KR102369814B9 - 금속판, 금속판의 제조 방법, 및 금속판을 사용하여 마스크를 제조하는 방법 - Google Patents

금속판, 금속판의 제조 방법, 및 금속판을 사용하여 마스크를 제조하는 방법

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Publication number
KR102369814B9
KR102369814B9 KR1020217025409A KR20217025409A KR102369814B9 KR 102369814 B9 KR102369814 B9 KR 102369814B9 KR 1020217025409 A KR1020217025409 A KR 1020217025409A KR 20217025409 A KR20217025409 A KR 20217025409A KR 102369814 B9 KR102369814 B9 KR 102369814B9
Authority
KR
South Korea
Prior art keywords
metal plate
manufacturing
mask
manufacturing mask
metal
Prior art date
Application number
KR1020217025409A
Other languages
English (en)
Other versions
KR102369814B1 (ko
KR20210104160A (ko
Inventor
치카오 이케나가
이사오 미야타니
Original Assignee
다이니폰 인사츠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 다이니폰 인사츠 가부시키가이샤 filed Critical 다이니폰 인사츠 가부시키가이샤
Priority to KR1020227006045A priority Critical patent/KR20220028173A/ko
Publication of KR20210104160A publication Critical patent/KR20210104160A/ko
Application granted granted Critical
Publication of KR102369814B1 publication Critical patent/KR102369814B1/ko
Publication of KR102369814B9 publication Critical patent/KR102369814B9/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
    • B21B1/227—Surface roughening or texturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/38—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling sheets of limited length, e.g. folded sheets, superimposed sheets, pack rolling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B15/00—Arrangements for performing additional metal-working operations specially combined with or arranged in, or specially adapted for use in connection with, metal-rolling mills
    • B21B15/0007—Cutting or shearing the product
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020217025409A 2013-09-13 2014-09-12 금속판, 금속판의 제조 방법, 및 금속판을 사용하여 마스크를 제조하는 방법 KR102369814B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020227006045A KR20220028173A (ko) 2013-09-13 2014-09-12 증착 마스크의 제조 방법 및 긴 금속판

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2013190881A JP5455099B1 (ja) 2013-09-13 2013-09-13 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法
JPJP-P-2013-190881 2013-09-13
PCT/JP2014/074255 WO2015037709A1 (ja) 2013-09-13 2014-09-12 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法
KR1020207028168A KR20200117053A (ko) 2013-09-13 2014-09-12 금속판, 금속판의 제조 방법, 및 금속판을 사용하여 마스크를 제조하는 방법

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020207028168A Division KR20200117053A (ko) 2013-09-13 2014-09-12 금속판, 금속판의 제조 방법, 및 금속판을 사용하여 마스크를 제조하는 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020227006045A Division KR20220028173A (ko) 2013-09-13 2014-09-12 증착 마스크의 제조 방법 및 긴 금속판

Publications (3)

Publication Number Publication Date
KR20210104160A KR20210104160A (ko) 2021-08-24
KR102369814B1 KR102369814B1 (ko) 2022-03-03
KR102369814B9 true KR102369814B9 (ko) 2024-04-18

Family

ID=50614582

Family Applications (6)

Application Number Title Priority Date Filing Date
KR1020177032628A KR102163526B1 (ko) 2013-09-13 2014-09-12 금속판, 금속판의 제조 방법, 및 금속판을 사용하여 마스크를 제조하는 방법
KR1020227006045A KR20220028173A (ko) 2013-09-13 2014-09-12 증착 마스크의 제조 방법 및 긴 금속판
KR1020217025409A KR102369814B1 (ko) 2013-09-13 2014-09-12 금속판, 금속판의 제조 방법, 및 금속판을 사용하여 마스크를 제조하는 방법
KR1020167006016A KR101798480B1 (ko) 2013-09-13 2014-09-12 금속판, 금속판의 제조 방법, 및 금속판을 사용하여 마스크를 제조하는 방법
KR1020207028168A KR20200117053A (ko) 2013-09-13 2014-09-12 금속판, 금속판의 제조 방법, 및 금속판을 사용하여 마스크를 제조하는 방법
KR1020237041164A KR20230169419A (ko) 2013-09-13 2014-09-12 증착 마스크의 제조 방법 및 긴 금속판

Family Applications Before (2)

Application Number Title Priority Date Filing Date
KR1020177032628A KR102163526B1 (ko) 2013-09-13 2014-09-12 금속판, 금속판의 제조 방법, 및 금속판을 사용하여 마스크를 제조하는 방법
KR1020227006045A KR20220028173A (ko) 2013-09-13 2014-09-12 증착 마스크의 제조 방법 및 긴 금속판

Family Applications After (3)

Application Number Title Priority Date Filing Date
KR1020167006016A KR101798480B1 (ko) 2013-09-13 2014-09-12 금속판, 금속판의 제조 방법, 및 금속판을 사용하여 마스크를 제조하는 방법
KR1020207028168A KR20200117053A (ko) 2013-09-13 2014-09-12 금속판, 금속판의 제조 방법, 및 금속판을 사용하여 마스크를 제조하는 방법
KR1020237041164A KR20230169419A (ko) 2013-09-13 2014-09-12 증착 마스크의 제조 방법 및 긴 금속판

