatic chucks and a particle deposition apparatus therefor
US5788814A (en) * 1996-04-09 1998-08-04 David Sarnoff Research Center Chucks and methods for positioning multiple objects on a substrate
US6399143B1 (en) * 1996-04-09 2002-06-04 Delsys Pharmaceutical Corporation Method for clamping and electrostatically coating a substrate
US6070033A (en) * 1996-10-07 2000-05-30 Aetas Peripheral Corporation Charging device for an electrophotographic imaging forming system utilizing thin film conducting members
AT1590U1 (de) * 1996-10-17 1997-08-25 Maitron Gmbh Elektrodenanordnung
JP3801730B2 (ja) * 1997-05-09 2006-07-26 株式会社半導体エネルギー研究所 プラズマcvd装置及びそれを用いた薄膜形成方法
US6039816A (en) 1997-06-12 2000-03-21 Ngk Spark Plug Co., Ltd. Ozonizer, water purifier and method of cleaning an ozonizer
US6055928A (en) * 1998-03-02 2000-05-02 Ball Semiconductor, Inc. Plasma immersion ion processor for fabricating semiconductor integrated circuits
JP2961103B1 (ja) * 1998-04-28 1999-10-12 三菱重工業株式会社 プラズマ化学蒸着装置
US6149774A (en) 1998-06-10 2000-11-21 Delsys Pharmaceutical Corporation AC waveforms biasing for bead manipulating chucks
US6063194A (en) 1998-06-10 2000-05-16 Delsys Pharmaceutical Corporation Dry powder deposition apparatus
US6284205B1 (en) * 1998-08-21 2001-09-04 Kabushiki Kaisha Toshiba Ozonizing unit ozone generator and ozone-processing system
US6292085B1 (en) * 1999-04-09 2001-09-18 Electronic Descaling 2000, Inc. Multiple coil assembly for use with electronic descaling unit
US6923979B2 (en) 1999-04-27 2005-08-02 Microdose Technologies, Inc. Method for depositing particles onto a substrate using an alternating electric field
DE19931366A1 (de) * 1999-07-07 2001-02-01 T E M Gmbh Flache Baugruppe zur elektrischen Erzeugung eines Plasmas in Luft
JP3464177B2 (ja) * 1999-09-06 2003-11-05 沖電気工業株式会社 半導体製造装置および静電気除去方法
DE19955671B4 (de) * 1999-11-19 2004-07-22 Muegge Electronic Gmbh Vorrichtung zur Erzeugung von Plasma
DE19960401A1 (de) * 1999-12-06 2001-07-12 Fzm Fertigungszentrum Maschb G Elektrode für Plasmaquelle
WO2001043184A2 (en) * 1999-12-09 2001-06-14 Saint-Gobain Ceramics & Plastics, Inc. Electrostatic chucks with flat film electrode
US6723274B1 (en) 1999-12-09 2004-04-20 Saint-Gobain Ceramics & Plastics, Inc. High-purity low-resistivity electrostatic chucks
US6603650B1 (en) 1999-12-09 2003-08-05 Saint-Gobain Ceramics And Plastics, Inc. Electrostatic chuck susceptor and method for fabrication
DE10027247C2 (de) * 2000-05-31 2003-09-25 Iut Inst Fuer Umwelttechnologi Plasmagenerator mit dielektrisch behinderter Entladung
EG23455A (en) * 2001-08-01 2005-09-28 Sharp Kk Ion generator and electric apparatus and their uses in an air condition.
