KR102137664B1 - 전계 효과형 트랜지스터, 표시 소자, 영상 표시 장치 및 시스템 - Google Patents

전계 효과형 트랜지스터, 표시 소자, 영상 표시 장치 및 시스템 Download PDF

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KR102137664B1
KR102137664B1 KR1020187012510A KR20187012510A KR102137664B1 KR 102137664 B1 KR102137664 B1 KR 102137664B1 KR 1020187012510 A KR1020187012510 A KR 1020187012510A KR 20187012510 A KR20187012510 A KR 20187012510A KR 102137664 B1 KR102137664 B1 KR 102137664B1
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protective layer
effect transistor
layer coating
field effect
metal oxide
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KR20180049246A (ko
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료이치 사오토메
나오유키 우에다
유키 나카무라
유키코 아베
신지 마츠모토
유지 소네
사다노리 아라에
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가부시키가이샤 리코
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    • H01L29/78606
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/674Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6755Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/36Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
    • G09G3/3611Control of matrices with row and column drivers
    • G09G3/3674Details of drivers for scan electrodes
    • G09G3/3677Details of drivers for scan electrodes suitable for active matrices only
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/36Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
    • G09G3/3611Control of matrices with row and column drivers
    • G09G3/3685Details of drivers for data electrodes
    • G09G3/3688Details of drivers for data electrodes suitable for active matrices only
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/36Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
    • G09G3/3611Control of matrices with row and column drivers
    • G09G3/3696Generation of voltages supplied to electrode drivers
    • H01L27/1225
    • H01L27/1248
    • H01L27/3244
    • H01L29/78618
    • H01L29/7869
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6704Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6704Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • H10D30/6713Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/421Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer
    • H10D86/423Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer comprising semiconductor materials not belonging to the Group IV, e.g. InGaZnO
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/451Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs characterised by the compositions or shapes of the interlayer dielectrics
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00Aspects of the constitution of display devices
    • G09G2300/08Active matrix structure, i.e. with use of active elements, inclusive of non-linear two terminal elements, in the pixels together with light emitting or modulating elements
    • G09G2300/0809Several active elements per pixel in active matrix panels
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00Aspects of the constitution of display devices
    • G09G2300/08Active matrix structure, i.e. with use of active elements, inclusive of non-linear two terminal elements, in the pixels together with light emitting or modulating elements
    • G09G2300/0809Several active elements per pixel in active matrix panels
    • G09G2300/0842Several active elements per pixel in active matrix panels forming a memory circuit, e.g. a dynamic memory with one capacitor
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2310/00Command of the display device
    • G09G2310/02Addressing, scanning or driving the display screen or processing steps related thereto
    • G09G2310/0264Details of driving circuits
    • G09G2310/0278Details of driving circuits arranged to drive both scan and data electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Thin Film Transistor (AREA)
KR1020187012510A 2013-10-30 2014-10-23 전계 효과형 트랜지스터, 표시 소자, 영상 표시 장치 및 시스템 Active KR102137664B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2013225182 2013-10-30
JPJP-P-2013-225182 2013-10-30
JP2014164080A JP6394171B2 (ja) 2013-10-30 2014-08-12 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
JPJP-P-2014-164080 2014-08-12
PCT/JP2014/078842 WO2015064670A1 (en) 2013-10-30 2014-10-23 Field-effect transistor, display element, image display device, and system

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KR1020167013994A Division KR101856078B1 (ko) 2013-10-30 2014-10-23 전계 효과형 트랜지스터, 표시 소자, 영상 표시 장치 및 시스템

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KR102137664B1 true KR102137664B1 (ko) 2020-07-24

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KR1020167013994A Active KR101856078B1 (ko) 2013-10-30 2014-10-23 전계 효과형 트랜지스터, 표시 소자, 영상 표시 장치 및 시스템

