KR20010031578A - 변성 폴리이미드 수지 및 이를 함유하는 열경화성 수지조성물 - Google Patents
변성 폴리이미드 수지 및 이를 함유하는 열경화성 수지조성물 Download PDFInfo
- Publication number
- KR20010031578A KR20010031578A KR1020007004626A KR20007004626A KR20010031578A KR 20010031578 A KR20010031578 A KR 20010031578A KR 1020007004626 A KR1020007004626 A KR 1020007004626A KR 20007004626 A KR20007004626 A KR 20007004626A KR 20010031578 A KR20010031578 A KR 20010031578A
- Authority
- KR
- South Korea
- Prior art keywords
- formula
- component
- isocyanate
- equivalent
- polybutadiene
- Prior art date
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 57
- 239000009719 polyimide resin Substances 0.000 title claims abstract description 41
- 239000011342 resin composition Substances 0.000 title claims abstract description 30
- 229920001187 thermosetting polymer Polymers 0.000 title claims abstract description 11
- 239000005062 Polybutadiene Substances 0.000 claims abstract description 46
- 229920002857 polybutadiene Polymers 0.000 claims abstract description 46
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 37
- 150000001875 compounds Chemical class 0.000 claims abstract description 33
- -1 diisocyanate compound Chemical class 0.000 claims abstract description 17
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 16
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims abstract description 14
- 230000001588 bifunctional effect Effects 0.000 claims abstract description 4
- 239000010408 film Substances 0.000 claims description 49
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 45
- 239000011347 resin Substances 0.000 claims description 42
- 229920005989 resin Polymers 0.000 claims description 42
- 239000012948 isocyanate Substances 0.000 claims description 30
- 150000002513 isocyanates Chemical class 0.000 claims description 30
- 238000006243 chemical reaction Methods 0.000 claims description 27
- 239000002994 raw material Substances 0.000 claims description 24
- 150000008065 acid anhydrides Chemical class 0.000 claims description 16
- 229920005862 polyol Polymers 0.000 claims description 15
- 150000003077 polyols Chemical class 0.000 claims description 15
- 239000004642 Polyimide Substances 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 10
- 150000002894 organic compounds Chemical class 0.000 claims description 10
- 239000010419 fine particle Substances 0.000 claims description 9
- 229920002121 Hydroxyl-terminated polybutadiene Polymers 0.000 claims description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 8
- 238000006116 polymerization reaction Methods 0.000 claims description 8
- 229920001971 elastomer Polymers 0.000 claims description 5
- 239000005060 rubber Substances 0.000 claims description 5
- 239000004952 Polyamide Substances 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims description 4
- 229920002647 polyamide Polymers 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000005056 polyisocyanate Substances 0.000 claims description 2
- 229920001228 polyisocyanate Polymers 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims description 2
- 230000004048 modification Effects 0.000 claims 1
- 238000012986 modification Methods 0.000 claims 1
- 229920002994 synthetic fiber Polymers 0.000 claims 1
- 239000000969 carrier Substances 0.000 abstract description 3
- 239000000047 product Substances 0.000 description 23
- 239000011248 coating agent Substances 0.000 description 18
- 238000000576 coating method Methods 0.000 description 18
- 238000007789 sealing Methods 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 239000007787 solid Substances 0.000 description 10
