KR101921047B1 - Method for manufacturing semiconductor device - Google Patents

Method for manufacturing semiconductor device Download PDF

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KR101921047B1
KR101921047B1 KR1020177031979A KR20177031979A KR101921047B1 KR 101921047 B1 KR101921047 B1 KR 101921047B1 KR 1020177031979 A KR1020177031979 A KR 1020177031979A KR 20177031979 A KR20177031979 A KR 20177031979A KR 101921047 B1 KR101921047 B1 KR 101921047B1
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film
oxide semiconductor
semiconductor film
metal oxide
oxide
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KR1020177031979A
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KR20170126014A (en
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순페이 야마자키
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가부시키가이샤 한도오따이 에네루기 켄큐쇼
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    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66969Multistep manufacturing processes of devices having semiconductor bodies not comprising group 14 or group 13/15 materials
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    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409Unipolar field-effect transistors
    • H01L29/66477Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66742Thin film unipolar transistors
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    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
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    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/34Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
    • H01L21/38Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions
    • H01L21/385Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
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    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
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    • H01L21/34Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
    • H01L21/46Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
    • H01L21/461Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/4763Deposition of non-insulating, e.g. conductive -, resistive -, layers on insulating layers; After-treatment of these layers
    • H01L21/47635After-treatment of these layers
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    • H01L21/34Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
    • H01L21/46Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
    • H01L21/477Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
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    • H01L29/772Field effect transistors
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    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78603Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the insulating substrate or support
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    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
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    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/7869Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
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    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78696Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
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    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1222Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
    • H01L27/1225Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO

Abstract

In the transistor including the oxide semiconductor film, a metal oxide film is formed for preventing charging that contacts the oxide semiconductor film and covers the source electrode and the drain electrode. Thereafter, oxygen is introduced (added) into the oxide semiconductor film through the metal oxide film and heat treatment is performed. Through these steps of oxygen introduction and heat treatment, impurities such as hydrogen, moisture, hydroxyl groups, or hydrides are intentionally removed from the oxide semiconductor film, and the oxide semiconductor film is highly purified. In addition, by providing the metal oxide film, generation of a parasitic channel on the back channel side of the oxide semiconductor film can be prevented in the transistor.

Description

[0001] METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE [0002]

An embodiment of the present invention relates to a semiconductor device and a method of manufacturing the semiconductor device.

In this specification, a semiconductor device generally refers to a device that can function by utilizing semiconductor properties, and electro-optical devices, semiconductor circuits, and electronic devices are all semiconductor devices.

A technique for forming a transistor (also referred to as a thin film transistor (TFT)) using a semiconductor thin film formed on a substrate having an insulating surface has attracted attention. Such transistors are applied to a wide range of electronic devices such as integrated circuits (IC) or image display devices (display devices). As a semiconductor thin film applicable to the transistor, a silicon-based semiconductor material is widely known; In addition, oxide semiconductors have attracted attention as other materials.

For example, a transistor including an amorphous oxide having an electron carrier concentration of less than 10 18 / cm 3 and containing an active layer of indium (In), gallium (Ga), and zinc (Zn) is disclosed (see Patent Document 1 ).

[Reference]

[Patent Literature]

[Patent Document 1] Published Japanese Patent Application No. 2006-165528

However, the electrical conductivity of the oxide semiconductor changes when deviations from the stoichiometric composition occur due to an excess or deficiency of oxygen, or when hydrogen or moisture forming an electron donor is incorporated into the oxide semiconductor during the thin film forming process. This phenomenon is a factor of variation of the electrical characteristics of the transistor including the oxide semiconductor.

In view of the above problems, an object of the present invention is to provide a semiconductor device including an oxide semiconductor, which has stable electrical characteristics and high reliability.

It is also an object of the present invention to prevent the generation of parasitic channels on the back channel side of the oxide semiconductor film.

Impurities such as hydrogen, moisture, a hydroxyl group, or a hydride (also referred to as a hydrogen compound) which cause fluctuation are intentionally removed from the oxide semiconductor film in order to suppress the fluctuation of the electrical characteristics of the transistor including the oxide semiconductor film . Further, oxygen which is a main component of the oxide semiconductor and reduced in the process of removing the impurities is supplied. The oxide semiconductor film is thus highly purified and electrically I-type (intrinsic).

The I-type (intrinsic) oxide semiconductor is highly purified by removing hydrogen, which is an n-type impurity, from the oxide semiconductor so that almost no impurities other than the main component of the oxide semiconductor are contained, (Intrinsic). That is, a highly purified I-type (intrinsic) oxide semiconductor or an oxide semiconductor in the vicinity thereof is obtained by removing impurities such as hydrogen or moisture as much as possible, not by adding impurities. This allows the Fermi level (Ef) to be at the same level as the intrinsic Fermi level (Ei).

In the transistor including the oxide semiconductor film, an oxide layer for preventing electrification on the back channel side of the oxide semiconductor film is formed in contact with the oxide semiconductor film, oxygen is introduced (added) through the oxide layer, A layer is formed on the oxide layer, and a heat treatment is performed. This heat treatment may be performed before the insulating layer is formed on the oxide layer.

The oxide layer having an antistatic function is provided on the back channel side (opposite side of the gate insulating film) of the oxide semiconductor film, preferably, the high-purity oxide semiconductor film, and the oxide layer has a dielectric constant It is preferable to have a low dielectric constant. For example, an oxide layer having a dielectric constant of 8 or more and 20 or less is used.

The oxide layer is thicker than the oxide semiconductor film. For example, when it is assumed that the thickness of the oxide semiconductor film is not less than 3 nm and not more than 30 nm, the thickness of the oxide layer is preferably more than 10 nm and not more than the thickness of the oxide semiconductor film.

A metal oxide may be used for the oxide layer. As the metal oxide, for example, gallium oxide or gallium oxide added with 0.01 atom% to 5 atom% of indium or zinc may be used.

Impurities such as hydrogen, moisture, a hydroxyl group, or a hydride (also referred to as a hydrogen compound) are intentionally removed from the oxide semiconductor film through the oxygen introduction and the heat treatment described above, whereby the oxide semiconductor film has high purity . By the introduction of the oxygen, the bond between the metal and the hydrogen contained in the oxide semiconductor or the bond between the metal and the hydroxyl group is cut off, and the hydrogen or the hydroxyl group reacts with oxygen to produce water; This facilitates the removal of impurities, such as hydrogen or hydroxyl groups, in the form of water by subsequent thermal treatment.

Oxygen is introduced into the oxide semiconductor film through the metal oxide film deposited on the oxide semiconductor film so that depth of introduction (introduction region) of oxygen can be controlled, and oxygen can be efficiently introduced into the oxide semiconductor film.

Further, the metal oxide film containing oxygen and the oxide semiconductor film are subjected to the heat treatment in a state of being in contact with each other; Therefore, oxygen, which is one of the main components of the oxide semiconductor and reduced in the process of removing impurities, can be supplied to the oxide semiconductor film in the metal oxide film containing oxygen. Therefore, the oxide semiconductor film is highly purified so as to be I-type (intrinsic).

In order to prevent the impurities such as moisture or hydrogen from being mixed into the oxide semiconductor film after the thermal treatment, a protective insulating layer for preventing the contamination from the outside may further be formed on the insulating layer.

The electrical characteristics of the transistor including the high-purity oxide semiconductor film, such as threshold voltage and off-state current, are almost temperature-independent. In addition, the transistor characteristics have little change due to light deterioration.

As described above, the variation of the electrical characteristics of the transistor including the highly purified and electrically I-type (intrinsic) oxide semiconductor film is suppressed, and the transistor is electrically stable. As a result, a very stable semiconductor device including an oxide semiconductor with stable electrical characteristics can be provided.

The heat treatment is performed at a temperature of 250 ° C or more and 650 ° C or less, 450 ° C or more and 600 ° C or less, or a temperature lower than the strain point of the substrate. The heat treatment may be performed in an atmosphere of nitrogen, oxygen, super dry air (air having a moisture content of 20 ppm or less, preferably 1 ppm or less, more preferably 10 ppb or less), or rare gas (argon, helium, etc.).

An embodiment of the present invention disclosed in this specification is a method of manufacturing a semiconductor device, comprising: forming a gate electrode on a substrate; Forming a gate insulating film covering the gate electrode; Forming an oxide semiconductor film in a region overlapping the gate electrode with the gate insulating film interposed therebetween; Forming a source electrode and a drain electrode on the oxide semiconductor film; Forming a metal oxide film in contact with the oxide semiconductor film and covering the source electrode and the drain electrode; Introducing oxygen into at least one of the oxide semiconductor film, the metal oxide film, and the interface between the oxide semiconductor film and the metal oxide film; Forming an insulating film covering the metal oxide film; And performing a heat treatment.

Another embodiment of the present invention disclosed in this specification is a method of manufacturing a semiconductor device, comprising: forming a gate electrode on a substrate; Forming a gate insulating film covering the gate electrode; Forming an oxide semiconductor film in a region overlapping the gate electrode with the gate insulating film interposed therebetween; Forming a source electrode and a drain electrode on the oxide semiconductor film; Forming a metal oxide film in contact with the oxide semiconductor film and covering the source electrode and the drain electrode; Forming an insulating film covering the metal oxide film; Introducing oxygen into at least one of the oxide semiconductor film, the metal oxide film, and the interface between the oxide semiconductor film and the metal oxide film; And performing a heat treatment.

Further, another embodiment of the structure of the present invention disclosed in this specification is a method of manufacturing a semiconductor device, comprising: forming a gate electrode on a substrate; Forming a gate insulating film covering the gate electrode; Forming an oxide semiconductor film in a region overlapping the gate electrode with the gate insulating film interposed therebetween; Performing a first heat treatment on the oxide semiconductor film including heating in an inert atmosphere and cooling in an oxygen atmosphere; Forming a source electrode and a drain electrode on the oxide semiconductor film; Forming a metal oxide film in contact with the oxide semiconductor film and covering the source electrode and the drain electrode; Introducing oxygen into at least one of the oxide semiconductor film, the metal oxide film, and the interface between the oxide semiconductor film and the metal oxide film; Forming an insulating film covering the metal oxide film; And performing a second heat treatment.

Further, another embodiment of the structure of the present invention disclosed in this specification is a method of manufacturing a semiconductor device, comprising: forming a gate electrode on a substrate; Forming a gate insulating film covering the gate electrode; Forming an oxide semiconductor film in a region overlapping the gate electrode with the gate insulating film interposed therebetween; Performing a first heat treatment on the oxide semiconductor film including heating in an inert atmosphere and cooling in an oxygen atmosphere; Forming a source electrode and a drain electrode on the oxide semiconductor film; Forming a metal oxide film in contact with the oxide semiconductor film and covering the source electrode and the drain electrode; Forming an insulating film covering the metal oxide film; Introducing oxygen into at least one of the oxide semiconductor film, the metal oxide film, and the interface between the oxide semiconductor film and the metal oxide film; And performing a second heat treatment.

In the semiconductor device fabrication method, it is preferable that a film containing gallium oxide is formed as the metal oxide film.

Alternatively, in the above-described method for fabricating a semiconductor device, it is preferable that a gallium oxide film containing indium or zinc of 0.01 atom% to 5 atom% is formed as the metal oxide film.

In the method for manufacturing a semiconductor device, the heat treatment temperature is preferably 450 ° C to 600 ° C.

In the semiconductor device fabrication method, it is preferable that a film containing indium and gallium is formed as the oxide semiconductor film.

In the above structure, the gallium oxide film is preferably used as the metal oxide film. The gallium oxide film may be formed by a sputtering method, a CVD method, a vapor deposition method, or the like. The gallium oxide film depends on the composition ratio of oxygen and gallium, but has an energy gap of about 4.9 eV and transparency in the visible light wavelength range.

In this specification, gallium oxide is sometimes expressed as GaO x (x> 0). For example, when GaO x has a crystal structure, Ga 2 O 3 in which x is 1.5 is known.

In the above structures, the oxide semiconductor film may be subjected to a heat treatment before the metal oxide film is formed on the oxide semiconductor film. The introduction of the oxygen can be performed by an ion implantation method or an ion doping method.

A metal oxide film is formed on and in contact with the oxide semiconductor film, oxygen is introduced through the metal oxide film, and then thermal processing is performed. Through these processes of oxygen introduction and heat treatment, impurities such as hydrogen, moisture, hydroxyl groups, or hydrides can be intentionally removed from the oxide semiconductor film, whereby the oxide semiconductor film can be highly purified. The variation of the electrical characteristics of the transistor including the highly purified and electrically I-type (intrinsic) oxide semiconductor film is suppressed, and the transistor is electrically stable.

Thus, according to one embodiment of the present invention, a transistor with stable electrical characteristics can be fabricated.

Further, according to an embodiment of the present invention, a semiconductor device including a transistor, which has good electrical characteristics and high reliability, can be manufactured.

1A to 1E are views showing one embodiment of a semiconductor device and a method of manufacturing the semiconductor device.
2A to 2C are views showing an embodiment of a semiconductor device, respectively.
3 shows one embodiment of a semiconductor device.
4 shows one embodiment of a semiconductor device.
5 is a view showing an embodiment of a semiconductor device;
6A and 6B are views showing one embodiment of a semiconductor device.
7A and 7B are views showing an electronic device.
8A to 8F are views showing electronic devices, respectively.
9A is a model diagram showing a laminated structure of dielectrics, and FIG. 9B is an equivalent circuit diagram.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the following description, and those skilled in the art will readily appreciate that the modes and details disclosed herein can be modified in various ways. Therefore, the present invention should not be construed as being limited to the description of the following embodiments.