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US (2) US9972274B2 (https=)
EP (1) EP3063783B1 (https=)
JP (1) JP6394171B2 (https=)
KR (2) KR102137664B1 (https=)
CN (2) CN110047938A (https=)
BR (1) BR112016009806B1 (https=)
RU (1) RU2630708C1 (https=)
SG (1) SG11201603456VA (https=)
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Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6015389B2 (ja) * 2012-11-30 2016-10-26 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
JP6394171B2 (ja) * 2013-10-30 2018-09-26 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
JP6582655B2 (ja) * 2015-07-14 2019-10-02 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
JP6794706B2 (ja) * 2015-10-23 2020-12-02 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
JP6878820B2 (ja) * 2015-11-17 2021-06-02 株式会社リコー 電界効果型トランジスタ、表示素子、表示装置、システム、及び電界効果型トランジスタの製造方法
JP6607013B2 (ja) 2015-12-08 2019-11-20 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
JP2017105013A (ja) 2015-12-08 2017-06-15 株式会社リコー ガスバリア性積層体、半導体装置、表示素子、表示装置、システム
US10600916B2 (en) 2015-12-08 2020-03-24 Ricoh Company, Ltd. Field-effect transistor, display element, image display device, and system
US10170635B2 (en) 2015-12-09 2019-01-01 Ricoh Company, Ltd. Semiconductor device, display device, display apparatus, and system
JP6907512B2 (ja) * 2015-12-15 2021-07-21 株式会社リコー 電界効果型トランジスタの製造方法
CN106952948A (zh) * 2016-01-06 2017-07-14 中华映管股份有限公司 主动元件及其制作方法
JP6665536B2 (ja) 2016-01-12 2020-03-13 株式会社リコー 酸化物半導体
JP6562089B2 (ja) 2016-02-01 2019-08-21 株式会社リコー 電界効果型トランジスタ及びその製造方法、表示素子、表示装置、システム
JP6701835B2 (ja) 2016-03-11 2020-05-27 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
US10818705B2 (en) 2016-03-18 2020-10-27 Ricoh Company, Ltd. Method for manufacturing a field effect transistor, method for manufacturing a volatile semiconductor memory element, method for manufacturing a non-volatile semiconductor memory element, method for manufacturing a display element, method for manufacturing an image display device, and method for manufacturing a system
CN108780756B (zh) 2016-03-18 2021-10-22 株式会社理光 用于制造场效应晶体管的方法
JP6855848B2 (ja) * 2016-03-18 2021-04-07 株式会社リコー 電界効果型トランジスタの製造方法、揮発性半導体メモリ素子の製造方法、不揮発性半導体メモリ素子の製造方法、表示素子の製造方法、画像表示装置の製造方法、システムの製造方法
US20180016678A1 (en) 2016-07-15 2018-01-18 Applied Materials, Inc. Multi-layer coating with diffusion barrier layer and erosion resistant layer
KR20180033352A (ko) 2016-09-23 2018-04-03 삼성디스플레이 주식회사 캡핑층을 포함하는 유기발광 표시장치
JP6848405B2 (ja) * 2016-12-07 2021-03-24 株式会社リコー 電界効果型トランジスタの製造方法
JP2018148145A (ja) * 2017-03-08 2018-09-20 株式会社リコー 電界効果型トランジスタ、表示素子、表示装置、システム
JP2018156963A (ja) * 2017-03-15 2018-10-04 株式会社リコー 電界効果型トランジスタ、表示素子、表示装置、システム、及びそれらの製造方法
RU2754985C2 (ru) * 2017-05-11 2021-09-08 Бэйлор Юниверсити Настраиваемый посредством полевого эффекта поглотитель с близкой к нулю диэлектрической проницаемостью
US10688811B2 (en) 2018-02-27 2020-06-23 Ricoh Company, Ltd. Air blower, drying device, liquid discharge apparatus, and treatment-liquid application device
CN111837172A (zh) * 2018-03-06 2020-10-27 株式会社半导体能源研究所 显示装置以及电子设备
JP6986231B2 (ja) 2018-03-16 2021-12-22 株式会社リコー 塗布装置及び画像形成システム
KR102215837B1 (ko) 2018-03-19 2021-02-16 가부시키가이샤 리코 산화물 형성용 도포액, 산화물막의 제조 방법, 및 전계 효과형 트랜지스터의 제조 방법
CN108933179B (zh) * 2018-07-05 2020-06-16 深圳市华星光电半导体显示技术有限公司 一种薄膜晶体管及其制作方法
EP3599646A3 (en) 2018-07-23 2020-04-01 Ricoh Company, Ltd. Metal oxide, field-effect transistor, and method for producing the same
JP7305933B2 (ja) 2018-07-23 2023-07-11 株式会社リコー 金属酸化物膜形成用塗布液、酸化物絶縁体膜、電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
JP7135682B2 (ja) 2018-09-28 2022-09-13 株式会社リコー 給送装置、画像形成装置及び画像形成システム
CN112242441A (zh) * 2019-07-16 2021-01-19 联华电子股份有限公司 高电子迁移率晶体管
RU2748455C1 (ru) * 2020-07-08 2021-05-25 Федеральное государственное бюджетное образовательное учреждение высшего образования "Чеченский государственный университет" Способ изготовления полупроводникового прибора
CN112687554B (zh) * 2020-12-28 2023-05-09 深圳市华星光电半导体显示技术有限公司 阵列基板制备方法、阵列基板及显示装置
US12439650B2 (en) * 2021-01-15 2025-10-07 Taiwan Semiconductor Manufacturing Co., Ltd. CMOS fabrication methods for back-gate transistor