- 238000004132 cross linking Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 6
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 6
- UNPLRYRWJLTVAE-UHFFFAOYSA-N Cloperastine hydrochloride Chemical compound Cl.C1=CC(Cl)=CC=C1C(C=1C=CC=CC=1)OCCN1CCCCC1 UNPLRYRWJLTVAE-UHFFFAOYSA-N 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 238000005452 bending Methods 0.000 description 5
- KAKZBPTYRLMSJV-UHFFFAOYSA-N butadiene group Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 125000005442 diisocyanate group Chemical group 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 4
- 239000002966 varnish Substances 0.000 description 4
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 3
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 3
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 3
- 239000005058 Isophorone diisocyanate Substances 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000008034 disappearance Effects 0.000 description 3
- 238000010292 electrical insulation Methods 0.000 description 3
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 3
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 3
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- 125000004018 acid anhydride group Chemical group 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000002981 blocking agent Substances 0.000 description 2
- 239000007809 chemical reaction catalyst Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- WHIVNJATOVLWBW-UHFFFAOYSA-N n-butan-2-ylidenehydroxylamine Chemical compound CCC(C)=NO WHIVNJATOVLWBW-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 2
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- AXFVIWBTKYFOCY-UHFFFAOYSA-N 1-n,1-n,3-n,3-n-tetramethylbutane-1,3-diamine Chemical compound CN(C)C(C)CCN(C)C AXFVIWBTKYFOCY-UHFFFAOYSA-N 0.000 description 1
- LTMRRSWNXVJMBA-UHFFFAOYSA-L 2,2-diethylpropanedioate Chemical compound CCC(CC)(C([O-])=O)C([O-])=O LTMRRSWNXVJMBA-UHFFFAOYSA-L 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- JYCTWJFSRDBYJX-UHFFFAOYSA-N 5-(2,5-dioxooxolan-3-yl)-3a,4,5,9b-tetrahydrobenzo[e][2]benzofuran-1,3-dione Chemical compound O=C1OC(=O)CC1C1C2=CC=CC=C2C(C(=O)OC2=O)C2C1 JYCTWJFSRDBYJX-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- UWLZEGRKCBALET-UHFFFAOYSA-N 6-(2,5-dioxooxolan-3-yl)-4-methyl-4,5,6,7-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)=C2C(C)CC1C1CC(=O)OC1=O UWLZEGRKCBALET-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-N Acetoacetic acid Natural products CC(=O)CC(O)=O WDJHALXBUFZDSR-UHFFFAOYSA-N 0.000 description 1
- 239000004953 Aliphatic polyamide Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- PXAJQJMDEXJWFB-UHFFFAOYSA-N acetone oxime Chemical compound CC(C)=NO PXAJQJMDEXJWFB-UHFFFAOYSA-N 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 229920003231 aliphatic polyamide Polymers 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000010382 chemical cross-linking Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013039 cover film Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- WOWBFOBYOAGEEA-UHFFFAOYSA-N diafenthiuron Chemical compound CC(C)C1=C(NC(=S)NC(C)(C)C)C(C(C)C)=CC(OC=2C=CC=CC=2)=C1 WOWBFOBYOAGEEA-UHFFFAOYSA-N 0.000 description 1
- PKKGKUDPKRTKLJ-UHFFFAOYSA-L dichloro(dimethyl)stannane Chemical compound C[Sn](C)(Cl)Cl PKKGKUDPKRTKLJ-UHFFFAOYSA-L 0.000 description 1
- CCAFPWNGIUBUSD-UHFFFAOYSA-N diethyl sulfoxide Chemical compound CCS(=O)CC CCAFPWNGIUBUSD-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- BVURNMLGDQYNAF-UHFFFAOYSA-N dimethyl(1-phenylethyl)amine Chemical compound CN(C)C(C)C1=CC=CC=C1 BVURNMLGDQYNAF-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- ABMDIECEEGFXNC-UHFFFAOYSA-N n-ethylpropanamide Chemical compound CCNC(=O)CC ABMDIECEEGFXNC-UHFFFAOYSA-N 0.000 description 1
