KR102914619B1 - 촬상 유닛 및 측정 장치 - Google Patents

촬상 유닛 및 측정 장치

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Publication number
KR102914619B1
KR102914619B1 KR1020227024143A KR20227024143A KR102914619B1 KR 102914619 B1 KR102914619 B1 KR 102914619B1 KR 1020227024143 A KR1020227024143 A KR 1020227024143A KR 20227024143 A KR20227024143 A KR 20227024143A KR 102914619 B1 KR102914619 B1 KR 102914619B1
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KR
South Korea
Prior art keywords
wavelength
light
transmittance
imaging
dichroic mirror
Prior art date
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Application number
KR1020227024143A
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English (en)
Korean (ko)
Other versions
KR20220137629A (ko
Inventor
도모노리 나카무라
Original Assignee
하마마츠 포토닉스 가부시키가이샤
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Priority to KR1020267001282A priority Critical patent/KR20260019648A/ko
Publication of KR20220137629A publication Critical patent/KR20220137629A/ko
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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0205Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608Height gauges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G01B11/0633Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection using one or more discrete wavelengths
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0691Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of objects while moving
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/027Control of working procedures of a spectrometer; Failure detection; Bandwidth calculation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28Investigating the spectrum
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28Investigating the spectrum
    • G01J3/30Measuring the intensity of spectral lines directly on the spectrum itself
    • G01J3/36Investigating two or more bands of a spectrum by separate detectors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S17/00Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
    • G01S17/88Lidar systems specially adapted for specific applications
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
    • G01S7/481Constructional features, e.g. arrangements of optical elements
    • G01S7/4814Constructional features, e.g. arrangements of optical elements of transmitters alone
    • G01S7/4815Constructional features, e.g. arrangements of optical elements of transmitters alone using multiple transmitters
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
    • G01S7/481Constructional features, e.g. arrangements of optical elements
    • G01S7/4816Constructional features, e.g. arrangements of optical elements of receivers alone
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
    • G01S7/481Constructional features, e.g. arrangements of optical elements
    • G01S7/4817Constructional features, e.g. arrangements of optical elements relating to scanning
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10Beam splitting or combining systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10Beam splitting or combining systems
    • G02B27/14Beam splitting or combining systems operating by reflection only
    • G02B27/141Beam splitting or combining systems operating by reflection only using dichroic mirrors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Optical Filters (AREA)
  • Blocking Light For Cameras (AREA)
  • Studio Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020227024143A 2020-02-13 2021-01-04 촬상 유닛 및 측정 장치 Active KR102914619B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020267001282A KR20260019648A (ko) 2020-02-13 2021-01-04 촬상 유닛 및 측정 장치

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020022724 2020-02-13
JPJP-P-2020-022724 2020-02-13
PCT/JP2021/000041 WO2021161684A1 (ja) 2020-02-13 2021-01-04 撮像ユニット及び測定装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020267001282A Division KR20260019648A (ko) 2020-02-13 2021-01-04 촬상 유닛 및 측정 장치

Publications (2)

Publication Number Publication Date
KR20220137629A KR20220137629A (ko) 2022-10-12
KR102914619B1 true KR102914619B1 (ko) 2026-01-19

Family

ID=77291527

Family Applications (4)

Application Number Title Priority Date Filing Date
KR1020227024143A Active KR102914619B1 (ko) 2020-02-13 2021-01-04 촬상 유닛 및 측정 장치
KR1020267001282A Pending KR20260019648A (ko) 2020-02-13 2021-01-04 촬상 유닛 및 측정 장치
KR1020227018393A Pending KR20220137616A (ko) 2020-02-13 2021-02-02 높이 계측 장치 및 높이 계측 방법
KR1020227018154A Pending KR20220137615A (ko) 2020-02-13 2021-02-09 막 두께 측정 장치 및 막 두께 측정 방법

Family Applications After (3)

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KR1020267001282A Pending KR20260019648A (ko) 2020-02-13 2021-01-04 촬상 유닛 및 측정 장치
KR1020227018393A Pending KR20220137616A (ko) 2020-02-13 2021-02-02 높이 계측 장치 및 높이 계측 방법
KR1020227018154A Pending KR20220137615A (ko) 2020-02-13 2021-02-09 막 두께 측정 장치 및 막 두께 측정 방법

Country Status (7)

Country Link
US (5) US12467740B2 (https=)
EP (5) EP4443120A3 (https=)
JP (8) JP7629437B2 (https=)
KR (4) KR102914619B1 (https=)
CN (4) CN115087849A (https=)
TW (5) TWI869534B (https=)
WO (3) WO2021161684A1 (https=)

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JP7637614B2 (ja) * 2021-12-15 2025-02-28 浜松ホトニクス株式会社 計測装置及び計測方法
KR102859859B1 (ko) * 2022-11-18 2025-09-15 한국생산기술연구원 유기박막 두께 측정장치, 및 방법
EP4603791A1 (en) 2023-01-10 2025-08-20 Hamamatsu Photonics K.K. Film thickness measuring device and film thickness measuring method
CN120500609A (zh) 2023-01-10 2025-08-15 浜松光子学株式会社 膜厚测定装置及膜厚测定方法
KR20260012697A (ko) * 2023-05-19 2026-01-27 하마마츠 포토닉스 가부시키가이샤 검사 장치 및 검사 방법
KR20260012696A (ko) * 2023-05-19 2026-01-27 하마마츠 포토닉스 가부시키가이샤 검사 장치 및 검사 방법
WO2025243616A1 (ja) * 2024-05-24 2025-11-27 浜松ホトニクス株式会社 光情報取得装置及び光情報取得方法
JP2025177908A (ja) * 2024-05-24 2025-12-05 浜松ホトニクス株式会社 光情報取得装置及び光情報取得方法
JP2025177906A (ja) * 2024-05-24 2025-12-05 浜松ホトニクス株式会社 検査装置及び検査方法
WO2025243617A1 (ja) * 2024-05-24 2025-11-27 浜松ホトニクス株式会社 カメラ
JP2026000304A (ja) * 2024-06-17 2026-01-05 浜松ホトニクス株式会社 撮像装置
JP7848272B2 (ja) * 2024-07-09 2026-04-20 浜松ホトニクス株式会社 半導体デバイス製造方法
WO2026074789A1 (ja) * 2024-10-01 2026-04-09 浜松ホトニクス株式会社 膜厚測定方法及び膜厚測定装置
JP2026067064A (ja) * 2024-10-08 2026-04-20 浜松ホトニクス株式会社 物質センシング装置、光集積回路及び物質センシング方法

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