KR20060044544A - 반도체 장치, 자기 센서 및 자기 센서 유닛 - Google Patents
반도체 장치, 자기 센서 및 자기 센서 유닛 Download PDFInfo
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- KR20060044544A KR20060044544A KR1020050023596A KR20050023596A KR20060044544A KR 20060044544 A KR20060044544 A KR 20060044544A KR 1020050023596 A KR1020050023596 A KR 1020050023596A KR 20050023596 A KR20050023596 A KR 20050023596A KR 20060044544 A KR20060044544 A KR 20060044544A
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- electrode
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- semiconductor chip
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Abstract
Description
Claims (14)
- 반도체 장치에 있어서,표면에 집적 회로 및 이에 전기 접속된 센서 소자가 형성된 반도체 칩과,상기 반도체 칩의 표면측에 형성되고, 적어도 상기 집적 회로에 전기 접속된 패드 전극과,상기 반도체 칩의 표면측에 위치하고, 상기 반도체 칩을 외부 회로에 전기 접속하는 전극부와,상기 패드 전극 및 상기 전극부를 서로 전기 접속하는 배선부와,전기적인 절연 재료로 형성되고, 적어도 상기 전극부를 상기 반도체 칩의 표면측에 노출시킨 상태에서, 상기 반도체 칩의 표면을 피복함과 함께 상기 센서 소자, 배선부 및 전극부를 밀봉하는 절연부를 포함하고,상기 전극부는 상기 센서 소자와 상기 반도체 칩의 두께 방향으로 중첩되지 않는 위치에 배치되어 있는 것을 특징으로 하는 반도체 장치.
- 제1항에 있어서,상기 배선부는 상기 센서 소자와 상기 반도체 칩의 두께 방향으로 중첩되지 않는 위치에 배치되어 있는 것을 특징으로 하는 반도체 장치.
- 제1항에 있어서,상기 전극부가 복수개 제공되고,상기 반도체 칩의 표면을 대략 균등하게 분할하도록, 상기 표면을 따라 한 방향으로 연장되는 복수의 제1 격자선을 등간격으로 상정함과 함께, 상기 표면을 따라 상기 제1의 격자선에 직교하는 복수의 제2 격자선을 등간격으로 상정하고,이들 제1 격자선과 제2 격자선과의 각 교점을 상기 전극부의 가상의 배치 위치로 하며,상기 전극부 중, 상기 센서 소자와 상기 두께 방향으로 중첩되지 않는 하나의 전극부는, 상기 가상의 배치 위치에 배치되고,상기 전극부 중, 다른 전극부는, 상기 가상의 배치위치로부터 제1 격자선 혹은 제2 격자선을 따라 상기 센서 소자로부터 이격하는 방향으로 이동한 위치에 배치됨과 함께, 상기 제1의 격자선 혹은 제2 격자선 상에 있어, 서로 인접하는 격자선 사이에 배치되는 전극부의 수를 1 이하로 하는 것을 특징으로 하는 반도체 장치.
- 제1항에 있어서,상기 센서 소자 및 상기 전극부를 복수 구비하고,각 센서 소자와 이 센서 소자의 주위에 배치되는 상기 전극부와의 위치 관계, 및, 각 센서 소자의 주위에 배치되는 상기 전극부의 수가, 모든 상기 센서 소자에 관하여 동일한 것을 특징으로 하는 반도체 장치.
- 제1항에 있어서,상기 센서 소자에 인접하는 위치에 배치된 하나의 전극부가, 해당 하나의 전극부보다도 상기 센서 소자로부터 이격하여 배치된 다른 전극부와 비교하여 작게 형성되어 있는 것을 특징으로 하는 반도체 장치.