US6897615B2 (en) * 2001-11-01 2005-05-24 Axcelis Technologies, Inc. Plasma process and apparatus
FR2836157B1 (fr) * 2002-02-19 2004-04-09 Usinor Procede de nettoyage de la surface d'un materiau enduit d'une susbstance organique, generateur et dispositif de mise en oeuvre
US20050044619A1 (en) * 2002-08-02 2005-03-03 Mattson Roy W. Sanitation suction device
US20040066601A1 (en) * 2002-10-04 2004-04-08 Varian Semiconductor Equipment Associates, Inc. Electrode configuration for retaining cooling gas on electrostatic wafer clamp
CN1791467B (zh) * 2003-05-15 2010-11-03 夏普株式会社 离子发生元件、离子发生装置、电气设备
DE112004000057B4 (de) * 2003-05-27 2008-09-25 Matsushita Electric Works, Ltd., Kadoma Plasmabehandlungsapparat und Plasmabehandlungsverfahren
EP1667498A4 (en) 2003-09-12 2008-04-02 Ngk Insulators Ltd PLASMA MANUFACTURING ELECTRODE AND PLASMA REACTOR
JP4684222B2 (ja) * 2004-03-19 2011-05-18 株式会社クリエイティブ テクノロジー 双極型静電チャック
DE102004060377A1 (de) * 2004-12-15 2006-06-29 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren und Vorrichtung zum Betrieb einer Plasmaeinrichtung
DE102005001158B4 (de) * 2005-01-10 2016-11-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Barrierenentladungselektroden mit Kühlung und Vorrichtung mit einer solchen Barrierenentladungselektrode
JP4608630B2 (ja) * 2005-02-21 2011-01-12 独立行政法人産業技術総合研究所 イオン発生器及び除電器
JP2006302625A (ja) * 2005-04-19 2006-11-02 Matsushita Electric Works Ltd プラズマ処理装置及びプラズマ処理方法
US7529075B1 (en) * 2005-08-23 2009-05-05 The United States Of America As Represented By The Secretary Of The Army Systems and methods involving electric-field cages
EP1933605B1 (en) * 2005-09-16 2019-05-15 Toyo Advanced Technologies Co., Ltd. Plasma generating device and plasma generating method
JP2007234437A (ja) * 2006-03-02 2007-09-13 Trinc:Kk プラズマ放電式除電器
JP2008205209A (ja) * 2007-02-20 2008-09-04 Matsushita Electric Works Ltd プラズマ処理装置
US8084757B2 (en) * 2008-01-17 2011-12-27 Applied Materials, Inc. Contamination prevention in extreme ultraviolet lithography
DE102008007219B4 (de) * 2008-02-01 2010-02-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Fluidisierbehälter zur Verbesserung der Aufladung von Pulverpartikeln mittels neuer gepulster Hochspannungstechnik
JP5223424B2 (ja) * 2008-04-08 2013-06-26 パナソニック株式会社 集塵装置
JP5078792B2 (ja) * 2008-07-29 2012-11-21 京セラ株式会社 誘電性構造体、誘電性構造体を用いた放電装置、流体改質装置、および反応システム
EP2180768A1 (en) * 2008-10-23 2010-04-28 TNO Nederlandse Organisatie voor Toegepast Wetenschappelijk Onderzoek Apparatus and method for treating an object
WO2011038307A1 (en) * 2009-09-25 2011-03-31 Conyers Technology Group, Llc Electrochemical processing of fluids
GB0919274D0 (en) * 2009-11-03 2009-12-16 Univ The Glasgow Plasma generation apparatus and use of plasma generation apparatus
EP2608329A4 (en) * 2010-08-18 2014-10-22 Kyocera Corp ION WIND GENERATING BODY AND ION WIND GENERATING DEVICE
JP5626899B2 (ja) * 2011-05-17 2014-11-19 株式会社日立製作所 大気圧プラズマ処理装置
DE102011076806A1 (de) * 2011-05-31 2012-12-06 Leibniz-Institut für Plasmaforschung und Technologie e.V. Vorrichtung und Verfahren zur Erzeugung eines kalten, homogenen Plasmas unter Atmosphärendruckbedingungen
DE102011105713B4 (de) * 2011-06-23 2014-06-05 Cinogy Gmbh Elektrodenanordnung für eine dielektrisch behinderte Gasentladung
