JP6651768B2 - パターン描画装置 - Google Patents

パターン描画装置 Download PDF

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Publication number
JP6651768B2
JP6651768B2 JP2015189496A JP2015189496A JP6651768B2 JP 6651768 B2 JP6651768 B2 JP 6651768B2 JP 2015189496 A JP2015189496 A JP 2015189496A JP 2015189496 A JP2015189496 A JP 2015189496A JP 6651768 B2 JP6651768 B2 JP 6651768B2
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JP
Japan
Prior art keywords
scanning
substrate
light
unit
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2015189496A
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English (en)
Japanese (ja)
Other versions
JP2017067823A5 (enExample
JP2017067823A (ja
Inventor
加藤　正紀
正紀 加藤
中山　修一
修一 中山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2015189496A priority Critical patent/JP6651768B2/ja
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to CN201910086058.5A priority patent/CN109991733B/zh
Priority to CN201811044160.0A priority patent/CN108931899B/zh
Priority to KR1020187008676A priority patent/KR102789884B1/ko
Priority to PCT/JP2016/078541 priority patent/WO2017057415A1/ja
Priority to CN201680056753.1A priority patent/CN108139690A/zh
Priority to CN201910086630.8A priority patent/CN110082905B/zh
Priority to HK18108158.1A priority patent/HK1248829A1/zh
Priority to CN202311024301.3A priority patent/CN116974156A/zh
Priority to KR1020257010194A priority patent/KR20250051128A/ko
Priority to TW105131295A priority patent/TWI701525B/zh
Priority to TW109122577A priority patent/TWI762965B/zh
Publication of JP2017067823A publication Critical patent/JP2017067823A/ja
Publication of JP2017067823A5 publication Critical patent/JP2017067823A5/ja
Priority to HK18116235.1A priority patent/HK1257067A1/zh
Application granted granted Critical
Publication of JP6651768B2 publication Critical patent/JP6651768B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/124—Details of the optical system between the light source and the polygonal mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/125—Details of the optical system between the polygonal mirror and the image plane
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
    • G02F1/33—Acousto-optical deflection devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Mechanical Optical Scanning Systems (AREA)
JP2015189496A 2015-09-28 2015-09-28 パターン描画装置 Active JP6651768B2 (ja)

Priority Applications (13)

Application Number Priority Date Filing Date Title
JP2015189496A JP6651768B2 (ja) 2015-09-28 2015-09-28 パターン描画装置
KR1020257010194A KR20250051128A (ko) 2015-09-28 2016-09-27 패턴 묘화 장치 및 패턴 묘화 방법
KR1020187008676A KR102789884B1 (ko) 2015-09-28 2016-09-27 패턴 묘화 장치 및 패턴 묘화 방법
PCT/JP2016/078541 WO2017057415A1 (ja) 2015-09-28 2016-09-27 パターン描画装置およびパターン描画方法
CN201680056753.1A CN108139690A (zh) 2015-09-28 2016-09-27 图案描绘装置及图案描绘方法
CN201910086630.8A CN110082905B (zh) 2015-09-28 2016-09-27 图案描绘装置及基板处理装置
HK18108158.1A HK1248829A1 (zh) 2015-09-28 2016-09-27 图案描绘装置及图案描绘方法
CN202311024301.3A CN116974156A (zh) 2015-09-28 2016-09-27 图案描绘装置
CN201910086058.5A CN109991733B (zh) 2015-09-28 2016-09-27 图案描绘装置及基板处理装置
CN201811044160.0A CN108931899B (zh) 2015-09-28 2016-09-27 图案描绘装置及基板处理装置
TW105131295A TWI701525B (zh) 2015-09-28 2016-09-29 圖案描繪裝置
TW109122577A TWI762965B (zh) 2015-09-28 2016-09-29 圖案描繪裝置
HK18116235.1A HK1257067A1 (zh) 2015-09-28 2018-06-25 图案描绘装置及图案描绘方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015189496A JP6651768B2 (ja) 2015-09-28 2015-09-28 パターン描画装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2018036163A Division JP6583451B2 (ja) 2018-03-01 2018-03-01 パターン描画装置
JP2020007215A Division JP6870755B2 (ja) 2020-01-21 2020-01-21 パターン描画方法

Publications (3)

Publication Number Publication Date
JP2017067823A JP2017067823A (ja) 2017-04-06
JP2017067823A5 JP2017067823A5 (enExample) 2018-04-19
JP6651768B2 true JP6651768B2 (ja) 2020-02-19

Family

ID=58423880

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015189496A Active JP6651768B2 (ja) 2015-09-28 2015-09-28 パターン描画装置

Country Status (6)

Country Link
JP (1) JP6651768B2 (enExample)
KR (2) KR102789884B1 (enExample)
CN (5) CN116974156A (enExample)
HK (2) HK1248829A1 (enExample)
TW (2) TWI762965B (enExample)
WO (1) WO2017057415A1 (enExample)

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* Cited by examiner, † Cited by third party
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JP6901261B2 (ja) * 2016-12-27 2021-07-14 株式会社ディスコ レーザー装置
CN111512233B (zh) * 2017-09-08 2023-03-28 株式会社尼康 图案描绘装置
JP6891083B2 (ja) 2017-09-25 2021-06-18 株式会社Ｓｃｒｅｅｎホールディングス 基材処理装置および検出方法
JP7070581B2 (ja) * 2017-09-26 2022-05-18 株式会社ニコン パターン描画装置
TWI667530B (zh) * 2017-09-28 2019-08-01 日商紐富來科技股份有限公司 Inspection method and inspection device
KR102667683B1 (ko) 2017-10-25 2024-05-22 가부시키가이샤 니콘 패턴 묘화 장치
JP6583451B2 (ja) * 2018-03-01 2019-10-02 株式会社ニコン パターン描画装置
JP7239388B2 (ja) * 2019-05-09 2023-03-14 株式会社アドテックエンジニアリング 直描式露光装置
TWI790178B (zh) * 2020-11-02 2023-01-11 日商尼康股份有限公司 圖案曝光裝置
JP7744276B2 (ja) * 2022-03-24 2025-09-25 株式会社Ｓｃｒｅｅｎホールディングス 光源装置
FR3150917A1 (fr) * 2023-07-06 2025-01-10 Commissariat à l'Energie Atomique et aux Energies Alternatives Système laser adapté à distribuer un faisceau laser impulsionnel de puissance suivant plusieurs directions successives

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Also Published As

Publication number Publication date
CN110082905A (zh) 2019-08-02
CN108931899A (zh) 2018-12-04
CN108139690A (zh) 2018-06-08
KR20250051128A (ko) 2025-04-16
TW201727393A (zh) 2017-08-01
TWI762965B (zh) 2022-05-01
CN116974156A (zh) 2023-10-31
TW202038024A (zh) 2020-10-16
CN109991733B (zh) 2021-07-30
WO2017057415A1 (ja) 2017-04-06
HK1257067A1 (zh) 2019-10-11
JP2017067823A (ja) 2017-04-06
CN108931899B (zh) 2021-08-06
CN110082905B (zh) 2022-06-03
TWI701525B (zh) 2020-08-11
KR102789884B1 (ko) 2025-04-01
CN109991733A (zh) 2019-07-09
HK1248829A1 (zh) 2018-10-19
KR20180058728A (ko) 2018-06-01

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