- 반도체 장치에 있어서,표면에 집적 회로 및 이에 전기 접속된 센서 소자가 형성된 반도체 칩과,상기 반도체 칩의 표면측에 형성되고, 적어도 상기 집적 회로에 전기 접속된 패드 전극과,상기 반도체 칩의 표면측에 위치하고, 상기 반도체 칩을 외부 회로에 전기 접속하는 복수의 전극부와,상기 패드 전극 및 상기 전극부를 서로 전기 접속하는 배선부와,전기적인 절연 재료로 형성되고, 적어도 상기 전극부를 상기 반도체 칩의 표면측에 노출시킨 상태에서, 상기 반도체 칩의 표면을 피복함과 함께 상기 센서 소자, 배선부 및 전극부를 밀봉하는 절연부를 포함하고,상기 전극부는 상기 절연부에서 상기 반도체 칩의 두께 방향으로 돌출하는 돌기부를 포함하고,상기 센서 소자에 인접하여 배치된 하나의 돌기부는 상기 센서 소자로부터 이격하여 배치된 다른 돌기부와 비교하여, 상기 절연부에서의 돌출 길이가 작은 것을 특징으로 하는 반도체 장치.
- 반도체 장치에 있어서,표면에 집적 회로 및 이에 전기 접속된 센서 소자가 형성된 반도체 칩과,상기 반도체 칩의 표면측에 형성되고, 적어도 상기 집적 회로에 전기 접속된 패드 전극과,상기 반도체 칩의 표면측에 위치하고, 상기 반도체 칩을 외부 회로에 전기 접속하는 복수의 전극부와,상기 패드 전극 및 상기 전극부를 서로 전기 접속하는 배선부와,전기적인 절연 재료로 형성되고, 적어도 상기 전극부를 상기 반도체 칩의 표면측에 노출시킨 상태에서, 상기 반도체 칩의 표면을 피복함과 함께 상기 센서 소자, 배선부 및 전극부를 밀봉하는 절연부를 포함하고,상기 전극부는 상기 절연부에서 상기 반도체 칩의 두께 방향으로 돌출하는 돌기부를 포함하고,상기 센서 소자에 인접하여 배치된 하나의 돌기부는 상기 센서 소자로부터 이격하여 배치된 다른 돌기부보다도 융점이 낮은 도전성 재료로 형성되어 있는 것을 특징으로 하는 반도체 장치.
- 반도체 장치에 있어서,표면에 집적 회로 및 이에 전기 접속된 센서 소자가 형성된 반도체 칩과,상기 반도체 칩의 표면측에 형성되고, 적어도 상기 집적 회로에 전기 접속된 패드 전극과,상기 반도체 칩의 표면측에 위치하고, 상기 반도체 칩을 외부 회로에 전기 접속하는 복수의 전극부와,상기 패드 전극 및 상기 전극부를 서로 전기 접속하는 배선부와,전기적인 절연 재료로 형성되고, 적어도 상기 전극부를 상기 반도체 칩의 표면측에 노출시킨 상태에서, 상기 반도체 칩의 표면을 피복함과 함께 상기 센서 소자, 배선부 및 전극부를 밀봉하는 절연부를 포함하고,상기 전극부는 상기 절연부에서 상기 반도체 칩의 두께 방향으로 돌출하는 돌기부를 포함하고,상기 돌기부는 도전성 재료로 형성된 대략 구 형상의 코어와, 상기 도전성 재료보다도 융점이 낮은 도전성 재료로 형성된 코어의 주위를 피복하는 외피부를 포함하고,상기 센서 소자에 인접하여 배치된 하나의 돌기부의 코어는 상기 센서 소자로부터 이격하여 배치된 다른 돌기부의 코어보다도 작게 형성되고, 또한, 상기하나의 돌기부 및 상기 다른 돌기부의 외피부의 직경이 대략 동등한 것을 특징으로 하는 반도체 장치.
- 자기 센서에 있어서,대략 판 형상으로 형성되고, 자계의 적어도 1 방향의 자기 성분에 대하여 감응하는 자기 센서 칩과, 상기 자기 센서 칩의 표면으로부터 돌출하고, 상기 자기 센서 칩을 대략 판 형상으로 회로 기판에 전기적으로 접속하는 복수의 전극부를 포함하고,상기 전극부는 상기 자기 센서 칩의 표면에 일렬로 배열되는 것을 특징으로 하는 자기 센서.
