KR20100124287A - 구리의 표면처리방법 및 프린트 배선판의 표면처리방법 - Google Patents

구리의 표면처리방법 및 프린트 배선판의 표면처리방법 Download PDF

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Publication number
KR20100124287A
KR20100124287A KR1020107020269A KR20107020269A KR20100124287A KR 20100124287 A KR20100124287 A KR 20100124287A KR 1020107020269 A KR1020107020269 A KR 1020107020269A KR 20107020269 A KR20107020269 A KR 20107020269A KR 20100124287 A KR20100124287 A KR 20100124287A
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KR
South Korea
Prior art keywords
copper
surface treatment
mol
wiring board
printed wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020107020269A
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English (en)
Korean (ko)
Inventor
토시노리 카와무라
하루오 아카호시
쿠니오 아라이
Original Assignee
히다치 비아 메카닉스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 히다치 비아 메카닉스 가부시키가이샤 filed Critical 히다치 비아 메카닉스 가부시키가이샤
Publication of KR20100124287A publication Critical patent/KR20100124287A/ko
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
    • H05K3/0038—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material combined with laser drilling through a metal layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/34—Anodisation of metals or alloys not provided for in groups C25D11/04 - C25D11/32
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0104—Properties and characteristics in general
    • H05K2201/0112—Absorbing light, e.g. dielectric layer with carbon filler for laser processing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0315—Oxidising metal
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Laser Beam Processing (AREA)
  • Chemical Treatment Of Metals (AREA)
KR1020107020269A 2008-03-10 2009-02-25 구리의 표면처리방법 및 프린트 배선판의 표면처리방법 Withdrawn KR20100124287A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2008-060140 2008-03-10
JP2008060140A JP4870699B2 (ja) 2008-03-10 2008-03-10 銅の表面処理方法およびプリント配線板の表面処理方法

Publications (1)

Publication Number Publication Date
KR20100124287A true KR20100124287A (ko) 2010-11-26

Family

ID=41065065

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107020269A Withdrawn KR20100124287A (ko) 2008-03-10 2009-02-25 구리의 표면처리방법 및 프린트 배선판의 표면처리방법

Country Status (6)

Country Link
US (1) US20110036493A1 (enExample)
JP (1) JP4870699B2 (enExample)
KR (1) KR20100124287A (enExample)
CN (1) CN101965760A (enExample)
TW (1) TW201004517A (enExample)
WO (1) WO2009113396A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011055858A1 (de) 2010-12-07 2012-09-06 Lg Display Co., Ltd. Flüssigkristallanzeige

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2489974B (en) 2011-04-14 2015-10-21 Conductive Inkjet Tech Ltd Improvements in and relating to transparent components
JP5750686B2 (ja) * 2011-10-14 2015-07-22 メック株式会社 プリント配線板の製造方法及びこれに用いる表面処理剤
US20130256143A1 (en) * 2012-03-30 2013-10-03 GM Global Technology Operations LLC Anodized inserts for coulomb damping or frictional damping
US9202639B2 (en) 2012-08-17 2015-12-01 Nokia Technologies Oy Apparatus and associated methods
CN105256359A (zh) * 2015-11-27 2016-01-20 中国船舶重工集团公司第七二五研究所 一种铜合金钝化液及钝化层制备方法
CN112601473B (zh) 2018-09-06 2023-02-03 Ykk株式会社 紧固件部件
US11078589B2 (en) * 2019-08-28 2021-08-03 Saudi Arabian Oil Company Hydrophobic stainless-steel copper-coated mesh and method of synthesizing same
US20220342126A1 (en) * 2019-09-03 2022-10-27 3M Innovative Properties Company Optical films and methods of manufacturing such optical films
CN110923797A (zh) * 2019-11-08 2020-03-27 东莞市国瓷新材料科技有限公司 利用电解清洗、清洁改善dpc电镀填孔均匀性的工艺

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1417413A (en) * 1920-06-30 1922-05-23 Sestron Foreign Patents Ltd Coloration of metallic surfaces
JPH05259611A (ja) * 1992-03-12 1993-10-08 Hitachi Chem Co Ltd プリント配線板の製造法
JP3229701B2 (ja) * 1993-03-09 2001-11-19 臼井国際産業株式会社 銅素材表面における電気絶縁層の形成方法
JP3486543B2 (ja) * 1997-11-12 2004-01-13 キヤノン株式会社 酸化第１銅膜の堆積法及び該酸化第１銅膜堆積法を用いた半導体デバイスの製造方法
PL192904B1 (pl) * 1999-09-29 2006-12-29 Europa Metalli Spa Elektrochemiczny sposób wytwarzania nieorganicznej warstwy powłokowej na powierzchni elementu z miedzi lub ze stopu na bazie miedzi oraz wyrób miedziany
JP2002060967A (ja) * 2000-08-23 2002-02-28 Mec Kk 銅または銅合金の表面処理法
JP3968433B2 (ja) * 2003-03-27 2007-08-29 独立行政法人物質・材料研究機構 低反射材料とその作製方法
JP3883543B2 (ja) * 2003-04-16 2007-02-21 新光電気工業株式会社 導体基材及び半導体装置
TW200541434A (en) * 2004-04-30 2005-12-16 Hitachi Via Mechanics Ltd Printed circuit board and method for processing printed circuit board and method for manufacturing printed circuit board

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011055858A1 (de) 2010-12-07 2012-09-06 Lg Display Co., Ltd. Flüssigkristallanzeige

Also Published As

Publication number Publication date
TW201004517A (en) 2010-01-16
CN101965760A (zh) 2011-02-02
US20110036493A1 (en) 2011-02-17
WO2009113396A1 (ja) 2009-09-17
JP2009218368A (ja) 2009-09-24
JP4870699B2 (ja) 2012-02-08

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Date Code Title Description
PA0105 International application

Patent event date: 20100910

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid