KR100853726B1 - 이온 밸런스 조정방법 및 그것을 이용한 워크의 제전방법 - Google Patents

이온 밸런스 조정방법 및 그것을 이용한 워크의 제전방법 Download PDF

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KR100853726B1
KR100853726B1 KR1020060116762A KR20060116762A KR100853726B1 KR 100853726 B1 KR100853726 B1 KR 100853726B1 KR 1020060116762 A KR1020060116762 A KR 1020060116762A KR 20060116762 A KR20060116762 A KR 20060116762A KR 100853726 B1 KR100853726 B1 KR 100853726B1
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positive
workpiece
ion balance
static elimination
negative
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KR20070055393A (ko
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토시오 사토
사토시 스즈키
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에스엠시 가부시키가이샤
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
    • H05F3/00—Carrying-off electrostatic charges
    • H05F3/04—Carrying-off electrostatic charges by means of spark gaps or other discharge devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
    • H01T19/00—Devices providing for corona discharge
    • H01T19/04—Devices providing for corona discharge having pointed electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
    • H01T23/00—Apparatus for generating ions to be introduced into non-enclosed gases, e.g. into the atmosphere

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Elimination Of Static Electricity (AREA)
KR1020060116762A 2005-11-25 2006-11-24 이온 밸런스 조정방법 및 그것을 이용한 워크의 제전방법 Active KR100853726B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00340027 2005-11-25
JP2005340027A JP4910207B2 (ja) 2005-11-25 2005-11-25 イオンバランス調整方法及びそれを用いたワークの除電方法

Publications (2)

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KR20070055393A KR20070055393A (ko) 2007-05-30
KR100853726B1 true KR100853726B1 (ko) 2008-08-22

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KR1020060116762A Active KR100853726B1 (ko) 2005-11-25 2006-11-24 이온 밸런스 조정방법 및 그것을 이용한 워크의 제전방법

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Country Link
US (1) US7586731B2 (https=)
JP (1) JP4910207B2 (https=)
KR (1) KR100853726B1 (https=)
CN (1) CN1972551B (https=)
DE (1) DE102006055121B4 (https=)
TW (1) TW200738072A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130111435A (ko) * 2012-03-30 2013-10-10 에스엠씨 가부시키 가이샤 전하발생장치
WO2022270938A1 (ko) * 2021-06-25 2022-12-29 (주)선재하이테크 광 이오나이저

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KR100759587B1 (ko) * 2005-04-19 2007-09-17 (주)선재하이테크 막대형 이오나이저
JP5097514B2 (ja) * 2007-11-22 2012-12-12 国立大学法人東京工業大学 ワイヤ電極式イオナイザ
JP5299989B2 (ja) * 2007-12-06 2013-09-25 ヒューグルエレクトロニクス株式会社 イオナイザ
KR100944078B1 (ko) * 2008-01-28 2010-02-24 한국원자력연구원 이온 발생 장치 및 이온 발생 방법
JP5212787B2 (ja) * 2008-02-28 2013-06-19 Ｓｍｃ株式会社 イオナイザ
JP5201338B2 (ja) * 2008-07-08 2013-06-05 Ｓｍｃ株式会社 イオナイザ
CN102106051B (zh) * 2008-08-01 2015-03-25 夏普株式会社 照明装置
JP5336949B2 (ja) * 2009-06-30 2013-11-06 サントリーホールディングス株式会社 樹脂製容器の帯電除去方法、樹脂製容器の殺菌充填方法、樹脂製容器の充填キャッピング方法、樹脂製容器の帯電除去装置および樹脂製容器の殺菌充填システム
JP5435423B2 (ja) 2009-12-09 2014-03-05 Ｓｍｃ株式会社 イオナイザ及び除電方法
CN101969736A (zh) * 2010-11-03 2011-02-09 北京聚星创源科技有限公司 离子发生系统及控制离子平衡度的方法
US9588161B2 (en) 2010-12-07 2017-03-07 Desco Industries, Inc. Ionization balance device with shielded capacitor circuit for ion balance measurements and adjustments
WO2013085952A1 (en) 2011-12-08 2013-06-13 3M Innovative Properties Company An ionization monitoring device and method
DE102012207219B4 (de) 2012-04-30 2017-11-23 Gema Switzerland Gmbh Antistatikvorrichtung und zugehöriges Betriebsverfahren
KR101750740B1 (ko) * 2013-04-11 2017-06-27 가부시키가이샤 고가네이 이온 발생기
CN103354693A (zh) * 2013-06-14 2013-10-16 苏州天华超净科技股份有限公司 静电消除系统
WO2015076155A1 (ja) * 2013-11-20 2015-05-28 株式会社コガネイ イオン発生器
US11337783B2 (en) * 2014-10-22 2022-05-24 Ivoclar Vivadent Ag Dental machine tool
US10251251B2 (en) * 2016-02-03 2019-04-02 Yi Jing Technology Co., Ltd Electrostatic dissipation device with static sensing and method thereof
US10548206B2 (en) * 2017-09-05 2020-01-28 International Business Machines Corporation Automated static control
WO2019175952A1 (ja) 2018-03-13 2019-09-19 株式会社 エー・アンド・デイ 除電器、除電器を備えた電子天びん、および除電方法
JP6740299B2 (ja) * 2018-08-24 2020-08-12 ファナック株式会社 加工条件調整装置及び機械学習装置
KR102346822B1 (ko) * 2019-09-17 2022-01-04 (주)선재하이테크 이온 밸런스의 감시 및 이온 밸런스의 자동 조정 기능을 구비한 바 타입 이오나이저
KR102295099B1 (ko) 2019-10-04 2021-08-31 한국전자기술연구원 이온밸런스 측정센서 및 그 측정방법, 이온밸런스 측정센서를 이용한 이온밸런스 조절장치 및 그 조절방법
KR102382561B1 (ko) * 2020-02-21 2022-04-04 에스케이하이닉스 주식회사 이온 발생기의 모니터링 장치 및 시스템
JP7433719B2 (ja) * 2020-04-10 2024-02-20 株式会社ディスコ 加工装置
WO2022092376A1 (ko) * 2020-11-02 2022-05-05 한국전자기술연구원 이온밸런스 측정센서 및 그 측정방법, 이온밸런스 측정센서를 이용한 이온밸런스 조절장치 및 그 조절방법
US11785697B2 (en) * 2022-01-07 2023-10-10 Universal City Studios Llc Systems and methods for monitoring electrostatic buildup for an attraction system
TWI858502B (zh) * 2023-01-11 2024-10-11 有銳有限公司 用於靜電消除設備的離子平衡監控系統與其運作方法

