KR102789884B1 - 패턴 묘화 장치 및 패턴 묘화 방법 - Google Patents

패턴 묘화 장치 및 패턴 묘화 방법 Download PDF

Info

Publication number
KR102789884B1
KR102789884B1 KR1020187008676A KR20187008676A KR102789884B1 KR 102789884 B1 KR102789884 B1 KR 102789884B1 KR 1020187008676 A KR1020187008676 A KR 1020187008676A KR 20187008676 A KR20187008676 A KR 20187008676A KR 102789884 B1 KR102789884 B1 KR 102789884B1
Authority
KR
South Korea
Prior art keywords
scanning
substrate
light source
unit
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020187008676A
Other languages
English (en)
Korean (ko)
Other versions
KR20180058728A (ko
Inventor
마사키 가토
슈이치 나카야마
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Priority to KR1020257010194A priority Critical patent/KR20250051128A/ko
Publication of KR20180058728A publication Critical patent/KR20180058728A/ko
Application granted granted Critical
Publication of KR102789884B1 publication Critical patent/KR102789884B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/124—Details of the optical system between the light source and the polygonal mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/125—Details of the optical system between the polygonal mirror and the image plane
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
    • G02F1/33—Acousto-optical deflection devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Mechanical Optical Scanning Systems (AREA)
KR1020187008676A 2015-09-28 2016-09-27 패턴 묘화 장치 및 패턴 묘화 방법 Active KR102789884B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020257010194A KR20250051128A (ko) 2015-09-28 2016-09-27 패턴 묘화 장치 및 패턴 묘화 방법

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2015-189496 2015-09-28
JP2015189496A JP6651768B2 (ja) 2015-09-28 2015-09-28 パターン描画装置
PCT/JP2016/078541 WO2017057415A1 (ja) 2015-09-28 2016-09-27 パターン描画装置およびパターン描画方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020257010194A Division KR20250051128A (ko) 2015-09-28 2016-09-27 패턴 묘화 장치 및 패턴 묘화 방법

Publications (2)

Publication Number Publication Date
KR20180058728A KR20180058728A (ko) 2018-06-01
KR102789884B1 true KR102789884B1 (ko) 2025-04-01

Family

ID=58423880

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020187008676A Active KR102789884B1 (ko) 2015-09-28 2016-09-27 패턴 묘화 장치 및 패턴 묘화 방법
KR1020257010194A Pending KR20250051128A (ko) 2015-09-28 2016-09-27 패턴 묘화 장치 및 패턴 묘화 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020257010194A Pending KR20250051128A (ko) 2015-09-28 2016-09-27 패턴 묘화 장치 및 패턴 묘화 방법

Country Status (6)

Country Link
JP (1) JP6651768B2 (enExample)
KR (2) KR102789884B1 (enExample)
CN (5) CN116974156A (enExample)
HK (2) HK1248829A1 (enExample)
TW (2) TWI762965B (enExample)
WO (1) WO2017057415A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6901261B2 (ja) * 2016-12-27 2021-07-14 株式会社ディスコ レーザー装置
CN111512233B (zh) * 2017-09-08 2023-03-28 株式会社尼康 图案描绘装置
JP6891083B2 (ja) 2017-09-25 2021-06-18 株式会社Ｓｃｒｅｅｎホールディングス 基材処理装置および検出方法
JP7070581B2 (ja) * 2017-09-26 2022-05-18 株式会社ニコン パターン描画装置
TWI667530B (zh) * 2017-09-28 2019-08-01 日商紐富來科技股份有限公司 Inspection method and inspection device
KR102667683B1 (ko) 2017-10-25 2024-05-22 가부시키가이샤 니콘 패턴 묘화 장치
JP6583451B2 (ja) * 2018-03-01 2019-10-02 株式会社ニコン パターン描画装置
JP7239388B2 (ja) * 2019-05-09 2023-03-14 株式会社アドテックエンジニアリング 直描式露光装置
TWI790178B (zh) * 2020-11-02 2023-01-11 日商尼康股份有限公司 圖案曝光裝置
JP7744276B2 (ja) * 2022-03-24 2025-09-25 株式会社Ｓｃｒｅｅｎホールディングス 光源装置
FR3150917A1 (fr) * 2023-07-06 2025-01-10 Commissariat à l'Energie Atomique et aux Energies Alternatives Système laser adapté à distribuer un faisceau laser impulsionnel de puissance suivant plusieurs directions successives