Note that ordinals such as " first " and " second " in this specification are used for convenience and do not denote the order of processes and the stacking order of layers. Furthermore, the ordinals in this specification do not denote certain names which specify the invention.

(Example 1)

In this embodiment, one embodiment of a semiconductor device and a method of manufacturing the semiconductor device will be described with reference to Figs. 1A to 1E. In this embodiment, a transistor including an oxide semiconductor film will be described as an example of the semiconductor device.

1E, the transistor 410 includes a gate electrode 401, a gate insulating film 402, an oxide semiconductor film 403, a source electrode 405a, and a drain (not shown) on a substrate 400 having an insulating surface. Electrode 405b. A metal oxide film 407 and an insulating film 409 having an antistatic function on the back channel side of the oxide semiconductor film 403 are stacked on the oxide semiconductor film 403 in this order.

Figs. 1A to 1E show an example of a method of manufacturing the transistor 410. Fig.

First, a conductive film is formed on the substrate 400 having an insulating surface, and then the gate electrode 401 is formed by a first photolithography step. Note that the resist mask may be formed by an ink-jet method. The formation of the resist mask by the ink-jet method does not require a photomask; Therefore, the manufacturing cost can be reduced.

While there is no particular limitation with respect to a substrate that can be used as the substrate 400 with an insulating surface, it is necessary that the substrate has at least sufficient heat resistance to the thermal treatment to be performed later. For example, a substrate such as a glass substrate, a ceramic substrate, a quartz substrate, a sapphire substrate, or the like can be used. Alternatively, a single crystal semiconductor substrate or polycrystalline semiconductor substrate such as silicon or silicon carbide; Compound semiconductor substrates such as silicon germanium; An SOI substrate or the like can be used as long as the substrate has an insulating surface. In addition, semiconductor devices can be provided on these substrates.

A flexible substrate may be used as the substrate 400. [ When a flexible substrate is used, the transistor 410 including the oxide semiconductor film 403 may be formed directly on the flexible substrate. Alternatively, the transistor 410 including the oxide semiconductor film 403 may be formed on a fabrication substrate, and then the transistor 410 may be detached and replaced with a flexible substrate. It is noted that a separate layer may be provided between the fabrication substrate and the transistor comprising the oxide semiconductor film to separate the transistor from the fabrication substrate and replace it with the flexible substrate.

An insulating film serving as a base film may be provided between the substrate 400 and the gate electrode 401. The base film has a function of preventing diffusion of an impurity element from the substrate 400 and has a single-layer structure or a laminate structure using at least one of a silicon nitride film, a silicon oxide film, a silicon nitride oxide film, and a silicon oxynitride film .

The gate electrode 401 may be formed using a metal material such as molybdenum, titanium, tantalum, tungsten, aluminum, copper, neodymium, or scandium or an alloy material containing any of these materials as a main component. As shown in Fig.

Next, the gate insulating film 402 is formed on the gate electrode 401. The gate insulating film 402 may be formed using a silicon oxide layer, a silicon nitride layer, a silicon oxynitride layer, a silicon nitride oxide layer, an aluminum oxide layer, an aluminum nitride layer, an aluminum oxynitride layer, an aluminum nitride oxide layer, A plasma CVD method, a sputtering method, or the like.

In this embodiment, as the oxide semiconductor film 403, the oxide semiconductor film 403 is formed to have high purity and to remove impurities such as intrinsic (I-type) or substantially Intrinsic (I-type) oxide semiconductors are used.

Such high purity oxide semiconductors are extremely sensitive to interfacial states or interface charge; Therefore, the interface between the oxide semiconductor film and the gate insulating film is important. Therefore, the gate insulating film in contact with the high-purity oxide semiconductor must have high quality.

(For example, with a frequency of 2.45 GHz), since the insulating layer to be formed can be dense and can have a high breakdown voltage and high quality, It is preferable to use a high-density plasma CVD method. This is because, when the high-purity oxide semiconductor is adhered to the high-quality gate insulating film, the interface state can be reduced and the interfacial characteristics can be good.

Of course, a different film forming method such as a sputtering method or a plasma CVD method can be used as long as a high quality insulating film can be formed as the gate insulating film. Further, an insulating layer can be used, and the film quality to the gate insulating film and the characteristics of the interface with the oxide semiconductor are improved by the heat treatment performed after the film formation. In either case, any gate insulating film can be used as long as the film quality as the gate insulating film is high, the interface state density with the oxide semiconductor is reduced, and a good interface can be formed.

The thickness of the gate electrode 401 to the substrate 400 or the gate insulating film 402 on which the gate electrode 401 is formed is set so that the hydrogen, the hydroxyl group, and the moisture are hardly contained in the gate insulating film 402 and the oxide semiconductor film, The substrate 400 on which the films are formed is preheated in the preheating chamber of the sputtering apparatus as a pretreatment for forming the oxide semiconductor film so that the impurities such as hydrogen and moisture adsorbed on the substrate 400 are exhausted and removed . As the exhaust means provided in the preheating chamber, a cryo pump is preferable. Note that this preheating treatment may be omitted. Similarly, this preheating treatment may be performed on the substrate 400 (before the formation of the metal oxide film 407) in which the films from the source electrode 405a to the drain electrode 405b are formed in a later step .

Next, an oxide semiconductor film having a thickness of 3 nm or more and 30 nm or less is formed on the gate insulating film 402 by a sputtering method. Since the transistor can be normally on when the thickness of the oxide semiconductor film is very large (for example, when the thickness is 50 nm or more), the thickness in the above range is preferable.

(Also referred to as particles or dust) adhered on the surface of the gate insulating film 402 by reverse sputtering in which argon gas is introduced and plasma is generated, before the oxide semiconductor film is formed by the sputtering method, Is preferably removed. The reverse sputtering is a method in which the RF power source is used for applying a voltage to the substrate side in an argon atmosphere, without applying a voltage to the target side, and plasma is generated in the vicinity of the substrate to modify the surface. Note that a nitrogen atmosphere, a helium atmosphere, an oxygen atmosphere and the like may be used instead of the argon atmosphere.

As oxide semiconductors used for the oxide semiconductor film, the following oxide semiconductors can be used: quaternary metal oxides such as In-Sn-Ga-Zn-O-based oxide semiconductors; Zn-O-based oxide semiconductor, an In-Sn-Zn-O-based oxide semiconductor, an In- Ga-Zn-O-based oxide semiconductors, or Sn-Al-Zn-O-based oxide semiconductors; Zn-O-based oxide semiconductor, Sn-Zn-O-based oxide semiconductor, Al-Zn-O-based oxide semiconductor, A binary metal oxide such as an In-Mg-O-based oxide semiconductor or an In-Ga-O-based oxide semiconductor; In-O-based oxide semiconductor; Sn-O-based oxide semiconductor; Zn-O-based oxide semiconductor and the like. Further, SiO 2 may be contained in the oxide semiconductor. For example, the In-Ga-Zn-O-based oxide semiconductor means an oxide film containing indium (In), gallium (Ga), and zinc (Zn) do. The In-Ga-Zn-O-based oxide semiconductor may contain elements other than In, Ga, and Zn.

Further, for the oxide semiconductor film, a thin film of a material represented by the chemical formula InMO 3 (ZnO) m (m> 0) can be used. Here, M represents at least one metal element selected from Ga, Al, Mn, and Co. For example, M may be Ga, Ga and Al, Ga and Mn, Ga and Co, and the like.

When an In-Ga-Zn-O-based material is used as the oxide semiconductor, an oxide target having a composition ratio of In 2 O 3 : Ga 2 O 3 : ZnO = 1: 1: 1 [molar ratio] Can be used as a target. An oxide target having a composition ratio of, for example, In 2 O 3 : Ga 2 O 3 : ZnO = 1: 1: 2 [molar ratio] can be used without limitation on the material and the composition of the target.

If the In-ZnO-based material is used as the oxide semiconductor, the target is the atomic ratio In: Zn = 50: 1 to 1: 2 (mole ratio of In 2 O 3: ZnO = 25 : 1 to 1: 4), preferably, the atomic ratio is In: Zn = 20: 1 to 1: 1 (mole ratio of In 2 O 3: ZnO = 10 : 1 to 1: 2), more preferably, the atomic ratio In: Zn = Has a composition ratio of 15: 1 to 1.5: 1 (molar ratio of In 2 O 3 : ZnO = 15: 2 to 3: 4). For example, in the target used for forming the In-Zn-O-based oxide semiconductor having the atomic ratio of In: Zn: O = X: Y: Z, the relation of Z> 1.5X + Y is satisfied.

The charging rate of the target is 90% or more and 100% or less, preferably 95% or more and 99.9% or less. By using the target having a high filling rate, a dense oxide semiconductor film can be formed.

In this embodiment, the oxide semiconductor film is formed by a sputtering method using an In-Ga-Zn-O-based oxide target. The oxide semiconductor film may be formed by sputtering in a rare gas (typically argon) atmosphere, an oxygen atmosphere, or a mixed atmosphere containing rare gas and oxygen.

It is preferable to use a high purity gas in which impurities such as hydrogen, moisture, hydroxyl groups, or hydrides are removed as the sputtering gas used when the oxide semiconductor film is formed.

In order to form the oxide semiconductor film, the substrate 400 is placed in a deposition chamber under a reduced pressure, and the substrate temperature is preferably set to 100 ° C or higher and 600 ° C or lower, preferably 200 ° C or higher and 400 ° C or lower. The film formation is performed in a state where the substrate 400 is heated, whereby the concentration of the impurities contained in the formed oxide semiconductor film can be reduced. In addition, damage caused by sputtering can be reduced. Thereafter, residual moisture in the film formation chamber is removed, hydrogen and moisture-free sputtering gas is introduced, and the above-described target is used to form the oxide semiconductor film on the substrate 400. [ To remove residual moisture in the deposition chamber, a gas entrapment vacuum pump such as a cryo pump, ion pump, or titanium sublimation pump is preferably used. Further, the exhaust means may be a turbo pump to which a cold trap is added. In the film forming chamber exhausted by the cryopump, a hydrogen atom, a compound containing hydrogen atom (more preferably, a compound containing a carbon atom) such as water (H 2 O), and the like are removed, The concentration of the impurities contained in the oxide semiconductor film formed in the film formation chamber can be reduced.

As an example of the film forming conditions, a distance between the substrate and the target is 100 mm, a pressure is 0.6 Pa, a direct current (DC) power source is 0.5 kW, and the atmosphere is an oxygen atmosphere (oxygen flow ratio is 100%). Note that pulsed DC power is preferably used because the powdery materials (also referred to as particles or dust) produced during film formation can be alleviated and the film thickness can be uniform.

Next, the oxide semiconductor film is processed into an island-shaped oxide semiconductor film 441 through a second photolithography step (see FIG. 1A). The resist mask for forming the island-like oxide semiconductor film 441 may be formed by an ink-jet method. Formation of the resist mask by an ink-jet method does not require a photomask; Therefore, the manufacturing cost can be reduced.

It is noted that the etching of the oxide semiconductor film may be dry etching, wet etching, or both dry etching and wet etching. As the etchant used for the wet etching of the oxide semiconductor film, for example, a mixed solution of phosphoric acid, acetic acid, and nitric acid may be used. In addition, ITO-07N (produced by KANTO CHEMICAL CO., INC.) May also be used.

Next, a conductive film for forming a source electrode and a drain electrode (including a wiring formed in the same layer as the source electrode and the drain electrode) is formed on the gate insulating film 402 and the oxide semiconductor film 441. [ A metal film containing an element selected from Al, Cr, Cu, Ta, Ti, Mo, and W as the conductive film for forming the source electrode and the drain electrode; (E.g., a titanium nitride film, a molybdenum nitride film, or a tungsten nitride film) may be used. Alternatively, a refractory metal film or a metal nitride film (for example, a titanium nitride film, a molybdenum nitride film, or a tungsten nitride film) such as Ti, Mo, or W may be formed on a metal film such as an Al film or a Cu film and / Or below. In addition, the conductive film for forming the source electrode and the drain electrode may be formed using a conductive metal oxide. As the conductive metal oxide, an alloy of indium oxide (In 2 O 3 ), tin oxide (SnO 2 ), zinc oxide (ZnO), indium oxide-tin oxide (In 2 O 3 -SnO 2 (abbreviated as ITO) An indium-zinc oxide alloy (In 2 O 3 -ZnO), or any of these metal oxide materials containing silicon oxide can be used.

It is noted that the material of the source electrode and the drain electrode is preferably selected in consideration of the electron affinity of the oxide semiconductor and the electron affinity of the metal oxide film. That is, when the work function of the material of the source electrode and the drain electrode is W [eV], the electron affinity of the oxide semiconductor is φ 1 [eV], and the electron affinity of the metal oxide film is φ 2 [eV] , it is preferable that the following inequality is satisfied: φ 2 + 0.4 <W < {φ 1 + 0.5}, and preferably {φ 2 + 0.9} <W <{φ 1 + 0.4}. For example, when a material having an electron affinity of 4.5 eV and a material having an electron affinity of 3.5 eV are used for the oxide semiconductor and the metal oxide film, respectively, the work function is preferably greater than 3.9 eV and less than 5.0 eV, A metal or a metal compound having a valence of 4.9 eV or less is preferably used for the material of the source electrode and the drain electrode. Therefore, in the transistor 410, electrons can be prevented from being injected from the source electrode 405a and the drain electrode 405b into the metal oxide film 407, and generation of a leakage current can be suppressed. In addition, good electrical characteristics can be obtained at the junction between the oxide semiconductor film and the source and drain electrodes. With respect to a material having such a work function, molybdenum nitride, tungsten nitride, or the like can be given, for example. These materials are preferable because these materials are also excellent in heat resistance. From the above inequality, the inequality φ 2 <{φ 1 + 0.1 }, preferably the inequality φ 2 <{φ 1 - 0.5 } is however derived, inequality φ 2 <{φ 1 - 0.9 } is noted that it is more preferable to be satisfied do.

