TW200918585A - Inorganic filler and organic filler-containing curable resin composition, resist film coated printed wiring board, and method for producing the same - Google Patents

Inorganic filler and organic filler-containing curable resin composition, resist film coated printed wiring board, and method for producing the same Download PDF

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TW200918585A
TW200918585A TW097137671A TW97137671A TW200918585A TW 200918585 A TW200918585 A TW 200918585A TW 097137671 A TW097137671 A TW 097137671A TW 97137671 A TW97137671 A TW 97137671A TW 200918585 A TW200918585 A TW 200918585A
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resin composition
group
acid
curable resin
resin
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TW097137671A
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Chinese (zh)
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TWI386446B (en
Inventor
Toshimitsu Kunou
Yasuhiro Kuroyanagi
Yukihiro Usui
Makoto Obunai
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San Ei Kagaku Co
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • H05K3/287Photosensitive compositions
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/28Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013Fillers, pigments or reinforcing additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0209Inorganic, non-metallic particles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0212Resin particles

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)

Abstract

A curable resin composition comprises: (I) 100 parts by weight of a curable resin; (II) 10 to 1200 parts by weight of an inorganic filler; and (III) 1 to 100 parts by weight of an organic filler having an elastic modulus of 1 to 2000 (MPa) and an average particle diameter of 0.01 to 10 μ m, wherein a content weight ratio of the components (II) and (III) is 1 to 41.

Description

200918585 六、發明說明: 【毛::屬之技術領域】 線路板係η關於—種硬化性樹脂組成物,其可用為印刷 的印刷線^別是白色印刷線路板和用於安裝熱產生性組件 劑膜之印刷類似者)所用的阻劑油墨;—種被覆有阻 |料频;與其製造紐。 L无則技術】 物業知塞者)各,性無機填充材的硬化性樹脂組成 有著色劑(氧化心業已知悉—種熱固性樹脂,其含 印刷線路从光_為反雜錢填充材以增強 (專利文件D ^用白色層壓板在可視短波長區内的反射率 替代者,Ρ 有—種熱固性樹脂漆,其含有高導熱性 來對類似者)作為熱射性無機填充材,其係用 Β = #具有Μ值的高密度封裝部件(諸如功率電晶 i 玄1二σ IC)之金屬基板的覆蓋絕緣層施加高熱輻射(專利 又件2)。 μΓ過’在任何上述情況中,將無機填充材以大量與硬 &組成物混合之時’所得硬倾的破裂抗性不幸地 S得不足。所以’對於功能性錢填充㈣填裝量有自 :、限制’且對於硬化膜不能施加足夠大的功能性質(光反 射性和熱輻射性或類似者)。 利文件1]曰本專利申請公開第脱挪號 利文件2 ]日本專财請公開第G 8 - 8 3 9 6 3號 3 320584 200918585 【發明内容】 [本發明要解決的問題] 本發明的一項目的為提供一種硬化性樹脂組成物,其 可對硬化膜施加更大的功能性質。 特別地,本發明的一目的為提供一種硬化性樹脂組成 物,其適合用為白色印刷線路板或類似者所用的阻劑油 墨,用以施加具有優良光反射性、破裂抗性和黃化抗性或 類似者之阻劑膜。替代地,本發明的另一目的為提供一種 硬化性樹脂組成物,其適合用為安裝有熱產生性組件的印 刷線路板或類似者所用的阻劑油墨,用以施加具有優良熱 輻射性、破裂抗性和褪色抗性或類似者之阻劑膜。 [解決問題之手段] 本案發明人進行過認真的研究以期達成上述諸目的, 且其結果,本案發明人完成下面的發明。 亦即,本發明的第一方面係提供一種硬化性樹脂組成 物,包含: (I) 10 0重量份的硬化性樹脂; (II) 10至12 0 0重量份的無機填充材;和 (III) 1至100重量份的有機填充材,該有機填充材具 有1至2000 (MPa)的彈性模量及0. 01至10微米(/z HI)的平均 粒徑,其中,成分(II)對(ΙΠ)的含量重量比為1至41。 本發明的第二方面係提供根據本發明第一方面的硬化 性樹脂組成物,其中,該成分(II)為白色顏料及/或具有1.0 至500(W/m · K)的熱導係數之材料。 4 320584 200918585 本發明的第三方面係提供根據本發明第4第二方面 的硬化性樹脂組成物,其中,該成分(ιπ)含有橡膠粒子。 本發明的第四方面係提供根據本發明第一至第三方面 中任一方_硬化輯缝餘,其巾,㈣化性樹脂組 成物為(Α)光-翻性樹脂組成物,其含有下列樹脂(卜^、 (1-2)和成分(⑴至(VI);⑻熱固性樹脂紕成物 ,其含有 下列树脂U-2)和成分⑴)、(ΠΙ)和⑻;或⑹光固性樹 脂組成物,其含有下列樹脂(Η)和成分⑼至(V); (1-1)光固性樹脂; (1-2)熱固性樹脂; (II) 無機填充材; (III) 有機填充材; (IV) 光反應性單體; <ν) 光硬化劑;和 (VI) 熱硬化劑。 本發明的第五方面健供根據本㈣第四方面的硬 性樹脂組成物,其中,該樹脂(1-1)為經由用埽型不飽和i 體=而得的含酸基的丙烯酸系樹脂與含脂: 物,該反應產物在分子料具有转;及/ = !=㈣或氧雜環丁—和化合物作為: 早體聚合而得之含脂環族環氧基及/ 脂與含酸基的不姊化A物之MW h说基… 子内不具㈣環。σ物之反應產物,該反應產物在< 320584 5 200918585 纟發明的第六方面係提供—種製造被覆有阻劑膜之印 刷線路板之方法,其中’該阻劑膜係從根據本發明第一至 •第五方面中任-方面的硬化性樹脂組成物所形成。 , 纟發_第七方㈣提供—種餘據本發明第六方面 的方法製造之被覆有阻劑膜之印刷線路板。 I發明可提供硬化性樹脂組成物,其能在即使將益機 填充材以大量與硬化性樹脂組成物混合因而促成且有較大 「量功能性無機填充材的混合物之時,也能提供具有優良破 、裂抗性的硬化膜’藉此對該硬化膜施加更大的功能性 【實施方式】 Λ 讀文中’將參照最佳具體實例詳細地說明本發明。 根據本發明之硬化性樹脂組成物含有⑴ 脂。成分(I)的例子包括(M)# 卜^± 树 ",匕栝ϋ D先固性樹脂。有關樹脂 (H),g者為於-分子内具有縣和至少兩個烯型 和鍵的光固性(特別者,紫外光硬化性)預聚物(特別者 (聚物或聚合物)。替代地,較佳者為該樹脂(1_1)具議 至000(特別者,期㈣⑽⑹的平均分子量及3斷 Κ0Η/克(mgKOH/g))或更小者(特別者,3〇至16〇 (最佳者, 40至130))的酸價。當酸價過小時,驗顯像性可能會二足’。 相,地,當酸價過大時,阻劑膜性質(化學抗性、對基板的 黏著性質、電絕緣性和硬度或類似者)可能惡化。土 、 此等樹脂(H)的具體例子包括:⑹:;)經由用稀型 為基本單體聚合而得之含酸基的丙稀酸 與含月曰料環氧基及/或氧雜環丁垸基的不徵和化 320584 6 200918585 反應產物。 〆作為化合物α-i-i)製備原料的含酸基丙烯酸系樹脂 係經由將作為基本單體的烯型不飽和酸聚合而得。其具體 例子包括烯型不飽和酸的均聚物及烯型不飽和酸與“另一 單體的共聚物。可以使用其中至少一類型。 烯型不飽和酸的具體例子包括(甲基)丙烯酸、(曱基) 丙烯酸2-羧基乙醋、(曱基)丙烯酸2_羧基丙醋、順丁烯二 酸酐、反丁烯二酸、巴豆酸、肉桂酸、反丁烯二酸一〒酯、 反丁婦一 ^ 一乙酯、反丁烯二酸一丙酯、順丁稀二酸一甲 酯、順丁烯二酸一乙酯、順丁烯二酸一丙酯、和山梨酸。 可以使用其中至少一類型。 上面所提“另一單體,,的具體例子包括(甲基)丙婦酸 C1至C8烷基酯[(曱基)丙烯酸甲酯和(甲基)丙烯酸乙酯或 類似者]、(曱基)丙烯酸2-羥基烷基醋[(甲基)丙烯 酸2-輕基曱醋、(甲基)丙埽酸2_經基乙醋和(甲基)丙稀酸 2-羥基丙醋或類似者]、乙二醇一甲基鍵丙婦酸醋、乙二醇 -甲基醚甲基丙烯酸酯、乙二醇一乙基醚丙烯酸酯、乙二 醇一乙基St甲基丙烯酸醋、甘油丙烯酸醋、甘油甲基丙烯 酸酯、丙烯酸二甲胺基乙酉旨、甲基丙稀酸二甲胺基乙酯、 丙烯酸四氳吱喃甲酉旨、甲基丙埽酸四氫吱喃甲醋、酸胺丙 烯酸酯(amide acrylate)、醯胺甲基丙烯酸酯(amide methacrylate)、丙烯腈、甲基丙烯腈、丙烯酸曱醋、甲基 丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、丙烯酸丁酯、 甲基丙稀酸丁酯、丙烯酸異丁醋、甲基丙稀酸異丁醋、丙 320584 7 200918585 烯酸2-乙基己酯、甲基丙烯酸2_乙基己酯、丙烯酸笨甲酯、 甲基丙烯酸苯曱酯、丙烯酸卡必醇酯(carbit〇l acrylate)、曱基丙烯酸卡必醇酯(carbit〇1 methacrylate)、經^_己内酯變性的丙烯酸四氫呋喃甲 酉曰、經ε -己内酯變性的甲基丙烯酸四氫呋喃甲酯、丙烯酸 二乙二醇乙氧基酯、丙烯酸異癸酯、甲基丙烯酸異癸酯、 丙烯酸辛酯、甲基丙烯酸辛酯、丙烯酸月桂基酯、甲基丙 烯酸月桂基酯、丙烯酸十三烷基酯、曱基丙烯酸十三烷基 酉曰、丙烯酸硬脂基酯和甲基丙烯酸硬脂基酯或類似者;乙 烯型芳族化合物[例如,苯乙烯、曱基苯乙烯、乙烯基 甲苯、對氯苯乙烯或類似者];不飽和醯胺化合物[例如,(甲 基)丙烯醯胺、二丙酮丙烯醯胺、Ν-羥曱基丙烯醢胺、和Ν_ 丁氧基甲基丙烯醯胺或類似者];多烯烴化合物[例如,丁 二烯、異戊二烯和氯丁二烯或類似者];及其他者[例如,.(曱 基)丙烯腈、甲基異戊二烯基酮、醋酸乙烯酯、叔碳酸乙烯 醋單體(VeoVa monomer)(Shell Chemical所製)、丙酸乙稀 酉旨、和三曱基乙酸乙烯酯]。可以使用其中至少一類型。 作為化合物(I -1 - i)的另一製備原料之含脂環族環氧 基及/或氧雜環丁炫基的不飽和化合物之例子包括在分子 内含有自由基聚合性不飽和基與脂環族環氧基及/或氧雜 環丁烷基之化合物。此等含脂環族環氧基及/或氧雜環丁烧 基的不餘和化合物之例子包括下式所示者。 [式1 ] 320584 8 200918585 R1200918585 VI. Description of the invention: [Mao:: the technical field of the genus] The circuit board η is about a kind of hardening resin composition, which can be used as a printed printing line, and is a white printed circuit board and used for mounting heat-generating components. The resist film ink used for the printing of the film is similar to that of the film; L no technology] Property knowers) Each of the hardening resins of the inorganic fillers is composed of a coloring agent (known in the heart of the oxidizing industry), which contains a printed circuit from the light _ for the anti-monetary filler to enhance ( Patent Document D ^ replaces the reflectivity of the white laminate in the visible short-wavelength region, Ρ has a thermosetting resin lacquer that contains high thermal conductivity to the like) as a heat-injective inorganic filler, which is used for 热= #High-density packaged components (such as power-electrical crystals), the cover insulating layer of the metal substrate is applied with high heat radiation (Patent 2). In any of the above cases, the inorganic When the filler is mixed with a large amount of the hard & composition, the resulting hard-dip rupture resistance is unfortunately insufficient. Therefore, for the functional money filling (four), the filling amount is from: "limit" and cannot be applied to the cured film. Sufficiently large functional properties (light reflectivity and heat radiation or the like). Document 1] 专利 专利 专利 专利 专利 脱 2 ] 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 3 320584 200918585 [Invention [Problem to be Solved by the Invention] An object of the present invention is to provide a curable resin composition which can impart greater functional properties to a cured film. In particular, it is an object of the present invention to provide a hardenability. a resin composition suitable for use as a resist ink for a white printed wiring board or the like for applying a resist film having excellent light reflectivity, crack resistance and yellowing resistance or the like. Alternatively, the present invention Another object is to provide a curable resin composition suitable for use as a resistive ink for a printed wiring board or the like to which a heat-generating component is mounted for application of excellent heat radiation, crack resistance and fading resistance. The resist film of the sex or the like. [Means for Solving the Problem] The inventors of the present invention conducted earnest research in order to achieve the above objects, and as a result, the inventors of the present invention completed the following invention. That is, the first aspect of the present invention. Provided is a curable resin composition comprising: (I) 100 parts by weight of a curable resin; (II) 10 to 1 part by weight of an inorganic filler; and (III) 1 100 parts by weight of an organic filler having an elastic modulus of from 1 to 2000 (MPa) and an average particle diameter of from 0.01 to 10 μm (/z HI), wherein the component (II) is (ΙΠ) The second aspect of the invention provides the curable resin composition according to the first aspect of the invention, wherein the component (II) is a white pigment and/or has a thickness of from 1.0 to 500 (W/ The material of the thermal conductivity of m · K) 4 320584 200918585 The third aspect of the invention provides the curable resin composition according to the fourth aspect of the invention, wherein the component (ιπ) contains rubber particles. According to a fourth aspect of the present invention, there is provided a method according to any one of the first to third aspects of the present invention, wherein the (four) chemical resin composition is a (Α) light-reversible resin composition containing the following resin ( Bu, (1-2) and components ((1) to (VI); (8) thermosetting resin composition containing the following resin U-2) and components (1)), (ΠΙ) and (8); or (6) photocurable resin composition And containing the following resins (Η) and components (9) to (V); (1-1) photocurable resin; (1-2) thermosetting Alicyclic; (II) an inorganic filler; (III) an organic filler; (IV) a photoreactive monomer; < ν) light hardener; and (VI) heat curing agent. According to a fifth aspect of the present invention, in the hard resin composition of the fourth aspect, the resin (1-1) is an acid group-containing acrylic resin obtained by using a fluorene-type unsaturated body = a fat-containing substance, the reaction product having a conversion in a molecular material; and / = !=(d) or an oxetane- and a compound as: an alicyclic-containing epoxy group and/or a lipid-containing acid group obtained by early polymerization The MW h of the A-inhibited A is said to have no (four) ring. The reaction product of the sigma, which is provided in the sixth aspect of the invention of < 320584 5 200918585 纟, a method for producing a printed wiring board coated with a resist film, wherein the resist film is from the invention according to the invention The curable resin composition of any one of the fifth aspect is formed. , the seventh party (four) provides a printed circuit board coated with a resist film manufactured by the method of the sixth aspect of the invention. The invention of the present invention can provide a curable resin composition which can be provided even when a prosthetic filler is mixed with a large amount of a curable resin composition, thereby contributing to a large amount of a mixture of functional inorganic fillers. A hardened film which is excellent in breaking and cracking resistance' thereby exerting greater functionality on the cured film [Embodiment] Λ Read the present invention will be described in detail with reference to the preferred embodiment. The composition of the curable resin according to the present invention The substance contains (1) fat. Examples of the component (I) include (M)#Bu^±tree", 匕栝ϋD first-setting resin. Regarding the resin (H), the g is in the molecule and has at least two a photocurable (particularly, ultraviolet curable) prepolymer of a olefinic type and a bond (particularly (polymer or polymer). Alternatively, it is preferred that the resin (1_1) has a value of 000 (special) The acid value of the average molecular weight of (4)(10)(6) and 3 Κ0Η/g (mgKOH/g)) or less (particularly, 3〇 to 16〇 (best, 40 to 130)). In hours, the imaging performance may be bipedal. Phase, ground, when the acid value is too large, the properties of the resist film ( Chemical resistance, adhesion to substrates, electrical insulation and hardness, or the like may deteriorate. Specific examples of the soil, such resins (H) include: (6): ;) obtained by polymerization using a dilute type as a basic monomer An acid group-containing acrylic acid and a ruthenium-containing epoxy group and/or an oxetanyl group are not combined with each other. 320584 6 200918585 Reaction product. 〆Acid-based acrylic resin as a raw material for preparing compound α-ii) It is obtained by polymerizing an ethylenically unsaturated acid as a basic monomer, and specific examples thereof include a homopolymer of an ethylenically unsaturated acid and a copolymer of an ethylenically unsaturated acid and "another monomer. At least one of these types can be used. Specific examples of the ethylenically unsaturated acid include (meth)acrylic acid, (mercapto)acrylic acid 2-carboxyethyl acrylate, (mercapto)acrylic acid 2-carboxy propyl vinegar, maleic anhydride, fumaric acid, croton Acid, cinnamic acid, monodecyl fumarate, anti-butanyl-ethyl ester, monopropyl fumarate, monomethyl succinate, monoethyl maleate, Monopropyl maleate, and sorbic acid. At least one of these types can be used. Specific examples of the "other monomer" mentioned above include (meth)propionic acid C1 to C8 alkyl ester [methyl (meth) acrylate and ethyl (meth) acrylate or the like], (曱2-hydroxyalkyl acrylate [2-methyl ketone (meth) acrylate, (meth) propyl phthalate 2 - ethyl acetoacetate and (meth) acrylate 2-hydroxy propyl vinegar or similar ], ethylene glycol monomethyl acetoacetate, ethylene glycol-methyl ether methacrylate, ethylene glycol monoethyl acrylate, ethylene glycol monoethyl methacrylate, glycerin Acrylic vinegar, glycerin methacrylate, dimethylaminoethyl acrylate, dimethylaminoethyl methacrylate, tetramethylammonium methacrylate, tetrahydrofuran methyl methacrylate Amide acrylate, amide methacrylate, acrylonitrile, methacrylonitrile, acrylonitrile, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate Ester, butyl methacrylate, isobutyl acrylate, isobutyl acrylate, propylene 320584 7 200918585 enoic acid 2- Ethylhexyl ester, 2-ethylhexyl methacrylate, methyl acrylate, phenyl methacrylate, carbitol acrylate, carbitol carbitol (carbit〇1) Methacrylate), tetrahydrofuranyl methacrylate modified by ^_caprolactone, tetrahydrofuran methyl methacrylate denatured by ε-caprolactone, diethylene glycol ethoxylate, isodecyl acrylate, methacrylic acid Isodecyl ester, octyl acrylate, octyl methacrylate, lauryl acrylate, lauryl methacrylate, tridecyl acrylate, tridecyl sulfonium decyl acrylate, stearyl acrylate and Stearyl acrylate or the like; a vinyl aromatic compound [eg, styrene, mercaptostyrene, vinyl toluene, p-chlorostyrene or the like]; an unsaturated guanamine compound [eg, (methyl) ) acrylamide, diacetone acrylamide, hydrazine-hydroxydecyl acrylamide, and hydrazine-butoxy methacrylamide or the like]; multiolefin compounds [eg, butadiene, isoprene, and Chloroprene or the like]; and others [ For example, (fluorenyl) acrylonitrile, methyl isoprenyl ketone, vinyl acetate, vinyl ether monomer (VeoVa monomer) (manufactured by Shell Chemical), ethyl propionate, and triterpene Vinyl acetate.] At least one of them may be used. Examples of the alicyclic epoxy group-containing and/or oxetane-based unsaturated compound as another preparation material of the compound (I-1 - i) are included in a compound containing a radical polymerizable unsaturated group and an alicyclic epoxy group and/or an oxetanyl group in the molecule. The alicyclic group-containing epoxy group and/or the oxetan group are not less than Examples of the compound and the compound include those shown by the following formula. [Formula 1] 320584 8 200918585 R1

