KR100901094B1 - 경화성 조성물, 경화 피막 및 피복 기재 - Google Patents

경화성 조성물, 경화 피막 및 피복 기재 Download PDF

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Publication number
KR100901094B1
KR100901094B1 KR1020010077928A KR20010077928A KR100901094B1 KR 100901094 B1 KR100901094 B1 KR 100901094B1 KR 1020010077928 A KR1020010077928 A KR 1020010077928A KR 20010077928 A KR20010077928 A KR 20010077928A KR 100901094 B1 KR100901094 B1 KR 100901094B1
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KR
South Korea
Prior art keywords
group
polymerizable monomer
fluorine
meth
acrylate
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Expired - Fee Related
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KR1020010077928A
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English (en)
Korean (ko)
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KR20020059228A (ko
Inventor
이시제끼겐지
야마모또히로쯔구
야마모또유이찌
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아사히 가라스 가부시키가이샤
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F14/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F14/18—Monomers containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020010077928A 2000-12-11 2001-12-10 경화성 조성물, 경화 피막 및 피복 기재 Expired - Fee Related KR100901094B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000375748 2000-12-11
JPJP-P-2000-00375748 2000-12-11
JPJP-P-2001-00327644 2001-10-25
JP2001327644A JP4401049B2 (ja) 2000-12-11 2001-10-25 硬化性組成物、硬化被膜および被覆基材

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020080059776A Division KR20080075063A (ko) 2000-12-11 2008-06-24 경화성 조성물, 경화 피막 및 피복 기재

Publications (2)

Publication Number Publication Date
KR20020059228A KR20020059228A (ko) 2002-07-12
KR100901094B1 true KR100901094B1 (ko) 2009-06-08

Family

ID=26605591

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020010077928A Expired - Fee Related KR100901094B1 (ko) 2000-12-11 2001-12-10 경화성 조성물, 경화 피막 및 피복 기재
KR1020080059776A Withdrawn KR20080075063A (ko) 2000-12-11 2008-06-24 경화성 조성물, 경화 피막 및 피복 기재

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020080059776A Withdrawn KR20080075063A (ko) 2000-12-11 2008-06-24 경화성 조성물, 경화 피막 및 피복 기재

Country Status (4)

Country Link
US (1) US6833393B2 (enExample)
JP (1) JP4401049B2 (enExample)
KR (2) KR100901094B1 (enExample)
TW (1) TWI237649B (enExample)