- 자기 센서에 있어서,대략 판 형상으로 형성되고, 자계의 적어도 1 방향의 자기 성분에 대하여 감응하는 자기 센서 칩과, 상기 자기 센서 칩의 표면으로부터 돌출하고, 상기 자기 센서 칩을 대략 판 형상의 회로 기판에 전기적으로 접속하는 복수의 전극부를 포함하고,상기 전극부는 상기 자기 센서 칩의 표면에 상호 평행한 복수의 열로 배열되고,상기 전극부의 돌출 길이는 상기 복수의 열의 배열 방향으로 점차 짧아지는 것을 특징으로 하는 자기 센서.
- 자기 센서 유닛에 있어서,제9항 또는 제10항에 기재된 2개의 자기 센서와, 표면에 전기 전극부를 접촉시켜 상기 자기 센서를 탑재하는 회로 기판을 포함하고,적어도 한 쪽의 상기 자기 센서의 자기 센서 칩이, 자계의 2 방향의 자기 성분에 대하여 감응하고,다른 쪽의 자기 센서 칩의 감응 방향이, 상기 한 쪽의 자기 센서 칩의 2개의 감응 방향을 포함하는 평면에 대하여 교차하도록, 각 자기 센서를 상기 회로 기판의 표면에 배치하는 것을 특징으로 하는 자기 센서 유닛.
- 자기 센서 유닛에 있어서,제9항 또는 제10항에 기재된 2개의 자기 센서와, 상기 자기 센서를 탑재하는 회로 기판을 포함하고,적어도 한 쪽의 상기 자기 센서의 자기 센서 칩이, 자계의 2방향의 자기 성분에 대하여 감응하고,다른 쪽의 자기 센서 칩의 감응 방향이, 상기 한 쪽의 자기 센서 칩의 2개의 감응 방향을 포함하는 평면에 대하여 교차하도록, 2개의 상기 자기 센서중 적어도 일부를 상기 회로 기판의 표면에 중첩시켜 배치하는 것을 특징으로 하는 자기 센서 유닛.
- 자기 센서 유닛에 있어서,자계의 2방향의 자기 성분에 대하여 감응하는 제1 자기 센서와, 자계의 적어도 1방향의 자기 성분에 대하여 감응하는 제2 자기 센서와, 이들 2개의 자기 센서를 표면에 탑재하는 대략 판 형상의 회로 기판을 포함하고,상기 각 자기 센서는 대략 판 형상으로 형성된 자기 센서 칩과, 상기 자기 센서 칩의 표면으로부터 돌출하고, 상기 회로 기판의 표면에 접촉시켜 상기 회로 기판에 전기 접속하는 복수의 전극부를 포함하고,상기 제2 자기 센서의 감응 방향이 상기 제1 자기 센서의 2개의 감응 방향을 포함하는 평면에 대하여 교차하도록, 또한, 상기 회로 기판의 표면을 기준으로 하여, 상기 회로 기판의 두께 방향에 관한 상기 회로 기판 및 상기 전극부의 높이 치수의 총합에 부분적인 변화를 유지시키도록, 적어도 한 쪽의 자기 센서 칩을 상기 회로 기판의 표면에 대하여 경사시키는 것을 특징으로 하는 자기 센서 유닛.
- 제13항에 있어서,상기 회로 기판의 표면은 계단 형상으로 형성되고, 적어도 한 쪽의 자기 센서의 전극부를 각 단의 상면에 배치하는 것을 특징으로 하는 자기 센서 유닛.
