KR102089098B1 - 절단 장치 및 절단 방법 - Google Patents

절단 장치 및 절단 방법 Download PDF

Info

Publication number
KR102089098B1
KR102089098B1 KR1020177024358A KR20177024358A KR102089098B1 KR 102089098 B1 KR102089098 B1 KR 102089098B1 KR 1020177024358 A KR1020177024358 A KR 1020177024358A KR 20177024358 A KR20177024358 A KR 20177024358A KR 102089098 B1 KR102089098 B1 KR 102089098B1
Authority
KR
South Korea
Prior art keywords
cutting
cut
jig
sealed substrate
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020177024358A
Other languages
English (en)
Korean (ko)
Other versions
KR20170110651A (ko
Inventor
카츠노리 츠타후지
칸지 이시바시
카츠마사 시라이
히로토 모치즈키
Original Assignee
토와 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 토와 가부시기가이샤 filed Critical 토와 가부시기가이샤
Publication of KR20170110651A publication Critical patent/KR20170110651A/ko
Application granted granted Critical
Publication of KR102089098B1 publication Critical patent/KR102089098B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Dicing (AREA)
KR1020177024358A 2015-02-05 2016-01-06 절단 장치 및 절단 방법 Active KR102089098B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2015-021259 2015-02-05
JP2015021259A JP6212507B2 (ja) 2015-02-05 2015-02-05 切断装置及び切断方法
PCT/JP2016/050202 WO2016125518A1 (ja) 2015-02-05 2016-01-06 切断装置及び切断方法

Publications (2)

Publication Number Publication Date
KR20170110651A KR20170110651A (ko) 2017-10-11
KR102089098B1 true KR102089098B1 (ko) 2020-03-13

Family

ID=56563870

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177024358A Active KR102089098B1 (ko) 2015-02-05 2016-01-06 절단 장치 및 절단 방법

Country Status (5)

Country Link
JP (1) JP6212507B2 (enExample)
KR (1) KR102089098B1 (enExample)
CN (1) CN107210206B (enExample)
TW (1) TWI622090B (enExample)
WO (1) WO2016125518A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6483541B2 (ja) * 2015-06-16 2019-03-13 株式会社ディスコ パッケージ基板の加工方法
JP2018133432A (ja) * 2017-02-15 2018-08-23 株式会社ディスコ 切削装置
EP3795271B1 (en) * 2018-05-14 2023-05-24 FUJI Corporation Mounter provided with a lead wire cutting unit
EP3702831A1 (de) 2019-03-01 2020-09-02 Carl Zeiss Vision International GmbH Datensatz zur verwendung in einem verfahren zur herstellung eines brillenglases
JP6912745B1 (ja) * 2019-09-27 2021-08-04 株式会社東京精密 ダイシング装置及び方法
KR102411860B1 (ko) 2019-09-27 2022-06-23 가부시키가이샤 도교 세이미쓰 다이싱 장치 및 방법
JP7377092B2 (ja) * 2019-12-16 2023-11-09 Towa株式会社 統計データ生成方法、切断装置及びシステム
JP7446169B2 (ja) * 2020-06-26 2024-03-08 キヤノントッキ株式会社 基板搬送装置、基板処理システム、基板搬送方法、電子デバイスの製造方法、プログラム及び記憶媒体
JP7440356B2 (ja) * 2020-06-26 2024-02-28 キヤノントッキ株式会社 アライメント装置、成膜装置、アライメント方法、電子デバイスの製造方法、プログラム及び記憶媒体
JP7440355B2 (ja) * 2020-06-26 2024-02-28 キヤノントッキ株式会社 アライメント装置、成膜装置、アライメント方法、電子デバイスの製造方法、プログラム及び記憶媒体
JP7438865B2 (ja) * 2020-06-26 2024-02-27 キヤノントッキ株式会社 アライメント装置、成膜装置、アライメント方法、電子デバイスの製造方法、プログラム及び記憶媒体
JP7613849B2 (ja) * 2020-06-26 2025-01-15 キヤノントッキ株式会社 アライメント装置、成膜装置、アライメント方法、電子デバイスの製造方法、プログラム及び記憶媒体
JP7423161B2 (ja) * 2020-06-30 2024-01-29 株式会社ディスコ チャックテーブル
KR102799609B1 (ko) * 2021-03-16 2025-04-29 한미반도체 주식회사 반도체 자재 절단장치의 절단 셋팅방법
JP7564747B2 (ja) * 2021-03-29 2024-10-09 Towa株式会社 加工装置、及び加工品の製造方法
KR102633129B1 (ko) * 2021-09-29 2024-02-06 한국생산기술연구원 다이 웨이퍼 간 본딩 시 정렬방법
CN114609711B (zh) * 2022-03-09 2023-07-18 业成科技(成都)有限公司 光学元件的制造方法、夹持装置、显示模组及电子设备
JP2024024364A (ja) * 2022-08-09 2024-02-22 Towa株式会社 切断装置、及び、切断品の製造方法
CN115815474B (zh) * 2022-12-01 2023-09-15 广东新亚光电缆股份有限公司 一种低压电线及其智能加工系统

