KR100997398B1 - 무기 필러 및 유기 필러 함유 경화성 수지 조성물, 레지스트막 피복 프린트배선판, 및 그 제조방법 - Google Patents
무기 필러 및 유기 필러 함유 경화성 수지 조성물, 레지스트막 피복 프린트배선판, 및 그 제조방법 Download PDFInfo
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- KR100997398B1 KR100997398B1 KR1020080087198A KR20080087198A KR100997398B1 KR 100997398 B1 KR100997398 B1 KR 100997398B1 KR 1020080087198 A KR1020080087198 A KR 1020080087198A KR 20080087198 A KR20080087198 A KR 20080087198A KR 100997398 B1 KR100997398 B1 KR 100997398B1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0209—Inorganic, non-metallic particles
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0212—Resin particles
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- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
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Abstract
Description
혼합 조성물 (중량부) |
실시예 | |||||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 | ||
광경화성수지 | 제조예1 | 200 | - | - | 200 | - | - | 200 | 200 | 200 | 200 | 200 |
제조예2 | - | 200 | - | - | - | - | - | - | - | - | - | |
제조예3 | - | - | 154 | - | 200 | - | - | - | - | - | - | |
열경화성수지 | 비스페놀 A 타입 에폭시 수지 | 15 | 10 | - | - | 10 | 80 | 15 | 15 | 15 | 15 | 15 |
3,3',5,5'-테트라메틸바이페닐 타입 에폭시 수지 | 15 | 10 | 20 | - | 20 | - | 15 | 15 | 15 | 15 | 15 | |
페놀릭 노볼락 타입 에폭시 수지 | - | 10 | 10 | - | - | 20 | - | - | - | - | - | |
무기 필러 |
산화 티탄 (표면 처리품, 평균 입경:0.3㎛) |
500 | - | - | 80 | - | - | 1269.2 | 101.5 | 203.1 | 500 | 500 |
산화 알루미늄 (평균 입경: 3㎛, 열 전도도 30.2W/m·K) |
- | 600 | - | - | 500 | 600 | - | - | - | - | - | |
황산 바륨 (표면 처리품, 평균 입경:0.3㎛) |
20 | 10 | 300 | 20 | 20 | 50 | 50.8 | 4.1 | 8.1 | 20 | 20 |
혼합 조성물 (중량부) |
실시예 | |||||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 | ||
유기필러 |
아크릴고무 (탄성 계수:15MPa, 평균 입경: 0.5㎛) |
25 | - | - | - | - | - | 105.6 | 2.6 | 105.6 | - | - |
아크릴고무 (탄성 계수:20MPa, 평균 입경: 0.1㎛) |
- | 15 | - | - | - | 30 | - | - | - | - | - | |
실리콘 고무 (탄성 계수:200MPa, 평균 입경: 1.0㎛) |
- | - | 20 | 10 | - | - | - | - | - | - | - | |
가교 폴리부틸 메타크릴레이트 (탄성 계수:400MPa, 평균 입경: 5㎛) |
- | - | - | - | 20 | - | - | - | - | - | - | |
아크릴고무 (탄성 계수:5MPa, 평균 입경: 1.0㎛) |
- | - | - | - | - | - | - | - | - | 25 | - | |
유기 필러 (탄성 계수:1000MPa, 평균 입경: 6.0㎛) |
- | - | - | - | - | - | - | - | - | - | 25 | |
아크릴고무 (탄성 계수:0.5MPa, 평균 입경: 1.0㎛) |
- | - | - | - | - | - | - | - | - | - | - | |
유기 필러 (탄성 계수:3000MPa, 평균 입경: 8.0㎛) |
- | - | - | - | - | - | - | - | - | - | - | |