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005034859A (ja) * 2003-07-17 2005-02-10 Sumitomo Heavy Ind Ltd レーザ加工装置
JP2008158326A (ja) 2006-12-25 2008-07-10 Olympus Corp レーザ走査型顕微鏡
JP2011108772A (ja) 2009-11-16 2011-06-02 Omron Corp レーザ加工装置およびレーザ加工方法
JP2015145990A (ja) * 2014-02-04 2015-08-13 株式会社ニコン 露光装置

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01237513A (ja) * 1987-05-13 1989-09-22 Dainippon Screen Mfg Co Ltd 光ビーム偏向走査装置
JP2711197B2 (ja) * 1992-01-21 1998-02-10 大日本スクリーン製造株式会社 光ビーム走査方法
JP3474302B2 (ja) * 1995-03-20 2003-12-08 富士写真フイルム株式会社 光ビーム偏向走査装置
JPH10142538A (ja) * 1996-11-12 1998-05-29 Asahi Optical Co Ltd マルチヘッド走査光学系を持つレーザ描画装置
CN100350329C (zh) * 1998-06-23 2007-11-21 株式会社理光 光束特性评价装置
JP3945951B2 (ja) * 1999-01-14 2007-07-18 日立ビアメカニクス株式会社 レーザ加工方法およびレーザ加工機
SE516347C2 (sv) * 1999-11-17 2001-12-17 Micronic Laser Systems Ab Laserskanningssystem och metod för mikrolitografisk skrivning
JP3975478B2 (ja) * 2001-07-17 2007-09-12 セイコーエプソン株式会社 パターン描画装置
JP2003039730A (ja) * 2001-08-01 2003-02-13 Noritsu Koki Co Ltd 焼付装置およびこれを備えた画像出力装置ならびに焼付方法
JP3617479B2 (ja) * 2001-08-03 2005-02-02 松下電器産業株式会社 レーザ加工装置およびその加工方法
JP2003053576A (ja) * 2001-08-16 2003-02-26 Sumitomo Heavy Ind Ltd レーザ加工方法及び装置
JP4593884B2 (ja) * 2002-05-10 2010-12-08 キヤノン株式会社 レーザ走査制御装置
JP2004223934A (ja) * 2003-01-24 2004-08-12 Canon Inc 画像形成装置
JP4699699B2 (ja) * 2004-01-15 2011-06-15 株式会社東芝 ビーム光走査装置及び画像形成装置
JP2006053438A (ja) * 2004-08-13 2006-02-23 Fuji Photo Film Co Ltd 走査露光装置
CN101203808A (zh) * 2005-04-15 2008-06-18 麦克罗尼克激光系统公司 图像增强技术
JP4425206B2 (ja) * 2005-11-07 2010-03-03 シャープ株式会社 光走査装置及びこれを用いた画像形成装置
JP2007269001A (ja) * 2006-03-10 2007-10-18 Ricoh Co Ltd 光走査装置、光走査方法、画像形成装置、カラー画像形成装置、プログラム、記録媒体
JP4952182B2 (ja) * 2006-03-20 2012-06-13 株式会社ニコン 走査型露光装置、マイクロデバイスの製造方法、走査露光方法、及びマスク
DE102007011425A1 (de) * 2007-03-08 2008-09-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Projektionsvorrichtung zum scannenden Projizieren
JP4946593B2 (ja) * 2007-04-20 2012-06-06 パナソニック株式会社 プラズマディスプレイ装置およびプラズマディスプレイパネルの駆動方法
JP4934498B2 (ja) * 2007-05-17 2012-05-16 キヤノン株式会社 走査式光学装置、画像形成装置及びジッター補正方法
JP2008309820A (ja) * 2007-06-12 2008-12-25 Dainippon Screen Mfg Co Ltd 描画システム、描画装置、および描画方法
JP2009020489A (ja) * 2007-06-14 2009-01-29 Kyocera Mita Corp 現像装置及びそれを備えた画像形成装置
JP4473297B2 (ja) * 2007-09-20 2010-06-02 日立ビアメカニクス株式会社 レーザ直描装置
JP2009146515A (ja) * 2007-12-14 2009-07-02 Sony Corp 記憶媒体製造方法、情報記憶原盤製造装置
JP5391579B2 (ja) * 2008-05-15 2014-01-15 船井電機株式会社 振動素子
JP5428666B2 (ja) * 2008-09-17 2014-02-26 株式会社リコー 画像形成装置および画像形成方法
CN101364053B (zh) * 2008-09-19 2010-09-29 清溢精密光电（深圳）有限公司 一种光刻机曝光系统及其控制方法
JP5193326B2 (ja) * 2011-02-25 2013-05-08 三星ダイヤモンド工業株式会社 基板加工装置および基板加工方法
CN103777476B (zh) * 2012-10-19 2016-01-27 上海微电子装备有限公司 一种离轴对准系统及对准方法
JP6281193B2 (ja) * 2013-05-30 2018-02-21 ソニー株式会社 レーザー走査型顕微鏡システム
JP6311720B2 (ja) * 2013-10-25 2018-04-18 株式会社ニコン レーザ装置、該レーザ装置を備えた露光装置及び検査装置
CN109212748B (zh) * 2014-04-28 2021-05-18 株式会社尼康 光束扫描装置及光束扫描方法
JP6349924B2 (ja) * 2014-04-28 2018-07-04 株式会社ニコン パターン描画装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005034859A (ja) * 2003-07-17 2005-02-10 Sumitomo Heavy Ind Ltd レーザ加工装置
JP2008158326A (ja) 2006-12-25 2008-07-10 Olympus Corp レーザ走査型顕微鏡
JP2011108772A (ja) 2009-11-16 2011-06-02 Omron Corp レーザ加工装置およびレーザ加工方法
JP2015145990A (ja) * 2014-02-04 2015-08-13 株式会社ニコン 露光装置