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080277663A1 (en) 2007-05-08 2008-11-13 Samsung Electronics Co., Ltd. Thin film transistor and method of manufacturing the same
JP2009230953A (ja) 2008-03-21 2009-10-08 Toppan Printing Co Ltd 有機elディスプレイパネル及びその製造方法
JP2013030784A (ja) 2008-08-27 2013-02-07 Idemitsu Kosan Co Ltd 電界効果型トランジスタ、その製造方法及びスパッタリングターゲット
JP2013175710A (ja) * 2012-01-23 2013-09-05 Semiconductor Energy Lab Co Ltd 半導体装置、及び半導体装置の作製方法

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59150430A (ja) * 1983-02-17 1984-08-28 Toshiba Corp 半導体デバイス
JP3666915B2 (ja) 1993-12-17 2005-06-29 Azエレクトロニックマテリアルズ株式会社 セラミックスの低温形成方法
JP4472056B2 (ja) 1999-07-23 2010-06-02 株式会社半導体エネルギー研究所 エレクトロルミネッセンス表示装置及びその作製方法
EP1434282A3 (en) * 2002-12-26 2007-06-27 Konica Minolta Holdings, Inc. Protective layer for an organic thin-film transistor
JP4278405B2 (ja) * 2003-02-28 2009-06-17 シャープ株式会社 酸化物半導体発光素子およびその製造方法
JP4108633B2 (ja) * 2003-06-20 2008-06-25 シャープ株式会社 薄膜トランジスタおよびその製造方法ならびに電子デバイス
JP2007073705A (ja) 2005-09-06 2007-03-22 Canon Inc 酸化物半導体チャネル薄膜トランジスタおよびその製造方法
US20070152276A1 (en) * 2005-12-30 2007-07-05 International Business Machines Corporation High performance CMOS circuits, and methods for fabricating the same
CN101632179B (zh) * 2007-04-06 2012-05-30 夏普株式会社 半导体元件及其制造方法、以及包括该半导体元件的电子器件
WO2009081885A1 (ja) 2007-12-25 2009-07-02 Idemitsu Kosan Co., Ltd. 酸化物半導体電界効果型トランジスタ及びその製造方法
JP5430248B2 (ja) * 2008-06-24 2014-02-26 富士フイルム株式会社 薄膜電界効果型トランジスタおよび表示装置
JP5305790B2 (ja) * 2008-08-28 2013-10-02 株式会社東芝 半導体発光素子
JP5552753B2 (ja) * 2008-10-08 2014-07-16 ソニー株式会社 薄膜トランジスタおよび表示装置
JP2010103203A (ja) 2008-10-22 2010-05-06 Konica Minolta Holdings Inc 薄膜トランジスタおよびその製造方法
CN103700704B (zh) 2008-11-07 2017-07-11 株式会社半导体能源研究所 半导体器件
JP5515281B2 (ja) 2008-12-03 2014-06-11 ソニー株式会社 薄膜トランジスタ、表示装置、電子機器および薄膜トランジスタの製造方法
JP2010182819A (ja) 2009-02-04 2010-08-19 Sony Corp 薄膜トランジスタおよび表示装置
US20100308418A1 (en) 2009-06-09 2010-12-09 Knut Stahrenberg Semiconductor Devices and Methods of Manufacture Thereof
KR101836532B1 (ko) 2009-09-04 2018-04-19 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제작 방법