A resist mask is formed on the conductive film by a third photolithography step. Etching is selectively performed to form the source electrode 405a and the drain electrode 405b. Thereafter, the resist mask is removed (see FIG. 1B).

In the third photolithography step, the exposure in forming the resist mask may be performed using ultraviolet light, KrF laser light, or ArF laser light. The channel length L of each of the transistors to be formed in a later stage is determined by the distance between the lower end of the source electrode and the lower end of the drain electrode adjacent to each other on the oxide semiconductor film 441. [ When the exposure is performed for a channel length (L) of less than 25 nm, the exposure at the time of forming the resist mask in the third photolithography step is carried out by using an ultraviolet ray having a microwave length of several nanometers or more and several tens of nanometers or less . &Lt; / RTI &gt; In the above exposure using ultraviolet rays, the resolution is high and the depth of focus is large. For these reasons, the channel length L of the transistor to be formed later may be 10 nm or more and 1000 nm or less, and the circuit can operate at a higher speed.

In order to reduce the number of photomasks used in the photolithography step and to reduce the number of photolithography steps, a multi-tone mask, which is an exposure mask through which light is transmitted to have a plurality of intensities, Can be performed. A resist mask formed using a multi-gradation mask has a plurality of thicknesses and can be changed in shape by etching; Thus, the resist mask may be used in a plurality of etching steps for processing into different patterns. As a result, a resist mask corresponding to at least two or more different patterns can be formed by one multi-gradation mask. Thus, the number of exposure masks can be reduced and the number of corresponding photolithography steps can also be reduced, thereby simplifying the process can be realized.

It is noted that the etching conditions are preferably optimized such that the oxide semiconductor film 441 is not etched away when the conductive film is etched. However, it is difficult to obtain etching conditions in which only the conductive film is etched and the oxide semiconductor film 441 is not etched at all. In some cases, when the conductive film is etched, only a part of the oxide semiconductor film 441 is etched to become an oxide semiconductor film having a trench (recessed portion).

In this embodiment, since the Ti film is used as the conductive film and the In-Ga-Zn-O-based oxide semiconductor is used as the oxide semiconductor film 441, ammonia hydrogen peroxide (a mixture of ammonia, water and hydrogen peroxide) Is used as an etchant.

Next, by the plasma treatment using a gas such as N 2 O, N 2 , or Ar, moisture adsorbed on the surface of the exposed portion of the oxide semiconductor film can be removed. When the plasma treatment is performed, the metal oxide film 407, which is in contact with a part of the oxide semiconductor film 441, is preferably formed after the plasma treatment without being exposed to the atmosphere.

Thereafter, the metal oxide film 407 which covers the source electrode 405a and the drain electrode 405b and is in contact with a part of the oxide semiconductor film 441 is formed. It is noted that the thickness of the metal oxide film 407 is thicker than the thickness of the oxide semiconductor film 441. The metal oxide film 407 is in contact with the back channel side of the oxide semiconductor film 441, that is, a part of the oxide semiconductor film 441 between the source electrode 405a and the drain electrode 405b Touch. The metal oxide film 407 is a film for removing charges accumulated at the interface with the oxide semiconductor film 441.

A positive charge is transferred from the source electrode 405a or the drain electrode 405b to the oxide semiconductor film due to a potential (charge) accumulated in the source electrode 405a or the drain electrode 405b, The interface on the back channel side can be charged. In particular, when the electrical conductivity of the oxide semiconductor film and the electrical conductivity of the material layer in contact with the back channel side of the oxide semiconductor film are different from each other, a charge flows into the oxide semiconductor film, the charge is captured at the interface, Thereby becoming the donor center of the interface. As a result, there is a problem that the characteristics of the transistors change. Therefore, both reduction of the hydrogen of the oxide semiconductor film and prevention of electrification are important.

The difference between the physical property value of the oxide semiconductor film and the physical property value of the metal oxide film is preferably small. Here, the physical value means a work function, an electron affinity, a dielectric constant, a band gap, or the like. In particular, the difference between the band gap of the oxide semiconductor film and the band gap of the metal oxide film is preferably less than 3 eV. For example, in the case where an In-Ga-Zn-O-based oxide semiconductor is used as the oxide semiconductor film and silicon oxide or aluminum oxide is used as the metal oxide film, And the band gap of the silicon oxide or aluminum oxide is 8 eV, the above-described problem may arise. Further, when a nitride containing film (such as a silicon nitride film) is used in place of the metal oxide film, the electrical conductivity of the oxide semiconductor film may change due to the contact between the nitride containing film and the oxide semiconductor film have.

The metal oxide film 407 is a film that has a property of immediately removing a positive charge when a positive charge is charged on the back channel side. As the material of the metal oxide film 407, a material in which the hydrogen content is equal to or less than the hydrogen content of the oxide semiconductor film, or the hydrogen content is not larger than the one by one or more than the hydrogen content of the oxide semiconductor film and the energy gap is equal to or greater than the energy gap of the material of the oxide semiconductor film Is preferably used.

As described above, the use of the metal oxide film 407 having an antistatic function allows the flow of charges from the material layer in contact with the back channel side of the oxide semiconductor film 403 to the oxide semiconductor film 403 Can be suppressed. Further, even when a positive charge is charged on the back channel side of the oxide semiconductor film 403, a positive charge can be immediately removed by the metal oxide film 407 provided on the upper surface of the oxide semiconductor film. Also, by using the metal oxide film 407, generation of parasitic channels on the back channel side of the oxide semiconductor film 403 can be prevented. As a result, variations in the electrical characteristics of the oxide semiconductor film 403, such as electrical conductivity and threshold voltage, can be suppressed, thereby improving the reliability of the transistor 410. [

In this embodiment, a gallium oxide film obtained by a sputtering method using a pulsed direct current (DC) power source is used as the metal oxide film 407. It is noted that the gallium oxide target is preferably used as the target used in the sputtering method. The electrical conductivity of the metal oxide film 407 can be appropriately adjusted by adding In or Zn to the metal oxide film 407 in accordance with the electrical conductivity of the oxide semiconductor film to be used. For example, a film containing 0.01 atom% to 5 atom% of indium or zinc is formed by a sputtering method using a target obtained by adding indium or zinc to gallium oxide. When the electric conductivity of the metal oxide film 407 is improved and becomes closer to the electric conductivity of the oxide semiconductor film 403 by adding indium or zinc, accumulated charges can be further reduced.

The bandgap of the gallium oxide is 3.0 eV to 5.2 eV (for example, 4.9 eV), the dielectric constant thereof is 10 to 12, and the electron affinity thereof is 3.5 eV. The band gap of the In-Ga-Zn-O-based oxide semiconductor is 3.15 eV, its dielectric constant is 15, and its electron affinity is 3.5 eV. Therefore, the difference between the physical property value of the gallium oxide film and the physical property value of the oxide semiconductor film is small, which is preferable. Since gallium oxide has a broad bandgap of about 4.9 eV, it has translucency in the visible light wavelength range. Further, since the contact resistance between the In-Ga-Zn-O-based oxide semiconductor film and the gallium oxide film can be reduced, gallium oxide is preferably used as the metal oxide film. In-Ga-O-based oxide semiconductor or Ga-Zn-O-based oxide semiconductor is used as the oxide semiconductor material in addition to the In-Ga-Zn-O-based oxide semiconductor when gallium oxide is used as the metal oxide film .

In particular, when the In-Ga-Zn-O film is used for the oxide semiconductor film, since the In-Ga-Zn-O film contains a gallium element common to GaOx used as the metal oxide film 407, The oxide semiconductor film and the metal oxide film materials are compatible with each other.

The metal oxide film 407 is preferably formed using a method in which impurities such as moisture and hydrogen are not mixed into the metal oxide film 407. When hydrogen is contained in the metal oxide film 407, introduction of hydrogen into the oxide semiconductor film or extraction of oxygen by hydrogen from the oxide semiconductor film is caused; Therefore, the back channel of the oxide semiconductor film can be made low resistance (n-type conductivity) and a parasitic channel can be formed. Therefore, it is important that the formation method in which hydrogen is not used is used so that the metal oxide film 407 does not contain hydrogen as much as possible.

In this embodiment, as the metal oxide film 407, a gallium oxide film having a thickness of 10 nm or more and a thickness of at least the thickness of the oxide semiconductor film 441 is formed by the sputtering method. This is because the metal oxide film 407 can emit electrons efficiently in this manner by increasing the thickness of the metal oxide film 407. The substrate temperature at the time of film formation may be from room temperature to 300 deg. The gallium oxide film may be formed by a sputtering method in a rare gas (typically, argon) atmosphere, an oxygen atmosphere, or a mixed atmosphere containing rare gas and oxygen.

In order to remove residual moisture from the deposition chamber of the metal oxide film 407 in a manner similar to the formation of the oxide semiconductor film, a gas storage vacuum pump (such as a cryopump) is preferably used. When the metal oxide film 407 is formed in the deposition chamber that is exhausted using the cryopump, the concentration of impurities contained in the metal oxide film 407 can be reduced. Further, as the exhaust means for removing residual moisture from the film formation chamber of the metal oxide film 407, a turbo pump equipped with a cooling trap may be used.

It is preferable to use a high purity gas in which impurities such as hydrogen, moisture, hydroxyl groups, or hydrides are removed as the sputtering gas when the metal oxide film 407 is formed.

The metal oxide film 407 may cover at least the channel forming region of the oxide semiconductor film, the source electrode 405a, and the drain electrode 405b. If necessary, the metal oxide film 407 can be selectively removed. It is noted that a known wet etch or known dry etch may be used to etch the gallium oxide film used in this example. For example, wet etching is performed using a hydrofluoric acid solution or a nitric acid solution.

Next, oxygen 421 is introduced into the oxide semiconductor film 441, the metal oxide film 407, and the oxide semiconductor film 441 and the metal oxide film 407 through the metal oxide film 407, Interface (see Fig. 1C).

As the method of introducing the oxygen 421, an ion implantation method, an ion doping method, or the like can be used. In the ion implantation method, the source gas is made into a plasma, the ion species contained in the plasma are extracted and mass-separated, and the ion species having a predetermined mass are accelerated and injected into the workpiece by the ion beam. In the ion doping method, the source gas is made of plasma, ion species are extracted from the plasma by the action of a predetermined electric field, and the extracted ion species are accelerated without mass separation and injected into the object to be processed with the ion beam. When the introduction of oxygen is performed using an ion implantation method involving mass-separation, an impurity such as a metal element can be prevented from being added to the oxide semiconductor film together with oxygen. Also, the ion doping method enables ion-beam irradiation to a larger area than the ion implantation method; Thus, when the addition of oxygen is performed using an ion doping method, the takt time can be shortened.

Since the oxygen is introduced into the oxide semiconductor film 441 through the metal oxide film 407 stacked on the oxide semiconductor film 441, the introduction depth (introduction region) of oxygen can be controlled; Therefore, oxygen can be introduced into the oxide semiconductor film 441 efficiently. The depth of introduction of oxygen can be controlled by appropriately setting introduction conditions such as the thickness or the dose or the acceleration voltage of the metal oxide film 407 through which oxygen passes.

Subsequently, the insulating film 409 is formed on the metal oxide film 407 (see FIG. 1D). As the insulating film 409, an inorganic insulating film is used and an insulating film such as a silicon oxide film, a silicon oxynitride film, an aluminum oxide film, and an aluminum oxynitride film, or a silicon nitride film, a silicon nitride oxide film, , And a nitride insulating film such as an aluminum nitride oxide film may be used. For example, a silicon oxide film and a silicon nitride film are stacked in this order on the metal oxide film 407 by a sputtering method.

Note that the oxygen introduction treatment may be performed after the insulating film 409 is formed on the metal oxide film 407. [

Next, the oxide semiconductor film 441 into which oxygen has been introduced is subjected to heat treatment in a state where a part of the oxide semiconductor film 441 (the channel forming region) is in contact with the metal oxide film 407 (see FIG. 1E) .

The heat treatment is performed at 250 ° C or higher and 650 ° C or lower, preferably 450 ° C or higher and 600 ° C or lower, or less than the strain point of the substrate. For example, after the substrate is introduced into an electric furnace, which is one type of heat treatment apparatus, the oxide semiconductor film is subjected to a heat treatment at 450 캜 for one hour in a nitrogen atmosphere.

It should be noted that the heat treatment apparatus used is not limited to an electric furnace but an apparatus for heating the object to be treated by heat conduction or thermal radiation from a heating element such as a resistance heating element may be alternatively used. For example, rapid thermal annealing (RTA) devices such as gas-assisted thermal annealing (GRTA) devices or lamp rapid annealing (LRTA) devices may be used. The LRTA device is an apparatus for heating an object to be processed by radiating light (electromagnetic waves) emitted from a lamp such as a halogen lamp, a metal halide lamp, a xenon arc lamp, a carbon arc lamp, a high pressure sodium lamp, or a high pressure mercury lamp . The GRTA apparatus is a device for heat treatment using a hot gas. As the high-temperature gas, an inert gas which does not react with the object to be treated by heat treatment, such as rare gas such as nitrogen or argon, is used. Note that, in the case where the GRTA apparatus is used as the heat treatment apparatus, the substrate can be heated with an inert gas heated to a high temperature of 650 DEG C to 700 DEG C because the heat treatment time is short.