KR102076660B1 (ko) * 2012-06-21 2020-02-12 엘지전자 주식회사 공기 조화기 및 그 제어방법
US9746180B2 (en) 2012-11-27 2017-08-29 Clearsign Combustion Corporation Multijet burner with charge interaction
US20140170575A1 (en) * 2012-12-14 2014-06-19 Clearsign Combustion Corporation Ionizer for a combustion system, including foam electrode structure
JP5983529B2 (ja) 2013-05-16 2016-08-31 株式会社村田製作所 放電素子
WO2016205743A1 (en) * 2015-06-19 2016-12-22 Applied Materials, Inc. Selective depositing of powder in additive manufacturing
CN107848208A (zh) * 2015-06-19 2018-03-27 应用材料公司 利用静电压实的增材制造
CN106076625B (zh) * 2016-08-11 2017-06-16 天津大学 一种圆筒形微静电过滤器
US10619845B2 (en) * 2016-08-18 2020-04-14 Clearsign Combustion Corporation Cooled ceramic electrode supports
US10322890B2 (en) * 2016-10-17 2019-06-18 Oakland University Sheet metal blank destacker
CN106861908B (zh) * 2017-03-03 2018-07-24 中冶宝钢技术服务有限公司 烧结机电除尘器维修工艺
CN108993773B (zh) * 2018-08-07 2023-11-17 中国船舶重工集团公司第七一八研究所 一种印刷线板式放电电极
JP2020034180A (ja) * 2018-08-27 2020-03-05 国立大学法人埼玉大学 交流電界による有害性排ガス処理装置の燃焼炉
WO2020084594A1 (en) 2018-10-25 2020-04-30 National Research Council Of Canada Printed film electrostatic concentrator for radon detection
CN109633071B (zh) * 2019-02-27 2021-05-07 贵州健安德科技有限公司 一种利用uplc-ms/ms法检测水中噻森铜的方法
US11040353B1 (en) * 2020-08-12 2021-06-22 James T. Cash Electrostatic air filter used to destroy pathogens and viruses with infrared heat
DE102022130811A1 (de) 2022-11-22 2024-05-23 Schiedel Gmbh Abgasrohr, Abgasreinigungsgerät, Verfahren zur Reinigung eines Abgasrohrs sowie Verwendung eines Abgasrohrs

Family Cites Families (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3004197A (en) * 1956-12-13 1961-10-10 Aerovox Corp Ceramic capacitor and method of making it
US3470905A (en) * 1965-04-09 1969-10-07 Don Edward Heskett Pressure responsive device for controlling liquid level in tanks
US3615980A (en) * 1970-02-12 1971-10-26 Daniel J Rose Decal metallization of ceramic substrates
GB1381783A (en) * 1971-05-12 1975-01-29 Masuda S Apparatus for controlling the movement of light particles
BE789321A (fr) * 1971-09-29 1973-01-15 Masuda Senichi Procede pour l'application au moyen d'un rideau de champs electriques de revetements formes par des particules de poussieres etdispositif pourla mise en oeuvre du procede
BE789579A (fr) * 1971-10-06 1973-02-01 Masuda Senichi Enceinte pour l'application, au moyen d'un rideau de champs electriquesdu type contact, de revetements formes par des poudres chargees electrostatiquement
JPS5347684B2 (ko) * 1972-06-26 1978-12-22
US3882059A (en) * 1973-05-11 1975-05-06 Technical Ceramics Inc Method of making ceramic capacitor
US3970905A (en) * 1974-07-10 1976-07-20 Onoda Cement Company, Ltd. Thin wire type of electric field curtain system
CA1007737A (en) * 1974-09-17 1977-03-29 Northern Electric Company Semiconductor optical modulator
FR2296958A1 (fr) * 1975-01-06 1976-07-30 Cellophane Sa Nouvelles electrodes d'ionisation
JPS51103328A (en) * 1975-03-07 1976-09-11 Nippon Denso Co Gasunenshosochino seigyosochi
US3968405A (en) * 1975-04-14 1976-07-06 Testone Anthony Quintin Static electricity suppressor with patterned coating and method of making
GB1549055A (en) * 1975-04-30 1979-08-01 Sumitomo Precision Prod Co Ozone generator
