KR102371057B1 - 불포화기 함유 알칼리 현상성 수지 및 솔더 레지스트용 수지 재료 - Google Patents

불포화기 함유 알칼리 현상성 수지 및 솔더 레지스트용 수지 재료 Download PDF

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KR102371057B1
KR102371057B1 KR1020177024473A KR20177024473A KR102371057B1 KR 102371057 B1 KR102371057 B1 KR 102371057B1 KR 1020177024473 A KR1020177024473 A KR 1020177024473A KR 20177024473 A KR20177024473 A KR 20177024473A KR 102371057 B1 KR102371057 B1 KR 102371057B1
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South Korea
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alkali developable
mass
unsaturated group
developable resin
resin
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KR1020177024473A
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English (en)
Korean (ko)
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KR20170125033A (ko
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슌스케 야마다
šœ스케 야마다
유 아사노
히로후미 가메야마
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디아이씨 가부시끼가이샤
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • C08F299/028—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
KR1020177024473A 2015-02-26 2016-02-09 불포화기 함유 알칼리 현상성 수지 및 솔더 레지스트용 수지 재료 KR102371057B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015036639 2015-02-26
JPJP-P-2015-036639 2015-02-26
PCT/JP2016/053771 WO2016136455A1 (ja) 2015-02-26 2016-02-09 不飽和基含有アルカリ現像性樹脂及びソルダーレジスト用樹脂材料

Publications (2)

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KR20170125033A KR20170125033A (ko) 2017-11-13
KR102371057B1 true KR102371057B1 (ko) 2022-03-07

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JP (1) JP6324517B2 (ja)
KR (1) KR102371057B1 (ja)
CN (1) CN107250199B (ja)
TW (1) TWI691789B (ja)
WO (1) WO2016136455A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6819104B2 (ja) * 2015-10-26 2021-01-27 Dic株式会社 不飽和基含有アルカリ現像性樹脂及びソルダーレジスト用樹脂材料
CN109312051B (zh) * 2016-06-16 2021-07-09 Dic株式会社 环氧(甲基)丙烯酸酯树脂和抗蚀构件
JP6828410B2 (ja) * 2016-12-14 2021-02-10 Dic株式会社 酸基含有（メタ）アクリレート樹脂及びソルダーレジスト用樹脂材料
WO2018169036A1 (ja) * 2017-03-17 2018-09-20 大阪有機化学工業株式会社 感光性樹脂組成物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005165294A (ja) 2003-11-11 2005-06-23 Mitsubishi Chemicals Corp 硬化性組成物、硬化物、カラーフィルタ及び液晶表示装置
WO2006121062A1 (ja) 2005-05-11 2006-11-16 Toppan Printing Co., Ltd. アルカリ現像型感光性樹脂組成物、それを用いて形成した液晶分割配向制御突起付き基板及びカラーフィルタ、並びに液晶表示装置
JP2012122045A (ja) 2010-05-19 2012-06-28 Fujifilm Corp 重合性組成物
JP2013195854A (ja) 2012-03-21 2013-09-30 Fujifilm Corp 着色感放射線性組成物、着色硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3543409B2 (ja) * 1995-03-24 2004-07-14 大日本インキ化学工業株式会社 活性エネルギ−線硬化型エポキシアクリレ−ト樹脂組成物
JPH0987346A (ja) * 1995-09-19 1997-03-31 Dainippon Ink & Chem Inc エネルギ−線硬化型エポキシアクリレ−ト樹脂組成物
DE19956779A1 (de) * 1999-11-25 2001-05-31 Bakelite Ag Vinylester mit hoher Vernetzungsdichte Verfahren zu ihrer Herstellung und Verwendung
JP5118830B2 (ja) * 2006-08-07 2013-01-16 共栄社化学株式会社 エポキシ基含有硬化性樹脂成分
JP5204459B2 (ja) * 2007-10-17 2013-06-05 共栄社化学株式会社 硬化性樹脂成分の製造方法
JP4538076B1 (ja) * 2009-04-13 2010-09-08 日本ユピカ株式会社 多官能エポキシ（メタ）アクリレート化合物及び該化合物を含有する感光性熱硬化性樹脂組成物並びにその硬化物
JP2011144230A (ja) * 2010-01-13 2011-07-28 Japan U-Pica Co Ltd 多官能エポキシ（メタ）アクリレート化合物及び該化合物を含有する感光性熱硬化性樹脂組成物並びにその硬化物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005165294A (ja) 2003-11-11 2005-06-23 Mitsubishi Chemicals Corp 硬化性組成物、硬化物、カラーフィルタ及び液晶表示装置
WO2006121062A1 (ja) 2005-05-11 2006-11-16 Toppan Printing Co., Ltd. アルカリ現像型感光性樹脂組成物、それを用いて形成した液晶分割配向制御突起付き基板及びカラーフィルタ、並びに液晶表示装置
JP2012122045A (ja) 2010-05-19 2012-06-28 Fujifilm Corp 重合性組成物
JP2013195854A (ja) 2012-03-21 2013-09-30 Fujifilm Corp 着色感放射線性組成物、着色硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置

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Publication number Publication date
CN107250199A (zh) 2017-10-13
KR20170125033A (ko) 2017-11-13
WO2016136455A1 (ja) 2016-09-01
TWI691789B (zh) 2020-04-21
TW201704866A (zh) 2017-02-01
CN107250199B (zh) 2019-10-11
JP6324517B2 (ja) 2018-05-16
JPWO2016136455A1 (ja) 2017-04-27

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