KR101116999B1 - 광학 요소를 위한 교체 장치 - Google Patents

광학 요소를 위한 교체 장치 Download PDF

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Publication number
KR101116999B1
KR101116999B1 KR1020067012405A KR20067012405A KR101116999B1 KR 101116999 B1 KR101116999 B1 KR 101116999B1 KR 1020067012405 A KR1020067012405 A KR 1020067012405A KR 20067012405 A KR20067012405 A KR 20067012405A KR 101116999 B1 KR101116999 B1 KR 101116999B1
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KR
South Korea
Prior art keywords
optical element
objective lens
replacement device
lithographic objective
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020067012405A
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English (en)
Korean (ko)
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KR20060111597A (ko
Inventor
옌스 쿠글러
프란츠 조르크
안드레아스 부름브란트
토마스 이트너
토마스 슐레터러
Original Assignee
칼 짜이스 에스엠테 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of KR20060111597A publication Critical patent/KR20060111597A/ko
Application granted granted Critical
Publication of KR101116999B1 publication Critical patent/KR101116999B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/14—Mountings, adjusting means, or light-tight connections, for optical elements for lenses adapted to interchange lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
KR1020067012405A 2003-12-23 2004-11-30 광학 요소를 위한 교체 장치 Expired - Fee Related KR101116999B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10361441 2003-12-23
DE10361441.9 2003-12-23
PCT/EP2004/013576 WO2005064404A1 (en) 2003-12-23 2004-11-30 Replacement apparatus for an optical element

Publications (2)

Publication Number Publication Date
KR20060111597A KR20060111597A (ko) 2006-10-27
KR101116999B1 true KR101116999B1 (ko) 2012-03-15

Family

ID=34673078

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067012405A Expired - Fee Related KR101116999B1 (ko) 2003-12-23 2004-11-30 광학 요소를 위한 교체 장치

Country Status (8)

Country Link
US (8) US7265917B2 (enExample)
EP (1) EP1700167B1 (enExample)
JP (1) JP4750043B2 (enExample)
KR (1) KR101116999B1 (enExample)
CN (2) CN100545754C (enExample)
AT (1) ATE405866T1 (enExample)
DE (1) DE602004016048D1 (enExample)
WO (1) WO2005064404A1 (enExample)

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WO2005054953A2 (en) * 2003-11-24 2005-06-16 Carl-Zeiss Smt Ag Holding device for an optical element in an objective
US7265917B2 (en) * 2003-12-23 2007-09-04 Carl Zeiss Smt Ag Replacement apparatus for an optical element
US7986472B2 (en) * 2005-05-31 2011-07-26 Carl Zeiss SMT, AG. Optical element module
WO2007022922A2 (de) * 2005-08-23 2007-03-01 Carl Zeiss Smt Ag Austauschvorrichtung für ein optisches element
DE102005060622A1 (de) * 2005-12-19 2007-04-19 Carl Zeiss Smt Ag Montagevorrichtung für eine optische Einrichtung
US7724351B2 (en) 2006-01-30 2010-05-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and exchangeable optical element
KR101235492B1 (ko) * 2006-07-03 2013-02-20 칼 짜이스 에스엠테 게엠베하 리소그래피 투사 대물렌즈 교정/수리 방법
DE102006038455A1 (de) 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optisches System für die Halbleiterlithographie
DE102006046675A1 (de) * 2006-09-29 2008-04-03 Carl Zeiss Smt Ag Mikrolithopraphische Projektionsbelichtungsanlage
DE102006050835A1 (de) * 2006-10-27 2008-05-08 Carl Zeiss Smt Ag Verfahren und Vorrichtung zum Austausch von Objetkivteilen
EP2097789B1 (en) * 2006-12-01 2012-08-01 Carl Zeiss SMT GmbH Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
DE102007009867A1 (de) * 2007-02-28 2008-09-11 Carl Zeiss Smt Ag Abbildungsvorrichtung mit auswechselbaren Blenden sowie Verfahren hierzu
WO2008113605A2 (de) * 2007-03-20 2008-09-25 Carl Zeiss Smt Ag Verfahren zum verbessern von abbildungseigenschaften eines optischen systems sowie derartiges optisches system
JP5063224B2 (ja) * 2007-07-03 2012-10-31 キヤノン株式会社 投射レンズ及び画像投射装置
JPWO2009154090A1 (ja) * 2008-06-17 2011-11-24 コニカミノルタオプト株式会社 レンズ駆動装置及びカメラユニット
DE102008032853A1 (de) 2008-07-14 2010-01-21 Carl Zeiss Smt Ag Optische Einrichtung mit einem deformierbaren optischen Element
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CN101614967A (zh) 2009-12-30
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US20150070789A1 (en) 2015-03-12
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US8902519B2 (en) 2014-12-02
US20100271716A1 (en) 2010-10-28
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US7515363B2 (en) 2009-04-07
US7265917B2 (en) 2007-09-04
US20050134972A1 (en) 2005-06-23
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US7995296B2 (en) 2011-08-09
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US20090168207A1 (en) 2009-07-02
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US20160041475A1 (en) 2016-02-11
US20130279029A1 (en) 2013-10-24
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US20070297074A1 (en) 2007-12-27
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