KR20080016941A - 포토레지스트 필름 롤, 및 그 제조 방법 - Google Patents

포토레지스트 필름 롤, 및 그 제조 방법 Download PDF

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Publication number
KR20080016941A
KR20080016941A KR1020087000368A KR20087000368A KR20080016941A KR 20080016941 A KR20080016941 A KR 20080016941A KR 1020087000368 A KR1020087000368 A KR 1020087000368A KR 20087000368 A KR20087000368 A KR 20087000368A KR 20080016941 A KR20080016941 A KR 20080016941A
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KR
South Korea
Prior art keywords
photosensitive resin
film
photoresist film
width
resin layer
Prior art date
Application number
KR1020087000368A
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English (en)
Korean (ko)
Inventor
데루히로 우에마츠
도루 다카하시
고지 사이토
Original Assignee
도오꾜오까고오교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 도오꾜오까고오교 가부시끼가이샤 filed Critical 도오꾜오까고오교 가부시끼가이샤
Publication of KR20080016941A publication Critical patent/KR20080016941A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020087000368A 2005-06-20 2006-05-26 포토레지스트 필름 롤, 및 그 제조 방법 KR20080016941A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005179813A JP2006350245A (ja) 2005-06-20 2005-06-20 フォトレジストフィルムロール、およびその製造方法
JPJP-P-2005-00179813 2005-06-20

Publications (1)

Publication Number Publication Date
KR20080016941A true KR20080016941A (ko) 2008-02-22

Family

ID=37570277

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087000368A KR20080016941A (ko) 2005-06-20 2006-05-26 포토레지스트 필름 롤, 및 그 제조 방법

Country Status (5)

Country Link
JP (1) JP2006350245A (ja)
KR (1) KR20080016941A (ja)
CN (1) CN101203807B (ja)
TW (1) TW200719082A (ja)
WO (1) WO2006137243A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5109606B2 (ja) * 2007-11-15 2012-12-26 コニカミノルタホールディングス株式会社 有機エレクトロルミネッセンス素子の製造方法と保護フィルム
JP5181224B2 (ja) * 2008-04-28 2013-04-10 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及び、プリント配線板の製造方法
CN105676593B (zh) * 2016-01-19 2019-07-16 杭州福斯特应用材料股份有限公司 一种储存稳定的感光干膜及其制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5246901U (ja) * 1975-09-30 1977-04-02
JPS5611407Y2 (ja) * 1976-10-02 1981-03-14
JPS61279847A (ja) * 1985-06-05 1986-12-10 Nitto Electric Ind Co Ltd 画像形成材料
JPH0810790B2 (ja) * 1988-04-27 1996-01-31 ソマール株式会社 プリント基板カバーレイフィルム押圧用シート
JP2730630B2 (ja) * 1988-08-19 1998-03-25 日立化成工業 株式会社 積層体エレメントおよびその滲み出しの防止方法
JPH05267831A (ja) * 1992-03-17 1993-10-15 Matsushita Electric Ind Co Ltd プリント配線板の製造方法およびプリント配線板用ドライフィルムの製造方法
KR970009975B1 (en) * 1993-12-31 1997-06-19 Hyundai Electronics Ind Patterning method of photoresist for charge storage electrode in the semiconductor device
KR100399444B1 (ko) * 1995-06-30 2004-04-29 주식회사 하이닉스반도체 에지강조형위상반전마스크및그제조방법
JPH10115912A (ja) * 1996-10-09 1998-05-06 Dainippon Printing Co Ltd 感光性ドライフィルムレジストのラミネート方法
JPH1124251A (ja) * 1997-06-30 1999-01-29 Dainippon Printing Co Ltd ドライフィルム及びその製造方法並びにドライフィルムの転写方法と転写装置
JP2000058506A (ja) * 1998-08-06 2000-02-25 Mitsubishi Electric Corp 半導体装置の製造方法及び半導体装置
JP2002099079A (ja) * 2000-09-22 2002-04-05 Hitachi Chem Co Ltd 梱包物、感光性エレメントの梱包法、感光性エレメントのエッジフュージョン防止法及び感光性エレメントの巻きずれ防止法
JP2004034439A (ja) * 2002-07-02 2004-02-05 Nec Kagoshima Ltd ラミネ−タ装置

Also Published As

Publication number Publication date
WO2006137243A1 (ja) 2006-12-28
CN101203807B (zh) 2011-09-14
TWI349163B (ja) 2011-09-21
TW200719082A (en) 2007-05-16
CN101203807A (zh) 2008-06-18
JP2006350245A (ja) 2006-12-28

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