TW200719082A - Photoresist film roll and method for producing the same - Google Patents

Photoresist film roll and method for producing the same

Info

Publication number
TW200719082A
TW200719082A TW095120076A TW95120076A TW200719082A TW 200719082 A TW200719082 A TW 200719082A TW 095120076 A TW095120076 A TW 095120076A TW 95120076 A TW95120076 A TW 95120076A TW 200719082 A TW200719082 A TW 200719082A
Authority
TW
Taiwan
Prior art keywords
photoresist film
film roll
producing
photosensitive resin
resin layer
Prior art date
Application number
TW095120076A
Other languages
English (en)
Other versions
TWI349163B (zh
Inventor
Teruhiro Uematsu
Toru Takahashi
Koji Saito
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200719082A publication Critical patent/TW200719082A/zh
Application granted granted Critical
Publication of TWI349163B publication Critical patent/TWI349163B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095120076A 2005-06-20 2006-06-06 Photoresist film roll and method for producing the same TW200719082A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005179813A JP2006350245A (ja) 2005-06-20 2005-06-20 フォトレジストフィルムロール、およびその製造方法

Publications (2)

Publication Number Publication Date
TW200719082A true TW200719082A (en) 2007-05-16
TWI349163B TWI349163B (zh) 2011-09-21

Family

ID=37570277

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095120076A TW200719082A (en) 2005-06-20 2006-06-06 Photoresist film roll and method for producing the same

Country Status (5)

Country Link
JP (1) JP2006350245A (zh)
KR (1) KR20080016941A (zh)
CN (1) CN101203807B (zh)
TW (1) TW200719082A (zh)
WO (1) WO2006137243A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5109606B2 (ja) * 2007-11-15 2012-12-26 コニカミノルタホールディングス株式会社 有機エレクトロルミネッセンス素子の製造方法と保護フィルム
CN103792788A (zh) * 2008-04-28 2014-05-14 日立化成工业株式会社 感光性树脂组合物、感光性元件、抗蚀图形的形成方法及印刷电路板的制造方法
CN105676593B (zh) * 2016-01-19 2019-07-16 杭州福斯特应用材料股份有限公司 一种储存稳定的感光干膜及其制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5246901U (zh) * 1975-09-30 1977-04-02
JPS5611407Y2 (zh) * 1976-10-02 1981-03-14
JPS61279847A (ja) * 1985-06-05 1986-12-10 Nitto Electric Ind Co Ltd 画像形成材料
JPH0810790B2 (ja) * 1988-04-27 1996-01-31 ソマール株式会社 プリント基板カバーレイフィルム押圧用シート
JP2730630B2 (ja) * 1988-08-19 1998-03-25 日立化成工業 株式会社 積層体エレメントおよびその滲み出しの防止方法
JPH05267831A (ja) * 1992-03-17 1993-10-15 Matsushita Electric Ind Co Ltd プリント配線板の製造方法およびプリント配線板用ドライフィルムの製造方法
KR970009975B1 (en) * 1993-12-31 1997-06-19 Hyundai Electronics Ind Patterning method of photoresist for charge storage electrode in the semiconductor device
KR100399444B1 (ko) * 1995-06-30 2004-04-29 주식회사 하이닉스반도체 에지강조형위상반전마스크및그제조방법
JPH10115912A (ja) * 1996-10-09 1998-05-06 Dainippon Printing Co Ltd 感光性ドライフィルムレジストのラミネート方法
JPH1124251A (ja) * 1997-06-30 1999-01-29 Dainippon Printing Co Ltd ドライフィルム及びその製造方法並びにドライフィルムの転写方法と転写装置
JP2000058506A (ja) * 1998-08-06 2000-02-25 Mitsubishi Electric Corp 半導体装置の製造方法及び半導体装置
JP2002099079A (ja) * 2000-09-22 2002-04-05 Hitachi Chem Co Ltd 梱包物、感光性エレメントの梱包法、感光性エレメントのエッジフュージョン防止法及び感光性エレメントの巻きずれ防止法
JP2004034439A (ja) * 2002-07-02 2004-02-05 Nec Kagoshima Ltd ラミネ−タ装置

Also Published As

Publication number Publication date
CN101203807A (zh) 2008-06-18
JP2006350245A (ja) 2006-12-28
CN101203807B (zh) 2011-09-14
TWI349163B (zh) 2011-09-21
WO2006137243A1 (ja) 2006-12-28
KR20080016941A (ko) 2008-02-22

Similar Documents

Publication Publication Date Title
TW200617604A (en) Composition for forming antireflective film and method for forming wiring using the same
AU2003285175A1 (en) Drag reduction multilayer film and method of use
WO2006138587A3 (en) Three-dimensional direct-write lithography
TW200710579A (en) Bottom resist layer composition and patterning process using the same
EP1801647A4 (en) DRAFT FOR PHOTOMASQUE AND PHOTOMASQUE
SG131773A1 (en) Method of dividing a non-metal substrate
TW200608144A (en) Photoresist undercoat-forming material and patterning process
TWI366068B (en) Hardmask composition for processing resist underlayer film, process for producing semiconductor integrated circuit device using the hardmask composition, and semiconductor integrated circuit device produced by the process
WO2008070830A3 (en) Components for use in electro-optic displays
SG135043A1 (en) Wafer processing method
TW200641523A (en) Photosensitive resin composition for use in forming light-blocking layer, light-blocking layer and color filter
EP1783546A4 (en) SEMI-PORTABLE FILM, FOTOMASKENROHLING, PHOTOMASK AND METHOD FOR THE DESIGN OF A SEMI-PERMANENT FILM
TW200745167A (en) Polarizing plate and liquid crystal display
WO2006113145A3 (en) Systems and methods for mitigating variances on a patterned wafer using a prediction model
TW200741978A (en) Stressor integration and method thereof
WO2008090988A1 (ja) 光学素子、これを用いた露光装置、及びデバイス製造方法
TWI348061B (en) Polarizer-alignment dual function film, fabrication method thereof and lcd containing the polarizer-alignment films
GB2431514B (en) Thin film transistor, pixel structure and repairing method thereof
EP1422565A3 (en) Multilayer photoresist systems
EP1803773A4 (en) POLYMERIZABLE LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL FILM MADE FROM THE COMPOSITION
TW200719082A (en) Photoresist film roll and method for producing the same
TW200739137A (en) Method for forming surface unevenness
TWI316264B (en) Thin film transistor (tft) and method for fabricating the same
TW200720734A (en) Optical film and fabrication method thereof
TWI368827B (en) Hardmask composition for resist underlayer film and method for producing semiconductor integrated circuit device using the same