- MZYHMUONCNKCHE-UHFFFAOYSA-N naphthalene-1,2,3,4-tetracarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=C(C(O)=O)C(C(O)=O)=C21 MZYHMUONCNKCHE-UHFFFAOYSA-N 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- DVQHRBFGRZHMSR-UHFFFAOYSA-N sodium methyl 2,2-dimethyl-4,6-dioxo-5-(N-prop-2-enoxy-C-propylcarbonimidoyl)cyclohexane-1-carboxylate Chemical compound [Na+].C=CCON=C(CCC)[C-]1C(=O)CC(C)(C)C(C(=O)OC)C1=O DVQHRBFGRZHMSR-UHFFFAOYSA-N 0.000 description 1
- WSFQLUVWDKCYSW-UHFFFAOYSA-M sodium;2-hydroxy-3-morpholin-4-ylpropane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC(O)CN1CCOCC1 WSFQLUVWDKCYSW-UHFFFAOYSA-M 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/65—Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/30—Low-molecular-weight compounds
- C08G18/34—Carboxylic acids; Esters thereof with monohydroxyl compounds
- C08G18/343—Polycarboxylic acids having at least three carboxylic acid groups
- C08G18/346—Polycarboxylic acids having at least three carboxylic acid groups having four carboxylic acid groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/69—Polymers of conjugated dienes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/80—Masked polyisocyanates
- C08G18/8061—Masked polyisocyanates masked with compounds having only one group containing active hydrogen
- C08G18/807—Masked polyisocyanates masked with compounds having only one group containing active hydrogen with nitrogen containing compounds
- C08G18/8077—Oximes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1035—Preparatory processes from tetracarboxylic acids or derivatives and diisocyanates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49866—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
- H01L23/49894—Materials of the insulating layers or coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0216—Reduction of cross-talk, noise or electromagnetic interference
- H05K1/023—Reduction of cross-talk, noise or electromagnetic interference using auxiliary mounted passive components or auxiliary substances
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
- Y10T428/31681—Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Electromagnetism (AREA)
- Polyurethanes Or Polyureas (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
Description
Claims (11)
- 수평균 분자량 800 내지 5,000의 2관능성 수산기 말단 폴리부타디엔(화합물 a), 화학식 1의 4염기산 2무수물(화합물 b) 및 디이소시아네이트 화합물(화합물 c)을 반응시켜 수득할 수 있는 화학식 2의 변성 폴리이미드 수지.화학식 1화학식 2위의 화학식 1 및 화학식 2에서,R1은 카복실기를 4개 갖는 유기 화합물의 카복실기를 제거한 잔기이며,R2는 이소시아네이트기를 2개 갖는 유기 화합물의 이소시아네이트기를 제거한 잔기이며,R3은 수산기 말단 폴리부타디엔의 수산기를 제거한 잔기이며,L1 및 M1은 각각 폴리부타디엔 단위 및 폴리이미드 단위의 구성수의 비이며,n1은 중합도이며, 이때 L1+M1=1, 0〈L1〈1, 0〈M1〈1인 동시에 1≤n1≤10,000이다.
- 수평균 분자량 800 내지 5,000의 2관능성 수산기 말단 폴리부타디엔과 디이소시아네이트 화합물을 당량수로 하여 수산기:이소시아네이트기= 1: 1.5 내지 2.5로 반응시켜 수득할 수 있는 화학식 3의 이소시아네이트기 함유 생성물(합성원료 1, 이소시아네이트 당량수: X당량) 및 화학식 1의 4염기산 2무수물(합성원료 2, 산무수물 당량수: Y당량)을 반응시켜 수득할 수 있는 화학식 2의 변성 폴리이미드 수지.화학식 3위의 화학식 3에서,R2는 이소시아네이트기를 2개 갖는 유기 화합물의 이소시아네이트기를 제거한 잔기이며,R3은 수산기 말단 폴리부타디엔의 수산기를 제거한 잔기이며,n2는 중합도이며 0≤n2≤100이다.
- 합성원료 1 및 2를 이들의 당량수가 Y〉X≥Y/3, 0〈X 또한 0〈Y의 범위로 반응시켜 수득할 수 있는 화학식 4의 변성 폴리이미드 수지.화학식 4위의 화학식 4에서,R1은 카복실기를 4개 갖는 유기 화합물(4염기산)의 카복실기를 제거한 잔기이며,R2는 이소시아네이트기를 2개 갖는 유기 화합물의 이소시아네이트기를 제거한 잔기이며,R3은 수산기 말단 폴리부타디엔의 수산기를 제거한 잔기이며,L2 및 M2는 각각 폴리부타디엔 단위 및 폴리이미드 단위의 구성수의 비이며,n3은 중합도이며, 이때 L2+M2=1, 0〈L2〈1, 0〈M2〈1인 동시에 1≤n3≤1,000이다.
- 제3항에 따르는 수지에 추가로 화학식 3의 이소시아네이트기 함유 생성물 또는/및 디이소시아네이트 화합물(화합물 c)(합성원료 3, 이소시아네이트 당량수: Z당량)을 반응시켜 수득할 수 있는 화학식 2의 변성 폴리이미드 수지.
