KR101205821B1 - 기판 처리 장치 및 기판 처리 방법 - Google Patents

기판 처리 장치 및 기판 처리 방법 Download PDF

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Publication number
KR101205821B1
KR101205821B1 KR1020060034996A KR20060034996A KR101205821B1 KR 101205821 B1 KR101205821 B1 KR 101205821B1 KR 1020060034996 A KR1020060034996 A KR 1020060034996A KR 20060034996 A KR20060034996 A KR 20060034996A KR 101205821 B1 KR101205821 B1 KR 101205821B1
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KR
South Korea
Prior art keywords
liquid
substrate
processing
processing liquid
supplied
Prior art date
Application number
KR1020060034996A
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English (en)
Korean (ko)
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KR20060110789A (ko
Inventor
유이치 이마오카
아키노리 이소
Original Assignee
시바우라 메카트로닉스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 시바우라 메카트로닉스 가부시키가이샤 filed Critical 시바우라 메카트로닉스 가부시키가이샤
Publication of KR20060110789A publication Critical patent/KR20060110789A/ko
Application granted granted Critical
Publication of KR101205821B1 publication Critical patent/KR101205821B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
KR1020060034996A 2005-04-20 2006-04-18 기판 처리 장치 및 기판 처리 방법 KR101205821B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00122464 2005-04-20
JP2005122464A JP4627681B2 (ja) 2005-04-20 2005-04-20 基板の処理装置及び処理方法

Publications (2)

Publication Number Publication Date
KR20060110789A KR20060110789A (ko) 2006-10-25
KR101205821B1 true KR101205821B1 (ko) 2012-11-28

Family

ID=37194432

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060034996A KR101205821B1 (ko) 2005-04-20 2006-04-18 기판 처리 장치 및 기판 처리 방법

Country Status (4)

Country Link
JP (1) JP4627681B2 (ja)
KR (1) KR101205821B1 (ja)
CN (1) CN1853799B (ja)
TW (1) TWI402900B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5060835B2 (ja) * 2006-07-26 2012-10-31 芝浦メカトロニクス株式会社 基板の処理装置
CN101251721B (zh) * 2008-04-14 2010-09-01 友达光电股份有限公司 显影喷嘴结构及喷涂显影液的方法
CN103163002A (zh) * 2013-04-11 2013-06-19 王刚平 一种免疫组化湿盒
KR102391753B1 (ko) * 2014-09-30 2022-04-28 시바우라 메카트로닉스 가부시끼가이샤 기판 처리 장치
KR102355116B1 (ko) * 2017-04-03 2022-01-26 주식회사 케이씨텍 슬러리 노즐 및 이를 구비하는 기판 연마 장치
CN108447805A (zh) * 2018-03-30 2018-08-24 无锡尚德太阳能电力有限公司 湿法链式刻蚀槽进液结构
KR102420868B1 (ko) 2021-08-26 2022-07-14 실드 주식회사 가요성 흡음벽

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3488926A (en) * 1968-03-08 1970-01-13 Harrworth Inc Separator for removing gas bubbles from flowing liquids
GB2055634B (en) * 1979-08-16 1983-01-26 Ishikawajima Harima Heavy Ind Gas-liquid separators
JPH0556285U (ja) * 1992-01-07 1993-07-27 株式会社カイジョー 超音波洗浄装置
JPH06304535A (ja) * 1993-04-22 1994-11-01 Shimada Phys & Chem Ind Co Ltd 処理槽における液面揺れ制御装置
JPH08323106A (ja) * 1995-06-02 1996-12-10 Hitachi Ltd 薬液供給装置及び薬液供給方法
JP2887114B2 (ja) * 1996-08-30 1999-04-26 芝浦メカトロニクス株式会社 超音波洗浄装置
JP2002346486A (ja) * 2001-05-24 2002-12-03 Heiwa Corp ペレット研磨材洗浄装置
JP2003170086A (ja) * 2001-12-11 2003-06-17 Sumitomo Precision Prod Co Ltd ノズル装置及びこれを備えた基板処理装置
JP3947398B2 (ja) * 2001-12-28 2007-07-18 株式会社コガネイ 薬液供給装置および薬液供給方法
TW591970B (en) * 2002-10-31 2004-06-11 Ritdisplay Corp Color ink bubble removal device in OLED ink printing process and method thereof
JP4421956B2 (ja) * 2003-07-18 2010-02-24 芝浦メカトロニクス株式会社 基板の処理装置及び処理方法

Also Published As

Publication number Publication date
TWI402900B (zh) 2013-07-21
JP4627681B2 (ja) 2011-02-09
JP2006297274A (ja) 2006-11-02
TW200727350A (en) 2007-07-16
KR20060110789A (ko) 2006-10-25
CN1853799B (zh) 2013-02-06
CN1853799A (zh) 2006-11-01

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