I H2c «= c — COO r2^_ r3 於該式中,R1表氫或CH3(其可具有取代基)。 於該式中,R2表可具有取代基之二價烴基。只2的具體例 子^括下列基.亞甲基、伸乙基、伸丙基、四亞子基、乙 基伸乙基、五亞甲基、六亞甲基、多亞甲基、伸苯基 環己基、和苯二甲基。 於該式中,η表〇或1。 於該式中,R表具有可形成縮合環的環氧基及/或氧雜 環丁烧基之-價基。r3的具體例子包括環氧丙基、氧雜環 丁烷基,及下式所示者。 [式2]I H2c «= c — COO r2^_ r3 In the formula, R1 represents hydrogen or CH3 (which may have a substituent). In the formula, R2 represents a divalent hydrocarbon group which may have a substituent. Specific examples of only 2 include the following groups: methylene, ethyl, propyl, tetralin, ethylethyl, pentamethylene, hexamethylene, polymethylene, phenyl Cyclohexyl, and benzodimethyl. In the formula, η represents 1 or 1. In the formula, the R group has an epoxide group which can form a condensed ring and/or a valence group of an oxacyclobutane group. Specific examples of r3 include a glycidyl group, an oxetanyl group, and the formulae shown below. [Formula 2]

含脂環族環氧基及/或氧雜環丁烷基的不飽和化合物 之具體例子包括(甲基)丙烯酸環氧丙基酉旨;(甲基)丙烯酸 C^至C6烷基—2, 3_環氧基丙基酯[(甲基)丙烯酸2_甲基u -极乳基丙基酯、(曱基)丙烯酸2_乙基_2,3_環氧基丙基醋 或類^者];具有脂環族環氧基的化合物[(甲基)丙稀酸 3’4裒氧基環己基甲基酯、(甲基)丙烯酸& 環氧基環己 基乙基^ (甲基)丙稀酸3, 4-環氧基環己基丁基^丙稀 酉欠3’ 4環氧基環己基曱胺基酯或類似者];及下式所示 可以使用其中至少一類型。 320584 9 200918585 [式3 ] ch3Specific examples of the unsaturated compound containing an alicyclic epoxy group and/or an oxetane group include (meth)acrylic acid epoxypropyl group; (meth)acrylic acid C^ to C6 alkyl-2, 3_epoxypropyl ester [(meth)acrylic acid 2_methyl u-milyl propyl ester, (mercapto)acrylic acid 2_ethyl 2,3_epoxypropyl vinegar or class ^ a compound having an alicyclic epoxy group [(meth)acrylic acid 3'4 decyloxycyclohexylmethyl ester, (meth)acrylic acid & epoxycyclohexylethyl^ (methyl) 3, 4-epoxycyclohexylbutyl propyl acrylate is owed to 3' 4 epoxycyclohexyl decyl amide or the like]; and at least one of them can be used as shown in the following formula. 320584 9 200918585 [Formula 3] ch3

