KR102089098B1 - 절단 장치 및 절단 방법 - Google Patents
절단 장치 및 절단 방법 Download PDFInfo
- Publication number
- KR102089098B1 KR102089098B1 KR1020177024358A KR20177024358A KR102089098B1 KR 102089098 B1 KR102089098 B1 KR 102089098B1 KR 1020177024358 A KR1020177024358 A KR 1020177024358A KR 20177024358 A KR20177024358 A KR 20177024358A KR 102089098 B1 KR102089098 B1 KR 102089098B1
- Authority
- KR
- South Korea
- Prior art keywords
- cutting
- cut
- jig
- sealed substrate
- mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 48
- 239000000758 substrate Substances 0.000 claims abstract description 274
- 238000006073 displacement reaction Methods 0.000 claims abstract description 37
- 230000007246 mechanism Effects 0.000 claims description 86
- 230000007723 transport mechanism Effects 0.000 claims description 25
- 238000003384 imaging method Methods 0.000 claims description 17
- 230000008569 process Effects 0.000 claims description 17
- 238000007789 sealing Methods 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000001179 sorption measurement Methods 0.000 claims description 6
- 230000004044 response Effects 0.000 abstract description 3
- 239000011347 resin Substances 0.000 description 40
- 229920005989 resin Polymers 0.000 description 40
- 229910052751 metal Inorganic materials 0.000 description 23
- 239000002184 metal Substances 0.000 description 23
- 238000007689 inspection Methods 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 239000008280 blood Substances 0.000 description 3
- 210000004369 blood Anatomy 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 238000010897 surface acoustic wave method Methods 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000008521 reorganization Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Dicing (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2015-021259 | 2015-02-05 | ||
| JP2015021259A JP6212507B2 (ja) | 2015-02-05 | 2015-02-05 | 切断装置及び切断方法 |
| PCT/JP2016/050202 WO2016125518A1 (ja) | 2015-02-05 | 2016-01-06 | 切断装置及び切断方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20170110651A KR20170110651A (ko) | 2017-10-11 |
| KR102089098B1 true KR102089098B1 (ko) | 2020-03-13 |
Family
ID=56563870
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020177024358A Active KR102089098B1 (ko) | 2015-02-05 | 2016-01-06 | 절단 장치 및 절단 방법 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6212507B2 (enExample) |
| KR (1) | KR102089098B1 (enExample) |
| CN (1) | CN107210206B (enExample) |
| TW (1) | TWI622090B (enExample) |
| WO (1) | WO2016125518A1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6483541B2 (ja) * | 2015-06-16 | 2019-03-13 | 株式会社ディスコ | パッケージ基板の加工方法 |
| JP2018133432A (ja) * | 2017-02-15 | 2018-08-23 | 株式会社ディスコ | 切削装置 |
| EP3795271B1 (en) * | 2018-05-14 | 2023-05-24 | FUJI Corporation | Mounter provided with a lead wire cutting unit |
| EP3702831A1 (de) | 2019-03-01 | 2020-09-02 | Carl Zeiss Vision International GmbH | Datensatz zur verwendung in einem verfahren zur herstellung eines brillenglases |
| JP6912745B1 (ja) * | 2019-09-27 | 2021-08-04 | 株式会社東京精密 | ダイシング装置及び方法 |
| KR102411860B1 (ko) | 2019-09-27 | 2022-06-23 | 가부시키가이샤 도교 세이미쓰 | 다이싱 장치 및 방법 |
| JP7377092B2 (ja) * | 2019-12-16 | 2023-11-09 | Towa株式会社 | 統計データ生成方法、切断装置及びシステム |
| JP7446169B2 (ja) * | 2020-06-26 | 2024-03-08 | キヤノントッキ株式会社 | 基板搬送装置、基板処理システム、基板搬送方法、電子デバイスの製造方法、プログラム及び記憶媒体 |
| JP7440356B2 (ja) * | 2020-06-26 | 2024-02-28 | キヤノントッキ株式会社 | アライメント装置、成膜装置、アライメント方法、電子デバイスの製造方法、プログラム及び記憶媒体 |
| JP7440355B2 (ja) * | 2020-06-26 | 2024-02-28 | キヤノントッキ株式会社 | アライメント装置、成膜装置、アライメント方法、電子デバイスの製造方法、プログラム及び記憶媒体 |
| JP7438865B2 (ja) * | 2020-06-26 | 2024-02-27 | キヤノントッキ株式会社 | アライメント装置、成膜装置、アライメント方法、電子デバイスの製造方法、プログラム及び記憶媒体 |
| JP7613849B2 (ja) * | 2020-06-26 | 2025-01-15 | キヤノントッキ株式会社 | アライメント装置、成膜装置、アライメント方法、電子デバイスの製造方法、プログラム及び記憶媒体 |
| JP7423161B2 (ja) * | 2020-06-30 | 2024-01-29 | 株式会社ディスコ | チャックテーブル |
| KR102799609B1 (ko) * | 2021-03-16 | 2025-04-29 | 한미반도체 주식회사 | 반도체 자재 절단장치의 절단 셋팅방법 |
| JP7564747B2 (ja) * | 2021-03-29 | 2024-10-09 | Towa株式会社 | 加工装置、及び加工品の製造方法 |
| KR102633129B1 (ko) * | 2021-09-29 | 2024-02-06 | 한국생산기술연구원 | 다이 웨이퍼 간 본딩 시 정렬방법 |