The heat treatment may be performed in an atmosphere of nitrogen, oxygen, super dry air (air having a moisture content of 20 ppm or less, preferably 1 ppm or less, more preferably 10 ppb or less), or rare gas (argon, helium, etc.). It is noted that the atmosphere of nitrogen, oxygen, super-dry air, or rare gas is preferably free of moisture, hydrogen, and the like. The purity of nitrogen, oxygen, or rare gas introduced into the heat treatment apparatus is preferably set to 6N (99.9999%) or more, preferably 7N (99.99999%) or more (that is, the impurity concentration is 1 ppm or less, preferably 0.1 ppm or less) Do.

Oxygen is introduced into at least one of the oxide semiconductor film 441, the metal oxide film 407 and the interface between the oxide semiconductor film 441 and the metal oxide film 407, Heat treatment is performed; Therefore, the dangling bonds existing at the interface between the oxide semiconductor film 441, the metal oxide film 407, or the oxide semiconductor film 441 and the metal oxide film 407 are oxidized by oxygen Lt; / RTI &gt; When dangling bonds are present at the interface between the oxide semiconductor film 441, the metal oxide film 407, or the oxide semiconductor film 441 and the metal oxide film 407, hydrogen is diffused and bonds are formed Can be; However, the formation of the bonds can be prevented by the termination of the dangling bonds by oxygen.

By the introduction of the oxygen, the bond between the metal and hydrogen contained in the oxide semiconductor or the bond between the metal and the hydroxyl group is cut off, and the hydrogen or the hydroxyl group reacts with oxygen to produce water. As a result, impurities such as hydrogen or hydroxyl groups can be easily removed as water by the heat treatment.

In this way, the formation of bonds can be prevented, the oxide semiconductor film can be dehydrated or dehydrogenated, and impurities such as hydrogen, moisture, hydroxyl, or hydride can be removed from the oxide semiconductor film by the oxygen introduction and the heat treatment Lt; / RTI &gt;

Further, the oxide semiconductor film and the metal oxide film 407 containing oxygen are subjected to heat treatment in a state of being in contact with each other; Therefore, oxygen, which is one of the main components of the oxide semiconductor and reduced in the step of removing impurities, can be supplied to the oxide semiconductor film in the oxygen-containing metal oxide film 407. Therefore, the charge capturing center of the oxide semiconductor film can be reduced. Through the above steps, the oxide semiconductor film 403 which is highly purified and electrically I-type (intrinsic) can be obtained. In addition, the impurities can be simultaneously removed from the metal oxide film 407 by the heat treatment, and the metal oxide film 407 can be highly purified.

The highly-purified oxide semiconductor film 403 contains very few (near zero) carriers derived from the donor. The carrier concentration of the oxide semiconductor film 403 is less than 1 x 10 14 / cm 3 , preferably less than 1 x 10 12 / cm 3 , more preferably less than 1 x 10 11 / cm 3 .

By adding oxygen through the metal oxide film 407, distortion occurs in the arrangement of atoms near the interface between the oxide semiconductor film 441 and the metal oxide film 407. Thereafter, the atoms near the interface between the oxide semiconductor film 403 and the metal oxide film 407 are rearranged by the heat treatment. At this time, the atoms of the oxide semiconductor film 403 and the metal oxide film 407 are bonded to each other, and the electrical conductivity of the oxide semiconductor film 403 and the electrical conductivity of the metal oxide film 407 The difference can be reduced, and the charge on the back channel side of the oxide semiconductor film can be prevented. As a result, variations in the electrical characteristics of the oxide semiconductor film, such as the threshold voltage, can be suppressed, thereby improving the reliability of the transistor.

Through the above processes, the transistor 410 is formed (see FIG. The transistor 410 is a transistor including the oxide semiconductor film 403 in which impurities such as hydrogen, moisture, a hydroxyl group, or a hydride (also referred to as a hydrogen compound) are intentionally removed and highly purified. As a result, variations in the electrical characteristics of the transistor 410 are suppressed and the transistor 410 is electrically stable.

Note that the heat treatment performed after the introduction of oxygen may be performed prior to the formation of the insulating film 409. In this case, the insulating film 409 is formed on the metal oxide film 407 after the heat treatment.

In addition to the heat treatment, other heat treatment may be performed. For example, the heat treatment (first heat treatment) may be performed after the oxide semiconductor film 441 is formed, and the heat treatment (second heat treatment) may be performed after the metal oxide film 407 is formed . In this case, the first heat treatment may be, for example, a treatment in which heating is performed in an inert gas atmosphere and cooling is performed in an oxygen atmosphere (at least in an atmosphere containing oxygen). When such first heat treatment is used, it may be preferable that dehydration and oxygen supply are performed on the oxide semiconductor film.

After step &lt; RTI ID = 0.0 &gt; 1e, &lt; / RTI &gt; For example, the heat treatment may be performed at 100 ° C or higher and 200 ° C or lower in the air for 1 hour to 30 hours or less. This heat treatment can be performed at a fixed heating temperature. Alternatively, the following change of the heating temperature may be repeated a plurality of times: the heating temperature is increased from room temperature to a temperature of from 100 캜 to 200 캜 and then decreased to room temperature.

The field effect mobility of the transistor 410 including the oxide semiconductor film 403 can be relatively high, and high-speed operation is possible. As a result, when the transistor is used in the pixel portion, high-quality images can be provided. Further, a driver circuit portion including the transistors including the highly-purified oxide semiconductor film and the pixel portion can be formed on one substrate; Therefore, the number of components of the semiconductor device can be reduced.

In the transistor 410 having the metal oxide film 407, the parasitic channel on the back channel side of the oxide semiconductor film 403 can be prevented. Further, by preventing the generation of the parasitic channel on the back channel side of the oxide semiconductor film 403 of the transistor 410, the fluctuation of the threshold voltage can be suppressed, thereby improving the reliability of the transistor .

In the transistor 410 shown in FIG. 1E, two dielectric layers, the oxide semiconductor film 403, and the metal oxide film 407 are provided in contact with each other. In the case where two different dielectric layers are stacked, the two stacked layers are formed so that the dielectric constant, the electric conductivity, and the thickness of the first layer (the oxide semiconductor film 403 of the transistor 410) are? 1 ,? 1 , And d 1 , and when the dielectric constant, the electric conductivity, and the thickness of the second layer (the metal oxide film 407 of the transistor 410) are set to? 2 ,? 2 , and d 2 , respectively, Can be expressed as shown in Fig. Note that in FIG. 9A, S represents the area. The model diagram of Fig. 9A can be replaced with the equivalent circuit of Fig. 9B. In the figure, C 1 , G 1 , C 2 , and G 2 represent the capacitance value of the first layer, the resistance value of the first layer, the capacitance value of the second layer, and the resistance value of the second layer, respectively do. Here, when the voltage V is applied to the two layers, the charge Q expressed by the following equation (1) is considered to be accumulated at the interface between the two layers after t seconds.

Figure 112017109217237-pat00001

In the transistor 410 shown in FIG. 1E, the interface at which the charge Q is accumulated corresponds to the back channel side of the oxide semiconductor film 403. The electric charge Q accumulated on the interface on the back channel side can be reduced by suitably setting the dielectric constant, the electric conductivity, or the thickness of the metal oxide film 407. [

Here, the expression (1) is transformed into the expression (2) and the expression (3).

Figure 112017109217237-pat00002

Figure 112017109217237-pat00003

Figure 112017109217237-pat00004

From the equations (2) and (3), four conditions (A) to (D) are assumed to reduce the charge Q.

Condition (A): τ i is extremely large.

Condition (B): V 2 is close to zero, that is, G 2 is much larger than G 1 .

Condition (C): C 2 is close to zero.

Condition (D): τ 1 is close to τ 2 .

To make τ i extremely large under these conditions (A), τ i = { C 1 + C 2} / due to {G 1 + G 2}, {C 1 + C 2} is {G 1 + G 2} Can be made extremely large. Since C 1 and G 1 are parameters of the oxide semiconductor film 403, C 2 must be increased by the metal oxide film 407 to reduce the charge Q. However, since C 2 = ε 2 S / d 2 , when C 2 is increased by ε 2 , Q becomes larger according to [Equation 2], and a contradiction exists. That is, the charge Q can not be adjusted by? I.

In order to make V 2 close to zero under the condition (B), G 2 >> G 1 can be satisfied from (3). Since G 1 is a parameter of the oxide semiconductor film 403, G 2 must be increased by the metal oxide film 407 to reduce the charge Q. Specifically, d 2 is decreased or G 2 = σ 2 S / d 2 , so that a material with a large σ 2 is selected. However, when d 2 is decreased, C 2 is increased at C 2 = ε 2 S / d 2 , Q is increased as in the case of the above condition (A), and a decrease of d 2 can not be used. Further, when? 2 is large, the electrical conductivity of the metal oxide film 407 is higher than the electrical conductivity of the oxide semiconductor film 403, which causes a high possibility of leakage current and a short circuit; Therefore, a material having a large sigma 2 can not be used.

In order to make C 2 extremely small under the above condition (C), from C 2 = ε 2 S / d 2 , a material whose d 2 is increased or ε 2 is small is selected.

To make-up the τ 1 to τ 2 under the above condition (D), τ 1 = ε 1 / σ 1 and since τ 2 = ε 2 / σ 2 , satisfies ε 1 / σ 1 ≒ ε 2 / σ 2 Can be selected. This is equivalent to C 1 / G 1 ? C 2 / G 2 .

As a result, in order to prevent accumulation of the charge Q efficiently, a material having an increased thickness d 2 or a small dielectric constant (ε 2 ), preferably a dielectric constant of the oxide semiconductor film 403, (For example, a material having a dielectric constant? Of 8 or more and 20 or less) is selected as the material of the metal oxide film 407. [ Alternatively, ε 1 / σ 1 ≒ ε 2 / σ 2, the physical property value of the oxide so as to satisfy the (ε 1 is the dielectric constant, and σ 1 is the electric conductivity being of the oxide semiconductor in the oxide semiconductor) It is preferable that a material close to the physical property value of the semiconductor film is selected as the material of the metal oxide film.

As described above, a semiconductor device including an oxide semiconductor and having stable electrical characteristics can be provided. Therefore, a semiconductor device with high reliability can be provided.

The configurations, methods, and the like described in this embodiment may be suitably combined with any of the configurations, methods, and the like described in the other embodiments.

(Example 2)

In this embodiment, another embodiment of a method of manufacturing a semiconductor device will be described. A portion having the same or similar function as the portion of the embodiment can be formed as in the embodiment, and the same or similar steps as those in the embodiment can be performed as in the embodiment, The iteration technique is omitted. Further, the detailed description of the same part is not repeated.

In this embodiment, in the method of fabricating the transistor 410 of Embodiment 1, an example is described in which thermal processing is performed on the oxide semiconductor film before the metal oxide film 407 is formed in contact with the oxide semiconductor film will be.

This heat treatment can be performed on the oxide semiconductor film before it is processed into the island-shaped oxide semiconductor film, as long as the heat treatment is performed after formation of the oxide semiconductor film and before formation of the metal oxide film 407, The processing may be performed before the formation of the source electrode 405a and the drain electrode 405b or after the formation of the source electrode 405a and the drain electrode 405b.

The heat treatment is performed at a temperature of 250 ° C or more and 650 ° C or less, preferably 450 ° C or more and 600 ° C or less. For example, the substrate is introduced into an electric furnace, which is one of the heat treatment apparatuses, and the heat treatment is performed on the oxide semiconductor film at 450 DEG C for 1 hour in a nitrogen atmosphere. After the heat treatment, the metal oxide film is preferably formed without exposing the substrate to the atmosphere so that moisture or hydrogen can be prevented from being mixed into the oxide semiconductor film.

Further, the heat treatment apparatus is not limited to an electric furnace, and an apparatus for heating the object to be treated by heat conduction or thermal radiation from a heat generating body such as a resistance heating body may be used. For example, an RTA device such as a GRTA device or an LRTA device may be used. Note that, when the GRTA apparatus is used as the heat treatment apparatus, the substrate can be heated with inert gas heated to a high temperature of 650 DEG C to 700 DEG C because the heat treatment time is short.

The heat treatment may be performed in an atmosphere of nitrogen, oxygen, super dry air (air having a moisture content of 20 ppm or less, preferably 1 ppm or less, more preferably 10 ppb or less), or rare gas (argon, helium, etc.). It is noted that the atmosphere of nitrogen, oxygen, super-dry air, or rare gas is preferably free of moisture, hydrogen, and the like. Alternatively, the nitrogen, oxygen, or rare gas introduced into the heat treatment apparatus may have a concentration of 6N (99.9999%) or more, preferably 7N (99.99999%) or more (that is, the impurity concentration is 1 ppm or less, preferably 0.1 ppm or less) It has purity.

With this heat treatment, impurities such as moisture or hydrogen in the oxide semiconductor film can be reduced.

Also, the metal oxide film is formed on the oxide semiconductor film, and oxygen is introduced into the oxide semiconductor film through the metal oxide film, which is an oxide insulating layer, so that a bond between the metal and hydrogen contained in the oxide semiconductor, And the hydrogen or the hydroxyl group reacts with oxygen to produce water. After the introduction of the oxygen, an insulating layer is formed and a heat treatment is additionally performed, whereby impurities such as hydrogen or hydroxyl groups, which remain firm, can be easily removed as water.