- 제4항에 있어서, 합성원료 1, 2 및 3을 이들의 당량수가 Y>(X+Z)≥Y/3, 0.2≤(Z/X)≤5, 0〈X, 0〈Y, 또한 0≤Z의 범위로 반응시켜 수득할 수 있는 화학식 4의 변성 폴리이미드 수지.
- 수평균 분자량이 1,000 내지 8,000이며 1분자당 2 내지 10개의 수산기를 갖는 폴리부타디엔 폴리올(성분 A), 제3항 또는 제5항에 따르는 화학식 4의 변성 폴리이미드 수지(성분 B) 및 수평균 분자량이 1,000 내지 8,000이며 1분자당 2 내지 10개의 블록 이소시아네이트기를 갖는 폴리부타디엔 폴리 블록 이소시아네이트(성분 C)를 필수성분으로서 함유하며 성분 A와 성분 B의 중량비가 고형분으로서 (A):(B)= 40:60 내지 90:10이며 또한 폴리 블록 이소시아네이트의 양이 성분 A의 수산기 당량수와 성분 B의 산무수물 당량수의 합에 대하여 0.8 내지 3.5배 당량수인 열경화성 절연 수지 조성물
- 제6항에 있어서, 고무 미립자 또는/및 폴리아미드 미립자를 첨가하여 이루어진 열경화성 절연 수지 조성물.
- 수평균 분자량이 1,000 내지 8,000이며 1분자당 2 내지 10개의 수산기를 갖는 폴리부타디엔 폴리올(성분 A), 제3항 또는 제5항에 따르는 화학식 4의 변성 폴리이미드 수지(성분 B) 및 수평균 분자량이 1,000 내지 8,000이며 1분자당 2 내지 10개의 블록 이소시아네이트기를 갖는 폴리부타디엔 폴리 블록 이소시아네이트(성분 C)를 필수성분으로서 함유하며 성분 A와 성분 B의 중량비가 고형분으로서 (A):(B)= 40:60 내지 90:10이며 또한 폴리 블록 이소시아네이트의 양이 성분 A의 수산기 당량수와 성분 B의 산무수물 당량수의 합에 대하여 0.8 내지 3.5배 당량수인 가요성 회로 오버코팅용 수지 조성물.
- 제8항에 있어서, 고무 미립자 또는/및 폴리아미드 미립자를 첨가하여 이루어진 가요성 회로 오버코팅용 수지 조성물.
- 절연성 필름과 그 위에 금속 박막으로 형성된 패턴을 가지며 절곡 부분의 절연 필름의 일부 또는 전부가 제거되어 있는 필름 캐리어에서 절곡 부분을 포함하는 접속 부분 이외의 배선 패턴면측에 제8항 또는 제9항에 따르는 수지 조성물을 주성분으로 하는 오버코팅제를 도포한 필름 캐리어.
- 제10항에 따르는 필름 캐리어를 사용하는 필름 캐리어 장치.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP00604498A JP4016226B2 (ja) | 1998-01-14 | 1998-01-14 | 変成ポリイミド樹脂及びこれを含有する熱硬化性樹脂組成物 |
JP98-6044 | 1998-01-14 | ||
PCT/JP1999/000075 WO1999036454A1 (en) | 1998-01-14 | 1999-01-13 | Modified polyimide resin and thermosetting resin composition containing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010031578A true KR20010031578A (ko) | 2001-04-16 |
KR100510365B1 KR100510365B1 (ko) | 2005-08-24 |
Family
ID=11627640
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2000-7004626A KR100510365B1 (ko) | 1998-01-14 | 1999-01-13 | 변성 폴리이미드 수지, 이를 함유하는 열경화성 수지 조성물 및 가요성 회로 오버코팅용 수지 조성물 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6335417B1 (ko) |
EP (1) | EP1048680B1 (ko) |
JP (1) | JP4016226B2 (ko) |
KR (1) | KR100510365B1 (ko) |
DE (1) | DE69935312T2 (ko) |
TW (1) | TWI229103B (ko) |
WO (1) | WO1999036454A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8288484B2 (en) | 2009-03-10 | 2012-10-16 | Samsung Electronics Co., Ltd. | Cross-linked product of metal-containing polyamic acid, cross-linked product of metal-containing polyimide including the cross-linked product of metal-containing polyamic acid, method of manufacturing the cross-linked product of metal-containing polyimide, and polyimide film including the cross-linked product of metal-containing polyimide |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3972481B2 (ja) * | 1998-05-14 | 2007-09-05 | 日本メクトロン株式会社 | 感光性組成物 |