t化合/⑷一Η)可經由,例如,令含酸基的丙烯酸系樹 脂與含脂&族環氧基及/或氧雜環丁燒基的㈣和化合物 在約2◦至丨抓與約1至5小時的反應條件下反應而製備。 於化合物(ι-1-i)中,每1000平均分子量,不飽和基之 數目較佳者為〇· 2至4. 0 (特別者,〇. 7至3· 5)。當不飽和基 的數目過少時’膜的硬化性可能不足因而展現出差的對欲 被覆的材料之㈣性質和差_水性或咖者。相反地, t飽t基的數目過多時,在含酸基的丙稀酸系樹脂與含 月曰哀知裒氧基及/或氧雜環丁烧基的不飽和化合物之加成 反烏過程中’含脂環族環氧基及/或氧雜環丁烷基的不飽和 化合物可能稠化及膠凝。 替代地’化合物較佳地具有1〇〇〇至1〇〇〇〇〇 (特 別者,3000至70000)的平均分子量。當化合物(卜^)的分 子罝過小時,該膜可能具有不良的耐水性。相反地,當該 勿子里過大時,具有高黏度的化合物(卜丨—丨)處理起來不方 便。此外’該膜可能具有惡化遞增的膜厚度性質且對欲被 覆的耐水性材料具有不良的黏著性質。 再者’化合物(I-1 — i)較佳地’具有3〇〇或更小的酸價。 當該酸價過大時’該财能具有不良的耐水性。 有關化合物(I_1~i),較佳者為經由使(曱基)丙烯酸和 10 320584 200918585 (甲基)丙烯酸烷基酯的共聚物與(甲基)丙烯酸環氧丙基酯 部分反應所得者。 s 樹脂(1-1)的其他例子包括:一種經由將作為 基本單體之含脂環族環氧基及/或氧雜環丁烷基的不飽和 化合物聚合所得含脂環族環氧基及/或氧雜環丁烷基的樹 脂,與含酸基的不飽和化合物之反應產物。 作為化合物(I-1-ii)的製備原料之含脂環族環氧基及 /或氧雜環丁烷基的樹脂係經由將作為基本單體的含脂環 族環氧基及/或氧雜環丁烷基的不飽和化合物聚合而得。其 具體例子包括含脂環族環氧基及/或氧雜環了燒基的不飽 和化合物之均聚物,及含脂環族環氧基及/或氧雜環丁烷基 的不飽和化合物與“另—單體”#共聚物。可以使用其中 至少一類型。 含脂環族環氧基及/或氧雜環了絲的不飽和化合物 4 與上述3一單體”的例子包括在化合物(I-1-i)的說明 中所例舉者。 作為化合物— 的另—製備原料之含酸基的不飽 和化口物之例子包括在分子内具有不飽和基與酸基的化合 物。此等含酸基的不餘和化合物之具體例子包括(甲基)丙 =夂、(^基)丙烯酸2-羧基乙g旨、(甲基)丙烯酸2_幾基丙 醋和順丁烯二酸酐。可以使用其中至少一類型。 芬口物(1 1 u)可經由’例如,令該含脂環族環氧基 燒基的樹脂與該含酸基的不鮮化合物在 ',、、 咖和約⑴小時的條件下反應而製得。 320584 11 200918585 . 於化合物(I-l-ii)中,每1000平均分子量,不飽和基 之數目較佳者為0. 2至4. 0(特別者,0. 7至3. 5),且其平均 - 分子量較佳地為1000至100000 (特別者,3000至70000)。 . 樹脂(1-1)的其他例子包括(I-1-iii),其係經由對分 子内具有至少兩個環氧基的多官能環氧化合物所具環氧基 與不飽和一元羧酸的羧基施以酯化反應,且進一步令所產 生的經基與飽和或不飽和多元酸酐反應而得者。 上述多官能環氧化合物的具體例子包括酚醛型環氧樹 脂(例如,經由用酚醛樹脂與表氯醇及/或甲基表氯醇反應 所得者,該酚醛樹脂係經由用酚類(諸如苯酚、甲酚和烷基 酚)與甲醛在酸觸媒下反應而得)。可以使用其中至少一類 型。較佳者為曱酚系酚醛型環氧樹脂和苯酚系酚醛型環氧 樹脂。 上述不飽和一元緩酸的例子包括在化合物(I -1 - i)中 作為烯型不飽和酸所例舉者。不飽和一元叛酸較佳者為(曱 , 基)丙烯酸。 \ 上述酯化反應可為完全酯化或部分自旨化。較佳者為完 全酯化。 上述多元酸酐的例子包括二元酸酐,諸如順丁烯二酸 肝、丁二酸酐、分解烏頭酸酐(itaconic acid anhydride)、 酉太酸酐、四氫S太酸酐、六氫i太酸酐和甲基六氫1大酸酐;及 芳族多官能羧酸酐,諸如偏苯三甲酸酐、均苯四甲酸酐和 二苯基酮四曱酸二酐。可以使用其中至少一類型。較佳者 為四氫駄酸酐和六氳S太酸酐。 12 320584 200918585 . 對於與上述多元酸酐的反應,較佳地為每一所產生的 羥基使用0. 15莫耳(mol)或更多的多元酸酐。 樹脂(1-1)的另一例子包括(I-1-iv),其係經由用(甲 .基)丙烯酸烷基酯/(曱基)丙烯酸環氧丙酯共聚物與(甲基) 丙烯酸反應及將該共聚物進一步與飽和或不飽和多元酸酐 反應而得者。 (曱基)丙烯酸烷基酯的例子包括在化合物(丨 — 丨 — i)的 說明中作為“另一單體”所例舉者。 在上述共聚物的製備中(曱基)丙烯酸烷基酯與(甲基) 丙浠酸環氧丙酯的混合比例較佳者為4〇 : 6〇至: 2〇莫耳 比。 上述共聚物較佳地具有5000至70000 (特別者,10000 至50000)之平均分子量。 上述多元酸酐的例子包括在化合物— 的說明 中所例舉者。 化合物(I-Ι-iv)可以使用與化合物(n-iii)相同的 方式製備。 樹脂(1-1)的其他例子包括(1-1 _v),其係經由用(曱基) 丙烯酸羥基烷基酯、(甲基)丙烯酸烷基酯和(曱基)丙烯酸 裱氧丙酯的共聚物與(甲基)丙烯酸反應及將該共聚物進一 步與飽和或不飽和多元酸酐反應而得者。 於(甲基)丙烯酸羥基烷基酯中,該羥基烷基較佳者為 具有一級羥基的C1至C6脂族烴基。(甲基)丙烯酸羥基烷基 酯的具體例子包括丙烯酸2-羥基乙基酯和曱基丙烯酸2_羥 320584 13 200918585 • 基乙基醋。可以使用其中至少一類型。 (甲基)丙婦酸院基酯的例子包括在化合物的 說明中作為“另一單體”所例舉者。 在上述共承物的製備中(曱基)丙烯酸經基烧基酯、(曱 基)丙烯酸烷基酯與(曱基)丙烯酸環氧丙醋的混合比例較 佳者為10至50:10至70:20至60(特別者,15至30:3〇至5〇: 30至50)莫耳比。 上述共聚物較佳地具有10000至7〇〇〇〇 (特別者,2〇〇〇〇 至60000)之平均分子量。 上述多疋酸酐的例子包括在化合物的說明 中所例舉者。 化合物(M-v)可以使用與化合物(I-1-iii)相同的方 式製備。 樹脂(1-1)的其他例·子包括(M_vi),其係經由用分子 内具有至少兩個環氧基的多官能環氧化合物、不飽和一元 賴及分子内具有至少兩個經基和另一反應性基的化合物 (後文中也稱為含羥基/反應性基的化合物)之反應產物與 飽和或不飽和多元酸酐反應而得者。 上述夕s能環氧化合物的例子包括在化合物— 的說明中所例舉者。 、上述不飽和一元羧酸的例子包括在化合物(I-1-i)中 作為婦型不飽和酸所例舉者。 一於上述合經基/反應性基的化合物中,該反應性基為可 與環氧基反應的基且為—有別_基的基 。其具體例子包 14 320584 200918585 括含多羥基的一元羧酸,諸如二羥甲基丙酸。可以含有其 中至少一類型。 於上述反應產物的製備中,可以用添加劑形式加入將 _ 在後面說明的光反應性單體做為成分(IV)。 於上述反應產物的製備中,該多官能環氧化合物、不 飽和一元羧酸和含羥基/反應性基的化合物較佳地係以約 0. 8至1. 3(特別者,約〇. 9至1. 1)莫耳的不飽和一元羧酸和 〆 含羥基/反應性基的化合物之總量相對於1當量的該多官能 " 環氧化合物所具環氧基之比例彼此反應。再者,相對於1 莫耳的不飽和一元羧酸和含羥基/反應性基的化合物之總 畺,含起基/反應性基的化合物的量較佳地為〇· 至〇· 5(特 別者,約0. 1至〇· 3)莫耳。 於上述反應產物的製備中,有關其反應條件,其反應 溫度可為60至150。〇且其反應時間可為5至60小時。 上述多元酸酐的例子包括在化合物(I —1_丨丨丨)的說明 中所例舉者。 上述夕元酸酐與該反應產物的反應較佳地係以〇 1至 9當置的多元酸酐對每一當量的上面所製備之反應產物 之羥基的反應比例在6 0至15 (TC反應1至1 〇小時。 樹脂(1-1)的其他例子包括:(M—Vii)一種含不飽和 基的多羧酸樹脂。其具體例子包括經由用不飽和多元酸酐 (順丁烯二酸酐或類似者)與含乙烯基的芳族烴(苯乙烯或 類似者)之共聚物與(甲基)丙烯酸羥基烷基酯反應所得者。 上述(曱基)丙烯酸羥基烷基酯的例子包括在化合物 320584 15 200918585 (Ι-l-v)的說明中所例舉者。 樹脂(Μ)的其他例子包括一種含不飽和 基的多羧酸胺基甲酸酯樹脂。其具體例子包括經由用在上 述(I-1-V1)中所述的反應產物、飽和或不飽和多元酸酐與 含不飽和基的一元異氰酸酯反應所得反應產物。 上述多元酸酐的例子包括在化合物的說明 中所例舉者。 上述含不飽和基的一元異氰酸酯之具體例子包括經由 用甲基丙烯醯基異氰酸酯、甲基丙烯醯氧基乙基異氰酸酯 或有機二異氰酸酯(甲苯二異氰酸醋、二曱苯二異氰酸酯、 異佛酮二異氰酸酯、六亞甲基二異氰酸酯或類似者)與分子 内具有一個羥基的(甲基)丙烯酸酯[(曱基)丙烯酸羥基乙 基酯和(甲基)丙烯酸羥基丙基酯或類似者]以大約等莫耳 比例反應所得反應產物或類似者。 首先,將在上述(Ι-I-Vi)中所述反應產物與多元酸酐 以與上述(I-l-vi)相同的方式反應以製備化合物 (I 1 vi i i)。然後’將含不飽和基的一元異氰酸酯以〇. 至〇. 5當量對每丨當量的如此所得樹脂内的羥基之反應比例 在60至100DC反應5至15小時以製備化合物(H-viii)。 樹脂(1-1)的其他例子包括:d-i-ix)一種環氧樹脂的 不飽和脂肪酸部分加成物。 此等化合物(I-1-ix)的例子包括在例如’日本專利申 明公開第2003-105061號中所述光-熱固性樹脂組成物中之 ‘‘環氧樹脂的不飽和脂肪酸部分加成物”(較佳者,將不餘 320584 16 200918585 和脂肪酸加成職㈣料的魏樹 2〇至獅,特別者40至60%所得者)。 魏基…數的 化合物(1-1 —ix)的且 (甲基)丙烯酸的加成物例子包括紛盤型環氧樹脂與 ^ ,, .,,本酚糸酚醛型環氧樹脂的20至80% ::甲酚系酚醛型環氧樹脂的40至60%丙烯酸 物·雔辂Α私苯基甲鴕型%氧樹脂的4〇至6〇%丙烯酸加成 物:二_展氧樹腊的_甲基丙稀酸加成物; :哀么7細刪環氧樹脂的2〇至m甲基丙烤酸加成 物,和祕㈣_環氧樹脂的舰m巴豆酸加成物。. 有關樹脂(1-1),較佳者為化合物(I—w)、(H一㈨ 和(I-1-v) 〇 代地’有關樹脂(H),從黃化抗性的觀點來看,較 佳者為分子料具有芳環者。料魅α-υ係經由使用不 ^壤者.作為,例如製備原料而得。#代地,在使用具有 方&者作為製備原料之時,係麵脂(卜的製程_之任何 步,例如在製㈣起始、中間或最後步驟,將芳環適當 地氫化而得樹脂(1-1)。 成77 (I)的其他例子包括(丨—2)熱固性樹脂。有關樹脂 (1-2) ’從諸如熱固性質和硬化膜的性質等觀點來看,輕佳 =為分子内具有至少兩個環氧基的環氧化合物。替代地, 其平均分子量較佳地為3G眩謂Q(制者,35Q至·〇〇)。 η I ^等樹脂(1-2)的具體例子包括雙分s型環氧樹脂、雜 氧樹脂、雙酚型環氧樹脂、聯苯型環氧樹脂、四一 袞氧丙基一甲苯甲醯基乙烷樹脂、(氫化)雙酚A型環氧樹 320584 17 200918585 .脂、雙酚F型環氧樹脂、 氧樹脂、雙酚A的酚醛型俨、%氧樹脂、苯酚系酚醛型環 胺基的環氧樹脂、經橡;^脂、钳合物型環氣樹脂、含 _紛型環氧樹脂、_改質F % _脂、二環戊二埽苯 脂。可以使用其中至少脂與卜己内酉旨改質環氧樹 材。— 1::Γ者)表面處理及/或有:(長:烧 =偶合劑或類似者)表面處理。表面 機填=的可濕性、分散性和表面光澤或類似者。乂改善無 成/刀(II)的例子包括著色劑、特別是白 顏料的平均粒徑較佳地為例如0.01至2 0(特別者該白 ::::)微米。當該白色顏料的平均粒徑 二 1 遮敝性質可能惡化而減低反射性 2膜的 的平均粒徑過大時,被覆臈的田該白色顏料 減低被覆膜的物理性f。、、、::度可能增加因而 鹽、鹼具,例子包括氧化敛、氧化辞、驗式碳酸 知式仏錯、硫酸錯、硫化鋅和氧化録。可以使用1 類型。從著色強度和無毒性的觀點來看,較佳者 =強 由於氧化欽或類似者 性且在無表面處理中具有減低的耐熱性耐候 表面處理。乂 土錢用上述無機金屬氧化物對氧化鈦施以 成分⑼的其他例子包括導熱性材料。該導熱性材料 320584 18 200918585 較佳地具有1· 〇或更大( 係數。當該熱導係數過::者:1;0至5°_/m.K)的熱導 射。替代地,該_“1,阻龍可能制g的熱輕 f+ 料較佳地具有顆粒或粉末形式。 該十均拉徑為例如0.丨至 均粒徑過小時,流動性可it者,〇.5至5)微米。當該平 ,a. 減低而使高裝填比難以達成。 而減低被二:=大時’表面不均勻度可能增加因 土)導^生材料的具體例子包括由氧化物諸如氧化!呂(礬 /二氧化鈹;氮化物諸如氮脑、氮化朴氮化 :::化物諸如碳化石夕;金屬諸如銅、銀和焊劑;與鑽石; 所製成的粉末。可以使用其中至少一類型。 于'了上述之外’成分⑴)的具體例子包括滑石;硫酸 曰、<<太酉夂鋇’石夕石類,諸如氧化石夕粉末、細粉氧化石夕、非 晶㈣石、溶融石夕石和晶體石夕石;由黏土、礙酸鎮、鈦酸 i :炭敲鈣、矽酸鈣、氫氧化鋁、氫氧化鎂、硼酸鋅、鉬 酸鋅:氫氧化鋅、雲母、雲母粉、鈹土、錯土、錯英石、 '欖石塊滑石、尖晶石、富銘紅柱石和氧化欽或類似 ,所製成的粉末;或經由將彼等製成球狀所得珠粒;由彼 等所衣成的中空珠粒;與玻璃纖維或類似者。可以使用其 中至少一類型。 在需要對硬化膜施加高光反射性之時,白色顏料較佳 地係以成分(Π)之形式包含在内。當該硬化性樹脂組成物 特別地為白色印刷線路板所用的阻劑油墨之時,白色顏料 的含量為相對於整個硬化性樹脂組成物之5至80(特別者, 19 320584 200918585 l〇至70)重量%。其*士®盔,s a Z$可將具有40微米的膜厚度之 硬化膜所具先错反射率增加到_或更高。 曰代地在對硬化膜施加 11 ^ ^ ^ .脂組成物較佳地含有該導熱性材;=::=樹 化性樹脂組成物特別地為安穿 ,、、、刀 田“硬 ‘所用阻劑油墨之時,該牛的印刷線路板 •整個硬化性樹脂組成物之5、至8=的含置較佳地為相對於 心士旲Am, (特別者’ 10至70)重量%。 之=:可將所得硬化膜的熱導係數增加到ι.。或更 替代地,在對硬化膜同時施加高光反射率和 時,該硬化性樹脂組成物較佳地含有該白色顏料和' 材料兩者作為成分⑴)。該白色顏料和導熱性材料的:含 量較佳地為㈣於整個硬化性㈣組成物之嶋 者,10至70)重量%。 特別 根據本發明的硬化性樹脂組成物包含(III)有機填充 ,。經由添加成分(ΠΙ),可以增強硬化膜的破裂抗性。、此 等成分(III)具有1至2GGG[較佳者,丨至哪(更彳 100)](MPa)的彈性模量及_至1()(較佳者,^ ’ 的平均粒徑。當彈性模量過小之時,焊劑耐熱性錢 因而使物理性質惡化。相反地,當彈性模量過大之日士 : 能減低破裂抗性效用。當平均粒徑過小之時,有I 對成分(I)的分散性會減低。相反地,當平均粒經過大之 時’傾向於減低硬化膜的破裂抗性、電絕緣性與焊劑耐熱 性。於本發明中,有機填充材和無機填充材個別的平均才: 320584 20 200918585 HORIBA, Ltd. 徑係利用雷射散射粒度分布分析儀(La〜91q 的產品)予以測定。 此等成分(Π〗)的例子包括橡膠粒年± 丨卞。較佳者,從硬化 膜的破裂抗性、焊劑耐熱性與電絕緣性洗^ 二θ祕, 來改或頬似者的觀點看 來,該橡膠粒子的,、體例子包括石夕酉同型聚合物(特別者,石夕 酮橡膠)粒子和丙烯酸系聚合物(特別者, 紅/ g 粒子。特別者’彼等的核殼型粒子為特別較佳者。從黏著 強度和低應力效應的增強之觀點看來,較佳者為具有用似t 化 / (4) Η) can be obtained, for example, by the acid group-containing acrylic resin and the (4) and compound containing a lipid & epoxy group and / or oxetan group at about 2 ◦ It is prepared by reacting under the reaction conditions of about 1 to 5 hours. In the compound (ι-1-i), the number of the unsaturated groups per 1000 average molecular weight is preferably from 至·2 to 4.0 (particularly, 〇. 7 to 3.5). When the number of unsaturated groups is too small, the hardenability of the film may be insufficient to exhibit a poor (four) property to the material to be coated and a poor water or coffee. Conversely, when the number of t-rich t groups is too large, the addition of an acid group-containing acrylic resin to an unsaturated compound containing a sulfhydryl group and an oxetan group containing a ruthenium group The unsaturated compound containing an alicyclic epoxy group and/or an oxetane group may be thickened and gelled. Alternatively, the compound preferably has an average molecular weight of from 1 Torr to 1 Torr (particularly, from 3,000 to 70,000). When the molecular weight of the compound (b) is too small, the film may have poor water resistance. Conversely, when the babies are too large, compounds with high viscosity (di- 丨-丨) are not convenient to handle. Furthermore, the film may have deteriorated film thickness properties and have poor adhesion properties to the water resistant material to be coated. Further, the compound [I-1 - i) preferably has an acid value of 3 Torr or less. When the acid value is too large, the financial property has poor water resistance. The compound (I_1~i) is preferably obtained by partially reacting a copolymer of (mercapto)acrylic acid and 10 320584 200918585 alkyl (meth)acrylate with a glycidyl (meth)acrylate. Other examples of the s resin (1-1) include: an alicyclic group-containing epoxy group obtained by polymerizing an unsaturated compound containing an alicyclic epoxy group and/or an oxetanyl group as a basic monomer; / or oxetane resin, the reaction product with an acid group-containing unsaturated compound. The alicyclic epoxy group-containing and/or oxetane group-containing resin as a raw material for the preparation of the compound (I-1-ii) is via an alicyclic group-containing epoxy group and/or oxygen which will serve as a basic monomer. A heterocyclic butane-based unsaturated compound is obtained by polymerization. Specific examples thereof include a homopolymer of an unsaturated compound containing an alicyclic epoxy group and/or an oxocyclic group, and an unsaturated compound containing an alicyclic epoxy group and/or an oxetanyl group. Copolymer with "other-monomer" #. At least one of these types can be used. Examples of the unsaturated compound 4 containing an alicyclic epoxy group and/or an oxocyclohexane and the above 3-monomeric monomer include those exemplified in the description of the compound (I-1-i). Further examples of the acid group-containing unsaturation of the raw material include a compound having an unsaturated group and an acid group in the molecule. Specific examples of the acid group-containing compound and the compound include (meth) = 夂, (^ base) 2-carboxyethyl acrylate, (meth)acrylic acid 2 - propyl propyl vinegar and maleic anhydride. At least one type can be used. The fennel (1 1 u) can be For example, the alicyclic epoxy group-containing resin is reacted with the acid group-containing non-fresh compound under the conditions of ',, coffee, and about (1) hours. 320584 11 200918585 . In Il-ii), the number of the unsaturated groups per 1000 is preferably from 0.2 to 4.0 (particularly, from 0.7 to 3.5), and the average molecular weight thereof is preferably 1,000. To 100000 (particularly, 3000 to 70,000). Other examples of the resin (1-1) include (I-1-iii), which has a The epoxy group of the less than two epoxy group-containing polyfunctional epoxy compound is esterified with the carboxyl group of the unsaturated monocarboxylic acid, and further, the resulting radical is reacted with a saturated or unsaturated polybasic acid anhydride. Specific examples of the above polyfunctional epoxy compound include a novolac type epoxy resin (for example, by reacting with a phenol resin and epichlorohydrin and/or methyl epichlorohydrin via a phenol (such as phenol) , cresol and alkylphenol) and formaldehyde are reacted under an acid catalyst. At least one of them may be used. Preferred are an anthracene phenolic epoxy resin and a phenolic novolac epoxy resin. Examples of the saturated monobasic acid include those exemplified as the ethylenically unsaturated acid in the compound (I -1 - i). The unsaturated monobasic acid is preferably (fluorenyl) acrylic acid. It is fully esterified or partially self-contained. It is preferably fully esterified. Examples of the above polybasic acid anhydride include dibasic acid anhydride such as maleic acid, succinic anhydride, itaconic acid anhydride, 酉太Anhydride, tetrahydro S too anhydride, hexahydro i-anhydride, and methylhexahydrogen 1 major anhydride; and aromatic polyfunctional carboxylic anhydrides such as trimellitic anhydride, pyromellitic anhydride, and diphenyl ketone tetradecanoic acid The anhydride may be used. At least one of the types may be used. Preferred is tetrahydrophthalic anhydride and hexamethylene s-acid anhydride. 12 320584 200918585. For the reaction with the above polybasic acid anhydride, preferably 0.15 for each hydroxyl group produced. Molar (mol) or more polybasic acid anhydride. Another example of the resin (1-1) includes (I-1-iv) via alkyl (meth) acrylate / (fluorenyl) acrylate The reaction of the glycidyl ester copolymer with (meth)acrylic acid and further reacting the copolymer with a saturated or unsaturated polybasic acid anhydride. Examples of the (mercapto)alkyl acrylate include those exemplified as "another monomer" in the description of the compound (丨 - 丨 - i). In the preparation of the above copolymer, the mixing ratio of the alkyl (meth) acrylate to the (meth) propionate propyl acrylate is preferably 4 〇 : 6 〇 to 2 〇 mol ratio. The above copolymer preferably has an average molecular weight of from 5,000 to 70,000 (particularly, from 10,000 to 50,000). Examples of the above polybasic acid anhydrides include those exemplified in the description of the compound. The compound (I-oxime-iv) can be produced in the same manner as the compound (n-iii). Other examples of the resin (1-1) include (1-1 -v) which is via a hydroxyalkyl (meth) acrylate, an alkyl (meth) acrylate, and a nonyl propyl (meth) acrylate. The copolymer is reacted with (meth)acrylic acid and the copolymer is further reacted with a saturated or unsaturated polybasic acid anhydride. In the hydroxyalkyl (meth) acrylate, the hydroxyalkyl group is preferably a C1 to C6 aliphatic hydrocarbon group having a primary hydroxyl group. Specific examples of the hydroxyalkyl (meth) acrylate include 2-hydroxyethyl acrylate and methacrylic acid 2 hydroxy 320584 13 200918585 • ethyl vinegar. At least one of these types can be used. Examples of the (meth)-propyl acetoate ester include those exemplified as "another monomer" in the description of the compound. In the preparation of the above-mentioned co-support, the mixing ratio of the (mercapto)acrylic acid via the base alkyl ester, the alkyl (meth) acrylate and the (meth) acrylic acid propylene vinegar is preferably from 10 to 50:10 to 70:20 to 60 (specially, 15 to 30:3 to 5:30 to 50) Moerby. The above copolymer preferably has an average molecular weight of 10,000 to 7 Å (particularly, 2 Å to 60,000). Examples of the above polyphthalic anhydride include those exemplified in the description of the compound. The compound (M-v) can be produced in the same manner as the compound (I-1-iii). Other examples of the resin (1-1) include (M_vi) by using a polyfunctional epoxy compound having at least two epoxy groups in the molecule, an unsaturated monobasic group, and at least two mercapto groups in the molecule. The reaction product of another reactive group compound (hereinafter also referred to as a hydroxyl group/reactive group-containing compound) is reacted with a saturated or unsaturated polybasic acid anhydride. Examples of the above-mentioned s-energy epoxy compound include those exemplified in the description of the compound. Examples of the above unsaturated monocarboxylic acid include those exemplified as the cation-type unsaturated acid in the compound (I-1-i). In the above-mentioned permeating group/reactive group-containing compound, the reactive group is a group reactive with an epoxy group and is a group having a different group. A specific example thereof is a package comprising a polyhydroxyl-containing monocarboxylic acid such as dimethylolpropionic acid. It may contain at least one of the types. In the preparation of the above reaction product, a photoreactive monomer which will be described later may be added as a component (IV) as an additive. 5至特别的约约9. 9 (1) (Specially, about 〇. 9). The polyfunctional epoxy compound, the unsaturated monocarboxylic acid, and the hydroxyl group-reactive group-containing compound is preferably about 0.8 to 1.3. To a total of 1. 1) the molar amount of the unsaturated monocarboxylic acid and the hydrazine-containing/reactive group-containing compound of the molar react with each other with respect to 1 equivalent of the epoxy group of the polyfunctional < epoxy compound. Further, the amount of the compound having a starting group/reactive group is preferably from 〇· to 〇·5 with respect to the total oxime of the 1 molar unsaturated monocarboxylic acid and the hydroxyl group-reactive group-containing compound. , about 0. 1 to 〇 · 3) Moer. In the preparation of the above reaction product, the reaction temperature may be from 60 to 150 depending on the reaction conditions thereof. The reaction time can be from 5 to 60 hours. Examples of the above polybasic acid anhydrides include those exemplified in the description of the compound (I-1_丨丨丨). The reaction of the above oxime anhydride with the reaction product is preferably carried out by reacting a polybasic acid anhydride of 〇1 to 9 with respect to the hydroxyl group of each equivalent of the reaction product prepared above at 60 to 15 (TC reaction 1 to Other examples of the resin (1-1) include: (M-Vii) a polycarboxylic acid resin containing an unsaturated group, and specific examples thereof include the use of an unsaturated polybasic acid anhydride (maleic anhydride or the like). And a copolymer of a vinyl group-containing aromatic hydrocarbon (styrene or the like) and a hydroxyalkyl (meth)acrylate. The above-mentioned (hydroxy) hydroxyalkyl ester is exemplified in the compound 320584 15 Other examples of the resin (Μ) include a polycarboxylic acid urethane resin containing an unsaturated group, and specific examples thereof include the use of the above (I-1). a reaction product obtained by reacting a reaction product, a saturated or unsaturated polybasic acid anhydride described in -V1) with a monobasic isocyanate containing an unsaturated group. Examples of the above polybasic acid anhydride include those exemplified in the description of the compound. one of Specific examples of the isocyanate include via methacrylic acid isocyanate, methacryloxyethyl isocyanate or organic diisocyanate (toluene diisocyanate, dinonyl diisocyanate, isophorone diisocyanate, hexamethylene a base diisocyanate or the like) with a (meth) acrylate [(hydroxy) hydroxyethyl acrylate and a hydroxypropyl (meth) acrylate or the like having a hydroxyl group in the molecule at an approximate molar ratio The reaction product obtained by the reaction or the like. First, the reaction product and the polybasic acid anhydride in the above (Ι-I-Vi) are reacted in the same manner as in the above (Il-vi) to prepare a compound (I 1 vi ii). Then, the unsaturation-containing monoisocyanate is reacted at a ratio of 5 equivalents per hydrazine equivalent of the hydroxyl group in the thus obtained resin at 60 to 100 DC for 5 to 15 hours to prepare a compound (H-viii). Other examples of the resin (1-1) include: di-ix) an unsaturated fatty acid partial adduct of an epoxy resin. Examples of such a compound (I-1-ix) include an unsaturated fatty acid partial addition product of an epoxy resin in a photo-thermosetting resin composition as described in Japanese Patent Laid-Open Publication No. 2003-105061. (Better, there will be no more than 320584 16 200918585 and the addition of fatty acids to the four (four) materials of Wei Shu 2 to the lion, especially 40 to 60% of the income). Weiji...the number of compounds (1-1 -ix) Further, examples of the (meth)acrylic acid addition product include a platy type epoxy resin and 20,80% of the phenolphthalein type epoxy resin: 40 of a cresol novolac type epoxy resin. 4% to 6〇% acrylic acid adduct of 60% acrylic 雔辂Α phenyl hydrazine type oxy-type resin: _ methacrylic acid adduct of bis-oxo-bar wax; 7 finely deleted epoxy resin 2〇 to m methyl propyl baking acid addition, and secret (4) _ epoxy resin ship m crotonic acid addition. Related resin (1-1), preferably compound (I-w), (H-(9), and (I-1-v) 〇代地' related resin (H), from the viewpoint of yellowing resistance, it is preferred that the molecular material has an aromatic ring. - The system is not used by As a raw material, for example, in the preparation of raw materials, when using a square & as a raw material for preparation, the surface fat (any process of the process), for example, in the beginning, middle or In the final step, the aromatic ring is appropriately hydrogenated to obtain a resin (1-1). Other examples of the 77 (I) include (丨-2) thermosetting resin. The related resin (1-2) 'from thermosetting properties and a cured film From the viewpoint of the nature and the like, light weight = an epoxy compound having at least two epoxy groups in the molecule. Alternatively, the average molecular weight thereof is preferably 3G glare Q (manufacturer, 35Q to 〇〇). Specific examples of the resin (1-2) such as η I ^ include a double-part s type epoxy resin, a hydrogen oxy-resin, a bisphenol-type epoxy resin, a biphenyl type epoxy resin, and tetradecyloxypropyltoluene formazan. Ethylene resin, (hydrogenated) bisphenol A type epoxy tree 320584 17 200918585 . Grease, bisphenol F type epoxy resin, oxygen resin, phenolic type bismuth bisphenol, % oxygen resin, phenolic novolac type cyclic amine Base epoxy resin, rubber, grease, clamp type ring gas resin, containing _ type epoxy resin, _ modified F% _ lipid, dicyclopentane Benzene can be used. It can be used at least in the form of a surface treatment and/or with: (long: burning = coupling agent or the like). Surface machine fill = wettability, dispersibility and surface gloss or the like. Examples of the improvement of the non-forming/knife (II) include the average particle diameter of the colorant, particularly the white pigment, preferably, for example, 0.01 to 2 0 (Specially, the white::::) micron. When the average particle diameter of the white pigment is 1 and the concealing property may deteriorate and the average particle diameter of the reflective 2 film is too large, the white pigment of the coated field is reduced. The physical property of the film. , , , ::: may increase the salt and alkali, examples include oxidation, oxidation, hydrogenation, sulfuric acid, zinc sulfide and oxidation. You can use 1 type. From the viewpoint of coloring strength and non-toxicity, preferred = strong due to oxidation or the like and having a reduced heat-resistant weathering surface treatment in the absence of surface treatment. Other examples in which the above-mentioned inorganic metal oxide is used to apply the component (9) to the titanium oxide include a thermally conductive material. The thermally conductive material 320584 18 200918585 preferably has a thermal conductivity of 1·〇 or greater (coefficient. When the thermal conductivity is over: :1; 0 to 5°_/m.K). Alternatively, the heat-light f+ material which may be made of g. preferably has a particle or powder form. The ten-average diameter is, for example, 0. 丨 until the average particle diameter is too small, and the fluidity can be 〇.5 to 5) microns. When the level is flat, a. is reduced and the high packing ratio is difficult to achieve. And the reduction of the second: = large 'surface unevenness may increase due to soil' specific examples of materials including Oxides such as oxidation! Lu (矾/二2; nitrides such as nitrogen brain, nitrided nitride::: such as carbonized carbide; metals such as copper, silver, and flux; and diamonds; At least one of them may be used. Specific examples of the component (1) other than the above include talc; barium sulfate, <<Taiwan' Shishi stone, such as oxidized stone powder, fine powder oxidized stone Xi, amorphous (four) stone, molten stone stone and crystal stone stone; from clay, acid-stained town, titanic acid i: carbon knocking calcium, calcium citrate, aluminum hydroxide, magnesium hydroxide, zinc borate, zinc molybdate: Zinc hydroxide, mica, mica powder, bauxite, wrong soil, wrong stone, 'lumite talc, spinel, Fuminghong a powder made of sulphate and oxidized or similar, or a bead obtained by making them spherical; hollow beads coated by them; and glass fibers or the like. At least one type may be used. When it is desired to apply high light reflectivity to the cured film, the white pigment is preferably contained in the form of a component (Π). When the curable resin composition is particularly a resist ink for a white printed wiring board The content of the white pigment is from 5 to 80 (particularly, 19 320584 200918585 l〇 to 70)% by weight relative to the entire curable resin composition. Its *shi® helmet, sa Z$ can have a film of 40 μm The thickness of the cured film has a first error reflectance increased to _ or higher. Deuterated application of 11 ^ ^ ^ to the cured film. The fat composition preferably contains the thermally conductive material; =:: = tree resin The composition is particularly for the wearer's ink, which is used for the "hard" of the knife field, and the printed circuit board of the cow is preferably in the form of 5 to 8 = of the entire curable resin composition. Yu Xinshi, Am, (specially '10 to 70% by weight). =: The thermal conductivity of the resulting cured film can be increased to ι. Or, alternatively, when a high light reflectance is applied to the cured film at the same time, the curable resin composition preferably contains both the white pigment and the 'material as the component (1)). The white pigment and the thermally conductive material preferably have a content of (iv) from 10 to 70% by weight based on the entire hardenability (IV) composition. Particularly, the curable resin composition according to the present invention contains (III) an organic filler. The crack resistance of the cured film can be enhanced by the addition of the component (ΠΙ). These components (III) have an elastic modulus of 1 to 2 GGG [preferably, 丨 to (more than 100)] (MPa) and an average particle diameter of _ to 1 () (preferably, ^ '. When the modulus of elasticity is too small, the heat resistance of the flux deteriorates the physical properties. Conversely, when the modulus of elasticity is too large, the effect of the fracture resistance can be reduced. When the average particle size is too small, there is a component I ( The dispersibility of I) is reduced. Conversely, when the average particle is large, it tends to reduce the crack resistance, electrical insulation and solder heat resistance of the cured film. In the present invention, the organic filler and the inorganic filler are individually Average: 320584 20 200918585 HORIBA, Ltd. The diameter of the HORIBA, Ltd. is measured using a laser scattering particle size analyzer (product of La~91q). Examples of such components (Π) include rubber particles ± 丨卞. From the point of view of the rupture resistance of the cured film, the heat resistance of the solder, and the electrical insulating property, the rubber particles, the body examples include the diarrhea homopolymer ( In particular, linaloic rubber) particles and acrylic polymers (special , Wine / g of particles, especially by 'their core-shell particles are particularly preferred from the viewpoint of enhancing the adhesive strength and low stress effects seem, preferably those having a similar