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JP2004087139A JP4547956B2 (ja) | 2004-03-24 | 2004-03-24 | 半導体装置、及び、チップサイズパッケージ |
JP2004087140A JP2005274302A (ja) | 2004-03-24 | 2004-03-24 | 磁気センサ及び磁気センサユニット |
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EP (1) | EP1580568A3 (ko) |
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Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1880422B1 (en) * | 2005-05-04 | 2011-08-03 | Nxp B.V. | A device comprising a sensor module |
JP2007273564A (ja) * | 2006-03-30 | 2007-10-18 | Toshiba Corp | プリント回路板、半導体パッケージ、および電子機器 |
DE102006057970B4 (de) * | 2006-12-08 | 2020-01-02 | Infineon Technologies Ag | Halbleiterbauteil mit einem Magnetfeldsensor und Verfahren zur Herstellung |
US9076717B2 (en) | 2006-12-08 | 2015-07-07 | Infineon Technologies Ag | Semiconductor component comprising magnetic field sensor |
US7566866B2 (en) * | 2007-09-10 | 2009-07-28 | Gennum Corporation | Systems and methods for a tilted optical receiver assembly |
US8587297B2 (en) * | 2007-12-04 | 2013-11-19 | Infineon Technologies Ag | Integrated circuit including sensor having injection molded magnetic material |
TWI379391B (en) * | 2008-05-05 | 2012-12-11 | Siliconware Precision Industries Co Ltd | Electronic carrier board |
US8610430B2 (en) * | 2008-05-30 | 2013-12-17 | Infineon Technologies Ag | Bias field generation for a magneto sensor |
US20110187359A1 (en) * | 2008-05-30 | 2011-08-04 | Tobias Werth | Bias field generation for a magneto sensor |
US8174256B2 (en) * | 2008-05-30 | 2012-05-08 | Infineon Technologies Ag | Methods and systems for magnetic field sensing |
US9524945B2 (en) | 2010-05-18 | 2016-12-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Cu pillar bump with L-shaped non-metal sidewall protection structure |
US8377816B2 (en) | 2009-07-30 | 2013-02-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of forming electrical connections |
US8841766B2 (en) | 2009-07-30 | 2014-09-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Cu pillar bump with non-metal sidewall protection structure |
US8324738B2 (en) | 2009-09-01 | 2012-12-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Self-aligned protection layer for copper post structure |
US8659155B2 (en) | 2009-11-05 | 2014-02-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mechanisms for forming copper pillar bumps |
US8610270B2 (en) | 2010-02-09 | 2013-12-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and semiconductor assembly with lead-free solder |
US8441124B2 (en) | 2010-04-29 | 2013-05-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Cu pillar bump with non-metal sidewall protection structure |
US9018758B2 (en) | 2010-06-02 | 2015-04-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Cu pillar bump with non-metal sidewall spacer and metal top cap |
US8546254B2 (en) | 2010-08-19 | 2013-10-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mechanisms for forming copper pillar bumps using patterned anodes |
WO2012032962A1 (ja) * | 2010-09-10 | 2012-03-15 | コニカミノルタオプト株式会社 | 生体磁気計測装置、生体磁気計測システム、及び、生体磁気計測方法 |
