KR101751646B1 - 바인더 수지 및 이를 포함하는 감광성 수지 조성물 - Google Patents

바인더 수지 및 이를 포함하는 감광성 수지 조성물 Download PDF

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KR101751646B1
KR101751646B1 KR1020160115905A KR20160115905A KR101751646B1 KR 101751646 B1 KR101751646 B1 KR 101751646B1 KR 1020160115905 A KR1020160115905 A KR 1020160115905A KR 20160115905 A KR20160115905 A KR 20160115905A KR 101751646 B1 KR101751646 B1 KR 101751646B1
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South Korea
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group
formula
carbon atoms
weight
resin composition
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KR1020160115905A
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Korean (ko)
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KR20170039561A (ko
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류미선
김근수
정통일
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타코마테크놀러지 주식회사
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/123—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
    • C08G63/137—Acids or hydroxy compounds containing cycloaliphatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L31/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid or of a haloformic acid; Compositions of derivatives of such polymers
    • C08L31/06—Homopolymers or copolymers of esters of polycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J131/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid, or of a haloformic acid; Adhesives based on derivatives of such polymers
    • C09J131/06—Homopolymers or copolymers of esters of polycarboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Epoxy Resins (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020160115905A 2015-10-01 2016-09-08 바인더 수지 및 이를 포함하는 감광성 수지 조성물 KR101751646B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20150138333 2015-10-01
KR1020150138333 2015-10-01
KR1020160033658 2016-03-21
KR20160033658 2016-03-21

Publications (2)

Publication Number Publication Date
KR20170039561A KR20170039561A (ko) 2017-04-11
KR101751646B1 true KR101751646B1 (ko) 2017-07-11

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KR1020160115905A KR101751646B1 (ko) 2015-10-01 2016-09-08 바인더 수지 및 이를 포함하는 감광성 수지 조성물

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JP (1) JP6698155B2 (zh)
KR (1) KR101751646B1 (zh)
CN (1) CN108137794B (zh)
WO (1) WO2017057813A1 (zh)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190085768A (ko) 2018-01-11 2019-07-19 동우 화인켐 주식회사 바인더 수지, 착색 감광성 수지 조성물, 이를 포함하는 격벽 구조물 및 이를 포함하는 표시장치
US10876046B2 (en) 2018-07-02 2020-12-29 Samsung Sdi Co., Ltd. Curable composition including quantum dot, resin layer using the same and display device
US10921709B2 (en) 2018-02-06 2021-02-16 Samsung Sdi Co., Ltd. Photosensitive resin composition, photosensitive resin layer using the same, and color filter
WO2021137616A1 (ko) * 2020-01-03 2021-07-08 차혁진 고해상도를 갖는 유기발광디스플레이용 플렉시블 포토-패턴 마스크 및 이의 제조방법

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101840347B1 (ko) * 2016-10-26 2018-03-20 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
KR101949589B1 (ko) * 2017-05-12 2019-02-18 차혁진 화학증폭형 바인더 수지 및 이를 포함하는 포지티브 감광성 고굴절 유기절연막 조성물
KR102361604B1 (ko) * 2017-08-07 2022-02-10 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 이를 포함하는 표시장치
KR102362443B1 (ko) * 2017-08-31 2022-02-11 동우 화인켐 주식회사 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
KR102356879B1 (ko) 2017-09-29 2022-01-28 동우 화인켐 주식회사 바인더 수지, 착색 감광성 수지 조성물, 이를 포함하는 디스플레이 격벽 구조물 및 이를 포함하는 자발광 표시장치
KR102071112B1 (ko) * 2017-10-11 2020-01-29 타코마테크놀러지 주식회사 바인더 수지 및 이를 포함하는 감광성 수지 조성물 또는 코팅 용액
KR102387414B1 (ko) 2017-11-07 2022-04-15 동우 화인켐 주식회사 바인더 수지, 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 이를 포함하는 표시장치
KR102288575B1 (ko) 2017-11-09 2021-08-11 동우 화인켐 주식회사 바인더 수지, 착색 감광성 수지 조성물, 이를 포함하는 디스플레이 격벽 구조물 및 이를 포함하는 자발광 표시장치
KR102377269B1 (ko) * 2018-01-10 2022-03-22 동우 화인켐 주식회사 바인더 수지, 착색 감광성 수지 조성물, 이를 포함하는 디스플레이 격벽 구조물 및 이를 포함하는 표시장치
CN110333647B (zh) * 2019-07-03 2023-04-14 波米科技有限公司 一种正型感光性树脂组合物
JP2021092758A (ja) 2019-12-03 2021-06-17 東京応化工業株式会社 ネガ型感光性樹脂組成物及び硬化膜の製造方法
CN112180683B (zh) * 2020-08-28 2021-10-08 上海玟昕科技有限公司 一种正性高弹性感光树脂组合物
JP2022175020A (ja) 2021-05-12 2022-11-25 東京応化工業株式会社 感光性樹脂、ネガ型感光性樹脂組成物、パターン化された硬化膜の製造方法及びカルボキシ基含有樹脂