橡膠聚合物製成的核部分與用其玻螭轉移溫度(Tg)高於此 似橡膠聚合物所具Tg之似玻璃聚合物製成的殼部分的核殼 型橡膠粒子。更佳者,從進一步增強與樹脂(特別者,環氧 樹脂)組成物的相容性和分散性之觀點看來,形成殼部分的 聚合物係部分含有官能基(諸如羧基、羥基和環氧基)。 成分(I11)的其他例子包括由交聯聚甲基丙烯酸甲酯. 和交聯聚甲基丙烯酸丁醋或類似者所製成的樹脂粒子。交 聯聚曱基丙烯酸甲酯係經由’例如,於需要時在交聯性單 體之存在中’對甲基丙烯酸甲酯單體施以乳液聚合和懸浮 聚合而得。該交聯不會造成在熱塑性中所顯示的快速彈性 模量變化,且會造成高财熱性和增進的熱性質。 於根據本發明的硬化性樹脂組成物中可以進一步添加 成分(II)和(ΠΙ)以外的填充材,例如,消泡劑、脫模劑、 整飾劑、阻燃劑、黏度調節劑、增塑劑、抗微生物劑、抗 真菌劑、調平劑、安定劑、偶合劑和抗氧化劑或類似者。 於根據本發明的硬化性樹脂組成物中可以進一步添加 21 320584 200918585 稀釋劑。稀釋别的例子包括有機溶劑。有機溶劑的例子包 括酮類,諸如曱基乙基_和環己酮;芳族烴類,諸如甲苯、 -二曱苯和四曱基苯,二醇醚類,諸如賽珞蘇(cellosolve)、 .甲基賽珞蘇、丁基赛珞蘇、卡必醇(carbitol)、甲基卡必 醇、丁基卡必醇、丙二醇一甲基醚、二丙二醇一甲基醚、 二丙二醇二乙基醚、和三乙二醇一乙基醚;醋酸酯類,諸 如醋酸乙醋、醋酸丁酷、赛珞蘇醋酸酯、丁基賽珞蘇醋酸 酯、卡必醇醋酸酯、丁基卡必醇醋酸酯、丙二醇一甲基醚 '' 醋酸酯和二丙二醇一甲基醚醋酸酯;醇類,諸如乙醇、丙 醇、乙二醇和丙二醇;脂族烴類,諸如辛烷和癸烷;及石 油溶劑,諸如石油醚、石油腦、氫化石油腦和溶劑石油腦。 可以使用其中至少一類型。 於根據本發明的硬化性樹脂組成物中可以進一步添加 硫醇衍生物。經由添加硫醇衍生物,可以促進硬化反應且 也可增進被覆膜的黏著性質。再者,該硫醇衍生物具有減 ( 低硬化膜的彈性模量之功能,且因此,為一種有效的辅助 材料以增進硬化膜的破裂抗性。此等硫醇衍生物的例子包 括三經甲基丙院三-(3-氫硫基丙酸酯)、季戊四醇四~(3一 鼠马il基丙酸g旨)、.一-季戊四醇六-(3 -氮硫基丙酸i旨)與三· -[C3-氫硫基丙醯氧基)_乙基]異三聚氰酸酯。可以使用其 中至少一類型。 於根據本發明的硬化性樹脂組成物中可以進一步添加 低彈性硬化性樹脂。硬化樹脂的Tg可經由添加低彈性硬化 性樹脂而降低,且結果,硬化膜的破裂抗性可獲得進一步 22 320584 200918585 (特別H硬化性樹脂的彈性模量較佳地為例如1至 2000(Mj者,4i_)(MPa)。 例子包括部分含有官能基(諸如縣、:=^樹月旨的 酸系基和純基)之聚合物。其具體料包_由^ = 能基加到丙烯酸系共聚物的含不飽和基單體所得 系樹脂、矽酮樹脂和橡膠樹脂諸如丁二烯。 烯夂 於根據本發日㈣硬化性樹餘絲之 對於刚重量㈣成分⑴,成分(„)的量為二 佳者,40至lG〇〇)重量份,且相對於⑽重量份的成分乂 成分(ΙΠ)的量為1至100 (触者,5至80)重量份。Ip (II)的量過小時’可能無法對硬化膜施加足夠較大:: 性質(光反射性和熱輻射或類似者)。相反地,當該量過= 牯,流動性可能不良而使塗覆性質和絕緣性質惡化。告成 分(III)的量過小時,可能無法對硬倾施加足夠較^破 裂抗性。相反地,當成分(ΠΙ)的量過大時,流動性可能不 良而使塗覆性質惡化。 此 替代地,成分(II)對(III)的含量重量比[亦即,成分 (Π)/成分(丨丨丨”為丨至“(較佳者,5至25)。當該含量重 量比過低時,可能無法對硬化膜施加足夠較大的功能性質 (光反射性和熱輻射或類似者)。相反地,當該含量重量比 過高時,可能無法對硬化膜施加足夠較大的破裂抗性。 根據本發明的硬化性樹脂組成物的例子包括光〜熱固 性樹脂組成物[即,能促成光(特別者,紫外光)硬化和熱硬 化的至少兩階段硬化之樹脂組成物]。此等光—熱固性樹脂 320584 23 200918585 組成物的例子包括(A)樹脂(Μ)和(1-2),成分(II)和 (ΙΠ) ’成分⑽,光反應性單體,⑺光硬化劑,和(^) 熱硬化劑。 成分(IV)的例子包括反應性稀釋劑。其具體例子包括 丙稀酸2-減乙自旨、丙_2—麟乙g|、N_乙烯基t各烧 酮、丙烯《嗎琳、甲氧基四—乙二醇丙烯酸酯、甲氧基聚 乙二醇丙烯酸g旨、聚乙二醇二_丙稀酸酯、N,[二甲基丙稀 酸胺m甲基丙烯醯胺、N,N_二甲胺基丙基丙_胺、 丙烯酸二甲胺基乙基酯、丙烯酸义.二曱胺基丙基 醋、丙烯酸三聚氰胺、二一乙二醇二_丙烯酸醋、三—乙二醇 二-丙烯酸酯、丙二醇二-丙烯酸酯、二_丙二醇二—丙烯酸 酯、二-丙二醇二-丙烯酸酯、聚丙二醇二_丙烯酸酯、丙烯 酸苯氧基乙基g旨、丙烯酸四氫吱喃甲基g旨、丙烯酸環己醋、 甘油二-環氧丙基醚二—丙烯酸酯、甘油三-環氧丙基醚三_ 丙烯酸酯、丙烯酸異莰酯、環戊二烯一_或二—丙烯酸酯、 己一醇、二髮甲基丙燒、季戊四醇、二_三經曱基丙烧、二 -季戊四醇、多羥基醇如三_羥基乙基異三聚氰酸酯或其氧 化乙浠或氧化丙稀加成物的多丙烯酸酯,分別對應於上述 丙烯酸酯的曱基丙烯酸酯、及多元酸的一―、二_、三—或三 或更夕元的多元酯;與(甲基)丙烯酸經基烧基酯。可以使 用其中至少一類型。 成分(V)的具體例子包括乙醢苯類,諸如乙酿苯、g,2_ 二甲氧基-2-苯基乙醯苯、2, 2-二乙氧基-2-苯基乙醯苯、 對二甲胺基丙醯苯、1_羥基環己基苯基酮、2_曱基一一 24 320584 200918585 (甲硫基).苯基]-2-嗎琳-4-基-内户 甲胺基-1-(4-嗎啉-4-基笨基)〜丁1酮、2-苯曱基_2_二 乙醯苯;二苯基酮類,諸如二苯義_及、N,N_二甲胺基 雙-二甲胺基二苯基酮、4, 4,-雙、甲基二苯基酉同、4, 4,-勒酮(Michler,s ketone)及4—^ ^ ^胺基二苯基酮、米其 / i. 硫酸醋;安息香醚類,諸如苯甲鳥j 4 '甲基二苯基亞 喊、安息香乙基醚、安息香異兩二安息香、安息香曱基 縮酉同類,諸如乙醯苯二甲基縮⑽和息香異丁基鍵; ,_(thioxanthones),諸如n塞啦基—曱基縮酮;°塞 ?,田甘^_ 塞噸 _(thi〇xanth〇ne)、 2, 4-一曱基嗟噸酮、2, 4-二乙基噇 4s,n .. 丞塞鳴綱和2, 4-二異丙基噻 ’酮,恩醒類(anthraquinones),哗 ^ .. 请如2-曱基蒽醌、2-乙 ^機過氧化物類,冑如過氧化笨以和過氧化異丙苯;硫 知化合物’諸如2, 4, 5-三芳基“二聚.物、核黃素四—丁酸 _、2-氫硫基苯并料、2-氫硫基笨夠麵2_氳硫基苯 并11 塞唾’氧化雙(2, 4, 6-三曱基苯甲酸基)苯基膦、和三經 曱基丙烷三(3-氫硫基丙酸酯)。可以使用其中至少一類型二 成分(V)可以和至少-種光敏劑組合使用,該光敏劑係 諸如三級胺,諸如苯甲酸N,N-二甲胺基乙基酯、苯甲酸N,N一 一甲胺基異戊基酯、4-二曱胺基苯甲酸戊酯、三乙胺和三 乙醇胺。 成分(VI)的例子包括咪唑衍生物,諸如^米唾、2—甲基 味唾、2-乙基咪唑、2-乙基-4-曱基咪唑、2_苯基味。坐、= 苯基-4, 5-二-羥基甲基咪唑、4-苯基咪唑、丨_氰基乙基_2— 320584 25 200918585 苯基味。坐和1-(2-氰基乙基)-2-乙基〜4_甲基味唆;胍胺 類,諸如脈胺(guanamine)、乙酿胍胺和苯并胍胺;胺化合 物,諸如二氰二胺、苯曱基二曱胺、4_(二曱胺基)_N,N_ 二甲基苯曱胺、4_曱氧基-N’N-二曱基笨甲胺、4_曱基_N,N_ -曱基苯甲胺與二聚氰胺;及三輕甲基丙统三(3_氫硫基丙 酸酉旨)。可以使用其中至少一類型。 於根據本發明的樹脂組成物(A)之混合組成中,諸成分 的量較佳者為下述相對於100重量份的樹脂(^丨)和(1_2) =量的量:成分⑴)的量為顧特別者,赚圆) 重里份’成分(III)的量為G1〇〇(特別者 成,的量為酬特別者,5竭重量:= 的含量重=2至20)重量㈣ 重里比較么地為1至30(特別者,5至25)。 ^據本發明的硬化性聽組絲之其他料包括孰固The core portion of the rubber polymer is a core-shell type rubber particle having a shell portion made of a glass polymer having a glass transition temperature (Tg) higher than that of the rubber polymer. More preferably, from the viewpoint of further enhancing the compatibility and dispersibility with the resin (particularly, epoxy resin) composition, the polymer portion forming the shell portion contains functional groups such as a carboxyl group, a hydroxyl group and an epoxy group. base). Other examples of the component (I11) include resin particles made of crosslinked polymethyl methacrylate. and crosslinked polybutyl methacrylate or the like. The crosslinked polymethyl methacrylate is obtained by subjecting methyl methacrylate monomer to emulsion polymerization and suspension polymerization, for example, in the presence of a crosslinkable monomer as needed. This crosslinking does not cause a rapid elastic modulus change exhibited in the thermoplastic, and causes high heat and enhanced thermal properties. A filler other than the components (II) and (ΠΙ) may be further added to the curable resin composition according to the present invention, for example, an antifoaming agent, a releasing agent, a finishing agent, a flame retardant, a viscosity modifier, and an increase. Plasticizers, antimicrobials, antifungals, leveling agents, stabilizers, couplers and antioxidants or the like. Further, 21 320584 200918585 thinner may be added to the curable resin composition according to the present invention. Other examples of dilution include organic solvents. Examples of the organic solvent include ketones such as mercaptoethyl and cyclohexanone; aromatic hydrocarbons such as toluene, -bifluorene and tetradecylbenzene, glycol ethers such as cellosolve, Methyl acesulfame, butyl acesulfame, carbitol, methyl carbitol, butyl carbitol, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol diethyl Ether, and triethylene glycol monoethyl ether; acetates such as ethyl acetate, acetoacetate, cyproterone acetate, butyl cyproterone acetate, carbitol acetate, butyl carbitol Acetate, propylene glycol monomethyl ether '' acetate and dipropylene glycol monomethyl ether acetate; alcohols such as ethanol, propanol, ethylene glycol and propylene glycol; aliphatic hydrocarbons such as octane and decane; and petroleum Solvents such as petroleum ether, petroleum brain, hydrogenated petroleum brain and solvent petroleum brain. At least one of these types can be used. A thiol derivative may be further added to the curable resin composition according to the present invention. By adding a thiol derivative, the hardening reaction can be promoted and the adhesion property of the coating film can also be improved. Further, the thiol derivative has a function of reducing (the modulus of elasticity of the low-hardening film, and therefore, is an effective auxiliary material to promote the fracture resistance of the cured film. Examples of such thiol derivatives include three-menu Methyl propyl tris-(3-hydrothiopropionate), pentaerythritol tetra-(3-murine il-propionic acid g), mono-pentaerythritol hexa-(3-azinothiopropionic acid) And tris-[C3-hydrothiopropylpropoxy)-ethyl]iso-cyanate. At least one of them can be used. A low elastic curable resin can be further added to the curable resin composition according to the present invention. The Tg of the hardened resin can be lowered by adding a low elastic curable resin, and as a result, the crack resistance of the cured film can be further obtained 22 320584 200918585 (the elastic modulus of the special H curable resin is preferably, for example, 1 to 2000 (Mj) 4i_) (MPa). Examples include polymers partially containing functional groups such as acid groups and pure groups of the county, and the specific package is added to the acrylic system by ^ = energy group. The unsaturated resin-containing monomer of the copolymer is obtained as a resin, an anthrone resin, and a rubber resin such as butadiene. The olefin is used in the hardening tree according to the present invention (4) for the weight (4) component (1), the component („) The amount is two to 40 parts by weight, and the amount of the component ΙΠ component (ΙΠ) relative to (10) parts by weight is from 1 to 100 (contact, 5 to 80) parts by weight. Ip (II) When the amount is too small, it may not be possible to apply a sufficiently large thickness to the hardened film:: properties (light reflectivity and heat radiation or the like). Conversely, when the amount is over 牯, the fluidity may be poor to cause coating properties and insulating properties. Deterioration. If the amount of ingredient (III) is too small, it may not be able to apply enough to the hard Conversely, when the amount of the component (ΠΙ) is too large, the fluidity may be poor to deteriorate the coating property. Alternatively, the content ratio of the component (II) to the (III) is [that is, The component (Π)/component (丨丨丨) is 丨 to “(preferred, 5 to 25). When the weight ratio is too low, sufficient functional properties (light reflectivity) may not be applied to the cured film. And heat radiation or the like. Conversely, when the content by weight ratio is too high, it may not be possible to apply sufficiently large crack resistance to the cured film. Examples of the curable resin composition according to the present invention include light to thermosetting resin a composition [i.e., a resin composition capable of causing at least two-stage hardening of light (particularly, ultraviolet light) hardening and thermosetting]. Such light-thermosetting resins 320584 23 200918585 Examples of the composition include (A) resin (Μ) And (1-2), component (II) and (ΙΠ) 'component (10), photoreactive monomer, (7) light hardener, and (^) heat hardener. Examples of component (IV) include reactive diluent Specific examples include acrylic acid 2-reduction B, C 2—Linyi g|, N_vinyl t ketone, propylene “Merlin, methoxytetraethylene glycol acrylate, methoxypolyethylene glycol acrylate, polyethylene glycol propylene Dilute ester, N, [dimethyl methacrylate m methacrylamide, N, N dimethylaminopropyl propyl amine, dimethylaminoethyl acrylate, acrylonitrile. Propyl vinegar, melamine acrylate, diethylene glycol bis-acrylic acid vinegar, tri-ethylene glycol di-acrylate, propylene glycol di-acrylate, di-propylene glycol di-acrylate, di-propylene glycol di-acrylate, Polypropylene glycol di-acrylate, phenoxyethyl acrylate, tetrahydrofurfuryl methyl acrylate, cyclohexyl acrylate, glycerol di-epoxypropyl ether di-acrylate, triglyceride Ethyl ether tri-acrylate, isodecyl acrylate, cyclopentadiene mono- or di-acrylate, hexanol, dimethicone, pentaerythritol, di-tris-propyl mercapto, di-pentaerythritol, Polyhydric alcohols such as tris-hydroxyethyl isomeric cyanurate or polyacrylates of oxidized acetamidine or propylene oxide adducts, respectively Yue acrylate above-mentioned acrylates, and a polybasic acid -, _ two, three - or three or more membered evening polyesters; and (meth) acrylic group via ester burning. At least one of these types can be used. Specific examples of the component (V) include acetophenones such as ethyl benzene, g, 2 - dimethoxy-2-phenyl acetophenone, 2, 2-diethoxy-2-phenyl acetophenone , p-Dimethylaminopropenylbenzene, 1-hydroxycyclohexyl phenyl ketone, 2 曱 一 24 24 320 320584 200918585 (methylthio). phenyl]-2-morphin-4-yl-endo Amino-1-(4-morpholin-4-ylphenyl)-butanone, 2-benzoinyl-2-diethylbenzene; diphenyl ketones, such as diphenyl _ and N, N-dimethylamino bis-dimethylaminodiphenyl ketone, 4, 4,-bis, methyl diphenyl fluorene, 4, 4,- ketone (Michler, s ketone) and 4-^ ^ ^Aminodiphenyl ketone, rice / i. sulphuric acid vinegar; benzoin ethers, such as benzophenone j 4 'methyl diphenyl ya shout, benzoin ethyl ether, benzoin bismuth benzoin, benzoin thiol酉similar, such as acetophenone dimethyl (10) and iso-isobutyl bond; , _ (thioxanthones), such as n-s- syl- fluorenyl ketone; ° plug?, Tian Gan ^ _ ton _ (thi〇xanth 〇ne), 2, 4-indanyl xanthone, 2, 4-diethylindole 4s, n.. 丞 鸣 and 2, 4-diisopropyl thiophene, anthraquinones ) , 哗^ .. Please be like 2-mercaptopurine, 2-ethylperoxide peroxides, such as peroxide and cumene peroxide; sulfur compounds such as 2, 4, 5-triaryl "Dimerization, riboflavin tetra-butyric acid _, 2-hydrogenthio benzoate, 2-hydrosulfanyl benzoate 2 氲 thiobenzobenzene 11 sypene oxidized double (2, 4, 6-trimercaptobenzoic acid)phenylphosphine, and tris-propylpropane propane tris(3-hydrothiopropionate), wherein at least one type of two component (V) can be used in combination with at least one photosensitizer For use, the photosensitizer is such as a tertiary amine such as N,N-dimethylaminoethyl benzoate, N,N-methylaminoisoamyl benzoate, 4-diguanamine benzoic acid pentane Ester, triethylamine and triethanolamine. Examples of the component (VI) include imidazole derivatives such as saponin, 2-methyl sulphate, 2-ethylimidazole, 2-ethyl-4-mercaptoimidazole, 2 _Phenyl taste. Sit, = phenyl-4, 5-di-hydroxymethylimidazole, 4-phenylimidazole, 丨-cyanoethyl_2- 320584 25 200918585 Phenyl taste. Sit and 1-(2 -Cyanoethyl)-2-ethyl~4_methyl miso; guanamines, such as guanamine Ethylamine and benzoguanamine; amine compounds such as dicyandiamide, benzoguanidine diamine, 4_(diguanylamino)_N,N-dimethylbenzamide, 4_decyloxy-N 'N-dimercaptomethylamine, 4_mercapto_N,N_-mercaptobenzylamine and melamine; and tris-methylmethylpropane tris(3-hydrothiopropionate). At least one of these types can be used. In the mixed composition of the resin composition (A) according to the present invention, the amount of each component is preferably the following with respect to 100 parts by weight of the resin ((2) and the amount of (1_2) = amount: component (1)) The quantity is for the special person, earning a round) The amount of the ingredient (III) is G1〇〇 (special amount, the amount is special, 5 times weight: = content is heavy = 2 to 20) weight (four) Compare it to 1 to 30 (particularly, 5 to 25). ^ Other materials of the sclerosing auditory composition according to the present invention include tamping