US8357983B1 (en) * | 2011-08-04 | 2013-01-22 | Allegro Microsystems, Inc. | Hall effect element having a wide cross shape with dimensions selected to result in improved performance characteristics |
CN102385043B (zh) * | 2011-08-30 | 2013-08-21 | 江苏多维科技有限公司 | Mtj三轴磁场传感器及其封装方法 |
US9721912B2 (en) | 2011-11-02 | 2017-08-01 | Maxim Integrated Products, Inc. | Wafer-level chip-scale package device having bump assemblies configured to furnish shock absorber functionality |
US10804233B1 (en) * | 2011-11-02 | 2020-10-13 | Maxim Integrated Products, Inc. | Wafer-level chip-scale package device having bump assemblies configured to maintain standoff height |
US20130199831A1 (en) * | 2012-02-06 | 2013-08-08 | Christopher Morris | Electromagnetic field assisted self-assembly with formation of electrical contacts |
JP5912701B2 (ja) * | 2012-03-15 | 2016-04-27 | アルプス電気株式会社 | 磁気検出装置の製造方法 |
US9281292B2 (en) | 2012-06-25 | 2016-03-08 | Intel Corporation | Single layer low cost wafer level packaging for SFF SiP |
CN102925347B (zh) * | 2012-08-29 | 2016-01-20 | 张楚凡 | 半导体芯片、半导体酶芯片及筛选目标酶的方法 |
DE102013209514A1 (de) * | 2013-05-22 | 2014-11-27 | Micronas Gmbh | Dreidimensionaler Hallsensor zum Detektieren eines räumlichen Magnetfeldes |
CN104515957B (zh) * | 2013-09-27 | 2017-05-31 | 上海矽睿科技有限公司 | 磁传感装置及其制备方法 |
JP6318565B2 (ja) | 2013-11-13 | 2018-05-09 | セイコーエプソン株式会社 | 半導体装置および電子機器 |
JP2017174994A (ja) | 2016-03-24 | 2017-09-28 | ソニー株式会社 | 撮像装置、電子機器 |
JP6839938B2 (ja) * | 2016-07-25 | 2021-03-10 | 旭化成エレクトロニクス株式会社 | 半導体装置、磁気検出装置、半導体装置の製造方法および電子コンパス |
CN108075035B (zh) * | 2016-11-18 | 2021-08-20 | 旭化成微电子株式会社 | 霍尔元件 |
EP3477323B1 (en) * | 2016-12-16 | 2020-05-13 | Melexis Technologies SA | Magnetic sensor |
JP7015087B2 (ja) * | 2017-03-23 | 2022-02-02 | 旭化成エレクトロニクス株式会社 | ホール素子 |
CN111788679A (zh) * | 2018-02-13 | 2020-10-16 | 思睿逻辑国际半导体有限公司 | 包含无源电气组件的集成电路的制造 |
DE102019009298B4 (de) * | 2018-04-04 | 2024-08-22 | Infineon Technologies Ag | Transistorvorrichtungen sowie Verfahren zur Herstellung von Transistorvorrichtungen |
DE112019005745T5 (de) | 2018-11-15 | 2021-07-29 | Rohm Co., Ltd. | Halbleiterbauelement |
US11226709B2 (en) * | 2020-03-13 | 2022-01-18 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Touch substrate and touch screen |
CN114699087B (zh) * | 2022-05-23 | 2023-01-10 | 国家纳米科学中心 | 神经电极结构及其植入方法和制作方法 |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3225856A (en) * | 1963-10-01 | 1965-12-28 | Gen Motors Corp | Safety hinge and latch for a vehicle body closure |
KR910002313B1 (ko) * | 1985-05-10 | 1991-04-11 | 아사히가세이고오교 가부시끼가이샤 | 자전 변환소자 |
DE3855322T2 (de) * | 1987-08-21 | 1996-10-10 | Nippon Denso Co | Anordnung zur Detektion von Magnetismus |
US5262666A (en) * | 1989-05-15 | 1993-11-16 | Nippondenso Co., Ltd. | Semiconductor device with a nickel alloy protective resistor |
JP2557998B2 (ja) * | 1990-04-04 | 1996-11-27 | 旭化成工業株式会社 | InAsホール効果素子 |
JPH0677557A (ja) * | 1992-07-30 | 1994-03-18 | Mitsubishi Electric Corp | 混成集積回路装置 |
JP3260921B2 (ja) * | 1993-08-25 | 2002-02-25 | 株式会社デンソー | 可動体変位検出装置 |
JP2970455B2 (ja) * | 1994-03-14 | 1999-11-02 | 株式会社デンソー | 磁気抵抗素子の製造方法およびその磁場処理装置 |
