CN1972551B - 离子平衡调整方法以及使用它的工件的除电方法 - Google Patents

离子平衡调整方法以及使用它的工件的除电方法 Download PDF

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Publication number
CN1972551B
CN1972551B CN2006101628437A CN200610162843A CN1972551B CN 1972551 B CN1972551 B CN 1972551B CN 2006101628437 A CN2006101628437 A CN 2006101628437A CN 200610162843 A CN200610162843 A CN 200610162843A CN 1972551 B CN1972551 B CN 1972551B
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CN1972551A (zh
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佐藤俊夫
铃木智
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SMC Corp
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SMC Corp
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05FSTATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
    • H05F3/00Carrying-off electrostatic charges
    • H05F3/04Carrying-off electrostatic charges by means of spark gaps or other discharge devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01TSPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
    • H01T19/00Devices providing for corona discharge
    • H01T19/04Devices providing for corona discharge having pointed electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01TSPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
    • H01T23/00Apparatus for generating ions to be introduced into non-enclosed gases, e.g. into the atmosphere

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Elimination Of Static Electricity (AREA)
CN2006101628437A 2005-11-25 2006-11-24 离子平衡调整方法以及使用它的工件的除电方法 Active CN1972551B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005-340027 2005-11-25
JP2005340027A JP4910207B2 (ja) 2005-11-25 2005-11-25 イオンバランス調整方法及びそれを用いたワークの除電方法
JP2005340027 2005-11-25

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CN1972551A CN1972551A (zh) 2007-05-30
CN1972551B true CN1972551B (zh) 2011-05-04

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CN2006101628437A Active CN1972551B (zh) 2005-11-25 2006-11-24 离子平衡调整方法以及使用它的工件的除电方法

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US (1) US7586731B2 (https=)
JP (1) JP4910207B2 (https=)
KR (1) KR100853726B1 (https=)
CN (1) CN1972551B (https=)
DE (1) DE102006055121B4 (https=)
TW (1) TW200738072A (https=)

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TWI587591B (zh) * 2012-03-30 2017-06-11 Smc股份有限公司 電荷產生裝置

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JP5212787B2 (ja) * 2008-02-28 2013-06-19 Smc株式会社 イオナイザ
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JP5435423B2 (ja) 2009-12-09 2014-03-05 Smc株式会社 イオナイザ及び除電方法
CN101969736A (zh) * 2010-11-03 2011-02-09 北京聚星创源科技有限公司 离子发生系统及控制离子平衡度的方法
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CN103354693A (zh) * 2013-06-14 2013-10-16 苏州天华超净科技股份有限公司 静电消除系统
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JP6740299B2 (ja) * 2018-08-24 2020-08-12 ファナック株式会社 加工条件調整装置及び機械学習装置
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KR102295099B1 (ko) 2019-10-04 2021-08-31 한국전자기술연구원 이온밸런스 측정센서 및 그 측정방법, 이온밸런스 측정센서를 이용한 이온밸런스 조절장치 및 그 조절방법
KR102382561B1 (ko) * 2020-02-21 2022-04-04 에스케이하이닉스 주식회사 이온 발생기의 모니터링 장치 및 시스템
JP7433719B2 (ja) * 2020-04-10 2024-02-20 株式会社ディスコ 加工装置
WO2022092376A1 (ko) * 2020-11-02 2022-05-05 한국전자기술연구원 이온밸런스 측정센서 및 그 측정방법, 이온밸런스 측정센서를 이용한 이온밸런스 조절장치 및 그 조절방법
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI587591B (zh) * 2012-03-30 2017-06-11 Smc股份有限公司 電荷產生裝置

Also Published As

Publication number Publication date
DE102006055121B4 (de) 2018-11-29
DE102006055121A1 (de) 2007-05-31
KR20070055393A (ko) 2007-05-30
US7586731B2 (en) 2009-09-08
CN1972551A (zh) 2007-05-30
JP4910207B2 (ja) 2012-04-04
TWI326191B (https=) 2010-06-11
JP2007149419A (ja) 2007-06-14
US20070133145A1 (en) 2007-06-14
KR100853726B1 (ko) 2008-08-22
TW200738072A (en) 2007-10-01

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