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JP2006003860A (ja) 2003-11-26 2006-01-05 Nippon Steel Chem Co Ltd 感光性樹脂組成物及びそれを用いたカラーフィルター

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JP2003122034A (ja) * 2001-10-17 2003-04-25 Kyocera Mita Corp 電子写真感光体
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JP4653657B2 (ja) * 2003-05-23 2011-03-16 三井化学株式会社 （メタ）アクリル酸エステル化合物およびその用途
TW200530281A (en) * 2003-11-26 2005-09-16 Nippon Steel Chemical Co Photosensitive resin composition and color filter using the same
US8658342B2 (en) * 2009-04-27 2014-02-25 Nissan Chemicals Industries, Ltd. Photosensitive composition including photopolymerizable polymer having fluorene skeleton
WO2013118680A1 (ja) * 2012-02-07 2013-08-15 日立化成株式会社 感光性樹脂組成物、パターン硬化膜の製造方法及び電子部品
CN104395824B (zh) * 2012-11-01 2020-01-31 株式会社艾迪科 碱显影性感光性组合物
JP6123620B2 (ja) * 2013-09-30 2017-05-10 Jsr株式会社 感放射線性樹脂組成物、表示素子の絶縁膜、その形成方法及び表示素子
KR101682017B1 (ko) * 2013-11-27 2016-12-02 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층

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Publication number Priority date Publication date Assignee Title
JP3673321B2 (ja) 1996-05-10 2005-07-20 新日鐵化学株式会社 アルカリ現像可能な感光性樹脂組成物
JP2006003860A (ja) 2003-11-26 2006-01-05 Nippon Steel Chem Co Ltd 感光性樹脂組成物及びそれを用いたカラーフィルター

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190085768A (ko) 2018-01-11 2019-07-19 동우 화인켐 주식회사 바인더 수지, 착색 감광성 수지 조성물, 이를 포함하는 격벽 구조물 및 이를 포함하는 표시장치
US10921709B2 (en) 2018-02-06 2021-02-16 Samsung Sdi Co., Ltd. Photosensitive resin composition, photosensitive resin layer using the same, and color filter
US10876046B2 (en) 2018-07-02 2020-12-29 Samsung Sdi Co., Ltd. Curable composition including quantum dot, resin layer using the same and display device
WO2021137616A1 (ko) * 2020-01-03 2021-07-08 차혁진 고해상도를 갖는 유기발광디스플레이용 플렉시블 포토-패턴 마스크 및 이의 제조방법

Also Published As

Publication number Publication date
CN108137794B (zh) 2020-05-15
JP2018531311A (ja) 2018-10-25
CN108137794A (zh) 2018-06-08
KR20170039561A (ko) 2017-04-11
JP6698155B2 (ja) 2020-05-27
WO2017057813A1 (ko) 2017-04-06

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