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JPH06203993A (ja) * 1992-01-16 1994-07-22 Takasago Thermal Eng Co Ltd イオナイザによる帯電物品の除電制御法
JP2003068497A (ja) 2001-08-29 2003-03-07 Kasuga Electric Works Ltd 直流除電器の制御方法及び制御装置
JP2004063427A (ja) 2002-07-31 2004-02-26 Sunx Ltd 除電装置
JP2005100870A (ja) * 2003-09-25 2005-04-14 Shuji Takaishi イオン発生量制御方法及びイオナイザー

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US4630167A (en) 1985-03-11 1986-12-16 Cybergen Systems, Inc. Static charge neutralizing system and method
DE3603947A1 (de) 1986-02-06 1987-08-13 Stiehl Hans Henrich Dr System zur dosierung von luftgetragenen ionen mit hoher genauigkeit und verbessertem wirkungsgrad zur eliminierung elektrostatischer flaechenladungen
US4951172A (en) * 1988-07-20 1990-08-21 Ion Systems, Inc. Method and apparatus for regulating air ionization
JPH0612718B2 (ja) 1990-03-14 1994-02-16 春日電機株式会社 除電器のイオンバランス制御装置
EP1448029A3 (en) * 1992-08-14 2010-01-27 Hamamatsu Photonics K.K. Apparatus and method for producing gaseous ions by use of x-rays, and various apparatuses and structures using them
JP4020475B2 (ja) 1997-10-24 2007-12-12 株式会社キーエンス 除電装置
US6252233B1 (en) 1998-09-18 2001-06-26 Illinois Tool Works Inc. Instantaneous balance control scheme for ionizer
US6252756B1 (en) 1998-09-18 2001-06-26 Illinois Tool Works Inc. Low voltage modular room ionization system
JP4058273B2 (ja) * 2002-01-22 2008-03-05 株式会社Ｔｒｉｎｃ 静電位イオンバランス測定器および除電装置
US6873515B2 (en) 2002-04-17 2005-03-29 United Microelectronics Corp. Method for preventing electrostatic discharge in a clean room
US20050052815A1 (en) 2003-09-09 2005-03-10 Smc Corporation Static eliminating method and apparatus therefor

Patent Citations (4)

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Publication number Priority date Publication date Assignee Title
JPH06203993A (ja) * 1992-01-16 1994-07-22 Takasago Thermal Eng Co Ltd イオナイザによる帯電物品の除電制御法
JP2003068497A (ja) 2001-08-29 2003-03-07 Kasuga Electric Works Ltd 直流除電器の制御方法及び制御装置
JP2004063427A (ja) 2002-07-31 2004-02-26 Sunx Ltd 除電装置
JP2005100870A (ja) * 2003-09-25 2005-04-14 Shuji Takaishi イオン発生量制御方法及びイオナイザー

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130111435A (ko) * 2012-03-30 2013-10-10 에스엠씨 가부시키 가이샤 전하발생장치
KR101959280B1 (ko) * 2012-03-30 2019-03-18 에스엠시 가부시키가이샤 전하발생장치
WO2022270938A1 (ko) * 2021-06-25 2022-12-29 (주)선재하이테크 광 이오나이저

Also Published As

Publication number Publication date
DE102006055121B4 (de) 2018-11-29
DE102006055121A1 (de) 2007-05-31
KR20070055393A (ko) 2007-05-30
US7586731B2 (en) 2009-09-08
CN1972551A (zh) 2007-05-30
JP4910207B2 (ja) 2012-04-04
TWI326191B (https=) 2010-06-11
JP2007149419A (ja) 2007-06-14
US20070133145A1 (en) 2007-06-14
CN1972551B (zh) 2011-05-04
TW200738072A (en) 2007-10-01

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