KR101473091B1 - 기판 검사 장치 및 기판 검사 방법 - Google Patents

기판 검사 장치 및 기판 검사 방법 Download PDF

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KR101473091B1
KR101473091B1 KR1020130022758A KR20130022758A KR101473091B1 KR 101473091 B1 KR101473091 B1 KR 101473091B1 KR 1020130022758 A KR1020130022758 A KR 1020130022758A KR 20130022758 A KR20130022758 A KR 20130022758A KR 101473091 B1 KR101473091 B1 KR 101473091B1
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South Korea
Prior art keywords
etching
substrate
inspection
simulation
data
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KR1020130022758A
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English (en)
Korean (ko)
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KR20130135037A (ko
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사토루 야사카
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가부시키가이샤 스크린 홀딩스
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Publication of KR20130135037A publication Critical patent/KR20130135037A/ko
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020130022758A 2012-05-31 2013-03-04 기판 검사 장치 및 기판 검사 방법 KR101473091B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012123842A JP5826707B2 (ja) 2012-05-31 2012-05-31 基板検査装置および基板検査方法
JPJP-P-2012-123842 2012-05-31

Publications (2)

Publication Number Publication Date
KR20130135037A KR20130135037A (ko) 2013-12-10
KR101473091B1 true KR101473091B1 (ko) 2014-12-15

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ID=49736893

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130022758A KR101473091B1 (ko) 2012-05-31 2013-03-04 기판 검사 장치 및 기판 검사 방법

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Country Link
JP (1) JP5826707B2 (ja)
KR (1) KR101473091B1 (ja)
CN (1) CN103454286B (ja)
TW (1) TWI612294B (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6342738B2 (ja) * 2014-07-24 2018-06-13 株式会社Ｓｃｒｅｅｎホールディングス データ補正装置、描画装置、検査装置、データ補正方法、描画方法、検査方法およびプログラム
JP2016072335A (ja) * 2014-09-29 2016-05-09 株式会社Ｓｃｒｅｅｎホールディングス プロセス監視装置およびプロセス監視方法
JP2016070730A (ja) * 2014-09-29 2016-05-09 株式会社Ｓｃｒｅｅｎホールディングス 画像取得装置および画像取得方法
JP6342304B2 (ja) * 2014-11-12 2018-06-13 株式会社Ｓｃｒｅｅｎホールディングス データ補正装置、描画装置、検査装置、データ補正方法、描画方法、検査方法およびプログラム
JP6496159B2 (ja) * 2015-02-23 2019-04-03 株式会社Ｓｃｒｅｅｎホールディングス パターン検査装置およびパターン検査方法
CN106019851B (zh) * 2015-03-30 2018-05-25 株式会社思可林集团 基准位置获取方法、基准位置获取装置、图案描绘方法、图案描绘装置、以及记录程序的记录媒体
JP6466797B2 (ja) 2015-07-24 2019-02-06 株式会社Ｓｃｒｅｅｎホールディングス データ補正装置、描画装置、検査装置、データ補正方法、描画方法、検査方法およびプログラム
JP6466277B2 (ja) * 2015-07-27 2019-02-06 株式会社Ｓｃｒｅｅｎホールディングス データ補正装置、描画装置、検査装置、データ補正方法、描画方法、検査方法およびプログラム
KR102595300B1 (ko) * 2016-07-04 2023-10-31 삼성전자주식회사 검사 방법 및 시스템, 및 이를 이용한 반도체 패키지의 제조 방법
JP7280068B2 (ja) * 2019-03-12 2023-05-23 株式会社Ｓｃｒｅｅｎホールディングス 検査装置および検査方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06109446A (ja) * 1992-09-30 1994-04-19 Matsushita Electric Ind Co Ltd 配線パターン検査装置
US20020131040A1 (en) * 2001-01-26 2002-09-19 Xinhui Niu System and method for characterizing macro-grating test patterns in advanced lithography and etch processes
JP2006265641A (ja) * 2005-03-24 2006-10-05 Furukawa Electric Co Ltd:The エッチング・シミュレーション方法及びエッチング・シミュレーション装置
JP2011203343A (ja) * 2010-03-24 2011-10-13 Toshiba Corp パターン検査方法及び半導体装置の製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2942171B2 (ja) * 1995-06-09 1999-08-30 大日本スクリーン製造株式会社 プリント基板のパターン検査装置
JP4274784B2 (ja) * 2002-05-28 2009-06-10 新光電気工業株式会社 配線形成システムおよびその方法
US7053355B2 (en) * 2003-03-18 2006-05-30 Brion Technologies, Inc. System and method for lithography process monitoring and control
US7488933B2 (en) * 2005-08-05 2009-02-10 Brion Technologies, Inc. Method for lithography model calibration
WO2008047422A1 (fr) * 2006-10-18 2008-04-24 Casio Micronics Co., Ltd. Procédé pour inspecter un schéma de câblages et système conçu à cet effet
US8103979B2 (en) * 2008-10-20 2012-01-24 Advanced Micro Devices, Inc. System for generating and optimizing mask assist features based on hybrid (model and rules) methodology
WO2010117626A2 (en) * 2009-03-31 2010-10-14 Christophe Pierrat Lithography modelling and applications
JP5297930B2 (ja) * 2009-07-29 2013-09-25 株式会社日立ハイテクノロジーズ 欠陥検査装置およびその方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06109446A (ja) * 1992-09-30 1994-04-19 Matsushita Electric Ind Co Ltd 配線パターン検査装置
US20020131040A1 (en) * 2001-01-26 2002-09-19 Xinhui Niu System and method for characterizing macro-grating test patterns in advanced lithography and etch processes
JP2006265641A (ja) * 2005-03-24 2006-10-05 Furukawa Electric Co Ltd:The エッチング・シミュレーション方法及びエッチング・シミュレーション装置
JP2011203343A (ja) * 2010-03-24 2011-10-13 Toshiba Corp パターン検査方法及び半導体装置の製造方法

Also Published As

Publication number Publication date
TW201348696A (zh) 2013-12-01
TWI612294B (zh) 2018-01-21
JP5826707B2 (ja) 2015-12-02
CN103454286A (zh) 2013-12-18
CN103454286B (zh) 2016-08-03
JP2013250101A (ja) 2013-12-12
KR20130135037A (ko) 2013-12-10

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