The metal oxide film containing oxygen and the oxide semiconductor film are subjected to the heat treatment in a state of being in contact with each other; Therefore, oxygen, which is one of the main components of the oxide semiconductor and reduced in the step of removing impurities, can be supplied to the oxide semiconductor film in the metal oxide film containing oxygen.

Therefore, when the oxide semiconductor film is subjected to the heat treatment before the metal oxide film is formed, the metal oxide film is formed, and the heat treatment after the introduction of oxygen is performed, an I-type (intrinsic) film in which impurities such as moisture or hydrogen are additionally removed, An oxide semiconductor film or an oxide semiconductor film which is substantially I-type can be obtained.

Therefore, the transistor including the highly-purified oxide semiconductor film has a variation in controlled electrical characteristics and is electrically stable.

In the transistor including the metal oxide film having an antistatic function, generation of parasitic channels on the back channel side of the oxide semiconductor film can be prevented. Further, by preventing the generation of the parasitic channel on the back channel side of the oxide semiconductor film in the transistor, fluctuation of the threshold voltage can be suppressed.

As described above, a semiconductor device including an oxide semiconductor having stable electrical characteristics can be provided. Therefore, a semiconductor device with high reliability can be provided.

The configurations, methods, and the like described in this embodiment may be suitably combined with any of the configurations, methods, and the like described in the other embodiments.

(Example 3)

A semiconductor device (also referred to as a display device) having a display function can be manufactured using the above-described transistor described in the first and second embodiments. In addition, some or all of the driving circuits including the transistors may be formed on the substrate on which the pixel portion is formed, whereby the system-on-panel can be obtained.

2A, a seal member 4005 is provided so as to surround the pixel portion 4002 provided on the first substrate 4001, and the pixel portion 4002 is sealed by using the second substrate 4006. [ 2A, a signal line driver circuit 4003 and a scanning line driver circuit 4004 which are formed on a separately prepared substrate using a single crystal semiconductor film or a polycrystalline semiconductor film are formed on the first substrate 4001 in a region surrounded by the seal member 4005 As shown in FIG. Various signals and potentials are supplied from the flexible printed circuit boards (FPCs) 4018a and 4018b to the signal line driver circuit 4003, the scanning line driver circuit 4004 and the pixel portion 4002 formed separately.

2B and 2C, the sealing material 4005 is provided so as to surround the pixel portion 4002 and the scanning line driving circuit 4004 provided on the first substrate 4001. FIG. The second substrate 4006 is provided on the pixel portion 4002 and the scanning line driving circuit 4004. As a result, the pixel portion 4002 and the scanning line driving circuit 4004 are sealed together with the display device by the first substrate 4001, the sealing material 4005, and the second substrate 4006. 2B and 2C, the signal line driver circuit 4003 formed using a single crystal semiconductor film or a polycrystalline semiconductor film on a separately prepared substrate is formed on the first substrate 4001 in a region different from the region surrounded by the seal member 4005 Respectively. 2B and 2C, various signals and potentials are supplied from the FPC 4018 to the signal line driver circuit 4003, the scanning line driver circuit 4004, and the pixel portion 4002 separately formed.

2B and 2C illustrate examples in which the signal line driver circuit 4003 is separately formed and mounted on the first substrate 4001, the present invention is not limited to this configuration. The scanning line driving circuit may be separately formed and then mounted or a part of the signal line driving circuit or a part of the scanning line driving circuit may be separately formed and then mounted.

The connection method of the separately formed drive circuit is not particularly limited, and a chip on glass (COG) method, a wire bonding method, a tape automatic joining (TAB) method, and the like can be used. 2A shows an example in which the signal line driver circuit 4003 and the scanning line driver circuit 4004 are mounted by the COG method. 2B shows an example in which the signal line driver circuit 4003 is mounted by the COG method. 2C shows an example in which the signal line driver circuit 4003 is mounted by the TAB method.

Further, the display device includes a panel in which the display element is sealed, and a module in which an IC or the like including a controller is mounted on the panel.

Note that the display device in this specification means an image display device, a display device, or a light source (including a lighting device). The display device also includes the following modules in its category: modules with connectors attached, such as FPC, TAB tape, or TCP; A module provided with a TAB tape or TCP provided with a printed wiring board at the end; And an integrated circuit (IC) mounted directly on the display element by a COG method.

Further, the pixel portion and the scanning line driving circuit provided on the first substrate include a plurality of transistors to which the transistor described in Embodiment 1 or Embodiment 2 can be applied.

As the display element provided in the display device, a liquid crystal element (also referred to as a liquid crystal display element) or a light emitting element (also referred to as a light emitting display element) can be used. The light-emitting element includes, in its category, an element whose luminance is controlled by a current or a voltage, and specifically includes, in its category, an inorganic electroluminescence (EL) element, an organic EL element or the like. Further, a display medium such as an electronic ink in which the contrast is changed by an electric effect can be used.

Embodiments of the semiconductor device will be described with reference to Figs. 3, 4, and 5. Fig. Figures 3, 4, and 5 correspond to cross-sectional views along line M-N of Figure 2B.

3, 4, and 5, the semiconductor device includes a connection terminal electrode 4015 and a terminal electrode 4016, and the connection terminal electrode 4015 and the terminal electrode 4016 And is electrically connected to a terminal included in the FPC 4018 through an anisotropic conductive film 4019. [

The connection terminal electrode 4015 is formed using the same conductive film as the first electrode layer 4030 and the terminal electrode 4016 is formed using the same conductive film as the source and drain electrodes included in the transistors 4010 and 4011 .

The pixel portion 4002 and the scanning line driving circuit 4004 provided on the first substrate 4001 each include a plurality of transistors. 3, 4, and 5, the transistor 4011 included in the pixel portion 4002 and the transistor 4011 included in the scanning line driving circuit 4004 are shown as an example. In FIG. 3, an insulating film 4024 and a metal oxide film 4020 having an antistatic function are provided on the transistors 4010 and 4011. In Figs. 4 and 5, an insulating layer 4021 is further provided. Note that the insulating film 4023 is an insulating film functioning as a base film.

In this embodiment, the transistor described in Embodiment 1 or Embodiment 2 can be applied to the transistors 4010 and 4011. [

In the transistors 4010 and 4011, the oxide semiconductor film is highly purified and is an oxide semiconductor film in which impurities such as hydrogen, moisture, a hydroxyl group, or a hydride (also referred to as a hydrogen compound) are intentionally removed. This oxide semiconductor film is obtained by introducing oxygen through the metal oxide film 4020, forming the insulating film 4024 stacked on the metal oxide film 4020, and then performing a heat treatment. By the introduction of the oxygen, the bond between the metal and the hydrogen contained in the oxide semiconductor or the bond between the metal and the hydroxyl group is cut off, and the hydrogen or the hydroxyl group reacts with oxygen to produce water; This allows the impurities, hydrogen or hydroxyl groups, to be easily removed in the form of water by the heat treatment to be carried out later.

Oxygen is introduced into the oxide semiconductor film through the metal oxide film 4020 stacked on the oxide semiconductor film to control the depth of introduction (introduction region) of oxygen, and oxygen is efficiently introduced into the oxide semiconductor film .

The oxide semiconductor film and the metal oxide film 4020 containing oxygen are subjected to the heat treatment in a state of being in contact with each other; Therefore, oxygen, which is one of the main components of the oxide semiconductor and reduced in the step of removing impurities, may be supplied to the oxide semiconductor film in the oxygen-containing metal oxide film 4020. Therefore, the oxide semiconductor film is further highly purified so as to be electrically I-type (intrinsic).

As a result, the fluctuation of the electrical characteristics of the transistors 4010 and 4011 each including the highly-purified oxide semiconductor film is suppressed, and the transistors 4010 and 4011 are electrically stable. As described above, semiconductor devices with high reliability can be provided as the semiconductor devices of this embodiment described in Figs. 3, 4, and 5.

In addition, in the transistor including the metal oxide film having an antistatic function, generation of parasitic channels on the back channel side of the oxide semiconductor film can be prevented. Further, by preventing the generation of the parasitic channel on the back channel side of the oxide semiconductor film in the transistor, fluctuation of the threshold voltage can be suppressed.

Further, in this embodiment, a conductive layer is provided on the insulating film 4024 so as to overlap the channel forming region of the oxide semiconductor film in the transistor 4011 with respect to the driving circuit. By providing the conductive layer so as to overlap with the channel forming region of the oxide semiconductor film, the variation amount of the threshold voltage of the transistor 4011 before and after the BT test can be further reduced. The potential of the conductive layer may be the same as or different from the potential of the gate electrode of the transistor 4011. The conductive layer can also function as a second gate electrode. The potential of the conductive layer may be GND, 0 V, or floating.

In addition, the conductive layer has a function of blocking an external electric field, that is, has a function of preventing an external electric field from influencing the inside (a circuit portion including a thin film transistor) (in particular, blocking static electricity). The blocking function of the conductive layer can prevent variations in the electrical characteristics of the transistor due to the influence of an external electric field such as static electricity.

The transistor 4010 included in the pixel portion 4002 is electrically connected to a display element to form a display panel. As long as the display can be performed, various display elements can be used as the display element.

Note that an example of a liquid crystal display using a liquid crystal element as a display element is shown in Fig. 3, a liquid crystal element 4013 serving as a display element includes the first electrode layer 4030, a second electrode layer 4031, and a liquid crystal layer 4008. [ Insulating films 4032 and 4033 serving as alignment films are provided so that the liquid crystal layer 4008 is interposed therebetween. The second electrode layer 4031 is provided on the second substrate 4006 side and the first electrode layer 4030 and the second electrode layer 4031 are provided on the side of the second substrate 4006, do.

A columnar spacer denoted by reference numeral 4035 is obtained by selective etching of the insulating film and is provided for controlling the thickness (cell gap) of the liquid crystal layer 4008. [ Alternatively, a spherical spacer may be used.

When a liquid crystal element is used as the display element, a thermotropic liquid crystal, a low molecular liquid crystal, a polymer liquid crystal, a polymer dispersed liquid crystal, a ferroelectric liquid crystal, an antiferroelectric liquid crystal, or the like can be used. Such a liquid crystal material exhibits a cholesteric phase, a smectic phase, a cubic phase, a chiral nematic phase, an isotropic phase, etc. depending on the conditions.

Alternatively, a liquid crystal showing a blue phase in which an alignment film is unnecessary can be used. The blue phase is one of the liquid crystal phases, which occurs just before the cholesteric phase changes to isotropic phase with increasing temperature of the cholesteric liquid crystal. Since the blue phase appears only in a narrow temperature range, a liquid crystal composition in which 5% by weight or more of a chiral material is mixed is used in the liquid crystal layer to improve the temperature range. The liquid crystal composition comprising a liquid crystal and a chiral material exhibiting a blue phase has a short response time of 1 msec or less and has optically isotropic properties that make alignment treatment unnecessary and has a small viewing angle dependency. In addition, since the alignment film does not need to be provided and thus rubbing treatment is unnecessary, electrostatic discharge damage caused by the rubbing process can be prevented, and defects and damage of the liquid crystal display device can be prevented Can be reduced in the manufacturing process. Therefore, the productivity of the liquid crystal display device can be increased. A transistor including an oxide semiconductor film has a possibility that the electrical characteristics of the transistor may significantly change due to the influence of static electricity and deviate from the design range. Therefore, it is more effective to use a liquid crystal material showing a blue phase for a liquid crystal display device including a transistor including an oxide semiconductor film.

The liquid crystal material preferably has a resistivity of 1 x 10 9 ? · Cm or more, preferably 1 x 10 11 ? · Cm or more, more preferably 1 x 10 12 ? · Cm or more. In this specification, the value of the specific resistivity is measured at 20 占 폚.

The size of the storage capacitor formed in the liquid crystal display device is set in consideration of the leakage current of the transistor provided in the pixel portion so that the charge can be maintained for a predetermined period. It is sufficient to provide a storage capacitor device having a capacitance that is 1/3 or less, preferably 1/5 or less of the liquid crystal capacitance of each pixel, by using the transistor including the high-purity oxide semiconductor film.

In the transistor used in this embodiment, including the high-purity oxide semiconductor film, the off-state current (off-state current) can be reduced. Therefore, an electric signal such as an image signal can be maintained for a longer period, and a recording interval can be set longer in an on state. Therefore, the frequency of the refresh operation can be reduced, which causes an effect of suppressing power consumption.

In addition, the transistor including the high-purity oxide semiconductor film used in this embodiment can have a relatively high field-effect mobility and can therefore operate at high speed. Therefore, by using the transistor in the pixel portion of the liquid crystal display, a high-quality image can be provided. Further, a driver circuit portion including the transistor and a pixel portion may be formed on one substrate; Therefore, the number of components of the liquid crystal display device can be reduced.

(TN) mode, a planar alignment switching (IPS) mode, a fringe field switching (FFS) mode, an axially symmetric aligned micro-cell (ASM) mode, an optical compensated birefringence (OCB) A ferroelectric liquid crystal (FLC) mode, an antiferroelectric liquid crystal (AFLC) mode, or the like can be used.

