KR100942354B1 - 노즐 세정 장치 - Google Patents

노즐 세정 장치 Download PDF

Info

Publication number
KR100942354B1
KR100942354B1 KR1020070140380A KR20070140380A KR100942354B1 KR 100942354 B1 KR100942354 B1 KR 100942354B1 KR 1020070140380 A KR1020070140380 A KR 1020070140380A KR 20070140380 A KR20070140380 A KR 20070140380A KR 100942354 B1 KR100942354 B1 KR 100942354B1
Authority
KR
South Korea
Prior art keywords
cleaning
nozzle
slit nozzle
cleaning member
block
Prior art date
Application number
KR1020070140380A
Other languages
English (en)
Korean (ko)
Other versions
KR20080104941A (ko
Inventor
요시노리 다카기
Original Assignee
다이니폰 스크린 세이조우 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다이니폰 스크린 세이조우 가부시키가이샤 filed Critical 다이니폰 스크린 세이조우 가부시키가이샤
Publication of KR20080104941A publication Critical patent/KR20080104941A/ko
Application granted granted Critical
Publication of KR100942354B1 publication Critical patent/KR100942354B1/ko

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
    • B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
    • B05B15/555—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids discharged by cleaning nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/16—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/12—Brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/02—Cleaning pipes or tubes or systems of pipes or tubes
    • B08B9/027—Cleaning the internal surfaces; Removal of blockages
    • B08B9/032—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing
    • B08B9/0321—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing using pressurised, pulsating or purging fluid

Landscapes

  • Coating Apparatus (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020070140380A 2007-05-28 2007-12-28 노즐 세정 장치 KR100942354B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2007-00140019 2007-05-28
JP2007140019A JP4857193B2 (ja) 2007-05-28 2007-05-28 ノズル洗浄装置

Publications (2)

Publication Number Publication Date
KR20080104941A KR20080104941A (ko) 2008-12-03
KR100942354B1 true KR100942354B1 (ko) 2010-02-12

Family

ID=40105388

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070140380A KR100942354B1 (ko) 2007-05-28 2007-12-28 노즐 세정 장치

Country Status (4)

Country Link
JP (1) JP4857193B2 (zh)
KR (1) KR100942354B1 (zh)
CN (1) CN101314153B (zh)
TW (1) TW200846093A (zh)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5352080B2 (ja) * 2007-12-05 2013-11-27 東京応化工業株式会社 ノズル洗浄装置、ノズル洗浄方法、塗布装置及び塗布方法
JP5258811B2 (ja) * 2010-02-17 2013-08-07 東京エレクトロン株式会社 スリットノズル洗浄装置及び塗布装置
KR100996557B1 (ko) 2010-04-30 2010-11-24 이구환 디스펜싱용 젯 밸브의 노즐 세척장치
JP5771432B2 (ja) * 2011-04-13 2015-08-26 東京応化工業株式会社 塗布装置
JP5819123B2 (ja) * 2011-07-12 2015-11-18 東レ株式会社 口金洗浄方法
JP2013071033A (ja) * 2011-09-27 2013-04-22 Dainippon Screen Mfg Co Ltd ノズル洗浄装置および該ノズル洗浄装置を備えた塗布装置
JP5841449B2 (ja) * 2012-02-10 2016-01-13 東京エレクトロン株式会社 拭き取りパッド及びこのパッドを用いたノズルメンテナンス装置並びに塗布処理装置
CN102962229A (zh) * 2012-08-03 2013-03-13 北京京东方光电科技有限公司 一种涂布喷嘴清洗装置
JP6000782B2 (ja) * 2012-09-26 2016-10-05 株式会社Ｓｃｒｅｅｎホールディングス 塗布装置および液受け洗浄装置
JP2014176812A (ja) * 2013-03-15 2014-09-25 Dainippon Screen Mfg Co Ltd ノズル洗浄装置、塗布装置、ノズル洗浄方法、および塗布方法
CN103846183A (zh) 2013-12-20 2014-06-11 深圳市华星光电技术有限公司 一种涂布机喷嘴清洁装置
KR101578368B1 (ko) * 2014-12-04 2015-12-18 주식회사 디엠에스 노즐립 클리너 및 이를 이용한 슬릿 코터
KR102324883B1 (ko) * 2014-12-29 2021-11-12 주식회사 디엠에스 슬릿 코터
JP6337184B2 (ja) * 2017-06-22 2018-06-06 株式会社Ｓｃｒｅｅｎホールディングス ノズル洗浄装置、塗布装置、ノズル洗浄方法、および塗布方法
JP6815421B2 (ja) * 2019-01-29 2021-01-20 本田技研工業株式会社 ノズル付着物除去装置及びノズル付着物除去方法
JP7194719B2 (ja) * 2020-10-28 2022-12-22 本田技研工業株式会社 材料層形成装置
JP7308182B2 (ja) * 2020-12-21 2023-07-13 株式会社Ｓｃｒｅｅｎホールディングス ノズル洗浄装置および塗布装置
CN114558835B (zh) * 2022-04-02 2022-09-20 广东嘉元科技股份有限公司 一种用于铜箔水洗工艺的喷嘴外部结晶自动清理装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004322091A (ja) * 2003-04-23 2004-11-18 Samsung Electronics Co Ltd 洗浄ユニット、これを有するコーティング装置及び方法
KR100578558B1 (ko) 2004-01-07 2006-05-12 세메스 주식회사 슬릿노즐 세정 장치 및 슬릿노즐 처리 장치
KR20060044725A (ko) * 2004-03-25 2006-05-16 도쿄 오카 고교 가부시키가이샤 슬릿 노즐 세정장치
KR100642666B1 (ko) 2004-03-19 2006-11-10 다이니폰 스크린 세이조우 가부시키가이샤 노즐 세정 장치 및 기판 처리 장치