JP4296588B2 (ja) | 1999-04-22 | 2009-07-15 | 味の素株式会社 | 熱硬化性樹脂組成物およびこれを用いたフレキシブル回路オーバーコート剤 |
WO2002100139A1 (fr) * | 2001-06-01 | 2002-12-12 | Ajinomoto Co., Inc. | Procede de formation d'un film de protection d'isolation souple d'une carte de circuit imprime souple et carte de circuit imprime souple constituee du film de protection d'isolation souple ainsi que son procede d'obtention |
KR100930937B1 (ko) | 2002-01-31 | 2009-12-10 | 디아이씨 가부시끼가이샤 | 열경화성 폴리이미드 수지 조성물 및 폴리이미드 수지의제조 방법 |
JP2005042086A (ja) * | 2003-07-07 | 2005-02-17 | Nitto Denko Corp | ポリアミドイミド樹脂、ポリアミドイミド樹脂の製造方法、ポリアミドイミド樹脂組成物、被膜形成材料、及び電子部品用接着剤 |
JP4534117B2 (ja) * | 2003-07-15 | 2010-09-01 | 日立化成工業株式会社 | ポリイミド樹脂、ポリイミド樹脂組成物、それを用いた被膜形成材料、および電子部品 |
JP4617848B2 (ja) * | 2004-01-08 | 2011-01-26 | 日立化成工業株式会社 | 接着剤組成物及び回路接続用接着剤組成物 |
JP4929623B2 (ja) * | 2004-06-21 | 2012-05-09 | 味の素株式会社 | 変性ポリイミド樹脂を含有する熱硬化性樹脂組成物 |
JP4650176B2 (ja) * | 2004-09-10 | 2011-03-16 | 宇部興産株式会社 | ポリブタジエンを含んだ変性ポリイミド樹脂、その組成物及び硬化絶縁膜 |
US7687113B2 (en) * | 2004-09-10 | 2010-03-30 | Ube Industries, Inc. | Modified polyimide resin and curable resin composition |
JP2006137943A (ja) * | 2004-10-15 | 2006-06-01 | Ajinomoto Co Inc | 樹脂組成物 |
TW200621853A (en) * | 2004-10-15 | 2006-07-01 | Ajinomoto Kk | Resin composition |
JP4701914B2 (ja) * | 2004-10-29 | 2011-06-15 | 宇部興産株式会社 | 耐燃性が改良されたテープキャリアパッケージ用柔軟性配線板 |
JP4743204B2 (ja) * | 2005-05-27 | 2011-08-10 | 日立化成工業株式会社 | 変性ポリウレタン樹脂及びこれを用いた接着剤組成物、並びに回路部材の接続方法及び回路部材の接続構造 |
KR101021047B1 (ko) * | 2005-10-10 | 2011-03-15 | 아지노모토 가부시키가이샤 | 변성 폴리이미드 수지를 함유하는 열경화성 수지 조성물 |
US20070088134A1 (en) * | 2005-10-13 | 2007-04-19 | Ajinomoto Co. Inc | Thermosetting resin composition containing modified polyimide resin |
JP4986256B2 (ja) * | 2005-12-21 | 2012-07-25 | 味の素株式会社 | 変性ポリイミド樹脂を含有するプリプレグ |
JP5017894B2 (ja) * | 2006-03-14 | 2012-09-05 | 宇部興産株式会社 | 変性ポリイミド樹脂組成物 |
JP4224086B2 (ja) * | 2006-07-06 | 2009-02-12 | 三井金属鉱業株式会社 | 耐折性に優れた配線基板および半導体装置 |
JP4485504B2 (ja) * | 2006-09-19 | 2010-06-23 | ニッタ株式会社 | 画像形成装置用ベルト |
JP2008101195A (ja) * | 2006-09-19 | 2008-05-01 | Nitta Ind Corp | イミド変性エラストマー |
JP5208399B2 (ja) * | 2006-10-24 | 2013-06-12 | ニッタ株式会社 | ポリイミド樹脂 |
KR101472941B1 (ko) * | 2007-04-19 | 2014-12-16 | 가부시키가이샤 가네카 | 신규한 폴리이미드 전구체 조성물 및 그 이용 |
WO2008153208A1 (ja) * | 2007-06-14 | 2008-12-18 | Ajinomoto Co., Inc. | 多層プリント配線板の層間絶縁用樹脂組成物 |
JP5602339B2 (ja) * | 2007-08-27 | 2014-10-08 | ニッタ株式会社 | イミド変性エラストマー |