US6195228B1 (en) * | 1997-01-06 | 2001-02-27 | Nec Research Institute, Inc. | Thin, horizontal-plane hall sensors for read-heads in magnetic recording |
WO1999036957A1 (fr) * | 1998-01-19 | 1999-07-22 | Citizen Watch Co., Ltd. | Boitier de semiconducteur |
DE59912726D1 (de) * | 1998-03-30 | 2005-12-08 | Sentron Ag Zug | Magnetfeldsensor |
DE69936461T2 (de) * | 1998-08-07 | 2008-03-13 | Asahi Kasei Emd Corporation | Magnetsensor und zugehöriges herstellungsverfahren |
US6552425B1 (en) * | 1998-12-18 | 2003-04-22 | Intel Corporation | Integrated circuit package |
JP2001284497A (ja) * | 2000-04-03 | 2001-10-12 | Fujitsu Ltd | 半導体装置及びその製造方法及び半導体チップ及びその製造方法 |
JP3701542B2 (ja) * | 2000-05-10 | 2005-09-28 | シャープ株式会社 | 半導体装置およびその製造方法 |
JP2001337671A (ja) * | 2000-05-29 | 2001-12-07 | Kawai Musical Instr Mfg Co Ltd | 鍵盤楽器の大屋根前開閉装置 |
US20020024109A1 (en) * | 2000-08-29 | 2002-02-28 | Kambiz Hayat-Dawoodi | Integrated circuit and method for magnetic sensor testing |
JP3465790B2 (ja) * | 2000-09-25 | 2003-11-10 | 日本電信電話株式会社 | 光・電気集積回路実装構造及びその製作法 |
JP4444485B2 (ja) | 2000-11-21 | 2010-03-31 | 旭化成エレクトロニクス株式会社 | 角度センサ |
JP3498737B2 (ja) * | 2001-01-24 | 2004-02-16 | ヤマハ株式会社 | 磁気センサの製造方法 |
KR100427356B1 (ko) * | 2001-08-14 | 2004-04-13 | 삼성전기주식회사 | 광마우스용 서브 칩 온 보드 |
JP3626469B2 (ja) * | 2002-04-19 | 2005-03-09 | 三菱電機株式会社 | 磁気抵抗センサ装置 |
JP2004077374A (ja) * | 2002-08-21 | 2004-03-11 | Tokai Rika Co Ltd | 磁気センサの配置構造 |
CN2598149Y (zh) * | 2002-12-30 | 2004-01-07 | 胜开科技股份有限公司 | 光传感器封装改良构造 |
CN2598147Y (zh) * | 2002-12-30 | 2004-01-07 | 胜开科技股份有限公司 | 具高像素的影像传感器封装构造 |
JP2004281818A (ja) * | 2003-03-17 | 2004-10-07 | Seiko Epson Corp | 半導体装置、電子デバイス、電子機器、キャリア基板の製造方法、半導体装置の製造方法および電子デバイスの製造方法 |
JP2004363157A (ja) * | 2003-06-02 | 2004-12-24 | Res Inst Electric Magnetic Alloys | 薄膜磁気センサ及びその製造方法 |
JP4547956B2 (ja) * | 2004-03-24 | 2010-09-22 | ヤマハ株式会社 | 半導体装置、及び、チップサイズパッケージ |
-
2005
- 2005-03-22 KR KR1020050023596A patent/KR100780496B1/ko not_active IP Right Cessation
- 2005-03-22 TW TW094108786A patent/TWI281037B/zh not_active IP Right Cessation
- 2005-03-22 CN CNB2005100591178A patent/CN100438011C/zh not_active Expired - Fee Related
- 2005-03-22 EP EP05006248A patent/EP1580568A3/en not_active Withdrawn
- 2005-03-22 US US11/085,573 patent/US7309904B2/en not_active Expired - Fee Related
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2006
- 2006-04-28 US US11/412,923 patent/US7265430B2/en active Active
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2007
- 2007-08-10 US US11/837,435 patent/US20070284684A1/en not_active Abandoned
- 2007-10-29 US US11/927,395 patent/US20080173961A1/en not_active Abandoned
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TW200600815A (en) | 2006-01-01 |
CN1674270A (zh) | 2005-09-28 |
EP1580568A2 (en) | 2005-09-28 |
US20050230827A1 (en) | 2005-10-20 |
KR100780496B1 (ko) | 2007-11-29 |
CN100438011C (zh) | 2008-11-26 |
US7265430B2 (en) | 2007-09-04 |
US7309904B2 (en) | 2007-12-18 |
TWI281037B (en) | 2007-05-11 |
US20060197168A1 (en) | 2006-09-07 |
US20070284684A1 (en) | 2007-12-13 |
US20080173961A1 (en) | 2008-07-24 |
EP1580568A3 (en) | 2012-09-19 |
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