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001156025A (ja) 1999-11-29 2001-06-08 Disco Abrasive Syst Ltd ペレットの分離方法
JP2009170501A (ja) * 2008-01-11 2009-07-30 Disco Abrasive Syst Ltd 切削装置
KR101123613B1 (ko) 2008-03-17 2012-03-20 미쓰보시 다이야몬도 고교 가부시키가이샤 스크라이브 장치 및 스크라이브 방법
JP2012114126A (ja) * 2010-11-19 2012-06-14 Sharp Corp 基板分割装置および電子部品の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4733929B2 (ja) * 2004-04-20 2011-07-27 株式会社ディスコ 半導体ウエーハの切断方法
JP2005353723A (ja) 2004-06-09 2005-12-22 Apic Yamada Corp 切断装置、及び切断方法
JP6232667B2 (ja) * 2013-06-25 2017-11-22 ボンドテック株式会社 基板接合方法
JP6218511B2 (ja) * 2013-09-02 2017-10-25 Towa株式会社 切断装置及び切断方法
JP6143668B2 (ja) * 2013-12-28 2017-06-07 Towa株式会社 電子部品製造用の切断装置及び切断方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001156025A (ja) 1999-11-29 2001-06-08 Disco Abrasive Syst Ltd ペレットの分離方法
JP2009170501A (ja) * 2008-01-11 2009-07-30 Disco Abrasive Syst Ltd 切削装置
KR101123613B1 (ko) 2008-03-17 2012-03-20 미쓰보시 다이야몬도 고교 가부시키가이샤 스크라이브 장치 및 스크라이브 방법
JP2012114126A (ja) * 2010-11-19 2012-06-14 Sharp Corp 基板分割装置および電子部品の製造方法

Also Published As

Publication number Publication date
TWI622090B (zh) 2018-04-21
WO2016125518A1 (ja) 2016-08-11
KR20170110651A (ko) 2017-10-11
JP6212507B2 (ja) 2017-10-11
JP2016143861A (ja) 2016-08-08
TW201643951A (zh) 2016-12-16
CN107210206B (zh) 2020-09-22
CN107210206A (zh) 2017-09-26

Similar Documents

Publication Publication Date Title
KR102089098B1 (ko) 절단 장치 및 절단 방법
JP6339514B2 (ja) 切断装置及び切断方法
KR102128154B1 (ko) 흡착 기구 및 흡착 방법, 그리고 제조 장치 및 제조 방법
CN1983539B (zh) 晶粒键合的方法
KR102771049B1 (ko) 다이 부착 시스템, 및 이러한 시스템을 이용한 통합 정확도 검증 및 캘리브레이션을 위한 방법
TW201911462A (zh) 電子部件的實裝裝置與實裝方法,及封裝部件的製造方法
KR20140022582A (ko) 플립칩 본딩장치 및 본딩장치의 교정방법
KR102186384B1 (ko) 다이 본딩 장치 및 반도체 장치의 제조 방법
US11284550B2 (en) Use of placeable marker components for a staged placement of components on a carrier
EP2059112B1 (en) Electronic component taking out apparatus, surface mounting apparatus and method for taking out electronic component
TWI575587B (zh) Substrate cutting device and substrate cutting method
KR102417464B1 (ko) 전자 부품의 실장 장치
KR20110122447A (ko) 반도체 패키지 집합체 정렬방법
JP6498073B2 (ja) 切削ブレードの位置ずれ検出方法
CN117497459A (zh) 芯片贴装装置以及半导体器件的制造方法
KR101372379B1 (ko) 반도체 패키지용 회로기판의 검사방법
KR102781893B1 (ko) 가공 장치 및 가공품의 제조 방법
CN112447555B (zh) 电子零件的安装装置
JP5855866B2 (ja) ダミーチップおよびそれを用いた部品装着精度検査方法
CN111543125B (zh) 安装精度测定用芯片及安装精度测定用套件
KR20140064255A (ko) 전자부품 실장장치 및 이의 인포지션 판정 방법

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20170830

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20180305

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20190902

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20200115

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20200309

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20200310

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
PR1001 Payment of annual fee

Payment date: 20240304

Start annual number: 5

End annual number: 5