A normally black liquid crystal display device such as a transmissive liquid crystal display device using a vertical alignment (VA) mode can be used. The vertical alignment mode is a method of controlling the arrangement of liquid crystal molecules in a liquid crystal display panel, wherein the liquid crystal molecules are aligned in a direction perpendicular to the panel surface when no voltage is applied. Some examples are given as vertical alignment mode. For example, a multi-domain vertical alignment (MVA) mode, a patterned vertical alignment (PVA) mode, an ASV mode, and the like can be given. It is also possible to use a method called a so-called domain multiplication or multi-domain design in which the pixels are divided into some regions (subpixels) and the molecules are aligned in different directions in the respective regions .

Also, in the display device, an optical member (optical substrate) such as a black matrix (light shielding layer), a polarizing member, a retardation member, or an antireflection member is suitably provided. For example, circularly polarized light can be obtained using a polarizing substrate and a phase difference substrate. Further, a backlight, a sidelight, or the like can be used as the light source.

It is also possible to use a time division display method (also referred to as a field-sequential driving method) in which a plurality of light emitting diodes (LEDs) are used as a backlight. By using the field-sequential driving method, color display can be performed without using a color filter.

As a display method in the pixel portion, a progressive method, an interlace method, or the like can be used. Further, the color elements to be controlled in the pixel in color display are not limited to three colors: R, G, and B (R, G, and B correspond to red, green, and blue, respectively). For example, R, G, B, and W (W corresponds to white); Or at least one of R, G, B, and yellow, cyan, magenta, and the like may be used. In addition, the sizes of the display areas may be different between respective dots of color elements. This embodiment is not limited to the application to the display device for color display, but can also be applied to the display device for monochrome display.

Alternatively, as the display element included in the display device, a light emitting element using electroluminescence may be used. Light emitting elements using electroluminescence are classified according to whether the light emitting material is an organic compound or an inorganic compound. Generally, the former is referred to as an organic EL element, and the latter is referred to as an inorganic EL element.

In the organic EL device, by the application of a voltage to the light emitting element, electrons and holes are injected separately from the pair of electrodes into the layer containing the light emitting organic compound, and current flows. Carriers (electrons and holes) are recombined, and thus the luminescent organic compound is excited. The luminescent organic compound returns from the excited state to the ground state, thereby emitting light. Due to such a mechanism, this light emitting element is referred to as a current-excited light emitting element.

The inorganic EL elements are classified into a dispersion inorganic EL element and a thin film inorganic EL element according to their element structures. The dispersion-type inorganic EL device has a light-emitting layer in which particles of a light-emitting material are dispersed in a binder, and the light-emitting mechanism is a donor-acceptor recombination type luminescence using a donor level and an acceptor level. The thin film inorganic EL device has a structure in which a light emitting layer is sandwiched between dielectric layers, and dielectric layers are also interposed between electrode layers, and the light emitting mechanism is a localized type light emission using internal- to be. Note that an example of an organic EL element as a light emitting element is described herein.

In order to extract the light emitted from the light emitting element, at least one of the pair of electrodes is acceptable as long as it is transparent. A transistor and a light emitting element are formed on a substrate. Wherein the light emitting element is a top emission structure in which light emission is extracted through a surface opposite to the substrate; A bottom emission structure in which light emission is extracted through a surface on the substrate side; Or a two-sided emission structure in which light emission is extracted through a surface opposite to the substrate and a surface on the substrate side. A light emitting element having any of these emission structures can be used.

Fig. 4 shows an example of a light emitting device in which a light emitting element is used as a display element. The light emitting element 4513 serving as a display element is electrically connected to the transistor 4010 provided in the pixel portion 4002. The structure of the light emitting device 4513 is not limited to the laminated structure including the first electrode layer 4030, the electroluminescent layer 4511, and the second electrode layer 4031 shown in FIG. The structure of the light emitting element 4513 may be suitably changed depending on the direction and the like from which the light is extracted from the light emitting element 4513.

A partition wall 4510 is formed using an organic insulating material or an inorganic insulating material. It is particularly preferable that the barrier ribs 4510 are formed using a photosensitive resin material so as to have openings on the first electrode layer 4030, and the side walls of the openings are formed as inclined surfaces having continuous curvature.

The electroluminescent layer 4511 may be formed as a single layer or a plurality of stacked layers.

A protective film may be formed on the second electrode layer 4031 and the barrier 4510 to prevent oxygen, hydrogen, moisture, carbon dioxide, etc. from being mixed into the light emitting device 4513. As the protective film, a silicon nitride film, a silicon nitride oxide film, a DLC film, or the like may be formed. In addition, in a space formed by the first substrate 4001, the second substrate 4006, and the seal member 4005, a filler 4514 is provided for sealing. It is preferable that the light emitting device is packaged (sealed) with a coating material or a protective film (such as a laminated film or an ultraviolet ray hardening resin film) having high airtightness and little deaerating property and is not exposed to outside air in this manner.

As the filler 4514, in addition to an inert gas such as nitrogen or argon, an ultraviolet curing resin or a thermosetting resin may be used, and a resin such as polyvinyl chloride (PVC), acryl, polyimide, epoxy resin, silicone resin, (PVB), or ethylene vinyl acetate (EVA) may be used. For example, nitrogen is used for the filler.

Further, an optical film such as a polarizing plate, a circularly polarizing plate (including an elliptically polarizing plate), a retardation plate (? / 4 plate or? / 2 plate), or a color filter is suitably provided on the light- . The antireflection film may be provided on the polarizing plate or the circularly polarizing plate. For example, an anti-glare treatment capable of diffusing reflected light by irregularities on the surface to reduce glare can be performed.

Further, an electronic paper on which electronic ink is driven can be provided as the display device. The electronic paper is also called an electrophoretic display (electrophoretic display), has the same level of readability as plain paper, has a lower power consumption than other display devices, and can be set to have a thin and lightweight form have.

The electrophoretic display may have various modes. The electrophoretic display comprises a plurality of microcapsules dispersed in a solvent or solute, wherein each microcapsule comprises first particles having a positive charge and second particles having a negative charge. By applying an electric field to the microcapsules, the particles of the microcapsules move in opposite directions and only the color of the particles gathered on one side is displayed. It is noted that each of the first particles and the second particles includes a pigment and does not move without an electric field. In addition, the first particles and the second particles have different colors (which may include colorless).

Therefore, an electrophoretic display device is a display utilizing a so-called dielectrophoretic effect in which a material having a high dielectric constant moves to a high electric field area.

The solution in which the microcapsules are dispersed in a solvent is called an electronic ink. The electronic ink may be printed on a surface of glass, plastic, cloth, paper, or the like. In addition, by using particles having a pigment or a color filter, color display can also be achieved.

Wherein the first particles and the second particles of the microcapsules each comprise a conductive material, an insulating material, a semiconductor material, a magnetic material, a liquid crystal material, a ferroelectric material, an electroluminescent material, an electrochromic material, , Or may be made of a composite material thereof.

As the electronic paper, a display device using a twisting ball display method may be used. The twisted ball display method is characterized in that spherical particles colored respectively in black and white are disposed between a first electrode layer and a second electrode layer, which are electrode layers used in a display element, and the first electrode layer and the second electrode layer, And a potential difference is generated between the second electrode layers to perform display.

Fig. 5 shows an active matrix type electronic paper as one embodiment of the semiconductor device. The electronic paper of Fig. 5 is an example of a display device using a twisting ball display method.

A black region 4615a, a white region 4615b, and a black region 4615b are formed between the first electrode layer 4030 connected to the transistor 4010 and the second electrode layer 4031 provided on the second substrate 4006, Spherical particles 4613 are provided that include a cavity 4612 filled with liquid around the black region 4615a and the white region 4615b. The space around the spherical particles 4613 is filled with a filler 4614 such as resin. The second electrode layer 4031 corresponds to a common electrode (opposing electrode). The second electrode layer 4031 is electrically connected to the common potential line.

3, 4 and 5, the first substrate 4001 and the second substrate 4006 may include flexible substrates, for example, a plastic substrate having light transmittance, etc., Can be used. As the plastic, a glass fiber reinforced plastic (FRP) plate, a polyvinyl fluoride (PVF) film, a polyester film, or an acrylic resin film may be used. Further, a sheet having a structure in which an aluminum foil is interposed between PVF films or polyester films can be used.

The insulating film 4024 functions as a protective film of the transistors.

In addition, the metal oxide film 4020 functions to prevent generation of parasitic channels on the back channel side of the oxide semiconductor film, as well as to reduce oxygen in the step of removing impurities such as hydrogen, moisture, hydroxyl, or hydride To the oxide semiconductor film.

The metal oxide film 4020 may be formed using a gallium oxide film formed by a sputtering method. Alternatively, the metal oxide film 4020 may be a film obtained by adding indium or zinc to gallium oxide; For example, a gallium oxide film containing 0.01 atom% to 5 atom% of indium or zinc may be used. By the addition of indium or zinc, the electrical conductivity of the metal oxide film 4020 can be improved, whereby the accumulation of electric charges can be further reduced.

The insulating film 4024 may be formed in a single-layer structure or a stacked-layer structure using at least one of a silicon nitride film, a silicon nitride oxide film, an aluminum oxide film, an aluminum nitride film, an aluminum oxynitride film, and an aluminum nitride oxide film by a sputtering method .

The insulating layer 4021 may be formed using an inorganic insulating material or an organic insulating material. It is noted that the insulating layer 4021 formed using a heat-resistant organic insulating material such as acrylic resin, polyimide, benzocyclobutene resin, polyamide, or epoxy resin is preferably used as a planarization insulating film. In addition to these organic insulating materials, it is possible to use a low dielectric constant material (low-k material), a siloxane-based resin, a phosphosilicate glass (PSG), a borophosphosilicate glass (BPSG) or the like. The insulating layer may be formed by laminating a plurality of insulating films made of these materials.

The insulating layer 4021 may be formed by a sputtering method, a spin coating method, a dipping method, a spray coating method, a droplet discharging method (for example, , Inkjet method, screen printing, or offset printing), roll coating, curtain coating, knife coating, and the like.

The display device displays an image by transmitting light from a light source or a display element. Therefore, the thin films and the substrate, such as the insulating film and the conductive film provided in the pixel portion through which light is transmitted, are transparent to light in the visible light wavelength region.

The first electrode layer 4030 and the second electrode layer 4031 (each of which is also referred to as a pixel electrode layer, a common electrode layer, an opposing electrode layer, and the like) for applying a voltage to the display element have light transmissivity or light reflectivity Which depends on the direction in which light is extracted, the position where the electrode layer is provided, the pattern structure of the electrode layer, and the like.

In the first electrode layer 4030 and the second electrode layer 4031, indium oxide containing tungsten oxide, indium oxide containing tungsten oxide, indium oxide containing titanium oxide, indium oxide containing titanium oxide A transparent conductive material such as tin, indium tin oxide, ITO, indium zinc oxide, or indium tin oxide to which silicon oxide is added may be used.

The first electrode layer 4030 and the second electrode layer 4031 may be formed of tungsten (W), molybdenum (Mo), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb) Metals such as Cr, Cr, Co, Ni, Ti, Pt, Al, Cu and Ag; Alloys of these metals; And nitrides of these metals.

A conductive composition containing a conductive polymer (also referred to as a conductive polymer) may be used for the first electrode layer 4030 and the second electrode layer 4031. As the conductive polymer, a so-called? -Electroconjugated conductive polymer may be used. For example, polyaniline or a derivative thereof, polypyrrole or a derivative thereof, polythiophene or a derivative thereof, and two or more copolymers or derivatives thereof such as aniline, pyrrole and thiophene may be given.

It is preferable that a protection circuit for protecting the driving circuit is provided because the transistor is easily broken due to static electricity or the like. The protection circuit is preferably formed using a non-linear element.

By using any of the transistors described in Embodiment 1 or Embodiment 2 as described above, the semiconductor device can have various functions.

(Example 4)

A semiconductor device having an image sensor function for reading data of an object can be formed using the transistor described in the embodiment 1 or the embodiment 2. [

An example of a semiconductor device having an image sensor function is shown in Fig. 6A. 6A is an equivalent circuit of a photosensor, and FIG. 6B is a cross-sectional view showing a part of the photosensor.

One electrode of the photodiode 602 is electrically connected to the photodiode reset signal line 658 and the other electrode of the photodiode 602 is electrically connected to the gate of the transistor 640. One of the source and the drain of the transistor 640 is electrically connected to the photosensor reference signal line 672 and the other of the source and the drain of the transistor 640 is connected to one of the source and the drain of the transistor 656 Respectively. The gate of the transistor 656 is electrically connected to the gate signal line 659 and the other of the source and the drain of the transistor 656 is electrically connected to the photosensor output signal line 671.

In the circuit diagrams in this specification, it is noted that the transistor including the oxide semiconductor film is indicated by the symbol " OS " so that it can be identified as a transistor including an oxide semiconductor film. The transistor 640 and the transistor 656 in FIG. 6A are transistors each including an oxide semiconductor film.

6B is a cross-sectional view of the transistor 640 and the photodiode 602 of the photosensor. The photodiode 602 and the transistor 640 functioning as a sensor are provided on a substrate 601 (TFT substrate) having an insulating surface. A substrate 613 is provided over the transistor 640 and the photodiode 602 using an adhesive layer 608.

A metal oxide film 631 having an antistatic function, an insulating film 632, an interlayer insulating layer 633, and an interlayer insulating layer 634 are provided on the transistor 640. The photodiode 602 is provided on the interlayer insulating layer 633. The first semiconductor layer 606a, the second semiconductor layer 606b and the third semiconductor layer 606c are formed on the interlayer insulating layer 633 in the photodiode 602 and the interlayer insulating On the interlayer insulating layer 633 between the electrode layers 642 formed on the layer 634 in this order.