Also Published As

Publication number Publication date
CN110082905A (zh) 2019-08-02
CN108931899A (zh) 2018-12-04
CN108139690A (zh) 2018-06-08
KR20250051128A (ko) 2025-04-16
TW201727393A (zh) 2017-08-01
TWI762965B (zh) 2022-05-01
CN116974156A (zh) 2023-10-31
TW202038024A (zh) 2020-10-16
CN109991733B (zh) 2021-07-30
WO2017057415A1 (ja) 2017-04-06
HK1257067A1 (zh) 2019-10-11
JP2017067823A (ja) 2017-04-06
CN108931899B (zh) 2021-08-06
CN110082905B (zh) 2022-06-03
TWI701525B (zh) 2020-08-11
CN109991733A (zh) 2019-07-09
HK1248829A1 (zh) 2018-10-19
JP6651768B2 (ja) 2020-02-19
KR20180058728A (ko) 2018-06-01

Similar Documents

Publication Publication Date Title
KR102789884B1 (ko) 패턴 묘화 장치 및 패턴 묘화 방법
KR102060289B1 (ko) 패턴 묘화 장치
KR102414046B1 (ko) 패턴 묘화 장치 및 패턴 묘화 방법
JP6583451B2 (ja) パターン描画装置
JP6870755B2 (ja) パターン描画方法
JP6582782B2 (ja) パターン描画装置
JP6835163B2 (ja) パターン露光装置
JP6504293B2 (ja) パターン描画装置
HK40003476A (en) Pattern rendering device and substrate treatment device
HK40004637A (en) Pattern drawing device and substrate treatment device, as well as pattern drawing method and method for manufacturing elements
JP2017058494A (ja) パターン描画装置、パターン描画方法、基板処理装置、および、デバイス製造方法
HK40001179A (en) Pattern drawing device and pattern drawing method
HK1262718A1 (en) Pattern drawing device
HK1258827A1 (en) Pattern drawing device, pattern drawing method, and device manufacturing method
HK1261466A1 (en) Beam scanning device and beam scanning method
HK40007812A (en) Pattern exposure device
HK1232961A1 (en) Pattern drawing device, pattern drawing method, device manufacturing method, laser light source device, beam scanning device, and beam scanning method

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E90F Notification of reason for final refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A16-div-PA0104

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601