KR101591613B1 (ko) 2009-10-21 2016-02-03 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
JP5633346B2 (ja) 2009-12-25 2014-12-03 株式会社リコー 電界効果型トランジスタ、半導体メモリ、表示素子、画像表示装置及びシステム
CN102782858B (zh) * 2009-12-25 2015-10-07 株式会社理光 场效应晶体管、半导体存储器、显示元件、图像显示设备和系统
JP5899615B2 (ja) * 2010-03-18 2016-04-06 株式会社リコー 絶縁膜の製造方法及び半導体装置の製造方法
TWI589042B (zh) * 2010-01-20 2017-06-21 半導體能源研究所股份有限公司 發光裝置,撓性發光裝置,電子裝置,照明設備,以及發光裝置和撓性發光裝置的製造方法
JP2012216780A (ja) 2011-03-31 2012-11-08 Ricoh Co Ltd p型酸化物、p型酸化物製造用組成物、p型酸化物の製造方法、半導体素子、表示素子、画像表示装置、及びシステム
JP6076038B2 (ja) * 2011-11-11 2017-02-08 株式会社半導体エネルギー研究所 表示装置の作製方法
KR101942980B1 (ko) * 2012-01-17 2019-01-29 삼성디스플레이 주식회사 반도체 디바이스 및 그 형성 방법
US9159288B2 (en) * 2012-03-09 2015-10-13 Apple Inc. Gate line driver circuit for display element array
KR101568631B1 (ko) * 2012-06-06 2015-11-11 가부시키가이샤 고베 세이코쇼 박막 트랜지스터
JP5562384B2 (ja) * 2012-08-28 2014-07-30 キヤノン株式会社 薄膜トランジスタおよびその製造方法
US20150214374A1 (en) * 2012-08-30 2015-07-30 Sharp Kabushiki Kaisha Circuit board and display device
US9595544B2 (en) * 2012-08-30 2017-03-14 Sharp Kabushiki Kiasha Thin film transistor substrate and display device
US9853164B2 (en) * 2012-10-03 2017-12-26 Sharp Kabushiki Kaisha Semiconductor device and display device
JP6015389B2 (ja) * 2012-11-30 2016-10-26 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
US9035287B2 (en) * 2013-02-01 2015-05-19 Polyera Corporation Polymeric materials for use in metal-oxide-semiconductor field-effect transistors
KR20150001154A (ko) * 2013-06-26 2015-01-06 삼성디스플레이 주식회사 박막 트랜지스터 표시판 및 그 제조 방법
KR102146070B1 (ko) * 2013-07-01 2020-08-21 삼성디스플레이 주식회사 유기 발광 표시 장치
JP6394171B2 (ja) * 2013-10-30 2018-09-26 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080277663A1 (en) 2007-05-08 2008-11-13 Samsung Electronics Co., Ltd. Thin film transistor and method of manufacturing the same
JP2009230953A (ja) 2008-03-21 2009-10-08 Toppan Printing Co Ltd 有機elディスプレイパネル及びその製造方法
JP2013030784A (ja) 2008-08-27 2013-02-07 Idemitsu Kosan Co Ltd 電界効果型トランジスタ、その製造方法及びスパッタリングターゲット
JP2013175710A (ja) * 2012-01-23 2013-09-05 Semiconductor Energy Lab Co Ltd 半導体装置、及び半導体装置の作製方法

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