JP5031606B2 (ja) * | 2008-01-30 | 2012-09-19 | ソニー株式会社 | 電池パック及びその製造方法 |
CN102046727B (zh) | 2008-06-02 | 2013-02-13 | 株式会社钟化 | 树脂组合物及其利用 |
CN102076732B (zh) | 2008-07-22 | 2013-03-13 | 株式会社钟化 | 新型聚酰亚胺前体组合物及其利用 |
WO2010071107A1 (ja) * | 2008-12-15 | 2010-06-24 | 宇部興産株式会社 | 熱硬化性変性ポリイミド樹脂組成物 |
JP5621190B2 (ja) * | 2008-12-15 | 2014-11-05 | 宇部興産株式会社 | 変性ポリイミド樹脂組成物 |
JP5399754B2 (ja) * | 2009-03-31 | 2014-01-29 | 大阪瓦斯株式会社 | ポリイミド樹脂前駆体及びその硬化物 |
US8541108B2 (en) * | 2010-09-27 | 2013-09-24 | Xerox Corporation | Fuser member |
JP5699388B2 (ja) * | 2010-11-30 | 2015-04-08 | 大日本印刷株式会社 | 粘着剤組成物および粘着テープ |
US8507634B2 (en) * | 2010-12-22 | 2013-08-13 | Xerox Corporation | Polyimide intermediate transfer belt |
CN103443158B (zh) | 2011-05-31 | 2015-03-25 | 东洋纺株式会社 | 含羧基聚酰亚胺、热固性树脂组合物及柔性覆金属层叠体 |
WO2013072224A1 (de) * | 2011-11-16 | 2013-05-23 | Basf Se | Polymeres material, seine herstellung und verwendung |
CN109867954B (zh) | 2017-12-05 | 2021-07-27 | 财团法人工业技术研究院 | 树脂组合物 |
JP7042691B2 (ja) * | 2018-05-29 | 2022-03-28 | エア・ウォーター株式会社 | ビニルベンジルエーテル樹脂、当該ビニルベンジルエーテル樹脂の製造方法、硬化性樹脂組成物、当該硬化性樹脂組成物の硬化物、およびシールド部材 |
TW202219116A (zh) * | 2020-06-29 | 2022-05-16 | 日商日本化藥股份有限公司 | 異氰酸酯改質聚醯亞胺樹脂、樹脂組成物及其硬化物 |
US20240026064A1 (en) * | 2022-07-22 | 2024-01-25 | Kuroki Industrial Co., Ltd. | Modified polyurethane carrier substrate |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5231240B2 (ko) * | 1973-12-29 | 1977-08-13 | ||
JPS5850651B2 (ja) * | 1978-12-11 | 1983-11-11 | 日立化成工業株式会社 | 熱硬化性樹脂組成物 |
JPS63156828A (ja) * | 1986-12-22 | 1988-06-29 | Nippon Hidorajin Kogyo Kk | 新規な重縮合物 |
JP2815668B2 (ja) * | 1990-04-20 | 1998-10-27 | 住友ベークライト株式会社 | カバーコート付フレキシブルプリント回路板の製造方法 |
JP2868977B2 (ja) * | 1993-07-30 | 1999-03-10 | 住友ベークライト株式会社 | フィルム状接着剤 |
JPH07216339A (ja) * | 1993-12-07 | 1995-08-15 | Sanyo Chem Ind Ltd | ゴムチップ弾性体用バインダー |
JPH0812763A (ja) * | 1994-06-27 | 1996-01-16 | Tomoegawa Paper Co Ltd | 新規ポリアミドイミド共重合体、その製造方法、それを含む被膜形成材料およびパターン形成方法 |
JPH1112499A (ja) * | 1997-06-20 | 1999-01-19 | Hitachi Chem Co Ltd | 耐湿熱性変性ポリアミドイミド樹脂ペースト及びこれを用いた電子部品 |
TW393494B (en) * | 1997-08-14 | 2000-06-11 | Ajinomoto Kk | Curable resin composition for overcoat of flexible circuit |
-
1998
- 1998-01-14 JP JP00604498A patent/JP4016226B2/ja not_active Expired - Lifetime
-
1999
- 1999-01-13 US US09/581,543 patent/US6335417B1/en not_active Expired - Lifetime
- 1999-01-13 WO PCT/JP1999/000075 patent/WO1999036454A1/ja active IP Right Grant
- 1999-01-13 TW TW88100477A patent/TWI229103B/zh not_active IP Right Cessation
- 1999-01-13 DE DE1999635312 patent/DE69935312T2/de not_active Expired - Fee Related