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AU2002354441A1 (en) * 2001-12-07 2003-06-17 Asahi Glass Company, Limited Optical disk having hard coat layer exhibiting effective lubricity
WO2004044062A1 (ja) * 2002-11-13 2004-05-27 Asahi Glass Company, Limited 活性エネルギー線硬化型被覆用組成物および該組成物の硬化物からなる被膜を有する成形品
JP2004176054A (ja) * 2002-11-13 2004-06-24 Asahi Glass Co Ltd 活性エネルギー線硬化型被覆用組成物及びプラスチック成形品
WO2004047094A1 (ja) * 2002-11-18 2004-06-03 Asahi Glass Company, Limited 表面潤滑性を付与されたハードコート層を有する光ディスク
KR20050075362A (ko) * 2002-11-18 2005-07-20 아사히 가라스 가부시키가이샤 피지 오염 방지성이 부여된 하드 코트층을 갖는 광디스크
JP4590849B2 (ja) * 2003-10-03 2010-12-01 Ｔｄｋ株式会社 ハードコート剤組成物及びこれを用いた光情報媒体
EP1698644B1 (en) * 2003-11-21 2013-02-27 DIC Corporation Fluorine-containing photocuring composition
JP4766296B2 (ja) * 2003-11-21 2011-09-07 Ｄｉｃ株式会社 フッ素化アルキル基含有（メタ）アクリレートの製造方法
JP4784723B2 (ja) * 2003-12-24 2011-10-05 Ｔｄｋ株式会社 ハードコート剤組成物及びこれを用いた光情報媒体
KR20060131902A (ko) 2004-03-26 2006-12-20 아사히 가라스 가부시키가이샤 활성 에너지선 경화성 피복용 조성물 및 성형품
JP2006059507A (ja) * 2004-08-24 2006-03-02 Tdk Corp 光記録媒体
JP5148844B2 (ja) * 2006-06-05 2013-02-20 Ｈｏｙａ株式会社 眼鏡レンズの製造方法および眼鏡レンズ
US8231973B2 (en) * 2006-06-13 2012-07-31 3M Innovative Properties Company Fluoro(meth)acrylate polymer composition suitable for low index layer of antireflective film
US7615283B2 (en) 2006-06-13 2009-11-10 3M Innovative Properties Company Fluoro(meth)acrylate polymer composition suitable for low index layer of antireflective film
GB0703172D0 (en) * 2007-02-19 2007-03-28 Pa Knowledge Ltd Printed circuit boards
KR101420470B1 (ko) 2007-05-29 2014-07-16 아사히 가라스 가부시키가이샤 감광성 조성물, 격벽, 블랙 매트릭스
WO2009001629A1 (ja) * 2007-06-26 2008-12-31 Konica Minolta Opto, Inc. クリアーハードコートフィルム、これを用いた反射防止フィルム、偏光板、及び表示装置
WO2009051122A1 (ja) * 2007-10-19 2009-04-23 Kaneka Corporation 薄膜太陽電池モジュール
JP5607540B2 (ja) 2007-12-12 2014-10-15 スリーエム イノベイティブ プロパティズ カンパニー ポリ（アルキレンオキシド）反復単位を備えたペルフルオロポリエーテルポリマーを含むハードコート
JP5342344B2 (ja) * 2008-11-21 2013-11-13 旭化成イーマテリアルズ株式会社 新規ペリクル及びその製法
JP4277936B1 (ja) * 2008-12-05 2009-06-10 東洋インキ製造株式会社 活性エネルギー線硬化性組成物
JP2011127103A (ja) * 2009-11-18 2011-06-30 Nitto Denko Corp 複合フィルム
WO2011096081A1 (ja) * 2010-02-08 2011-08-11 株式会社 きもと エマルジョンマスク用電離放射線硬化型保護液およびそれを用いたエマルジョンマスク
WO2011114884A1 (ja) * 2010-03-15 2011-09-22 コニカミノルタオプト株式会社 ハードコートフィルム、その製造方法、偏光板、及び液晶表示装置
JP2012116978A (ja) * 2010-12-02 2012-06-21 Shin-Etsu Chemical Co Ltd 側鎖に（メタ）アクリル基を有する含フッ素共重合体及びこれを含む硬化性組成物
JP5720395B2 (ja) * 2011-04-20 2015-05-20 大日本印刷株式会社 タッチパネル付カラーフィルタ用保護層形成用組成物
TWI471693B (zh) * 2011-11-10 2015-02-01 Canon Kk 光可固化組成物，及使用彼之圖案化方法
JP6112334B2 (ja) * 2012-03-30 2017-04-12 Dic株式会社 フッ素原子含有重合性樹脂、それを用いた活性エネルギー線硬化性組成物、その硬化物及び物品。
KR102022464B1 (ko) * 2013-09-11 2019-09-18 엘지디스플레이 주식회사 디스플레이 장치 및 그 제조방법
WO2015182744A1 (ja) * 2014-05-30 2015-12-03 三菱レイヨン株式会社 樹脂製品
US9994732B1 (en) 2014-09-12 2018-06-12 Steven Martin Johnson Polysilazane and fluoroacrylate coating composition
US10562065B1 (en) * 2015-11-03 2020-02-18 Newtech Llc Systems and methods for application of polysilazane and fluoroacrylate coating compositions
US10584264B1 (en) * 2016-02-25 2020-03-10 Newtech Llc Hydrophobic and oleophobic coating compositions
CN109642000B (zh) * 2016-10-12 2021-11-19 日产化学株式会社 耐光性硬涂层材料
JP6354930B1 (ja) * 2016-12-07 2018-07-11 Dic株式会社 ＶａＲＴＭ成形用樹脂組成物、成形材料、成形品及び成形品の製造方法

Citations (4)

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Publication number Priority date Publication date Assignee Title
JPS63308017A (ja) * 1987-06-09 1988-12-15 Kansai Paint Co Ltd 硬化性組成物
JPH01223107A (ja) * 1988-03-02 1989-09-06 Kansai Paint Co Ltd 硬化性組成物
JPH04345609A (ja) * 1991-05-23 1992-12-01 Nippon Kayaku Co Ltd カラ−フイルタ−保護膜用紫外線硬化性樹脂組成物及びその硬化物
JPH08176504A (ja) * 1995-09-11 1996-07-09 Dainippon Ink & Chem Inc 被覆剤

Family Cites Families (2)

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US6184339B1 (en) * 1996-11-14 2001-02-06 The United States Of America As Represented By The Secretary Of The Commerce High strength polymeric networks derived from (meth) acrylate resins with organofluorine content and process for preparing same
JPH1160992A (ja) 1997-08-22 1999-03-05 Asahi Glass Co Ltd 紫外線硬化性被覆用組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63308017A (ja) * 1987-06-09 1988-12-15 Kansai Paint Co Ltd 硬化性組成物
JPH01223107A (ja) * 1988-03-02 1989-09-06 Kansai Paint Co Ltd 硬化性組成物
JPH04345609A (ja) * 1991-05-23 1992-12-01 Nippon Kayaku Co Ltd カラ−フイルタ−保護膜用紫外線硬化性樹脂組成物及びその硬化物
JPH08176504A (ja) * 1995-09-11 1996-07-09 Dainippon Ink & Chem Inc 被覆剤

Also Published As

Publication number Publication date
US6833393B2 (en) 2004-12-21
KR20020059228A (ko) 2002-07-12
TWI237649B (en) 2005-08-11
KR20080075063A (ko) 2008-08-14
JP4401049B2 (ja) 2010-01-20
JP2002241446A (ja) 2002-08-28
US20020111391A1 (en) 2002-08-15

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