In the transistor 640, the oxide semiconductor film is highly purified and is an oxide semiconductor film in which impurities such as hydrogen, moisture, a hydroxyl group, or a hydride (also referred to as a hydrogen compound) are intentionally removed. This oxide semiconductor film is obtained by introducing oxygen through the metal oxide film 631 deposited on the oxide semiconductor film, forming the insulating film 632 on the metal oxide film 631, and then performing a heat treatment. By the introduction of the oxygen, the bond between the metal and the hydrogen contained in the oxide semiconductor or the bond between the metal and the hydroxyl group is cut off, and the hydrogen or the hydroxyl group reacts with oxygen to produce water; This allows the impurities, hydrogen or hydroxyl groups, to be easily removed in the form of water by the heat treatment to be carried out later.

Oxygen is introduced into the oxide semiconductor film through the metal oxide film 631 stacked on the oxide semiconductor film to control the depth of introduction (introduction region) of oxygen, and oxygen is efficiently introduced into the oxide semiconductor film .

The oxide semiconductor film and the metal oxide film 631 containing oxygen are subjected to the heat treatment in a state in contact with each other; Accordingly, oxygen, which is one of the main components of the oxide semiconductor and reduced in the step of removing impurities, can be supplied to the oxide semiconductor film from the metal oxide film 631 containing oxygen. Therefore, the oxide semiconductor film is further highly purified so as to be electrically I-type (intrinsic).

As a result, the variation of the electrical characteristics of the transistor 640 including the high-purity oxide semiconductor film is suppressed, and the transistor 640 is electrically stable. As described above, a semiconductor device with high reliability can be provided as the semiconductor device of this embodiment.

The electrode layer 641 is electrically connected to the conductive layer 643 formed in the interlayer insulating layer 634 and the electrode layer 642 is electrically connected to the gate electrode 645 through the electrode layer 644. [ The gate electrode 645 is electrically connected to the gate electrode of the transistor 640 and the photodiode 602 is electrically connected to the transistor 640.

Here, a p-type conductive semiconductor layer is used as the first semiconductor layer 606a, a high-resistance semiconductor layer (I-type semiconductor layer) is used as the second semiconductor layer 606b, and n A pin type photodiode in which a semiconductor layer having a conductivity type is stacked is shown as an example.

The first semiconductor layer 606a may be formed using an amorphous silicon film containing a p-type semiconductor layer and an impurity element that imparts p-type conductivity. The first semiconductor layer 606a is formed by a plasma CVD method using a semiconductor source gas containing an impurity element belonging to Group 13 (such as boron (B)). As the semiconductor source gas, silane (SiH 4 ) may be used. Alternatively, Si 2 H 6 , SiH 2 Cl 2 , SiHCl 3 , SiCl 4 , SiF 4, and the like can be used. Alternatively, an amorphous silicon film containing no impurity element may be formed, and then an impurity element may be introduced into the amorphous silicon film by using a diffusion method or an ion implantation method. Heating can be performed after introducing the impurity element by an ion implantation method or the like to diffuse the impurity element. In this case, a LPCVD method, a vapor deposition method, a sputtering method, or the like can be used as a method for forming the amorphous silicon film. The first semiconductor layer 606a is preferably formed to have a thickness of 10 nm or more and 50 nm or less.

The second semiconductor layer 606b is an I-type semiconductor layer (intrinsic semiconductor layer) and is formed using an amorphous silicon film. For the formation of the second semiconductor layer 606b, an amorphous silicon film is formed by plasma CVD using a semiconductor source gas. As the semiconductor source gas, silane (SiH 4 ) may be used. Alternatively, Si 2 H 6 , SiH 2 Cl 2 , SiHCl 3 , SiCl 4 , SiF 4, and the like can be used. The second semiconductor layer 606b may be formed by an LPCVD method, a vapor deposition method, a sputtering method, or the like. The second semiconductor layer 606b is preferably formed to have a thickness of 200 nm or more and 1000 nm or less.

The third semiconductor layer 606c is an n-type semiconductor layer and is formed using an amorphous silicon film containing an impurity element that imparts n-type conductivity. The third semiconductor layer 606c is formed by a plasma CVD method using a semiconductor source gas containing an impurity element belonging to Group 15 (such as phosphorus (P)). As the semiconductor source gas, silane (SiH 4 ) may be used. Alternatively, Si 2 H 6 , SiH 2 Cl 2 , SiHCl 3 , SiCl 4 , SiF 4, and the like can be used. Alternatively, an amorphous silicon film containing no impurity element may be formed, and then an impurity element may be introduced into the amorphous silicon film by using a diffusion method or an ion implantation method. Heating can be performed after introducing the impurity element by an ion implantation method or the like to diffuse the impurity element. In this case, a LPCVD method, a vapor deposition method, a sputtering method, or the like can be used as a method for forming the amorphous silicon film. The third semiconductor layer 606c is preferably formed to have a thickness of 20 nm or more and 200 nm or less.

The first semiconductor layer 606a, the second semiconductor layer 606b, and the third semiconductor layer 606c do not necessarily have to be formed using an amorphous semiconductor, and they may be polycrystalline semiconductor or microcrystalline semiconductor A semi-amorphous semiconductor (SAS)) may be used.

Considering Gibbs free energy, the microcrystalline semiconductor is a metastable state that is intermediate between the amorphous state and the single crystal state. That is, the microcrystalline semiconductor is a semiconductor having a stable third state in view of free energy and has a short range order and lattice distortion. Columnar or spicular crystals grow in a normal direction relative to the substrate surface. The Raman spectrum of the microcrystalline silicon, which is a typical example of the microcrystalline semiconductor, is located at a lower frequency than 520 cm -1 , which expresses the peak of the Raman spectrum of single crystal silicon. That is, the peak of the Raman spectrum of the microcrystalline silicon exists between 480cm -1 expressing 520cm -1 and the amorphous silicon to express the single-crystal silicon. The semiconductor contains at least 1 atomic percent hydrogen or halogen to terminate the dangling bonds. In addition, the microcrystalline silicon contains a rare-gas element such as helium, argon, krypton, or neon to further promote lattice distortion, so that the stability can be increased and a good microcrystalline semiconductor film can be obtained.

The microcrystalline semiconductor film may be formed by a high frequency plasma CVD method having a frequency of several tens of megahertz to several hundred megahertz or by using a microwave plasma CVD apparatus having a frequency of 1 GHz or more. Typically, the microcrystalline semiconductor film may be formed using a gas containing silicon diluted with hydrogen, such as SiH 4 , Si 2 H 6 , SiH 2 Cl 2 , SiHCl 3 , SiCl 4 , or SiF 4 . Further, the microcrystalline semiconductor film may be formed using a gas containing silicon diluted with one or more kinds of rare gas elements selected from helium, argon, krypton, and neon in addition to hydrogen. In that case, the flow rate ratio of hydrogen to the gas containing silicon is from 5: 1 to 200: 1, preferably from 50: 1 to 150: 1, more preferably 100: 1. In addition, a carbide gas such as CH 4 or C 2 H 6 , a gas containing germanium such as GeH 4 or GeF 4 , F 2 or the like may be mixed with the above-mentioned gas containing silicon.

Further, since the mobility of holes generated by the photoelectric effect is lower than the mobility of electrons, the pinned photodiode has better characteristics when the surface on the p-type semiconductor layer side is used as the light receiving surface. Here, an example in which the light 622 received by the photodiode 602 from the surface of the substrate 601 on which the pinned photodiode is formed is converted into electrical signals is described. Further, light from the semiconductor layer having a conductivity type opposite to the conductivity type of the semiconductor layer on the light receiving surface is disturbance light; Therefore, it is preferable that the electrode layer on the semiconductor layer having the conductivity type opposite to the conductivity type of the semiconductor layer on the light-receiving surface is formed using the light shielding conductive film. It is noted that the surface on the side of the n-type semiconductor layer may alternatively be used as the light receiving surface.

The metal oxide film 631 may be formed using a gallium oxide film formed by a sputtering method. Further, the metal oxide film 631 may be a film obtained by adding indium or zinc to gallium oxide; For example, a gallium oxide film containing indium or zinc at 0.01 atom% to 5 atom% can be used. By the addition of indium or zinc, the electrical conductivity of the metal oxide film 631 can be improved, whereby the accumulation of charges can be further reduced.

The insulating film 632 may include oxide insulating layers such as a silicon oxide layer, a silicon oxynitride layer, an aluminum oxide layer, and an aluminum oxynitride layer, and a silicon nitride layer, a silicon nitride oxide layer, an aluminum nitride layer, Or a nitride insulating layer such as a nitride layer.

In order to reduce the surface roughness, it is preferable that an insulating layer functioning as a planarization insulating film is used as the interlayer insulating layers 633 and 634. The interlayer insulating layers 633 and 634 may be formed using an organic insulating material such as polyimide, acrylic resin, benzocyclobutene resin, polyamide, or epoxy resin, for example. In addition to these organic insulating materials, a single layer or laminated structure using a low dielectric constant material (low-k material), a siloxane based resin, a phosphosilicate glass (PSG), a borophosphosilicate glass (BPSG) or the like can be used.

The insulating layer 632, the interlayer insulating layer 633 and the interlayer insulating layer 634 may be formed by a sputtering method, a spin coating method, a dipping method, a spray coating method, a droplet discharging method Screen printing, or offset printing), roll coating, curtain coating, knife coating, and the like.

When the light 622 entering the photodiode 602 is detected, data on the object to be detected can be read. Note that a light source such as a backlight may be used to read data about the object to be detected.

The transistor described in Example 1 or Example 2 can be used as the transistor 640. The transistor comprising the oxide semiconductor film that is highly purified by intentional removal of impurities such as hydrogen, moisture, hydroxyl groups, or hydrides (also referred to as hydrogen compounds) is electrically stable with suppressed fluctuations of the electrical properties . In addition, in the transistor including the metal oxide film having an antistatic function, generation of parasitic channels on the back channel side of the oxide semiconductor film can be prevented. The generation of the parasitic channel on the back channel side of the oxide semiconductor film in the transistor is prevented, so that the fluctuation of the threshold voltage can be suppressed. Therefore, a semiconductor device with high reliability can be provided.

This embodiment can be implemented in appropriate combination with the configurations described in the other embodiments.

(Example 5)

The liquid crystal display device disclosed in this specification can be applied to various electronic devices (including game devices). Examples of such electronic devices include television sets (also referred to as televisions or television receivers), monitors such as computers, cameras such as digital cameras or digital video cameras, digital photo frames, mobile phones A portable game machine, a personal portable terminal, a voice reproducing device, and a large game machine such as a pachinko pinball machine. Examples of electronic devices each including the liquid crystal display described in the above embodiment will be described.

7A is an electronic book (also referred to as an e-book) that may include housings 9630, a display portion 9631, operating keys 9632, a solar cell 9633, and a charge / discharge control circuit 9634, Lt; / RTI &gt; The electronic book shown in Fig. 7A has a function of displaying various types of information (for example, a still image, a moving image, and a text image) on the display unit, a function of displaying a calendar, a date, A function of manipulating or editing the information displayed on the display unit, a function of controlling processing by various types of software (programs), and the like. 7A, the charge / discharge control circuit 9634 includes a battery 9635 and a DCDC converter (hereinafter referred to as a converter) 9636 as an example. The semiconductor device described in any one of Embodiments 1 to 4 can be applied to the display portion 9631, whereby a highly reliable electronic book can be provided.

When the transflective or reflective liquid crystal display device is used as the display portion 9631 in the configuration shown in Fig. 7A, the electronic book can be used in a relatively bright environment. In this case, power generation by the solar cell 9633 and charging by the battery 9635 can be effectively performed, which is preferable. Since the solar cell 9633 can be suitably provided in the space (front surface or rear surface) of the housing 9630, the battery 9635 can be efficiently charged, which is preferable. When the lithium ion battery is used as the battery 9635, there is an advantage such as downsizing.

The configuration and operation of the charge / discharge control circuit 9634 shown in Fig. 7A will be described with reference to the block diagram of Fig. 7B. The solar cell 9633, the battery 9635, the converter 9636, the converter 9637, the switches SW1 to SW3, and the display unit 9631 are shown in FIG. 7B and the battery 9635, The converter 9636, the converter 9637, and the switches SW1 to SW3 correspond to the charge / discharge control circuit 9634.

First, an example of operation in the case where power is generated by the solar cell 9633 using external light is described. The voltage of the power generated by the solar cell 9633 is stepped up or lowered by the converter 9636 to become the voltage for charging the battery 9635. [ Thereafter, when the power from the solar cell 9633 is used for the operation of the display portion 9631, the switch SW1 is turned on and the voltage of the power is stepped up or stepped down by the converter 9637, The voltage required for the transistor 9631 becomes a required voltage. When the display on the display unit 9631 is not performed, the switch SW1 is turned off and the switch SW2 is turned on so that the battery 9635 can be charged.

Next, the operation in the case where power is not generated by the solar cell 9633 using external light is described. The voltage of the electric power stored in the battery 9635 is stepped up or stepped down by the converter 9637 by turning on the switch SW3. Thereafter, the electric power from the battery 9635 is used for the operation of the display portion 9631.

It should be noted that although the solar cell 9633 is described as an example of a means for charging, the charging of the battery 9635 may be performed by other means. Further, a combination of the solar cell 9633 and other means for charging can be used.