Cl4 ^ 成刀(Π)、(ΠΙ)和(¥1)者。 的量脂組成物⑻之'合組成中’諸成分 分⑴二==°°重量份的樹㈣之量:成 (III)的量為丨 ' 別者’40至100〇)重量份;成分 的量為0.5至_別=:至8°)重量份;且成分㈤ 和(III)的含量重 60)重量份。替代地,成分(II) 再1 34里重減較佳地為1至別(特別者,5至25)。 再者,根據本發明的硬化性樹脂組成物之括光 320584 26 200918585 ,固性樹餘成物。該光陳樹触成物關子包括⑹一種 含樹脂(1-1)和成分(11)至(V)者。該樹脂組成物⑹可進一 - 步含成分(VI)。 Θ於根據本發明的樹月旨組成物⑹之混合組成中 ,諸成分 的量較佳者為下述相對於HK)重量份的樹脂(H)之量:成 7刀⑴)的里為難12⑽(特別者,仙至酬)重量份;成分 (jll)的里為1至_特別者,5至8())重量份;成分的 广里為1至50(特別者,5至4〇)重量份;且成分⑺的量為工至 40(曰4寸別者,3至30)重量份。替代地,成分(π)對(1⑴的 含量重量比較佳地為1至30(特別者,5至25)。 根據本發明的樹脂組成物(A)可經由,例如,首先用光 二射(波長.300至450奈米(nm),曝光量:2()()JL1酬毫焦/ 平方厘米(mj/cm2))進行初級硬化,然後經由加熱進行二級 硬化(於100至17(TC進行2〇至12〇分鐘)。 根據本發明的樹脂組成物⑻可經由,例如,加熱予以 C硬化(於100至170亡進行20至120分鐘)。 根據本發明的樹脂組成物⑹可經由,例如,用光照射 (波長.300至450奈米,曝光量:2〇〇至1〇〇〇毫焦/平方厘米 (m j/cm2))予以硬化。 热而提及者’該硬化可經由使用至少兩種各具不同反 應起始條件(波長和溫度或類似者)的硬化劑以多階段進 行例如,該熱固化可在初級硬化(於1〇〇至12〇。(3進行1〇 至60分鐘)和二級硬化(於130至17(TC進行20至120分鐘)的 兩階段中進行。 27 320584 200918585 根據本發明的硬化性樹脂組成物也可以應用於任何習 見印刷線路板的阻劑膜覆膜形成方法中。特別者,使用平 滑印刷線路板做為印刷線路板可增強電路的可被覆性且可 以有效地進一步改進可靠性和遮蔽性質(銅電路遮蔽性 質)。 [實施例] 〈光固性樹脂之製備〉 製備例1 於裝配有擾拌器、溫度計、回流冷凝器、滴液漏斗和 氮氣導入管之可拆式燒瓶内,裝入250重量份的二丙二醇一 甲基醚和10重量份的過氧-2-乙基己酸第三丁酯,且將彼等 加熱到95°C。然後將170重量份的曱基丙烯酸、130重量份 的曱基丙烯酸曱酯、250重量份的二丙二醇一曱基醚和10 重量份的偶氮雙(二曱基戊腈)之混合物於4小時期間逐滴-’ 加到瓶中。進一步地,將彼等熟化5小時而得具有羧基的甲 基丙烯酸-甲基丙烯酸曱酯共聚物溶液。接著,於此樹脂溶 液内,在通入7%氧氣-93%氮氣的混合氣體之同時,加入200 重量份的甲基丙烯酸(3, 4-環氧基環己基)曱基酯、2重量份 的三苯膦、和1重量份的氫醌一曱基醚,且在l〇〇°C進行彼 等的加成反應19小時而得含不飽和基的多元缓酸樹脂溶 液。在測量此含不餘和基的多元護酸樹脂之樹脂物理性質 之際,其固體含量為51%,其酸價為105毫克KOH/克;雙鍵 當量為490克/莫耳;且其重量平均分子量Mw(以聚苯乙烯為 準)為 13000。 28 320584 200918585 . 製備例2 於裝配有回流冷凝器、溫度計、氮氣置換用的玻璃管 ^擾摔益之可拆式境瓶内,加人140重量份的甲基丙烯酸環 氧丙酉曰、6〇重置份的曱基丙稀酸曱酉旨、200重量份的卡必醇 酉曰^酉曰0·4重里伤的月桂基硫醇和6重量份的偶氮雙(異丁 -赌)。將彼等在氮氣流中加熱,且在阶聚合5小時而得50% ,、承物/合液於上述5〇%共聚物溶液中,加入〇」重量份的 .氫西昆、74重量份的丙_、和0.4重量份的二甲基苯甲胺, 且在100 C進行彼等的加成反應24小時。然後,於其中加9〇 重量份的四氫酿酸軒和158重量份的卡必醇醋酸醋,且在 100 C令彼等反應3小時而得含不飽和基的多元羧酸樹脂溶 液其具有5(U的固體含量,35〇克/莫耳的雙鍵當量;w 毫克腿/克的酸價及26咖的重量平均分子量(以聚苯乙 浠為準)。 -· 製備例3 於裝配有授拌器和回流冷凝器的四頸燒瓶中,置入犯 重量份的甲紛系轉型環氧樹勝68q,㈣咖⑽㈣Cl4 ^ is a knife (Π), (ΠΙ), and (¥1). The composition of the fat composition (8) is divided into two components: (1) two == ° ° parts by weight of the tree (four): the amount of (III) is 丨 'other '40 to 100 〇) parts by weight; The amount is 0.5 to _part =: to 8° by weight; and the contents of the components (5) and (III) are 60 parts by weight. Alternatively, the component (II) is further reduced by 1 to 1 (particularly, 5 to 25). Further, the curable resin composition according to the present invention is surrounded by light 320584 26 200918585, a solid tree residue. The light Chenshu toucher includes (6) a resin (1-1) and components (11) to (V). The resin composition (6) may further comprise the component (VI). In the mixed composition of the tree composition (6) according to the present invention, the amount of each component is preferably the amount of the resin (H) relative to the basis of HK) by weight: in the case of 7 knives (1), it is difficult to 12 (10) (Special, cents pay) parts by weight; ingredients (jll) are 1 to _ special, 5 to 8 ()) parts by weight; ingredients are 1 to 50 (particularly, 5 to 4 inches) Parts by weight; and the amount of the component (7) is from 40 to 4,000 parts by weight, from 3 to 30 parts by weight. Alternatively, the content of the component (π) to (1(1) is preferably from 1 to 30 (particularly, from 5 to 25). The resin composition (A) according to the present invention may be, for example, first light-emitting (wavelength) .300 to 450 nm (nm), exposure: 2 () () JL1 remuneration / cm / cm (cm / cm2)) primary hardening, and then secondary hardening by heating (from 100 to 17 (TC The resin composition (8) according to the present invention can be subjected to C hardening (for example, from 100 to 170 for 20 to 120 minutes) by heating, for example, the resin composition (6) according to the present invention can be, for example, via, for example, , hardened by light (wavelength .300 to 450 nm, exposure: 2 〇〇 to 1 〇〇〇 millijoules per square centimeter (mj/cm 2 )). The heat is mentioned by the use of at least Two types of hardeners each having different reaction initiation conditions (wavelength and temperature or the like) are carried out in multiple stages. For example, the heat curing can be performed in primary hardening (from 1 to 12 Torr. (3 for 1 to 60 minutes) ) and secondary hardening (in 130 to 17 (TC for 20 to 120 minutes) in two stages. 27 320584 2009185 The curable resin composition according to the present invention can also be applied to any of the resist film forming methods of the printed wiring board. In particular, the use of a smooth printed wiring board as a printed wiring board can enhance the coating of the circuit and The reliability and the shielding property (copper circuit shielding property) can be effectively further improved. [Examples] <Preparation of Photocurable Resin> Preparation Example 1 was equipped with a scrambler, a thermometer, a reflux condenser, a dropping funnel, and a nitrogen gas. Into a separable flask of the introduction tube, 250 parts by weight of dipropylene glycol monomethyl ether and 10 parts by weight of tert-butyl peroxy-2-ethylhexanoate were charged, and they were heated to 95 °C. Then, a mixture of 170 parts by weight of mercaptoacrylic acid, 130 parts by weight of decyl decyl acrylate, 250 parts by weight of dipropylene glycol monodecyl ether and 10 parts by weight of azobis(decyl valeronitrile) was subjected to 4 hours. During the dropwise addition -' was added to the bottle. Further, they were aged for 5 hours to obtain a methacrylic acid-methacrylic acid methacrylate copolymer solution having a carboxyl group. Then, in the resin solution, 7% was passed. Oxygen-93% nitrogen While mixing the gas, 200 parts by weight of (3,4-epoxycyclohexyl)decyl methacrylate, 2 parts by weight of triphenylphosphine, and 1 part by weight of hydroquinone-mercaptoether are added, and l 〇〇 ° C for their addition reaction for 19 hours to obtain a polybasic acid buffer solution containing an unsaturated group. When measuring the physical properties of the resin of the multi-acid acid resin containing the base and the base, the solid content thereof It is 51%, its acid value is 105 mg KOH/g; the double bond equivalent is 490 g/mole; and its weight average molecular weight Mw (based on polystyrene) is 13,000. 28 320584 200918585 . Preparation 2 In the detachable bottle with reflux condenser, thermometer and glass tube for nitrogen replacement, 140 parts by weight of methacrylic acid methacrylate and 6 〇 replacement parts of thiol propylene Acidic, 200 parts by weight of carbitol 月 酉曰 · · · 重 重 重 月 月 月 和 和 和 和 和 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 They were heated in a nitrogen stream, and 50% was obtained by polymerizing for 5 hours, and the material/liquid mixture was added to the above 5 % copolymer solution, and hydrazine was added in an amount of 0.5 parts by weight. And propylene, and 0.4 parts by weight of dimethylbenzylamine, and their addition reaction at 100 C for 24 hours. Then, 9 parts by weight of tetrahydro-glycolic acid and 158 parts by weight of carbitol acetate vinegar were added thereto, and reacted at 100 C for 3 hours to obtain an unsaturated group-containing polycarboxylic acid resin solution having 5 (solid content of U, double bond equivalent of 35 g/mole; acid value of w mg leg/g and weight average molecular weight of 26 coffee (based on polystyrene). - Preparation Example 3 for assembly In a four-necked flask with a stirrer and a reflux condenser, the weight of the A-type transitional epoxy tree wins 68q, (4) coffee (10) (four)