| CN114609711B (zh) * | 2022-03-09 | 2023-07-18 | 业成科技(成都)有限公司 | 光学元件的制造方法、夹持装置、显示模组及电子设备 |
| JP2024024364A (ja) * | 2022-08-09 | 2024-02-22 | Towa株式会社 | 切断装置、及び、切断品の製造方法 |
| CN115815474B (zh) * | 2022-12-01 | 2023-09-15 | 广东新亚光电缆股份有限公司 | 一种低压电线及其智能加工系统 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001156025A (ja) | 1999-11-29 | 2001-06-08 | Disco Abrasive Syst Ltd | ペレットの分離方法 |
| JP2009170501A (ja) * | 2008-01-11 | 2009-07-30 | Disco Abrasive Syst Ltd | 切削装置 |
| KR101123613B1 (ko) | 2008-03-17 | 2012-03-20 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | 스크라이브 장치 및 스크라이브 방법 |
| JP2012114126A (ja) * | 2010-11-19 | 2012-06-14 | Sharp Corp | 基板分割装置および電子部品の製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4733929B2 (ja) * | 2004-04-20 | 2011-07-27 | 株式会社ディスコ | 半導体ウエーハの切断方法 |
| JP2005353723A (ja) | 2004-06-09 | 2005-12-22 | Apic Yamada Corp | 切断装置、及び切断方法 |
| JP6232667B2 (ja) * | 2013-06-25 | 2017-11-22 | ボンドテック株式会社 | 基板接合方法 |
| JP6218511B2 (ja) * | 2013-09-02 | 2017-10-25 | Towa株式会社 | 切断装置及び切断方法 |
| JP6143668B2 (ja) * | 2013-12-28 | 2017-06-07 | Towa株式会社 | 電子部品製造用の切断装置及び切断方法 |
-
2015
- 2015-02-05 JP JP2015021259A patent/JP6212507B2/ja active Active
-
2016
- 2016-01-06 KR KR1020177024358A patent/KR102089098B1/ko active Active
- 2016-01-06 WO PCT/JP2016/050202 patent/WO2016125518A1/ja not_active Ceased
- 2016-01-06 CN CN201680008290.1A patent/CN107210206B/zh active Active
- 2016-01-20 TW TW105101656A patent/TWI622090B/zh active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001156025A (ja) | 1999-11-29 | 2001-06-08 | Disco Abrasive Syst Ltd | ペレットの分離方法 |
| JP2009170501A (ja) * | 2008-01-11 | 2009-07-30 | Disco Abrasive Syst Ltd | 切削装置 |
| KR101123613B1 (ko) | 2008-03-17 | 2012-03-20 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | 스크라이브 장치 및 스크라이브 방법 |
| JP2012114126A (ja) * | 2010-11-19 | 2012-06-14 | Sharp Corp | 基板分割装置および電子部品の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI622090B (zh) | 2018-04-21 |
| WO2016125518A1 (ja) | 2016-08-11 |
| KR20170110651A (ko) | 2017-10-11 |
| JP6212507B2 (ja) | 2017-10-11 |
| JP2016143861A (ja) | 2016-08-08 |
| TW201643951A (zh) | 2016-12-16 |
| CN107210206B (zh) | 2020-09-22 |
| CN107210206A (zh) | 2017-09-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102089098B1 (ko) | 절단 장치 및 절단 방법 | |
| JP6339514B2 (ja) | 切断装置及び切断方法 | |
| KR102128154B1 (ko) | 흡착 기구 및 흡착 방법, 그리고 제조 장치 및 제조 방법 | |
| CN1983539B (zh) | 晶粒键合的方法 | |
| KR102771049B1 (ko) | 다이 부착 시스템, 및 이러한 시스템을 이용한 통합 정확도 검증 및 캘리브레이션을 위한 방법 | |
| TW201911462A (zh) | 電子部件的實裝裝置與實裝方法,及封裝部件的製造方法 | |
| KR20140022582A (ko) | 플립칩 본딩장치 및 본딩장치의 교정방법 | |
| KR102186384B1 (ko) | 다이 본딩 장치 및 반도체 장치의 제조 방법 | |
| US11284550B2 (en) | Use of placeable marker components for a staged placement of components on a carrier | |
| EP2059112B1 (en) | Electronic component taking out apparatus, surface mounting apparatus and method for taking out electronic component | |
| TWI575587B (zh) | Substrate cutting device and substrate cutting method | |
| KR102417464B1 (ko) | 전자 부품의 실장 장치 | |
| KR20110122447A (ko) | 반도체 패키지 집합체 정렬방법 | |
| JP6498073B2 (ja) | 切削ブレードの位置ずれ検出方法 | |
| CN117497459A (zh) | 芯片贴装装置以及半导体器件的制造方法 | |
| KR101372379B1 (ko) | 반도체 패키지용 회로기판의 검사방법 | |
| KR102781893B1 (ko) | 가공 장치 및 가공품의 제조 방법 | |
| CN112447555B (zh) | 电子零件的安装装置 | |
| JP5855866B2 (ja) | ダミーチップおよびそれを用いた部品装着精度検査方法 | |
| CN111543125B (zh) | 安装精度测定用芯片及安装精度测定用套件 | |
| KR20140064255A (ko) | 전자부품 실장장치 및 이의 인포지션 판정 방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20170830 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20180305 Comment text: Request for Examination of Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20190902 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20200115 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20200309 Patent event code: PR07011E01D |
|
| PR1002 | Payment of registration fee |
Payment date: 20200310 End annual number: 3 Start annual number: 1 |
|
| PG1601 | Publication of registration | ||
| PR1001 | Payment of annual fee |
Payment date: 20240304 Start annual number: 5 End annual number: 5 |