- 1999-01-13 KR KR10-2000-7004626A patent/KR100510365B1/ko not_active IP Right Cessation
- 1999-01-13 EP EP19990900289 patent/EP1048680B1/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8288484B2 (en) | 2009-03-10 | 2012-10-16 | Samsung Electronics Co., Ltd. | Cross-linked product of metal-containing polyamic acid, cross-linked product of metal-containing polyimide including the cross-linked product of metal-containing polyamic acid, method of manufacturing the cross-linked product of metal-containing polyimide, and polyimide film including the cross-linked product of metal-containing polyimide |
Also Published As
Publication number | Publication date |
---|---|
JP4016226B2 (ja) | 2007-12-05 |
WO1999036454A1 (en) | 1999-07-22 |
DE69935312T2 (de) | 2007-10-31 |
EP1048680A1 (en) | 2000-11-02 |
JPH11199669A (ja) | 1999-07-27 |
DE69935312D1 (de) | 2007-04-12 |
US6335417B1 (en) | 2002-01-01 |
KR100510365B1 (ko) | 2005-08-24 |
EP1048680A4 (en) | 2003-05-21 |
TWI229103B (en) | 2005-03-11 |
EP1048680B1 (en) | 2007-02-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100510365B1 (ko) | 변성 폴리이미드 수지, 이를 함유하는 열경화성 수지 조성물 및 가요성 회로 오버코팅용 수지 조성물 | |
US20060083928A1 (en) | Resin composition | |
KR100545459B1 (ko) | 가요성회로오버코팅용경화성수지조성물및이의박막상경화물 | |
JP2006137943A (ja) | 樹脂組成物 | |
JP2011052220A (ja) | ポリブタジエンを含んだ変性ポリイミド樹脂、その組成物及び硬化絶縁膜 | |
TWI439483B (zh) | Thermosetting resin composition | |
JPWO2011004756A1 (ja) | 配線板の保護膜用熱硬化性組成物 | |
KR100554864B1 (ko) | 열경화성 수지 조성물, 및 이를 사용하는 가요성 회로 오버코트제 | |
JP2007146188A (ja) | 変性ポリイミド樹脂の製造方法 | |
JP3844025B2 (ja) | オーバーコート用樹脂組成物 | |
JP3962940B2 (ja) | フレキシブル回路オーバーコート用樹脂組成物 | |
KR100542418B1 (ko) | 가요성 회로 오버 코팅용 경화성 수지 조성물 | |
JPH1171551A (ja) | フレキシブル回路オーバーコート用樹脂組成物 | |
JPH1161037A (ja) | フレキシブル回路オーバーコート用樹脂組成物 | |
JP4864399B2 (ja) | オーバーコート用樹脂組成物 | |
KR20220077952A (ko) | 커버레이 필름 제조용 수지 조성물, 이를 이용한 커버레이 필름 및 인쇄회로기판의 제조방법 | |
JP2011256403A (ja) | ポリイミド樹脂の製造方法 | |
JPH06268357A (ja) | 防湿絶縁処理された実装回路板の製造法 | |
JPH04331268A (ja) | ソルダ−レジストインク |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20120724 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20130719 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20140721 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20150716 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20160721 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20170720 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20180801 Year of fee payment: 14 |
|
EXPY | Expiration of term |