가교 폴리메틸 메타크릴레이트 (탄성 계수:2300MPa, 평균 입경: 25㎛) |
- | - | - | - | - | - | - | - | - | - | - |
혼합 조성물 (중량부) |
실시예 | |||||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 | ||
희석제 |
디펜타에리스리톨 헥사아크릴레이트(DPHA) | 20 | 20 | - | - | 20 | - | 20 | 20 | 20 | 20 | 20 |
디트리메틸올프로판 테트라아크릴레이트 | 5 | 5 | 20 | 25 | - | - | 5 | 5 | 5 | 5 | 5 | |
카르비톨 아세테이트 | 30 | 30 | 20 | 10 | 20 | 10 | 80 | 20 | 30 | 40 | 40 | |
경화제 |
비스(2,4,6-트리메틸벤조일)-페닐포스핀 옥사이드 | 12 | 12 | - | 4 | - | - | 12 | 12 | 12 | 12 | 12 |
2-메틸-1[4-(메틸티오)페닐]-2-모르폴리노-프로판-1-온 | - | - | 12 | - | 12 | - | - | - | - | - | - | |
2,4-디에틸티옥산톤 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | |
트리메틸올프로판트리스(3-머캅토프로피오네이트) | - | - | - | 2 | - | 1 | - | - | - | - | - | |
멜라민 | 2 | 2 | 2 | 2 | 2 | - | 2 | 2 | 2 | 2 | 2 | |
디시안디아미드 | - | - | 0.1 | - | - | 5 | - | - | - | - | - | |
2-페닐-4,5-디히드록시메틸이미다졸 | - | - | - | - | - | 4 | - | - | - | - | - | |
기타 | 폴리디메틸실록산 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 |
|
실시예 | |||||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 | ||
평가 시험 결과 |
건조 접촉 특성 | ○ | ○ | ○ | ○ | ○ | - | ○ | ○ | ○ | ○ | ○ |
현상가능성 | ○ | ○ | ○ | ○ | ○ | - | ○ | ○ | ○ | ○ | ○ | |
광민감성 | 10 | 8 | 9 | 11 | 8 | - | 8 | 11 | 9 | 9 | 9 | |
|
제조예 | |||||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 | ||
연필 경도 | 8H | 8H | 8H | 6H | 8H | 8H | 8H | 7H | 6H | 8H | 8H | |
접착성 | ○ | ○ | ○ | ○ | △ | ○ | △ | ○ | ○ | ○ | ○ | |
용제 저항성 | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | △ | |
내산성 | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | |
표면 상태 | ○ | ○ | ○ | ○ | △ | ○ | △ | ○ | ○ | ○ | ○ | |
솔더 내열성 도막박리시험 내균열성 접착 특성 |
○ ○ ○ |
○ ○ ○ |
○ ○ ○ |
○ ○ ○ |
○ △ △ |
○ ○ ○ |
○ △ △ |
△ ○ ○ |
○ ○ ○ |
○ ○ ○ |
○ ○ ○ |
|
금도금 내성 | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | |
외관 | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | |
초기값 (x 1013Ω) 168 시간 경과 후 (x 1011Ω) |
1.3 58.0 |
1.5 30.7 |
1.2 22.3 |
1.7 3.2 |
1.1 1.49 |
1.7 35.4 |
1.2 32 |
1.8 52 |
1.2 47.2 |
1.5 31.6 |
1.4 29 |
|
열충격 저항성 |
○ | ○ | ○ | ○ | △ | ○ | ○ | ○ | ○ | ○ | ○ | |
색차변화 (ΔE*ab) |
5 | 4.8 | 10 | 4.6 | 12 | 13 | 4.5 | 5.6 | 5.6 | 7.1 | 6.8 | |
스펙트럼 반사도(%) 450nm 550nm 600nm |
85 81 79 |
- - - |
2 2 2 |
71 68 65 |
- - - |
- - - |
91 88 85 |
80 77 73 |
82 80 77 |
86 82 79 |
86 83 79 |
|
열 전도도 (W/m·K) |
0.5 | 1.2 | 0.5 | 0.5 | 1.0 | 2.0 | - | - | - | - | - |
혼합 조성물 (중량부) |