Chemicals,Inc.,的產品,璦备 J座口口 ¥乳當量=215)。於其中加入196 重諸的丙二醇-甲基醚醋酸醋,且於加熱下予以溶解。 ?著於’、中曰加入〇·46重量份做為聚合抑制劑的曱基氩 U 1. 38重里知做為反應觸媒的三苯麟。在至⑽。c加 心此此口物且於其中逐漸滴加72重量份(1當量)的丙烯 酸。令彼等反應約32小㈣得具有U毫克腿/克的酸價之 反應產物。將此反應產物(輕基:丨當量)冷卻賴至赃, 320584 29 200918585 且於其中加入76重量份(0.5當量)的四氫酞酸酐。令彼等反 應約8小時’且在冷卻後取出。如此,得到含羧基之樹脂溶 液’其具有65%之不揮發物與77¾克K〇jj/克的固體物酸價。 &lt;硬化性樹脂組成物之製備〉 實施例1至11和比較例1至9 根據表1和表3中所示的浪合組成,將諸混合成分以三 輥磨機料均自地捏合而製備光—_性樹餘錢(實施 例1至3、5、7至11和比較例1至9) ’熱固性樹脂組成物(實Chemicals, Inc., products, preparation J mouth mouth ¥乳当量=215). 196 parts of propylene glycol-methyl ether acetate vinegar was added thereto and dissolved under heating.着 、 、 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 46 At (10). c This was added to the mouth and 72 parts by weight (1 equivalent) of acrylic acid was gradually added dropwise thereto. Let them react about 32 small (iv) to obtain a reaction product having an acid value of U mg leg/g. This reaction product (light base: hydrazine equivalent) was cooled to hydrazine, 320584 29 200918585 and 76 parts by weight (0.5 equivalent) of tetrahydrophthalic anhydride was added thereto. Let them react for about 8 hours' and take it out after cooling. Thus, a carboxyl group-containing resin solution was obtained which had a solid acid value of 65% of a nonvolatile matter and 773⁄4 g of K〇jj/g. &lt;Preparation of Curable Resin Composition> Examples 1 to 11 and Comparative Examples 1 to 9 According to the wave composition shown in Tables 1 and 3, the mixed components were prepared by kneading the three-roll mill materials by themselves. Light--sex tree surplus (Examples 1 to 3, 5, 7 to 11 and Comparative Examples 1 to 9) 'Thermosetting resin composition (real

該有機填充材的彈性模量顯示出經由使用真空加壓機 在150至2GGC模塑10分鐘製造樣品且使用張力檢驗儀測量The elastic modulus of the organic filler showed that the sample was molded by molding at 150 to 2 GGC for 10 minutes using a vacuum press and measured using a tensile tester.

表1和表3中的每_種有機填充材和無機填充材之平均 粒徑係彻雷射散射粒度分布分析儀(u_9iq,臓ΐβΑ, 測定有機填充材或無機填充材之 將檢驗樣品和分散介質«人樣品管内,且在超聲波 槽内分散10分鐘。然德,泪丨丨企女地 ......... 。在測技機填充材之平均粒徑時,係使用有機 雙紛A液體轉型環氧樹脂與濕潤劑(重量比例: Π is. ML·The average particle size of each of the organic fillers and inorganic fillers in Tables 1 and 3 is a laser-scattered particle size distribution analyzer (u_9iq, 臓ΐβΑ, which is used to determine the sample and dispersion of organic fillers or inorganic fillers. The medium «human sample tube, and dispersed in the ultrasonic bath for 10 minutes. Rand, tears and girls......... In the average particle size of the test machine filler, the use of organic double A liquid conversion epoxy resin and humectant (weight ratio: Π is. ML·

平均粒徑。在測 填充材、雙酚 320584 30 200918585 將硬化性樹脂組成物(實施例1至5、7至11和比較例1 至9)經由絹版印刷(1〇〇網目聚酯)塗佈在印刷線路基板的 整個表面上(厚度:1毫米(mm),銅電路厚度:6〇微米,l/s =10 0微米/10 0微米)。將該等硬化性樹脂組成物放置到熱空 氣循環型乾燥爐内,且予以初步乾燥(80°c,20分鐘)而得 乾燥被覆膜(膜厚度:20微米)。 然後,使用紫外射線曝光裝置(ORC Manufacturing Ltd,型號HMW-680C)用紫外射線以500毫焦/平方厘米透過 焊劑阻劑用的陰型膜照射上述被覆膜以進行初級光硬化。 該專膜係在1重s %的碳酸納溶液内顯像以在基板上形成經 曝光硬化(初步光硬化)的阻劑被覆膜圖案。 接著’將該基板初步熱硬化(l〇〇r,30分鐘)後,予以 完全硬化(15(TC ’ 60分鐘)。如此’製成被覆有焊劑阻劑膜 的印刷線路板(製造例1至5、7至11和製造比較例1至9)。 製造例6 將硬化性樹脂組成物(實施例6 )經由絹版印刷(丨2 〇網 目聚i旨)塗佈在與上述相同的印刷線路基板的整個表面 上。將該硬化性樹脂組成物初步乾燥(8(rc,2〇分鐘)而得 乾燥膜(膜厚度:2〇微米)。將乾燥被覆膜予以完全硬化(15〇 c ’ 60分鐘)而製成被覆有焊劑阻劑膜的印刷線路板(製造 例6)〇 〈硬化性樹脂組成物的評估檢驗〉 ^硬化性樹脂組成物(實施例丨至丨丨和比較例丨至9)的各 種。平估檢驗係用下述方法進行。表2和表4顯示出該等評估 320584 200918585 檢驗的結果。 (觸乾性) /將硬化性樹脂組成物塗佈在印刷線路基板的表面上。 然後將该印刷線路基板放置到熱空氣循環型乾燥爐内,且 予以乾餘(80〇C ’ 20分鐘)。之後,對其上塗布有硬化性樹 月曰組成物的表面用手指強力推動以檢測黏著性而測定被覆 膜的狀態。 〇(好):完全沒有觀察到黏著和指紋留置。 “△”(平均):稍微地觀察到在表面上黏著和指紋留置。 X (差).顯著地觀察到在表面上有黏著和指紋留置。 (顯像性) 於上述被覆有焊劑阻劑膜的印刷線路板製程之顯像程 ^中將1重量%碳酸納溶液之顯像溶液在2. 〇xl〇5pa之喷布 壓力下嘴布60秒鐘,且用目視測定未曝光部分被移除的狀 態。 “〇(好):於顯像中油墨完全移除而促成顯像。 X (差):於顯像中有存在著未顯像的部分。 (光敏性) 將ST 21階段式曝光表(Stauffer Corporation所製) 黏貼到乾燥的被覆膜。使用具有5〇〇毫焦/平方厘米整體光 里的紫外射線照射該膜且予以曝光。接著,在1%碳酸鈉溶 液中於2· Οχι〇5pa之喷布壓力下將該膜顯像6〇秒鐘,且確保 未顯像的被覆膜之階數。 〈焊劑阻劑膜(硬化膜)的評估檢驗〉 320584 200918585 1 用下述方法進行印刷線路板的焊劑阻劑膜(製造例1至 11和製造比較例1至9)的各種評估檢驗。表2和表4顯示出評 估檢驗結果。 (鉛筆硬度) 鉛筆硬度係根據JIS K5600予以評定。 .(黏著性質) 根據JIS K5600,將1毫米寬度的試片格網化而製造出 100格且使用Scotch膠帶進行剝離檢驗。觀察格子的剝離且 使用下述評估基準。 “〇”(好):交叉切割部分沒有剝離。 “△”(平均):交叉切割部分稍微地剝離到剝開的Scotch 膠帶之内。 “X ”(差):有40%或更多的交叉切割部分剝離到剝開的 Scotch膠帶之内。 (溶劑抗性) 將試片浸沒到室温異丙醇内30分鐘,且觀察在外觀上 的異常性。然後,使用Scotch膠帶(R)進行剝離檢驗。使用 下述評估基準。 “〇”(好):被覆膜的外觀沒有異常性,沒有膨脹且沒有 剝離。 “X ”(差):有觀察到被覆膜的膨脹和剝離。 (耐酸性) 將試片浸沒到室溫10%氯化氫水溶液内30分鐘。觀察在 外觀上的異常性且然後,使用Scotch膠帶進行剝離檢驗。 33 320584 200918585 , 使用下述評估基準。 “〇”(好):被覆膜的外觀沒有異常性,沒有膨脹且沒有 剝離。 “X ”(差):有觀察到被覆膜的膨脹和剝離。 (焊劑耐熱性) 將整平器(1 eveler)用的助溶劑W-2704 (MEC Co.,Ltd. 所製)塗覆在試片上,且浸沒在288°C焊劑槽内1〇秒鐘。將 相同的程序重複三次。將試片冷卻到室溫,且使用Scotch 膠帶(R)進行剝離檢驗以使用下述評估基準。 (好):被覆膜的外觀沒有異常性,没有膨脹且μ 剝離。 替 方法。 (差):有觀察到被覆膜的膨脹和剝離。 代地,在焊劑耐熱性檢驗之後依下逑進彳$ 破裂評估 (好):沒有觀察到裂痕。 (平均):有觀察到稍微地裂痕。 x (差):有顯著地產生裂痕。 黏著性The average particle size. In the test filler, bisphenol 320584 30 200918585 The curable resin composition (Examples 1 to 5, 7 to 11 and Comparative Examples 1 to 9) was applied to the printed circuit via stencil printing (1 〇〇 mesh polyester). On the entire surface of the substrate (thickness: 1 mm (mm), copper circuit thickness: 6 μm, l/s = 10 0 μm/10 0 μm). These curable resin compositions were placed in a hot air circulation type drying oven, and preliminary dried (80 ° C, 20 minutes) to obtain a dried coating film (film thickness: 20 μm). Then, the above coating film was irradiated with an ultraviolet ray irradiation apparatus (ORC Manufacturing Ltd, model HMW-680C) at 500 mJ/cm 2 through a negative film for flux resist to perform primary photohardening. The film was developed in a 1 wt% sodium carbonate solution to form an exposure hardened (preliminary photohardening) resist film pattern on the substrate. Then, the substrate was initially thermally hardened (10 Torr, 30 minutes), and then completely cured (15 (TC '60 minutes). Thus 'made a printed wiring board coated with a solder resist film (Manufacturing Example 1 to 5, 7 to 11 and Comparative Examples 1 to 9). Production Example 6 A curable resin composition (Example 6) was applied to the same printed wiring as described above by stencil printing (丨2〇网网) On the entire surface of the substrate, the curable resin composition was preliminarily dried (8 (rc, 2 min) to obtain a dried film (film thickness: 2 μm). The dried coating film was completely hardened (15〇c ' Printed wiring board coated with a solder resist film (manufacturing example 6) for 60 minutes) (Evaluation test of curable resin composition) ^ Curable resin composition (Examples to 丨丨 and Comparative Example) 9) Various evaluations are performed by the following methods: Tables 2 and 4 show the results of the evaluations of the evaluations of 320584 200918585. (Contact Dryness) / Coating of the curable resin composition on the surface of the printed wiring substrate Then, the printed circuit substrate is placed in the heat In a gas-circulating drying oven, it was dried (80 ° C '20 minutes). Then, the surface on which the composition of the curable tree scorpion was coated was strongly pushed by a finger to detect adhesion and the coating was measured. State: 〇 (good): Adhesion and fingerprint retention were not observed at all. “△” (average): Adhesion on the surface and fingerprint retention were observed slightly. X (poor). Significantly observed adhesion on the surface and The fingerprint is left in. (developing property) The developing solution of the 1% by weight sodium carbonate solution is applied to the printing process of the above-mentioned printed circuit board process coated with the solder resist film under the spray pressure of 2. 〇xl 〇 5pa The mouth cloth was placed for 60 seconds, and the state in which the unexposed portion was removed was visually determined. "〇 (good): The ink was completely removed in the development to promote the image. X (poor): there was a presence in the image. Unexposed portion (Photosensitivity) A ST 21 stage exposure meter (manufactured by Stawerf Corporation) was attached to a dry coating film, and the film was irradiated with ultraviolet rays having an overall light of 5 μm/cm 2 and Exposure. Then, at 1% carbonic acid The film was developed in a solution at a spray pressure of 2·Οχι〇5pa for 6 seconds, and the order of the uncoated film was ensured. <Evaluation test of the solder resist film (hardened film)> 320584 200918585 1 Various evaluation tests of the solder resist films (Manufacturing Examples 1 to 11 and Manufacturing Comparative Examples 1 to 9) of the printed wiring board were carried out by the following methods. Tables 2 and 4 show the evaluation test results (pencil hardness) pencil The hardness was evaluated in accordance with JIS K5600. (Adhesive property) According to JIS K5600, a test piece having a width of 1 mm was grid-formed to produce 100 cells, and a peel test was performed using a Scotch tape. The peeling of the lattice was observed and the following evaluation criteria were used. “〇” (good): The cross-cut part is not peeled off. "△" (average): The cross-cut portion was slightly peeled off into the peeled Scotch tape. "X" (poor): 40% or more of the cross-cut portion is peeled off into the stripped Scotch tape. (Solvent resistance) The test piece was immersed in room temperature isopropanol for 30 minutes, and abnormality in appearance was observed. Then, a peel test was performed using Scotch tape (R). Use the following evaluation criteria. “〇” (good): The appearance of the film was not abnormal, and there was no swelling and no peeling. "X" (poor): Expansion and peeling of the film were observed. (Acid resistance) The test piece was immersed in a room temperature 10% aqueous hydrogen chloride solution for 30 minutes. The abnormality in appearance was observed and then, a peel test was performed using Scotch tape. 33 320584 200918585 , using the following evaluation criteria. “〇” (good): The appearance of the film was not abnormal, and there was no swelling and no peeling. "X" (poor): Expansion and peeling of the film were observed. (Solder Heat Resistance) A fluxing agent W-2704 (manufactured by MEC Co., Ltd.) for a flattener was coated on a test piece and immersed in a solder bath of 288 ° C for 1 second. Repeat the same procedure three times. The test piece was cooled to room temperature, and a peel test was performed using Scotch tape (R) to use the following evaluation criteria. (Good): The appearance of the coating film is not abnormal, and there is no swelling and μ peeling. For the method. (Poor): Expansion and peeling of the coating film were observed. On behalf of the ground, after the solder heat resistance test, according to the next 彳 $ rupture evaluation (good): no cracks were observed. (Average): A slight crack was observed. x (poor): There is a significant crack. Adhesive

