KR101208137B1 - 프로브 장치 - Google Patents
프로브 장치 Download PDFInfo
- Publication number
- KR101208137B1 KR101208137B1 KR1020100005275A KR20100005275A KR101208137B1 KR 101208137 B1 KR101208137 B1 KR 101208137B1 KR 1020100005275 A KR1020100005275 A KR 1020100005275A KR 20100005275 A KR20100005275 A KR 20100005275A KR 101208137 B1 KR101208137 B1 KR 101208137B1
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- substrate
- probe
- inspection
- board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000523 sample Substances 0.000 title claims abstract description 141
- 239000000758 substrate Substances 0.000 claims abstract description 188
- 238000007689 inspection Methods 0.000 claims abstract description 126
- 238000012360 testing method Methods 0.000 claims abstract description 52
- 238000005498 polishing Methods 0.000 claims abstract description 50
- 230000007246 mechanism Effects 0.000 claims abstract description 40
- 238000001179 sorption measurement Methods 0.000 claims abstract description 21
- 238000012545 processing Methods 0.000 claims abstract description 9
- 238000012546 transfer Methods 0.000 claims description 79
- 238000000034 method Methods 0.000 claims description 14
- 230000004308 accommodation Effects 0.000 claims description 9
- 230000006870 function Effects 0.000 claims description 8
- 238000012423 maintenance Methods 0.000 claims description 7
- 238000003708 edge detection Methods 0.000 claims description 2
- 238000007517 polishing process Methods 0.000 abstract description 39
- 238000001467 acupuncture Methods 0.000 abstract description 4
- 235000012431 wafers Nutrition 0.000 description 366
- 238000003384 imaging method Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 210000000078 claw Anatomy 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2601—Apparatus or methods therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B19/00—Single-purpose machines or devices for particular grinding operations not covered by any other main group
- B24B19/16—Single-purpose machines or devices for particular grinding operations not covered by any other main group for grinding sharp-pointed workpieces, e.g. needles, pens, fish hooks, tweezers or record player styli
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Tests Of Electronic Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2009-011229 | 2009-01-21 | ||
| JP2009011229A JP5381118B2 (ja) | 2009-01-21 | 2009-01-21 | プローブ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20100085877A KR20100085877A (ko) | 2010-07-29 |
| KR101208137B1 true KR101208137B1 (ko) | 2012-12-04 |
Family
ID=42523227
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020100005275A Active KR101208137B1 (ko) | 2009-01-21 | 2010-01-20 | 프로브 장치 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5381118B2 (enExample) |
| KR (1) | KR101208137B1 (enExample) |
| CN (1) | CN101783305B (enExample) |
| TW (1) | TWI466208B (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5384270B2 (ja) * | 2009-09-21 | 2014-01-08 | 東京エレクトロン株式会社 | ローダ |