Country Status (5)

Country Link
US (2) US10233546B2 (ko)
JP (1) JP5455099B1 (ko)
KR (6) KR102163526B1 (ko)
CN (4) CN105492654B (ko)
WO (1) WO2015037709A1 (ko)

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KR101813549B1 (ko) * 2011-05-06 2018-01-02 삼성디스플레이 주식회사 분할 마스크와 그 분할 마스크를 포함한 마스크 프레임 조립체의 조립장치
JP5455099B1 (ja) 2013-09-13 2014-03-26 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法
JP5516816B1 (ja) 2013-10-15 2014-06-11 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
JP5641462B1 (ja) 2014-05-13 2014-12-17 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法
TWI671411B (zh) 2015-02-10 2019-09-11 日商大日本印刷股份有限公司 有機ｅｌ顯示裝置用蒸鍍遮罩之製造方法、欲製作有機ｅｌ顯示裝置用蒸鍍遮罩所使用之金屬板及其製造方法
EP3288097A4 (en) * 2015-04-24 2019-05-15 LG Innotek Co., Ltd. METAL SUBSTRATE AND SEPARATION MASK THEREWITH
KR102388829B1 (ko) 2015-07-17 2022-04-21 도판 인사츠 가부시키가이샤 메탈 마스크용 기재의 제조 방법, 증착용 메탈 마스크의 제조 방법, 메탈 마스크용 기재, 및, 증착용 메탈 마스크
CN107406964B (zh) 2015-07-17 2018-12-18 凸版印刷株式会社 金属掩模基材、金属掩模基材的管理方法、金属掩模以及金属掩模的制造方法
JP6805830B2 (ja) 2015-07-17 2020-12-23 凸版印刷株式会社 蒸着用メタルマスク基材、蒸着用メタルマスク、蒸着用メタルマスク基材の製造方法、および、蒸着用メタルマスクの製造方法
DE112016003225T5 (de) 2015-07-17 2018-04-19 Toppan Printing Co., Ltd. Metallmaskensubstrat, metallmaske und herstellungsverfahren für metallmaske
CN117821896A (zh) * 2015-07-17 2024-04-05 凸版印刷株式会社 蒸镀用金属掩模以及蒸镀用金属掩模的制造方法
KR102549358B1 (ko) 2015-11-02 2023-06-29 삼성디스플레이 주식회사 증착 마스크 조립체 및 이를 이용한 표시 장치의 제조 방법
DE112017002022B4 (de) 2016-04-14 2023-06-01 Toppan Printing Co., Ltd. Dampfbeschichtungsmaskensubstrat, Verfahren zum Herstellen eines Dampfbeschichtungsmaskensubstrats und Verfahren zum Herstellen einer Dampfbeschichtungsmaske
KR101786391B1 (ko) * 2016-10-06 2017-11-16 주식회사 포스코 증착용 마스크로 사용되는 합금 금속박, 증착용 마스크 및 이들의 제조방법과 이를 이용한 유기 발광 소자 제조방법
KR20220104846A (ko) 2016-10-07 2022-07-26 다이니폰 인사츠 가부시키가이샤 증착 마스크의 제조 방법, 증착 마스크가 배치된 중간 제품 및 증착 마스크
JP7037768B2 (ja) 2016-11-18 2022-03-17 大日本印刷株式会社 蒸着マスク
JP6376483B2 (ja) * 2017-01-10 2018-08-22 大日本印刷株式会社 蒸着マスクの製造方法、蒸着マスク装置の製造方法および蒸着マスクの良否判定方法
KR102333411B1 (ko) * 2017-01-10 2021-12-02 다이니폰 인사츠 가부시키가이샤 증착 마스크, 증착 마스크 장치의 제조 방법 및 증착 마스크의 제조 방법
JP7047364B2 (ja) * 2017-01-10 2022-04-05 大日本印刷株式会社 金属板の製造方法、マスクの製造方法およびマスク装置の製造方法
KR102330373B1 (ko) * 2017-03-14 2021-11-23 엘지이노텍 주식회사 금속판, 증착용 마스크 및 이의 제조방법
JP6319505B1 (ja) 2017-09-08 2018-05-09 凸版印刷株式会社 蒸着マスク用基材、蒸着マスク用基材の製造方法、蒸着マスクの製造方法および表示装置の製造方法
JP6984529B2 (ja) * 2017-09-08 2021-12-22 凸版印刷株式会社 蒸着マスク用基材、蒸着マスク用基材の製造方法、蒸着マスクの製造方法および表示装置の製造方法
WO2019054462A1 (ja) * 2017-09-15 2019-03-21 凸版印刷株式会社 蒸着マスクの製造方法、表示装置の製造方法、および、蒸着マスク
JP6299921B1 (ja) * 2017-10-13 2018-03-28 凸版印刷株式会社 蒸着マスク用基材、蒸着マスク用基材の製造方法、蒸着マスクの製造方法、および、表示装置の製造方法
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