JPS52106400A (en) * 1976-03-04 1977-09-06 Mizusawa Industrial Chem Process for producing alkali aluminosilicate having excellent whiteness from clay ore containing iron ingredient
JPS5922358B2 (ja) * 1976-03-08 1984-05-25 太平洋セメント株式会社 安全型電界カ−テン装置
SE7704663L (sv) * 1976-04-26 1977-10-27 Izon Corp Ljusforsterkningsanordning
JPS5833465B2 (ja) * 1976-05-31 1983-07-20 松下電工株式会社 太陽熱給湯蓄熱装置
US4155093A (en) * 1977-08-12 1979-05-15 Dennison Manufacturing Company Method and apparatus for generating charged particles
GB2012493B (en) * 1977-09-05 1982-02-24 Masuda S Device for electrically charging particles
JPS5442017A (en) * 1977-09-07 1979-04-03 Mitsubishi Heavy Ind Ltd Menbrane layout of low temperature tank
JPS5473106A (en) * 1977-11-20 1979-06-12 Meinan Machinery Works Jointing and reinforcing veneer
JPS5481125A (en) * 1977-12-12 1979-06-28 Nippon Steel Corp Ingot making by oneedirectional solidification
JPS5483218A (en) * 1977-12-14 1979-07-03 Hitachi Ltd Method of controlling legs of superconductively magnetically floating vehicle
US4325763A (en) * 1978-04-25 1982-04-20 Nippon Electric Company, Ltd. Method of manufacturing ceramic capacitors
JPS54151035A (en) * 1978-05-18 1979-11-27 Fujitsu Ltd Recording head
JPS5547574A (en) * 1978-09-28 1980-04-04 Sumitomo Electric Ind Ltd Optical character reading device
JPS5583218A (en) * 1978-12-19 1980-06-23 Matsushita Electric Ind Co Ltd Method of fabricating spiral ceramic capacitor
JPS55113581A (en) * 1979-02-26 1980-09-02 Canon Inc Liquid jet recording method
JPS55154383A (en) * 1979-05-12 1980-12-01 Tokyo Shibaura Electric Co Alumina and alumina metallizing method
US4265641A (en) * 1979-05-18 1981-05-05 Monsanto Company Method and apparatus for particle charging and particle collecting
ES8105585A1 (es) * 1979-05-18 1981-06-01 Monsanto Co Un aparato para cargar particulas de tamano inferior a la micra y mayores en una corriente de gas.
JPS5648666A (en) * 1979-09-28 1981-05-01 Ricoh Co Ltd Plural sheet recording system
JPS56155419A (en) * 1980-04-30 1981-12-01 Matsushita Electric Works Ltd Control circuit for loaded alternating current
JPS576385A (en) * 1980-06-12 1982-01-13 Citizen Watch Co Ltd Movement structure of digital watch
JPS5781779A (en) * 1980-11-11 1982-05-21 Nec Corp Method for compacting information of facsimile
JPS57129856A (en) * 1981-02-05 1982-08-12 Asahi Chemical Ind Imcombustible lightweight heat-insulating material
JPS57184296A (en) * 1981-05-09 1982-11-12 Hitachi Ltd Ceramic circuit board
JPS57205757A (en) * 1981-06-15 1982-12-16 Fuji Xerox Co Ltd Electrostatic charger
JPS57132134A (en) * 1981-12-29 1982-08-16 Canon Inc Data copying illuminator
JPS58154293A (ja) * 1982-03-10 1983-09-13 株式会社日立製作所 グリ−ンシ−トの寸法安定化法
JPS5944797A (ja) * 1982-09-07 1984-03-13 増田 閃一 物体の静電的処理装置
JP2919369B2 (ja) * 1996-07-30 1999-07-12 鹿児島日本電気株式会社 液晶表示装置及びその製造方法

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EP0102569A3 (en) 1984-10-10
DE3380890D1 (en) 1989-12-28
US4652318A (en) 1987-03-24
US4922099A (en) 1990-05-01
JPS5944797A (ja) 1984-03-13
EP0102569A2 (en) 1984-03-14
EP0102569B1 (en) 1989-11-23
KR920007084B1 (ko) 1992-08-24
JPH0349198B2 (ko) 1991-07-26

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