替代地,在焊劑耐熱性檢驗之後依下逑進行 評估方法。 根據JIS K5600,將1亳米寬度的試片格網 Μ匕而象j 100格且使用Scotch膠帶進行剝離檢驗。觀察袼子 、k出 使用下述評估基準。 的泰】離且 〇”(好):交叉切割部分沒有剝離。 c〇tch △ ”(平均):交叉切割部分稍微地剝離到韌開的$ 34 32〇584 200918585 膠帶之内。 “X,’(差):有40%或更多的交叉切割部分剝離到剝開的Alternatively, the evaluation method is performed after the solder heat resistance test. According to JIS K5600, a test piece having a width of 1 mm was used as a grid of j 100 and a peel test was performed using a Scotch tape. Observe the dice and k out using the following evaluation criteria. Thai] away from 〇" (good): the cross-cut portion is not peeled off. c〇tch △" (average): The cross-cut portion is slightly peeled off to the tough open $34 32〇584 200918585 tape. "X,' (poor): 40% or more of the cross-cut portion is peeled off to the peeling

Scotch膠帶之内。 (鐘金抗性) 將檢驗基板浸到30°C的酸性脫脂溶液内(Nihon MacDiarmid Co.,Ltd.製造的艷忱又^㈤之別體積^水溶液) 3分鐘,然後用水洗蘇。接著將檢驗基板浸到室溫14· 4重量 %過硫酸銨水溶液内3分鐘,且用水洗滌。進一步地,將檢 驗基板浸到室溫10體積%硫酸水溶液内1分鐘,且用水洗滌。 接著,將此基板浸到30°C觸媒溶液内(Meltex Co.,Ltd· 所製的金屬電鍍活化劑350之l〇體積%水溶液)2分鐘,且用 水洗滌。將該基板浸到85°C鍍鎳溶液内(Meltex Co.,Ltd. 所製,Melplate Ni-865M的20體積%水溶液,pH 4. 6)20分 鐘以進行鍍鎳。然後將該基板浸到室溫1〇體積%硫酸.氫水溶 液内1分鐘,且用水洗滌。 然後’將該基板浸到95°C鍍金溶液内(Meltex Co.,Ltd. 所製,15體積UP和3體積%的氰化金鉀 水溶液,pH 6)10分鐘以進行無電金鍍,用水洗滌,浸到6〇 C孤水中3分鐘,用水洗滌,且乾燥。將Sc〇tch膠帶黏附到 ^無电金鍍評估基板上且將膠帶剝離。觀察其狀況。 (好):沒有異常性。 平均):觀察到稍微剝離。 X (差):觀察到大幅剝離。 (HAST耐性) 320584 35 200918585 將一檢驗基板靜置168小時,同時將dC 5V的施加電壓 方β加於線條/空間=1 〇 0微米/1 〇 〇微求的梳型電極之間,於 其上在130°C和85%的不飽和加壓容器内施加焊劑阻劑。觀 祭外觀上的異常性且測罝在檢驗之前與之後的絕緣電阻。 對於絕緣電阻,係使用“R8340A”(ADVANTEST所製的 數位起rsj電阻/分鐘安培计)’且根據JPCA-HDO1的絕緣電阻 檢驗標準施加10 V的直流電壓1分鐘。然後於施加狀態測量 絕緣電阻。 “〇”(好):被覆膜的外觀沒有異常性。 * “△”(平均):電極沒有膨脹且沒有剝離,不過有觀察到 電極褪色。 X (差):被覆膜有膨脹及/或剝離。 (色差變化) 使用光譜比色計CM-2600d [Konica Minolta Sensing Corporat i on所製]從硬化後的L*a*b*比色測定和三次回流 〇6{1〇¥)(尖峰溫度:260°(:,5秒鐘)後的1^8*1)*比色測定 來測定色差(ΔΕ%!))。 (光譜反射率) 使用光譜比色計CM-2600d經由硬化後的L*a*b*比色測 定測量450、550和600奈米的反射率。 (熱導係數λ) 根據JIS R1611的標準,用雷射法拉西法(laser Frasch method)測定熱擴散率(〇:),且從比熱(Cp)和密度(p )計算 熱導係數。 36 320584 200918585 λ = a χ Cp χ p (耐熱震性) 對一試片重複進行在-40°C 30分鐘和在125°C 30分鐘 的處理,且在100次重複之後,以顯微鏡觀察試片。使用下 述評估基準。 “〇”(好):被覆膜上沒有觀察到裂痕。 “△”(平均):被覆膜上有觀察到稍微地裂痕。 “χ ”(差):被覆膜上有觀察到裂痕。 37 320584 200918585 表1 f.Inside the Scotch tape. (Zhongjin resistance) The test substrate was immersed in an acidic degreasing solution (Nihon MacDiarmid Co., Ltd., manufactured by Nihon MacDiarmid Co., Ltd.) in an acid degreasing solution (Nihon MacDiarmid Co., Ltd.) for 3 minutes, and then washed with water. Next, the test substrate was immersed in a room temperature of 14.4% by weight aqueous ammonium persulfate solution for 3 minutes, and washed with water. Further, the test substrate was immersed in a room temperature 10% by volume aqueous sulfuric acid solution for 1 minute, and washed with water. Next, the substrate was immersed in a 30 °C catalyst solution (10% by volume aqueous solution of metal plating activator 350 manufactured by Meltex Co., Ltd.) for 2 minutes, and washed with water. The substrate was immersed in a nickel plating solution (manufactured by Meltex Co., Ltd., Melplate Ni-865M, 20% by volume aqueous solution, pH 4. 6) at 85 ° C for 20 minutes to carry out nickel plating. The substrate was then immersed in a 1 vol% sulfuric acid aqueous solution at room temperature for 1 minute and washed with water. Then, the substrate was immersed in a gold plating solution at 95 ° C (manufactured by Meltex Co., Ltd., 15 volumes of UP and 3 vol% aqueous potassium cyanide solution, pH 6) for 10 minutes to carry out electroless gold plating, and washed with water. Immerse in 6 〇C water for 3 minutes, wash with water, and dry. The Sc〇tch tape was adhered to the ^electroless gold plating evaluation substrate and the tape was peeled off. Observe its condition. (Good): No abnormality. Average): A slight peeling was observed. X (poor): A large peel was observed. (HAST resistance) 320584 35 200918585 A test substrate is allowed to stand for 168 hours, and the applied voltage side β of dC 5V is applied between the comb electrodes of line/space=1 〇0 μm/1 〇〇 micro-seeking. A flux resist was applied to the 130 ° C and 85% unsaturated pressurized container. Observe the anomalous appearance of the sacrifice and measure the insulation resistance before and after the test. For the insulation resistance, "R8340A" (digits made by ADVANTEST from rsj resistance / minute ammeter) was used and a DC voltage of 10 V was applied for 1 minute in accordance with the insulation resistance test standard of JPCA-HDO1. The insulation resistance is then measured in the applied state. “〇” (good): The appearance of the film is not abnormal. * "△" (average): The electrode did not swell and did not peel off, but the electrode was observed to fade. X (poor): The film is swelled and/or peeled off. (Color difference change) Using a spectral colorimeter CM-2600d [manufactured by Konica Minolta Sensing Corporat on], the L*a*b* colorimetric measurement after hardening and three times of reflux 〇6{1〇¥) (spike temperature: 260) The color difference (ΔΕ%!) was measured by 1^8*1)* colorimetric measurement after ° (:, 5 seconds). (Spectral reflectance) The reflectances of 450, 550 and 600 nm were measured by a spectral colorimeter CM-2600d via a hardened L*a*b* colorimetric measurement. (Thermal Conductivity λ) The thermal diffusivity (〇:) was measured by the laser Frasch method according to the standard of JIS R1611, and the thermal conductivity was calculated from the specific heat (Cp) and the density (p). 36 320584 200918585 λ = a χ Cp χ p (heat shock resistance) Repeat the test at -40 ° C for 30 minutes and at 125 ° C for 30 minutes, and after 100 repetitions, observe the test piece with a microscope. . Use the evaluation criteria below. “〇” (good): No cracks were observed on the film. "△" (average): A slight crack was observed on the coating film. “χ ” (poor): Cracks were observed on the film. 37 320584 200918585 Table 1 f.

混合組成 (重量份數) 實施例 1 2 3 4 5 6 7 8 9 10 11 光 固 性 樹 脂 製備例1 200 — — 200 — — 200 200 200 200 200 製備例2 一 200 製備例3 — — 154 — 200 — — — — — — 熱 固 性 樹 脂 雙酚A型環氧樹 脂 15 10 — — 10 80 15 15 15 15 15 3, 3’,5, 5’-四 曱基聯苯型環 氧樹脂 15 10 20 — 20 — 15 15 15 15 15 笨酚系酚醛型 環氧樹脂 — 10 10 — — 20 — — — 一 — 無 填 充 材 氧化鈦(經表面 處理粒子,平均 粒徑:0. 3微米) 500 — — 60 — — 1269.2 101.5 203.1 500 500 氧化鋁(平均粒 徑:3微米,熱 導係數:30. 2 W/m · K) — 600 — — 500 600 — — — — — 硫酸鋇(經表面 處理粒子,平均 粒徑:0.3微米) 20 10 300 20 20 50 50.8 4.1 8.1 20 20 有 機 填 充 材 丙烯酸系橡膠 (彈性模量:15 MPa,平均粒 徑:0·5微米) 25 — — — — 105.6 2.6 105.6 — — 丙烯酸系橡膠 (彈性模量:20 MPa,平均粒 徑:0.1微米) — 15 — — — 30 — — 一 — — 矽酮橡膠(彈性 模量:200MPa, 平均粒徑:1.0 微米) — — 20 10 — — — — — — 一 交聯聚甲基丙 烯酸丁酯(彈性 模量:400MPa, 平均粒徑:5微 米) 20 丙烯酸系橡膠 (彈性模量: 5MPa,平均粒 徑:1.0微米) 25 38 320584 200918585 f 有機填充材(彈 性模量:1000 MPa,平均粒 徑:6.0微米) 25 丙烯酸系橡膠 (彈性模量:0. 5 MPa,平均粒 徑:1.0微米) 有機填充材(彈 性模量:3000 MPa,平均粒 徑:8.0微米) 交聯聚曱基丙 烯酸曱酯(彈性 模量:2300 MPa,平均粒 徑:25微米) 稀 釋 劑 二季戊四醇六-丙烯酸酯 (DPHA) 20 20 — — 20 — 20 20 20 20 20 二-三羥甲基丙 烧四-丙烯酸S旨 5 5 20 25 — — 5 5 5 5 5 卡必醇醋酸酯 30 30 20 10 20 10 80 20 30 40 40 硬 化 劑 氧化雙(2, 4, 6-三曱基苯甲醯 基)苯基膦 12 12 — 4 — - 12 12 12 12 12 2-曱基-H4-(甲硫基)苯基] -2-嗎琳-4_基-丙競rl-酮 — — 12 — 12 — — — — — — 2, 4~二乙基0ί 嘲酮 1 1 1 1 1 - 1 1 1 1 1 三羥甲基丙烷 三(3-氫硫基丙 酸酯) — — — 2 — 1 — — — — — 三聚氰胺 2 2 2 2 2 - 2 2 2 2 2 二氰二胺 一 — 0.1 — — 5 — — — — — 2-苯基-4, 5-二 羥基甲基咪唑 — - — — — 4 — — 一 — — 其 他 聚二甲基矽氧 烧 1 1 1 1 1 1 1 1 1 1 1 39 320584 200918585 &gt; 表2 實施例 1 2 3 4 5 6 7 8 9 10 11 觸乾性 〇 〇 〇 〇 〇 — 〇 〇 〇 〇 〇 顯像性 〇 〇 〇 〇 〇 — 〇 〇 〇 〇 〇 光敏性 10 8 9 11 8 — 8 11 9 9 9 製造例 1 2 3 4 5 6 7 8 9 10 11 鉛筆硬度 8H 8H 8H 6H 8H 8H 8H 7H 6H 8H 8H 黏著性質 〇 〇 〇 〇 Δ 〇 Δ 〇 〇 〇 〇 溶劑耐性 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 Δ 财酸性 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 表面狀態 〇 〇 〇 〇 △ 〇 Δ 〇 〇 〇 〇 焊劑耐熱性剝 離檢驗 〇 〇 〇 〇 〇 〇 〇 Δ 〇 〇 〇 檢 破裂抗性 〇 〇 〇 〇 Δ 〇 Δ 〇 〇 〇 〇 結 黏著性質 〇 〇 〇 〇 Δ 〇 Δ 〇 〇 〇 〇 果 金鍍抗性 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 η 估 外觀 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 起始值 1.3 1.5 1.2 1.7 1,1 1,7 L2 1.8 1.2 1.5 1.4 (χ1013Ω) 168小時之 後(^10¾) 58.0 30.7 22.3 3.2 1.49 35.4 32 52 47.2 31.6 29 耐熱震性 〇 〇 〇 〇 Δ 〇 〇 〇 〇 〇 〇 色差變化 (△E%b) 5 4.8 10 4.6 12 13 4.5 5.6 5.6 7.1 6.8 光譜反射率 (%) 450奈米 85 2 71 91 80 82 86 86 550奈米 81 — 2 68 — — 88 77 80 82 83 600奈米 79 — 2 65 — — 85 73 77 79 79 熱導係數 (W/m · K) 0.5 1.2 0.5 0.5 1.0 2.0 — — — — — 40 320584 200918585Mixed composition (parts by weight) Example 1 2 3 4 5 6 7 8 9 10 11 Photocurable resin Preparation Example 1 200 — — 200 — — 200 200 200 200 200 Preparation Example 2 One 200 Preparation Example 3 — — 154 — 200 — — — — — — Thermosetting resin bisphenol A epoxy resin 15 10 — — 10 80 15 15 15 15 15 3, 3', 5, 5'-tetradecylbiphenyl type epoxy resin 15 10 20 — 20 — 15 15 15 15 15 Phenol phenolic epoxy resin — 10 10 — — 20 — — — — — No filler titanium oxide (surface treated particles, average particle size: 0.3 μm) 500 — — 60 — — 1269.2 101.5 203.1 500 500 Alumina (average particle size: 3 μm, thermal conductivity: 30. 2 W/m · K) — 600 — — 500 600 — — — — — Barium sulfate (surface treated particles, average Particle size: 0.3 μm) 20 10 300 20 20 50 50.8 4.1 8.1 20 20 Acrylic rubber for organic filler (modulus of elasticity: 15 MPa, average particle diameter: 0.5 μm) 25 — — — — 105.6 2.6 105.6 — — Acrylic rubber (modulus of elasticity: 20 M Pa, average particle size: 0.1 μm) — 15 — — — 30 — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — Polybutyl methacrylate (elastic modulus: 400 MPa, average particle diameter: 5 μm) 20 Acrylic rubber (elastic modulus: 5 MPa, average particle diameter: 1.0 μm) 25 38 320584 200918585 f Organic filler (elastic modulus) : 1000 MPa, average particle diameter: 6.0 μm) 25 Acrylic rubber (elastic modulus: 0.5 MPa, average particle diameter: 1.0 μm) Organic filler (elastic modulus: 3000 MPa, average particle diameter: 8.0 μm) Cross-linked poly(decyl methacrylate) (elastic modulus: 2300 MPa, average particle size: 25 microns) Thinner Dipentaerythritol hexa-acrylate (DPHA) 20 20 — — 20 — 20 20 20 20 20 Di-trihydroxyl Acetylene-tetra-acrylic acid S 5 5 20 25 — — 5 5 5 5 5 carbitol acetate 30 30 20 10 20 10 80 20 30 40 40 hardener oxidation double (2, 4, 6 -tridecylbenzhydryl)phenylphosphine 12 12 — 4 — - 12 12 12 12 12 2-mercapto-H4-(methylthio)phenyl]-2-methylline-4_yl-propene Rl-ketone — 12 — 12 — — — — — — 2, 4~ Diethyl 0 ketolone 1 1 1 1 1 - 1 1 1 1 1 Trimethylolpropane tris(3-hydrothiopropionate ) — — — 2 — 1 — — — — — Melamine 2 2 2 2 2 - 2 2 2 2 2 Dicyanodiamine 1-0.1 — — 5 — — — — — 2-Phenyl-4, 5-dihydroxy Methylimidazole - - - - - 4 - - one - other polydimethyl oxime 1 1 1 1 1 1 1 1 1 1 1 39 320584 200918585 &gt; Table 2 Example 1 2 3 4 5 6 7 8 9 10 11 Dry-drying 〇〇〇〇〇 - 〇〇〇〇〇 Imaging 〇〇〇〇〇 - 〇〇〇〇〇 Photosensitivity 10 8 9 11 8 — 8 11 9 9 9 Manufacturing Example 1 2 3 4 5 6 7 8 9 10 11 Pencil hardness 8H 8H 8H 6H 8H 8H 8H 7H 6H 8H 8H Adhesive properties 〇〇〇〇Δ 〇Δ 〇〇〇〇Solvent resistance 〇〇〇〇〇〇〇〇〇〇Δ Acidic 〇〇〇 〇〇〇〇〇 〇〇〇surface state 〇〇〇〇△ 〇Δ 〇〇〇〇flux heat resistance peel test 〇〇〇〇〇〇〇Δ 〇〇〇detection crack resistance 〇〇〇〇Δ 〇Δ 〇〇〇〇 黏 adhesion property 〇〇〇〇Δ 〇Δ capsule gold plating resistance 〇〇〇〇〇〇〇〇〇〇〇 estimated appearance 〇〇〇〇〇〇〇〇〇〇〇 starting value 1.3 1.5 1.2 1.7 1, 1 1,7 L2 1.8 1.2 1.5 1.4 (χ1013Ω) After 168 hours (^103⁄4) 58.0 30.7 22.3 3.2 1.49 35.4 32 52 47.2 31.6 29 Thermal shock 〇〇〇〇Δ 〇〇〇〇〇〇 Color difference change (△E% b) 5 4.8 10 4.6 12 13 4.5 5.6 5.6 7.1 6.8 Spectral reflectance (%) 450 nm 85 2 71 91 80 82 86 86 550 nm 81 — 2 68 — — 88 77 80 82 83 600 nm 79 — 2 65 — — 85 73 77 79 79 Thermal conductivity (W/m · K) 0.5 1.2 0.5 0.5 1.0 2.0 — — — — — 40 320584 200918585