비교예 | |||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | ||
광경화성수지 | 제조예1 | 200 | - | 200 | 200 | 200 | 200 | 200 | 200 | 200 |
제조예2 | - | 200 | - | - | - | - | - | - | - | |
제조예3 | - | - | - | - | - | - | - | - | - | |
열경화성수지 | 비스페놀 A 타입 에폭시 수지 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | 15 |
3,3',5,5'-테트라메틸바이페닐 타입 에폭시 수지 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | |
페놀릭 노볼락 타입 에폭시 수지 | - | - | - | - | - | - | - | - | - | |
무기 필러 |
산화 티탄 (표면 처리품, 평균 입경:0.3㎛) |
500 | - | 1650.0 | 25.4 | 1269.2 | 50.8 | 114.2 | 500 | 500 |
산화 알루미늄 (평균 입경: 3㎛, 열 전도도 30.2W/m·K) |
- | - | - | - | - | - | - | - | - | |
황산 바륨 (표면 처리품, 평균 입경:0.3㎛) |
- | 200 | 66.0 | 1.0 | 50.8 | 2.0 | 4.6 | 20 | 20 |
혼합 조성물 (중량부) |
비교예 | |||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | ||
유기필러 |
아크릴고무 (탄성 계수:15MPa, 평균 입경: 0.5㎛) |
- | - | 105.6 | 0.7 | 145.2 | 105.6 | 2.6 | - | - |
아크릴고무 (탄성 계수:20MPa, 평균 입경: 0.1㎛) |
- | - | - | - | - | - | - | - | - | |
실리콘 고무 (탄성 계수:200MPa, 평균 입경: 1.0㎛) |
- | - | - | - | - | - | - | - | - | |
가교 폴리부틸 메타크릴레이트 (탄성 계수:400MPa, 평균 입경: 5㎛) |
- | - | - | - | - | - | - | - | - | |
아크릴고무 (탄성 계수:5MPa, 평균 입경: 1.0㎛) |
- | - | - | - | - | - | - | - | - | |
유기 필러 (탄성 계수:1000MPa, 평균 입경: 6.0㎛) |
- | - | - | - | - | - | - | - | - | |
아크릴고무 (탄성 계수:0.5MPa, 평균 입경: 1.0㎛) |
- | - | - | - | - | - | - | 25 | - | |
유기 필러 (탄성 계수:3000MPa, 평균 입경: 8.0㎛) |
- | - | - | - | - | - | - | - | 25 | |
가교 폴리메틸 메타크릴레이트 (탄성 계수:2300MPa, 평균 입경: 25㎛) |
- | 20 | - | - | - | - | - | - | - |
혼합 조성물 (중량부) |
비교예 | |||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | ||
희석제 |
디펜타에리스리톨 헥사아크릴레이트(DPHA) | - | - | 20 | 20 | 20 | 20 | 20 | 20 | 20 |
디트리메틸올프로판 테트라아크릴레이트 | 25 | 25 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | |
카르비톨 아세테이트 | 20 | 20 | 80 | 10 | 100 | 30 | 20 | 40 | 40 | |
경화제 |
비스(2,4,6-트리메틸벤조일)-페닐포스핀 옥사이드 | 12 | - | 12 | 12 | 12 | 12 | 12 | 12 | 12 |
2-메틸-1[4-(메틸티오)페닐] -2-모르폴리노-프로판-1-온 |
- | 12 | - | - | - | - | - | - | - | |
2,4-디에틸티옥산톤 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | |
트리메틸올프로판트리스(3-머캅토프로피오네이트) | - | - | - | - | - | - | - | - | - | |
멜라민 | 2 | 2 | 2 | 2 | 2 | 2 | 2 | 2 | 2 | |
디시안디아미드 | 0.5 | - | - | - | - | - | - | - | - | |
2-페닐-4,5-디히드록시메틸이미다졸 | - | - | - | - | - | - | - | - | - | |
기타 | 폴리디메틸실록산 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 |
|
비교예 | |||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | ||
평가 시험 결과 |