| US9335347B2 (en) * | 2012-09-10 | 2016-05-10 | Advantest Corporation | Method and apparatus for massively parallel multi-wafer test |
| CN102928761B (zh) * | 2012-11-20 | 2016-05-11 | 上海华虹宏力半导体制造有限公司 | 晶圆测试系统及晶圆测试方法 |
| SG11201605303XA (en) * | 2013-12-31 | 2016-08-30 | Shanghai Microelectronics Equi | Silicon wafer pre-alignment device and method therefor |
| JP6551655B2 (ja) * | 2015-03-31 | 2019-07-31 | 株式会社東京精密 | プローバ |
| CN105097592B (zh) * | 2015-06-17 | 2018-01-26 | 北京七星华创电子股份有限公司 | 半导体设备承载区域的硅片分布状态光电扫描方法及装置 |
| KR102503282B1 (ko) * | 2015-11-06 | 2023-02-24 | 세메스 주식회사 | 프로브 스테이션 |
| CN105575841B (zh) * | 2015-12-15 | 2019-08-02 | 北京中电科电子装备有限公司 | 一种晶圆测量装置 |
| CN107785299A (zh) * | 2016-08-30 | 2018-03-09 | 上海微电子装备(集团)股份有限公司 | 一种硅片拾取装置 |
| CN106807650A (zh) * | 2017-01-22 | 2017-06-09 | 江苏安纳金机械有限公司 | 一种充放电及休眠测试的自动拣料机及其运作方法 |
| US11125814B2 (en) * | 2017-02-22 | 2021-09-21 | Sintokogio, Ltd. | Test system |
| CN107942222A (zh) * | 2017-11-21 | 2018-04-20 | 德淮半导体有限公司 | 测试机台及测试方法 |
| WO2019208338A1 (ja) * | 2018-04-27 | 2019-10-31 | 東京エレクトロン株式会社 | 基板処理システム、および基板処理方法 |
| JP7349240B2 (ja) * | 2018-10-05 | 2023-09-22 | 東京エレクトロン株式会社 | 基板倉庫及び基板検査方法 |
| JP2020096028A (ja) * | 2018-12-11 | 2020-06-18 | 東京エレクトロン株式会社 | 検査装置、及び、検査方法 |
| JP7274350B2 (ja) * | 2019-05-28 | 2023-05-16 | 東京エレクトロン株式会社 | 搬送システム、検査システム及び検査方法 |
| JP7474325B2 (ja) * | 2020-06-05 | 2024-04-24 | ローツェ株式会社 | ウエハ搬送装置、およびウエハ搬送方法 |
| TWI773187B (zh) * | 2021-03-12 | 2022-08-01 | 旭東機械工業股份有限公司 | 用於檢測一晶圓盒的方法及系統 |
| CN117192342B (zh) * | 2023-11-08 | 2024-02-13 | 深圳市森美协尔科技有限公司 | 探针台 |
| CN120985619A (zh) * | 2025-10-24 | 2025-11-21 | 泓浒(苏州)半导体科技有限公司 | 一种多轨迹晶圆搬运机械手及控制方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56133843A (en) * | 1980-03-21 | 1981-10-20 | Nec Corp | Probe grinder for probe card |
| JP3634138B2 (ja) * | 1998-02-23 | 2005-03-30 | 株式会社 日立ディスプレイズ | 液晶表示装置 |
| JP2000164649A (ja) * | 1998-11-26 | 2000-06-16 | Tokyo Seimitsu Co Ltd | プローバの触針クリーニング機構 |
| JP4496456B2 (ja) * | 2001-09-03 | 2010-07-07 | 軍生 木本 | プローバ装置 |
| JP2003168707A (ja) * | 2001-11-30 | 2003-06-13 | Tokyo Electron Ltd | プローブ装置 |
| JP2006128451A (ja) * | 2004-10-29 | 2006-05-18 | Seiko Epson Corp | プローバー装置及びその探針メンテナンス方法、半導体装置の製造方法 |
| JP4166813B2 (ja) * | 2006-05-11 | 2008-10-15 | 東京エレクトロン株式会社 | 検査装置及び検査方法 |
| JP5120017B2 (ja) * | 2007-05-15 | 2013-01-16 | 東京エレクトロン株式会社 | プローブ装置 |
-
2009
- 2009-01-21 JP JP2009011229A patent/JP5381118B2/ja active Active
- 2009-11-16 CN CN2009101801843A patent/CN101783305B/zh active Active
-
2010
- 2010-01-20 TW TW099101536A patent/TWI466208B/zh active
- 2010-01-20 KR KR1020100005275A patent/KR101208137B1/ko active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN101783305B (zh) | 2012-03-21 |
| JP5381118B2 (ja) | 2014-01-08 |
| TWI466208B (zh) | 2014-12-21 |
| JP2010171139A (ja) | 2010-08-05 |
| CN101783305A (zh) | 2010-07-21 |
| KR20100085877A (ko) | 2010-07-29 |
| TW201029088A (en) | 2010-08-01 |
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