8A shows a laptop personal computer, including a main body 3001, a housing 3002, a display portion 3003, a keyboard 3004, and the like. The semiconductor device described in any of Embodiments 1 to 4 is applied to the display portion 3003 so that a highly reliable laptop personal computer can be provided.

8B shows a personal digital assistant (PDA) including a display portion 3023, an external interface 3025, an operation button 3024, and the like on the main body 3021. Fig. A stylus 3022 is also included as an accessory for operation. The semiconductor device described in any of Embodiments 1 to 4 is applied to the display portion 3023, whereby a highly reliable personal digital assistant (PDA) can be provided.

8C shows an example of an electronic book. For example, the electronic book 2700 includes two housings, a housing 2701 and a housing 2703. The housing 2701 and the housing 2703 are coupled with a hinge 2711 so that the electronic book 2700 can be opened and closed by the hinge 2711 as an axis. With this configuration, the electronic book 2700 can operate as a paper book.

A display portion 2705 and a display portion 2707 are embedded in the housing 2701 and the housing 2703, respectively. The display unit 2705 and the display unit 2707 can display one image or different images. In the configuration in which the images are displayed on different display portions, for example, the right display portion (the display portion 2705 in Fig. 8C) displays text and the left display portion (the display portion 2707 in Fig. can do. The semiconductor device described in any one of Embodiments 1 to 4 is applied to the display portion 2705 and the display portion 2707 so that highly reliable electronic books can be provided.

8C shows an example in which the housing 2701 is provided with an operation unit or the like. For example, the housing 2701 is provided with a power switch 2721, operation keys 2723, a speaker 2725, and the like. With the operation keys 2723, pages are passed. A keyboard, a pointing device, etc., may be provided on the surface of the housing, provided with the display portion. Also, an external connection terminal (earphone terminal, USB terminal, etc.), a recording medium insertion portion, or the like may be provided on the rear surface or the side surface of the housing. Also, the electronic book 2700 may have the function of an electronic dictionary.

The electronic book 2700 may have a configuration capable of transmitting and receiving data wirelessly. Through wireless communication, desired book data or the like can be purchased or downloaded from the electronic book server.

Fig. 8d shows a mobile phone, which includes two housings, a housing 2800 and a housing 2801. Fig. The housing 2801 is provided with a display panel 2802, a speaker 2803, a microphone 2804, a pointing device 2806, a camera lens 2807, an external connection terminal 2808, and the like. In addition, the housing 2800 includes a solar cell 2810, an external memory slot 2811, and the like for charging the portable telephone. An antenna is built in the housing 2801. The semiconductor device described in any of Embodiments 1 to 4 is applied to the display panel 2802, whereby a highly reliable cellular phone can be provided.

The display panel 2802 is provided with a touch panel. A plurality of operation keys 2805 displayed as images are shown by dashed lines in Fig. 8D. It is noted that a boost circuit is also included for boosting the voltage output from the solar cell 2810 sufficiently high for each circuit.

In the display panel 2802, the display direction may suitably change according to the usage pattern. In addition, the cellular phone is provided with the camera lens 2807 on the same surface as the display panel 2802, and thus can be used as a video phone. The speaker 2803 and the microphone 2804 may be used for recording and playing back video calls, sound, as well as voice calls. Further, in a deployed state as shown in Fig. 8D, the housing 2800 and the housing 2801 can be slid so that one overlaps the other; Therefore, the cellular phone can be downsized, which makes it suitable for carrying.

The external connection terminal 2808 can be connected to various types of cables, such as an AC adapter and a USB cable, and is capable of charging and communicating data with a personal computer or the like. In addition, a large amount of data can be stored and moved by inserting the recording medium into the external memory slot 2811. [

In addition to the above functions, an infrared communication function, a television reception function, and the like may be provided.

8E shows a digital video camera including a main body 3051, a display portion A 3057, an eyepiece portion 3053, operation switches 3054, a display portion B 3055, a battery 3056, and the like. The semiconductor device described in any of Embodiments 1 to 4 is applied to the display portion (A) 3057 and the display portion (B) 3055, whereby a highly reliable digital video camera can be provided .

Fig. 8F shows an example of a television set. In the television set 9600, the display portion 9603 is built in the housing 9601. [ The display portion 9603 can display images. Here, the housing 9601 is supported by a stand 9605. The semiconductor device described in any of Embodiments 1 to 4 is applied to the display portion 9603, whereby a highly reliable television set can be provided.

The television set 9600 can be operated by an operation switch of the housing 9601 or a separate remote controller. In addition, the remote controller may be provided with a display unit for displaying data output from the remote controller.

It should be noted that the television set 9600 may include a receiver, modem, and the like. A general television broadcast can be received by the receiver. Also, when the television set is connected to the communication network either wired or wirelessly via the modem, one-way (from transmitter to receiver) or bidirectional (between transmitter and receiver or between receivers) information communication can be performed.

This embodiment can be suitably implemented in combination with the configurations described in other embodiments.

This application is based on Japanese Patent Application Serial No. 2010-072532 filed with the Japanese Patent Office on Mar. 26, 2010, the entire contents of which are incorporated herein by reference.

The present invention relates to a semiconductor device and a method of manufacturing the same, and more particularly, to a semiconductor device and a method of manufacturing the same. A semiconductor layer, a semiconductor layer, a semiconductor layer, a semiconductor layer, an adhesive layer, a substrate, a substrate, a metal oxide film, an insulating film, an interlayer insulating layer, The present invention relates to a semiconductor device and a method of manufacturing the same, and more particularly, to a semiconductor device having an interlayer insulating layer, 2700: photoelectric sensor reference signal line 2700: e-book, 2701: housing, 2703: housing, 2705: display portion, 2707: display portion, 2711: wind pad, 2721: power switch, 2723: A housing, 2801 a housing, 2802 a display panel, 2803 a speaker, 2804 a microphone, 2805 operational keys, 2806 a pointing device, The present invention is not limited to the above embodiments and may be modified in various ways without departing from the scope of the present invention. The present invention is not limited to the above embodiments, but may be modified and changed without departing from the scope and spirit of the invention. The present invention is not limited to the above-described embodiments, and may be modified or changed without departing from the scope and spirit of the invention. A liquid crystal layer 4010 a transistor 4011 a transistor 4013 a liquid crystal element 4015 a connection terminal electrode 4016 a terminal electrode 4018 FPC 4019 Anisotropic conductive film 4020 metal oxide film 4021 insulating layer 4023 insulating film 4024 insulating film 4030 electrode layer 4031 electrode layer 4032 insulating film 4033 insulating film 4510 barrier layer 4511 electroluminescent layer Emitting element, 4514: filler, 4612: hole, 4613: spherical particle, 4614: filler, 4615a: black region, 4615b: white region, 9600: 9636: converter, 9637: solar cell, 9634: charge / discharge control circuit, 9635: battery, 9636: converter, 9637: display unit, 9631: display unit, 9631: display unit, 9631: display unit, 9601: Converter

Claims (13)

  1. A semiconductor device comprising:
    A gate electrode on the substrate;
    A gate insulating film on the gate electrode;
    An oxide semiconductor film interposed between the gate insulating film and the gate electrode;
    A source electrode and a drain electrode on the oxide semiconductor film; And
    And a metal oxide film containing gallium oxide on the source electrode and the drain electrode, wherein the metal oxide film includes the metal oxide film in contact with the oxide semiconductor film,
    Wherein the oxide semiconductor film includes indium, gallium, and zinc,
    The oxide semiconductor film has a thickness of 3 nm or more and 30 nm or less,
    Wherein the metal oxide film has a thickness larger than the thickness of the oxide semiconductor film and 10 nm or more,
    The difference between the band gap of the oxide semiconductor film and the band gap of the metal oxide film is less than 3 eV,
    Oxygen is introduced into at least one of the oxide semiconductor film, the metal oxide film, and the interface between the oxide semiconductor film and the metal oxide film.
  2. A semiconductor device comprising:
    A gate electrode on the substrate;
    A gate insulating film on the gate electrode;
    An oxide semiconductor film interposed between the gate insulating film and the gate electrode;
    A source electrode and a drain electrode on the oxide semiconductor film; And
    And a metal oxide film containing gallium oxide on the source electrode and the drain electrode, wherein the metal oxide film includes the metal oxide film in contact with the oxide semiconductor film,
    Wherein the oxide semiconductor film includes indium, gallium, and zinc,
    The oxide semiconductor film has a thickness of 3 nm or more and 30 nm or less,
    Wherein the metal oxide film has a thickness larger than the thickness of the oxide semiconductor film and 10 nm or more,
    The difference between the band gap of the oxide semiconductor film and the band gap of the metal oxide film is less than 3 eV,
    Wherein at least one of the oxide semiconductor film, the metal oxide film, and the interface between the oxide semiconductor film and the metal oxide film has a concentration of oxygen of the second region of the oxide semiconductor film not containing the first region Lt; / RTI &gt;
  3. A semiconductor device comprising:
    An oxide semiconductor film on the substrate;
    A source electrode and a drain electrode on the oxide semiconductor film; And
    And a metal oxide film containing gallium oxide on the source electrode and the drain electrode, wherein the metal oxide film includes the metal oxide film in contact with the oxide semiconductor film,
    Wherein the oxide semiconductor film includes indium, gallium, and zinc,
    The oxide semiconductor film has a thickness of 3 nm or more and 30 nm or less,
    Wherein the metal oxide film has a thickness larger than the thickness of the oxide semiconductor film and 10 nm or more,
    The difference between the band gap of the oxide semiconductor film and the band gap of the metal oxide film is less than 3 eV,
    The concentration of oxygen in at least one of the oxide semiconductor film, the metal oxide film, and the interface between the oxide semiconductor film and the metal oxide film does not include the first region and is overlapped with the source electrode or the drain electrode Is higher than that of the second region of the oxide semiconductor film.
  4. A semiconductor device comprising:
    An oxide semiconductor film on the substrate;
    A source electrode and a drain electrode on the oxide semiconductor film; And
    And a metal oxide film containing gallium oxide on the source electrode and the drain electrode, wherein the metal oxide film includes the metal oxide film in contact with the oxide semiconductor film,
    Wherein the oxide semiconductor film includes indium, gallium, and zinc,
    The oxide semiconductor film has a thickness of 3 nm or more and 30 nm or less,
    Wherein the metal oxide film has a thickness larger than the thickness of the oxide semiconductor film and 10 nm or more,
    The difference between the band gap of the oxide semiconductor film and the band gap of the metal oxide film is less than 3 eV,
    Oxygen is introduced into at least one of the oxide semiconductor film, the metal oxide film, and the interface between the oxide semiconductor film and the metal oxide film,
    The concentration of oxygen in at least one of the oxide semiconductor film, the metal oxide film, and the interface between the oxide semiconductor film and the metal oxide film does not include the first region and is overlapped with the source electrode or the drain electrode Is higher than that of the second region of the oxide semiconductor film.
  5. delete
  6. 5. The method according to any one of claims 1 to 4,
    Wherein the metal oxide film further comprises indium and zinc.
  7. 5. The method according to any one of claims 1 to 4,
    And an insulating film on the metal oxide film.
  8. 5. The method according to any one of claims 1 to 4,
    Wherein the metal oxide film is a gallium oxide film containing 0.01 atom% to 5 atom% indium or zinc.
  9. delete
  10. 5. The method according to any one of claims 1 to 4,
    Wherein the oxide semiconductor film has a carrier concentration of less than 1 x 10 &lt; 14 &gt; cm &lt;&quot; 3 & gt ;.
  11. 5. The method according to any one of claims 1 to 4,
    And the sum of the electron affinity of the oxide semiconductor film and 0.1 eV is larger than the electron affinity of the metal oxide film.
  12. A method of fabricating a semiconductor device comprising:
    Forming a gate electrode on the substrate;
    Forming a gate insulating film on the gate electrode;
    Forming an oxide semiconductor film overlying the gate electrode with the gate insulating film interposed therebetween;
    Forming a source electrode and a drain electrode on the oxide semiconductor film;
    Forming a metal oxide film containing gallium oxide on the source electrode and the drain electrode, wherein the metal oxide film is in contact with the oxide semiconductor film;
    Introducing oxygen into at least one of the oxide semiconductor film, the metal oxide film, and the interface between the oxide semiconductor film and the metal oxide film; And
    And performing a heat treatment,
    Wherein the oxide semiconductor film includes indium, gallium, and zinc,
    The oxide semiconductor film has a thickness of 3 nm or more and 30 nm or less,
    Wherein the metal oxide film has a thickness larger than the thickness of the oxide semiconductor film and 10 nm or more,
    Wherein a difference between a band gap of the oxide semiconductor film and a band gap of the metal oxide film is less than 3 eV.
  13. A method of fabricating a semiconductor device comprising:
    Forming an oxide semiconductor film on the substrate;
    Forming a source electrode and a drain electrode on the oxide semiconductor film;
    Forming a metal oxide film containing gallium oxide on the source electrode and the drain electrode, wherein the metal oxide film is in contact with the oxide semiconductor film;
    Introducing oxygen into at least one of the oxide semiconductor film, the metal oxide film, and the interface between the oxide semiconductor film and the metal oxide film after the metal oxide film is formed; And
    And performing a heat treatment,
    Wherein the oxide semiconductor film includes indium, gallium, and zinc,
    The oxide semiconductor film has a thickness of 3 nm or more and 30 nm or less,
    Wherein the metal oxide film has a thickness larger than the thickness of the oxide semiconductor film and 10 nm or more,
    Wherein a difference between a band gap of the oxide semiconductor film and a band gap of the metal oxide film is less than 3 eV.
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