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002177848A (ja) * 2000-12-15 2002-06-25 Toray Ind Inc 塗布用ダイの清掃装置および清掃方法並びにこれを用いたカラーフィルターの製造装置および製造方法
JP3973578B2 (ja) * 2003-03-10 2007-09-12 東京応化工業株式会社 ノズル洗浄装置
JP4429073B2 (ja) * 2004-05-20 2010-03-10 東京応化工業株式会社 スリットコータの予備吐出装置
JP2006167508A (ja) * 2004-12-13 2006-06-29 Toray Ind Inc 塗布用ダイの清掃方法および清掃装置並びにディスプレイ用部材の製造方法および製造装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004322091A (ja) * 2003-04-23 2004-11-18 Samsung Electronics Co Ltd 洗浄ユニット、これを有するコーティング装置及び方法
KR100578558B1 (ko) 2004-01-07 2006-05-12 세메스 주식회사 슬릿노즐 세정 장치 및 슬릿노즐 처리 장치
KR100642666B1 (ko) 2004-03-19 2006-11-10 다이니폰 스크린 세이조우 가부시키가이샤 노즐 세정 장치 및 기판 처리 장치
KR20060044725A (ko) * 2004-03-25 2006-05-16 도쿄 오카 고교 가부시키가이샤 슬릿 노즐 세정장치

Also Published As

Publication number Publication date
JP4857193B2 (ja) 2012-01-18
TWI337901B (zh) 2011-03-01
CN101314153B (zh) 2010-08-18
CN101314153A (zh) 2008-12-03
JP2008290031A (ja) 2008-12-04
KR20080104941A (ko) 2008-12-03
TW200846093A (en) 2008-12-01

Similar Documents

Publication Publication Date Title
KR100942354B1 (ko) 노즐 세정 장치
KR100642666B1 (ko) 노즐 세정 장치 및 기판 처리 장치
KR101005955B1 (ko) 예비 토출장치 및 예비 토출방법
JP4003441B2 (ja) 表面処理装置および表面処理方法
JP3653198B2 (ja) 乾燥用ノズルおよびこれを用いた乾燥装置ならびに洗浄装置
JP2005230807A (ja) 基板処理装置
TWI531411B (zh) 塗佈裝置及噴嘴的維護方法
JP2000168055A (ja) 印刷用スクリーンの清掃装置及び清掃方法
JP3679904B2 (ja) ノズル洗浄装置および該ノズル洗浄装置を備えた塗布装置
JP4455102B2 (ja) 基板処理装置
JP2013071033A (ja) ノズル洗浄装置および該ノズル洗浄装置を備えた塗布装置
TWI543825B (zh) A coating processing apparatus and a coating treatment method
JP2013193020A (ja) ノズル洗浄装置、塗布装置およびノズル洗浄方法
JP5288383B2 (ja) 塗布処理装置及び塗布処理方法
JP3180143U (ja) 塗布ノズル洗浄装置
KR20130101328A (ko) 인쇄판 세정 장치 및 이를 포함하는 인쇄 장치
JP2000061377A (ja) 基板処理装置および基板処理方法
JP4339299B2 (ja) レジスト塗布装置
JP2010162433A (ja) 液滴吐出装置および液滴吐出ヘッドの保守方法
KR20130091576A (ko) 기판처리장치
TW201703876A (zh) 塗布裝置及塗布方法
JP2024046077A (ja) 印刷装置および印刷装置における清掃方法
JP2022134204A (ja) ノズルガード洗浄装置、ノズルガード洗浄方法および塗布装置
KR200317728Y1 (ko) 에어로졸을 이용한 리드프레임 세정장치
JP3823074B2 (ja) 現像装置

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20130118

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20140120

Year of fee payment: 5

FPAY Annual fee payment

Payment date: 20150120

Year of fee payment: 6

FPAY Annual fee payment

Payment date: 20160119

Year of fee payment: 7

LAPS Lapse due to unpaid annual fee