3表I 混合組成(重量份數) 比較例 3 5 光固性樹脂 製備例1 製備例2 製備例3 200 200 200 200 200 200 200 200 200 熱固性樹脂 雙酚A型環氧樹脂 3, 3,,5,5’-四甲基聯苯 型環氧樹脂 苯酚系酚醛型環氧樹脂 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 無機填充材 氧化鈦(經表面處理粒 子,平均粒徑:0.3微米) 氧化鋁(平均粒徑:3微 米,熱導係數:30.2 W/m * K) 硫酸鋇(經表面處理粒 子,平均粒徑:〇.3微米) 丙烯酸系橡膠(彈性模 量:15MPa,平均粒徑: 0.5微米) 丙烯酸系橡膠(彈性模 量:20MPa,平均粒徑: 0.1微米) 矽酮橡膠(彈性模量: 200MPa,平均粒徑:·1.0 微米) 500 200 1650.0 66,0 105.6 25.4 1.0 1269.2 50.8 114.: 500 500 50.8 2.0 145.: 105. 4.6 2.6 20 20 有機填充材 交聯聚曱基丙烯酸丁酯 (彈性模量:400MPa,平 均粒徑:5微米) 丙烯酸系橡膠(彈性模 量:5MPa,平均粒徑: 1.0微米) 有機填充材(彈性模 量:lOOOMPa,平均粒 徑:6.0微米) 丙烯酸系橡膠(彈性模 量:D. 5MPa,平均粒徑: 1.0微米) 25 有機填充材(彈性模 量:3000MPa,平均粒 徑:8.0微米) 25 交聯聚曱基丙烯酸甲酯 (彈性模量:2300MPa, 平均粒徑:25微米) 41 320584 20 200918585 稀 釋 #J 二季戊四醇六-丙烯酸酯 (DPHA) — — 20 20 20 20 20 20 20 二-三羥曱基丙烷四-丙烯 酸酯 25 25 5 5 5 5 5 5 5 卡必醇醋酸酯 20 20 80 10 100 30 20 40 40 硬 化 劑 氧化雙(2, 4, 6-三甲基苯曱 醯基)苯基膦 12 — 12 12 12 12 12 12 12 2~甲基-1-[4-(甲硫基)苯 基]-2-嗎啉-4-基-丙烷-1-酮 — 12 — — — — — — 一 2, 4-二乙基噻噸酮 1 1 1 1 1 1 1 1 1 三羥甲基丙烷三(3-氩硫基 丙酸酯) — 三聚氰胺 2 2 2 2 2 2 2 2 2 二氰二胺 0.5 — — — — — - — 一 2-苯基-4, 5-二羥基甲基咪 σ坐 — 其 他 聚二f基矽氧烷 1 1 1 1 1 1 1 1 1 42 320584 200918585 * 表4 比較例 1 2 3 4 5 6 7 8 9 觸乾性 〇 〇 〇 〇 〇 〇 〇 △ 〇 顯像性 〇 〇 〇 〇 〇 〇 〇 〇 〇 光敏性 9 10 6 11 7 10 11 9 9 製造比較例 1 2 3 4 5 6 7 8 9 鉛筆硬度 8H 8H 8H 6H 7H 5H 7H 7H 8H 黏著性質 X X X 〇 〇 〇 〇 〇 △ 溶劑耐性 〇 〇 〇 〇 〇 〇 〇 〇 X 耐酸性 〇 〇 〇 〇 〇 〇 〇 〇 〇 表面狀態 〇 X X 〇 X 〇 〇 Δ Δ 焊劑耐熱性剝 檢 離檢驗 〇 X X Δ △ 〇 〇 Δ Δ 驗 破裂抗性 X X X Δ 〇 〇 Δ 〇 X 結 果 之 黏著性質 X X X Δ 〇 〇 〇 〇 X 金鍍抗性 Δ X X 〇 Δ 〇 〇 〇 Δ 評 估 外觀 △ X X 〇 Δ 〇 〇 Δ Δ 起始值 (χ1013Ω) 1.1 1.1 1.3 1.7 1.6 1.4 1.6 1.3 1.7 168小時之後 (χΙΟ'Ώ) 1.00 1.50 9.4 43 11 32.5 35.4 24.2 一 耐熱震性 Δ X X Δ Δ 〇 Δ 〇 Δ 色差變化 (△E*ab) — — 4.6 5.8 5.3 5.9 5.1 7.5 7.4 光譜反射率(¾) 450奈米 86 — 92 58 88 61 81 85 85 550奈米 82 — 90 55 85 58 79 82 83 600奈米 79 — 87 51 82 55 76 78 78 熱導係數 (W/m · K) 0.5 0.4 — — — — 一 一 (1)至(3)項表示在表1和3中的下列各者。 (1) :環氧當量:173克/當量(g/eq) (2) :環氧當量:188克/當量 (3) :環氧當量:178克/當量 如從表1至4明顯可知者,根據本發明的鹼顯像型焊劑 43 320584 200918585 阻劑油墨(使用例如環 脂)具有優良的無錯焊Π 不飽和基的多元㈣樹 類似者,且淮 &amp;耐…、性(防止剝離且防止褪色)或 =二 當焊劑阻劑油墨置於高溫中之時, 材可以高度L 4 j再者,功能性無機填充 可以達到高反射率和高熱導係數。 纟明m為能夠對應於電子設備的高性能率之 硬化性樹脂組成物。 4寸別者’本案發明人有考翻使該油墨具有焊劑耐執 性及阻劑的少掩色性,且有增強長期高溫褪色抗性、⑽ 矛反射率。該油墨做為LED基板或類似者所用的白色焊劑阻 劑係非常有用。 【圖式簡單說明】 •fe 〇 【主要元件符號說明】 M»、3 Table I Mixed composition (parts by weight) Comparative Example 3 5 Photosetting resin Preparation Example 1 Preparation Example 2 Preparation Example 3 200 200 200 200 200 200 200 200 200 Thermosetting resin bisphenol A type epoxy resin 3, 3,, 5,5'-tetramethylbiphenyl type epoxy resin phenolic novolac type epoxy resin 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 Inorganic filler titanium oxide (surface treated particles, Average particle size: 0.3 μm) Alumina (average particle diameter: 3 μm, thermal conductivity: 30.2 W/m * K) Barium sulfate (surface-treated particles, average particle diameter: 〇. 3 μm) Acrylic rubber (elasticity Modulus: 15 MPa, average particle diameter: 0.5 μm) Acrylic rubber (elastic modulus: 20 MPa, average particle diameter: 0.1 μm) Anthrone rubber (elastic modulus: 200 MPa, average particle diameter: ·1.0 μm) 500 200 1650.0 66,0 105.6 25.4 1.0 1269.2 50.8 114.: 500 500 50.8 2.0 145.: 105. 4.6 2.6 20 20 Organic filler cross-linked poly(butyl acrylate) (elastic modulus: 400 MPa, average particle size: 5 μm) Acrylic acid Rubber (elastic modulus: 5MPa, average particle size: 1 .0 micron) Organic filler (elastic modulus: 1000 MPa, average particle diameter: 6.0 μm) Acrylic rubber (elastic modulus: D. 5 MPa, average particle diameter: 1.0 μm) 25 Organic filler (modulus of elasticity: 3000 MPa) , average particle diameter: 8.0 μm) 25 cross-linked polymethyl methacrylate (elastic modulus: 2300 MPa, average particle diameter: 25 μm) 41 320584 20 200918585 Dilution #J dipentaerythritol hexa-acrylate (DPHA) — — 20 20 20 20 20 20 20 Di-trihydroxydecylpropane tetra-acrylate 25 25 5 5 5 5 5 5 5 carbitol acetate 20 20 80 10 100 30 20 40 40 Hardener oxidation double (2, 4, 6 -trimethylphenyl hydrazino)phenylphosphine 12 — 12 12 12 12 12 12 12 2~methyl-1-[4-(methylthio)phenyl]-2-morpholin-4-yl-propane -1- Ketone - 12 — — — — — — A 2, 4-diethyl thioxanthone 1 1 1 1 1 1 1 1 1 Trimethylolpropane tris(3-arylthiopropionate) — Melamine 2 2 2 2 2 2 2 2 2 dicyandiamide 0.5 — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — 1 1 1 1 1 1 42 320584 200918585 * Table 4 Comparative Example 1 2 3 4 5 6 7 8 9 Contact Dryness 〇〇〇〇〇〇〇 〇 〇 Imaging 〇〇〇〇〇〇〇〇〇 Photosensitivity 9 10 6 11 7 10 11 9 9 Manufacturing Comparative Example 1 2 3 4 5 6 7 8 9 Pencil hardness 8H 8H 8H 6H 7H 5H 7H 7H 8H Adhesive property XXX 〇〇〇〇〇△ Solvent resistance 〇〇〇〇〇〇〇〇X Acid resistance 〇〇〇〇〇〇〇〇〇 surface state 〇 XX 〇 X 〇〇 Δ Δ flux heat resistance stripping test 〇 XX Δ △ 〇〇 Δ Δ rupture resistance XXX Δ 〇〇 Δ 〇 X results of adhesion Properties XXX Δ 〇〇〇〇X Gold plating resistance Δ XX 〇Δ 〇〇〇Δ Evaluation appearance △ XX 〇Δ 〇〇Δ Δ Starting value (χ1013Ω) 1.1 1.1 1.3 1.7 1.6 1.4 1.6 1.3 1.7 168 hours later (χΙΟ 'Ώ) 1.00 1.50 9.4 43 11 32.5 35.4 24.2 A thermal shock resistance Δ XX Δ Δ 〇 Δ 〇 Δ chromatic aberration change (△E*ab) — — 4.6 5.8 5.3 5.9 5.1 7.5 7.4 Spectral reflectance (3⁄4) 450 nm 86 — 92 58 88 61 81 85 85 550 nm 82 — 90 55 85 58 79 82 83 600 nm 79 — 87 51 82 55 76 78 78 Thermal conductivity (W/m · K) 0.5 0.4 — — — — Items one (1) to (3) represent the following in Tables 1 and 3. (1) : Epoxy equivalent: 173 g / equivalent (g / eq) (2) : Epoxy equivalent: 188 g / equivalent (3): Epoxy equivalent: 178 g / equivalent as apparent from Tables 1 to 4 Alkali-developing flux according to the present invention 43 320584 200918585 Resist ink (using, for example, a ring grease) has excellent error-free soldering. Unsaturated polybasic (tetra) trees are similar, and Huai &amp; resistance, resistance (preventing peeling) And to prevent fading) or = two when the flux resist ink is placed in high temperature, the material can be highly L 4 j. Functional inorganic filling can achieve high reflectivity and high thermal conductivity. The m is a curable resin composition that can correspond to a high performance rate of an electronic device. The 4 inch other person's inventor has tested the ink to have a solder resisting resistance and a small color-blocking property of the resisting agent, and has enhanced long-term high temperature fading resistance and (10) spear reflectance. This ink is very useful as a white solder resist for LED substrates or the like. [Simple description of the diagram] •fe 〇 [Description of main component symbols] M»,

320584 44320584 44

Claims (1)

200918585 • 七、申請專利範圍: 1· 一種硬化性樹脂組成物,包含: (I) 重量份的硬化性樹脂; (Π) 10至1200重量份的無機填充材;和 I (III) 财機填充材,該有機填充材具有 1至2000(MPa)的彈性模量及〇· 〇1至J〇微米的平均粒 徑,其中,成分(π)對(ΠΙ)的含量重量比為丨至41 / 2. 如申請專利範圍第1項之硬化性樹脂組成物,其中,該 成分(π)為白色顏料及/或具有h 0至5〇〇(w/m •幻的熱 導係數之材料。 3. 如申請專利範圍第1項之硬化性樹脂組成物,其中,該 成分(III)含有橡膠粒子。 4. 如申請專利範圍第1項之硬化性樹脂組成物,其中,該 硬化性樹脂組成物為(A)光-熱固性樹脂组成物,其含有 下列樹脂(1-1)、(1-2)和成分(II)至(VI) ; (B)熱固性 樹脂組成物,其含有下列樹脂(1-2)和成分(II)、(in) 和(VI),或(c)光固性樹脂組成物’其含有下列樹脂(I _ 1) 和成分(II)至(V); (1-1)光固性樹脂; (Ϊ-2)熱固性樹脂; (Π)無機填充材; (III)有機填充材; CIV) 光反應性單體; (V) 光硬化劑;和 45 320584 200918585 (νι) 熱硬化劑。 5. 如申請專利範圍第4項之硬化性樹脂組成物,其中,該 樹脂(1-1)為經由用烯型不飽和酸作為基本單體聚合而 得的含酸基的丙烯酸系樹脂與含脂環族環氧基及/或氧 雜環丁烷基的不飽和化合物之反應產物,該反應產物在 分子内不具有芳環;及/或為經由用含脂環族環氧基及/ 或氧雜環丁烷基的不飽和化合物作為基本單體聚合而 得之含脂環族環氧基及/或氧雜環丁烷基的樹脂與含酸 基的不飽和化合物之反應產物,該反應產物在分子内不 具有芳環。 6. —種製造被覆有阻劑膜之印刷線路板之方法,其中,該 阻劑膜係從申請專利範圍第1至5項中任一項之硬化性 樹脂組成物所形成。 7. —種被覆有阻劑膜之印刷線路板,係用申請專利範圍第-· 6項的方法製造。 46 320584 200918585 四、指定代表圖:本案無圖式。 (一) 本案指定代表圖為:第( )圖。 (二) 本代表圖之元件符號簡單說明: 五、本案若有化學式時,請揭示最能顯示發明特徵的化學式: 本案無化學式。 320584200918585 • VII. Patent application scope: 1. A curable resin composition comprising: (I) parts by weight of hardening resin; (Π) 10 to 1200 parts by weight of inorganic filler; and I (III) The organic filler has an elastic modulus of 1 to 2000 (MPa) and an average particle diameter of 〇·〇1 to J〇micron, wherein the weight ratio of the component (π) to (ΠΙ) is 丨 to 41 / 2. The curable resin composition according to claim 1, wherein the component (π) is a white pigment and/or a material having a thermal conductivity of h 0 to 5 〇〇 (w/m • illusion. 3 The hardenable resin composition of the first aspect of the invention, wherein the component (III) contains a rubber particle. The hardenable resin composition of the first aspect of the invention, wherein the curable resin composition It is (A) a photo-thermosetting resin composition containing the following resins (1-1), (1-2) and components (II) to (VI); (B) a thermosetting resin composition containing the following resins (1) -2) and component (II), (in) and (VI), or (c) photocurable resin composition 'which contains the following tree (I _ 1) and components (II) to (V); (1-1) photocurable resin; (Ϊ-2) thermosetting resin; (Π) inorganic filler; (III) organic filler; CIV) light Reactive monomer; (V) light hardener; and 45 320584 200918585 (νι) thermal hardener. 5. The curable resin composition of claim 4, wherein the resin (1-1) is an acid group-containing acrylic resin obtained by polymerizing an ethylenically unsaturated acid as a basic monomer, and a reaction product of an alicyclic epoxy group and/or an oxetanyl group-unsaturated compound which does not have an aromatic ring in the molecule; and/or is via an alicyclic group-containing epoxy group and/or a reaction product of an alicyclic epoxy group-containing epoxy group and/or an oxetanyl group-containing resin and an acid group-containing unsaturated compound obtained by polymerizing an unsaturated compound of an oxetane group as a basic monomer, the reaction The product does not have an aromatic ring in the molecule. A method of producing a printed wiring board coated with a resist film, wherein the resist film is formed from the curable resin composition according to any one of claims 1 to 5. 7. A printed wiring board coated with a resist film is manufactured by the method of the patent application No. -6. 46 320584 200918585 IV. Designated representative map: There is no schema in this case. (1) The representative representative of the case is: ( ). (2) A brief description of the symbol of the representative figure: 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: There is no chemical formula in this case. 320584
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