HK1248829A1 - 图案描绘装置及图案描绘方法 - Google Patents

图案描绘装置及图案描绘方法 Download PDF

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Publication number
HK1248829A1
HK1248829A1 HK18108158.1A HK18108158A HK1248829A1 HK 1248829 A1 HK1248829 A1 HK 1248829A1 HK 18108158 A HK18108158 A HK 18108158A HK 1248829 A1 HK1248829 A1 HK 1248829A1
Authority
HK
Hong Kong
Prior art keywords
scanning
substrate
light source
light
unit
Prior art date
Application number
HK18108158.1A
Other languages
English (en)
Chinese (zh)
Inventor
加藤正纪
加藤正紀
中山修一
Original Assignee
株式会社尼康
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社尼康, 株式會社尼康 filed Critical 株式会社尼康
Publication of HK1248829A1 publication Critical patent/HK1248829A1/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/124—Details of the optical system between the light source and the polygonal mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/125—Details of the optical system between the polygonal mirror and the image plane
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
    • G02F1/33—Acousto-optical deflection devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Mechanical Optical Scanning Systems (AREA)
HK18108158.1A 2015-09-28 2016-09-27 图案描绘装置及图案描绘方法 HK1248829A1 (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015189496A JP6651768B2 (ja) 2015-09-28 2015-09-28 パターン描画装置
JP2015-189496 2015-09-28
PCT/JP2016/078541 WO2017057415A1 (ja) 2015-09-28 2016-09-27 パターン描画装置およびパターン描画方法

Related Parent Applications (3)

Application Number Title Priority Date Filing Date
HK18116235.1A Division HK1257067A1 (zh) 2015-09-28 2018-06-25 图案描绘装置及图案描绘方法
HK19126954.7A Division HK40003476A (en) 2015-09-28 2018-06-25 Pattern rendering device and substrate treatment device
HK19128112.0A Division HK40004637A (en) 2015-09-28 2018-06-25 Pattern drawing device and substrate treatment device, as well as pattern drawing method and method for manufacturing elements

Related Child Applications (3)

Application Number Title Priority Date Filing Date
HK18116235.1A Addition HK1257067A1 (zh) 2015-09-28 2018-06-25 图案描绘装置及图案描绘方法
HK19126954.7A Addition HK40003476A (en) 2015-09-28 2018-06-25 Pattern rendering device and substrate treatment device
HK19128112.0A Addition HK40004637A (en) 2015-09-28 2018-06-25 Pattern drawing device and substrate treatment device, as well as pattern drawing method and method for manufacturing elements

Publications (1)

Publication Number Publication Date
HK1248829A1 true HK1248829A1 (zh) 2018-10-19

Family

ID=58423880

Family Applications (2)

Application Number Title Priority Date Filing Date
HK18108158.1A HK1248829A1 (zh) 2015-09-28 2016-09-27 图案描绘装置及图案描绘方法
HK18116235.1A HK1257067A1 (zh) 2015-09-28 2018-06-25 图案描绘装置及图案描绘方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK18116235.1A HK1257067A1 (zh) 2015-09-28 2018-06-25 图案描绘装置及图案描绘方法

Country Status (6)

Country Link
JP (1) JP6651768B2 (enExample)
KR (2) KR102789884B1 (enExample)
CN (5) CN116974156A (enExample)
HK (2) HK1248829A1 (enExample)
TW (2) TWI762965B (enExample)
WO (1) WO2017057415A1 (enExample)

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JP6901261B2 (ja) * 2016-12-27 2021-07-14 株式会社ディスコ レーザー装置
CN111512233B (zh) * 2017-09-08 2023-03-28 株式会社尼康 图案描绘装置
JP6891083B2 (ja) 2017-09-25 2021-06-18 株式会社Ｓｃｒｅｅｎホールディングス 基材処理装置および検出方法
JP7070581B2 (ja) * 2017-09-26 2022-05-18 株式会社ニコン パターン描画装置
TWI667530B (zh) * 2017-09-28 2019-08-01 日商紐富來科技股份有限公司 Inspection method and inspection device
KR102667683B1 (ko) 2017-10-25 2024-05-22 가부시키가이샤 니콘 패턴 묘화 장치
JP6583451B2 (ja) * 2018-03-01 2019-10-02 株式会社ニコン パターン描画装置
JP7239388B2 (ja) * 2019-05-09 2023-03-14 株式会社アドテックエンジニアリング 直描式露光装置
TWI790178B (zh) * 2020-11-02 2023-01-11 日商尼康股份有限公司 圖案曝光裝置
JP7744276B2 (ja) * 2022-03-24 2025-09-25 株式会社Ｓｃｒｅｅｎホールディングス 光源装置
FR3150917A1 (fr) * 2023-07-06 2025-01-10 Commissariat à l'Energie Atomique et aux Energies Alternatives Système laser adapté à distribuer un faisceau laser impulsionnel de puissance suivant plusieurs directions successives

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Also Published As

Publication number Publication date
CN110082905A (zh) 2019-08-02
CN108931899A (zh) 2018-12-04
CN108139690A (zh) 2018-06-08
KR20250051128A (ko) 2025-04-16
TW201727393A (zh) 2017-08-01
TWI762965B (zh) 2022-05-01
CN116974156A (zh) 2023-10-31
TW202038024A (zh) 2020-10-16
CN109991733B (zh) 2021-07-30
WO2017057415A1 (ja) 2017-04-06
HK1257067A1 (zh) 2019-10-11
JP2017067823A (ja) 2017-04-06
CN108931899B (zh) 2021-08-06
CN110082905B (zh) 2022-06-03
TWI701525B (zh) 2020-08-11
KR102789884B1 (ko) 2025-04-01
CN109991733A (zh) 2019-07-09
JP6651768B2 (ja) 2020-02-19
KR20180058728A (ko) 2018-06-01

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