건조 접촉특성 | ○ | ○ | ○ | ○ | ○ | ○ | ○ | △ | ○ |
현상가능성 | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | |
광민감성 | 9 | 10 | 6 | 11 | 7 | 10 | 11 | 9 | 9 | |
|
제조 비교예 | |||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | ||
연필 경도 | 8H | 8H | 8H | 6H | 7H | 5H | 7H | 7H | 8H | |
접착성 | × | × | × | ○ | ○ | ○ | ○ | ○ | △ | |
용제 저항성 | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | × | |
내산성 | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | ○ | |
표면 상태 | ○ | × | × | ○ | × | ○ | ○ | △ | △ | |
솔더 내열성 도막박리시험 내균열성 접착 특성 |
○ × × |
× × × |
× × × |
△ △ △ |
△ ○ ○ |
○ ○ ○ |
○ △ ○ |
△ ○ ○ |
△ × × |
|
금도금 내성 | △ | × | × | ○ | △ | ○ | ○ | ○ | △ | |
외관 | △ | × | × | ○ | △ | ○ | ○ | △ | △ | |
초기값 (x 1013Ω) 168 시간 경과 후 (x 1011Ω) |
1.1 1.00 |
1.1 1.50 |
1.3 9.4 |
1.7 43 |
1.6 11 |
1.4 32.5 |
1.6 35.4 |
1.3 24.2 |
1.7 - |
|
열충격 저항성 |
△ | × | × | △ | △ | ○ | △ | ○ | △ | |
색차변화 (ΔE*ab) |
- | - | 4.6 | 5.8 | 5.3 | 5.9 | 5.1 | 7.5 | 7.4 | |
스펙트럼 반사도(%) 450nm 550nm 600nm |
86 82 79 |
- - - |
92 90 87 |
58 55 51 |
88 85 82 |
61 58 55 |
81 79 76 |
85 82 78 |
85 83 78 |
|
열 전도도 (W/m·K) |
0.5 | 0.4 | - | - | - | - | - | - | - |
Claims (7)
- (I) 100중량부의 경화성 수지;(Ⅱ) 10 내지 1200 중량부의 무기 필러로서, 상기 무기 필러는 백색 안료 및/또는 열전도도가 1.0 내지 500(W/m·K)인 재료를 함유하는 무기 필러; 및(Ⅲ) 1 내지 100 중량부의 탄성계수가 1 내지 2000(MPa)이고 평균 입경이 0.01 내지 10㎛인 유기 필러를 포함하는 경화성 수지 조성물로서, 성분 (Ⅱ) 대 (Ⅲ)의 함유량 중량비가 1 내지 41인 것을 특징으로 하는 경화성 수지 조성물.
- 삭제
- 제1항에 있어서, 성분 (Ⅲ)가 고무 입자를 함유하는 것을 특징으로 하는 경화성 수지 조성물.
- 제1항에 있어서, 경화성 수지 조성물이 (A) 하기 수지 (I-1), (I-2) 및 성분 (Ⅱ) 내지 (Ⅵ)를 함유하는 광-열경화성 수지 조성물, (B) 하기 수지 (I-2), 및 성분 (Ⅱ), (Ⅲ) 및 (Ⅵ)을 함유하는 열경화성 수지 조성물, 또는 (C) 하기 수지 (I-1) 및 성분 (Ⅱ) 내지 (Ⅴ)을 함유하는 광-경화성 수지 조성물인 것을 특징으로 하는 경화성 수지 조성물.(I-1) 광-경화성 수지;(I-2) 열경화성 수지;(Ⅱ) 무기 필러;(Ⅲ) 유기 필러;(Ⅳ) 광반응성 모노머;(Ⅴ) 광경화제; 및(Ⅵ) 열경화제.
- 제4항에 있어서, 수지 (I-1)은 필수 모노머로서 에틸렌 불포화 산과 지환식 에폭시기 및/또는 옥세탄기-함유 불포화 화합물을 중합함으로써 얻어지는, 분자 내에 방향족 고리를 갖지 않는 산기-함유 아크릴 수지의 반응 생성물, 및/또는 필수 모노머로서 지환식 에폭시기 및/또는 옥세탄기-함유 불포화 화합물과 산기-함유 불포화 화합물을 중합함으로써 얻어지는, 분자 내에 방향족 고리를 갖지 않는 지환식 에폭시기 및/또는 옥세탄기-함유 수지의 반응 생성물인 것을 특징으로 하는 경화성 수지 조성물.
- 제1항 및 제3항 내지 제5항 중 어느 한 항에 따른 경화성 수지 조성물로 레지스트막을 형성하는 것을 특징으로 하는 레지스트막 피복 프린트배선판의 제조방법.
- 제6항에 따른 방법에 의해 제조된 레지스트막 피복 프린트배선판.
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JP2008244913A JP5464314B2 (ja) | 2007-10-01 | 2008-08-26 | 無機フィラー及び有機フィラー含有硬化性樹脂組成物、並びにレジスト膜被覆プリント配線板及びその製造方法 |
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