KR100792462B1 - 투명 피막 형성용 도포액, 이러한 피막부 기재 및 액정표시셀 - Google Patents

투명 피막 형성용 도포액, 이러한 피막부 기재 및 액정표시셀 Download PDF

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Publication number
KR100792462B1
KR100792462B1 KR1020057019971A KR20057019971A KR100792462B1 KR 100792462 B1 KR100792462 B1 KR 100792462B1 KR 1020057019971 A KR1020057019971 A KR 1020057019971A KR 20057019971 A KR20057019971 A KR 20057019971A KR 100792462 B1 KR100792462 B1 KR 100792462B1
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South Korea
Prior art keywords
film
transparent
transparent film
liquid crystal
coating
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KR1020057019971A
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English (en)
Korean (ko)
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KR20060002011A (ko
Inventor
노부아키 요시다
아키라 나카시마
Original Assignee
쇼꾸바이 카세이 고교 가부시키가이샤
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Publication of KR20060002011A publication Critical patent/KR20060002011A/ko
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Publication of KR100792462B1 publication Critical patent/KR100792462B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
KR1020057019971A 2003-06-06 2004-06-04 투명 피막 형성용 도포액, 이러한 피막부 기재 및 액정표시셀 KR100792462B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003162454 2003-06-06
JPJP-P-2003-00162454 2003-06-06

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020077004020A Division KR100829054B1 (ko) 2003-06-06 2004-06-04 액정 표시셀

Publications (2)

Publication Number Publication Date
KR20060002011A KR20060002011A (ko) 2006-01-06
KR100792462B1 true KR100792462B1 (ko) 2008-01-08

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KR1020057019971A KR100792462B1 (ko) 2003-06-06 2004-06-04 투명 피막 형성용 도포액, 이러한 피막부 기재 및 액정표시셀
KR1020077004020A KR100829054B1 (ko) 2003-06-06 2004-06-04 액정 표시셀

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020077004020A KR100829054B1 (ko) 2003-06-06 2004-06-04 액정 표시셀

Country Status (5)

Country Link
JP (2) JP4860263B2 (zh)
KR (2) KR100792462B1 (zh)
CN (2) CN100410341C (zh)
TW (1) TWI257412B (zh)
WO (1) WO2004108845A1 (zh)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1970421B1 (en) * 2005-12-22 2015-04-29 JGC Catalysts and Chemicals Ltd. Coating liquid for forming low dielectric constant amorphous silica coating film and low dielectric constant amorphous silica coating film obtained from such coating liquid
KR101754329B1 (ko) 2010-12-09 2017-07-06 삼성전자주식회사 전기 변색 소자 및 그 제조 방법
JP5678824B2 (ja) * 2011-01-05 2015-03-04 Jsr株式会社 液晶配向剤、液晶配向膜、位相差フィルムの製造方法、位相差フィルム及び液晶表示素子
JP6080583B2 (ja) * 2013-02-07 2017-02-15 日揮触媒化成株式会社 表面改質無機複合酸化物微粒子、その製造方法、該微粒子を含む分散液、光学基材用塗布液、光学基材用塗膜および塗膜付基材
CN103235437B (zh) * 2013-04-27 2015-12-02 南京中电熊猫液晶显示科技有限公司 一种液晶显示装置及其制造方法
JP6266230B2 (ja) * 2013-05-15 2018-01-24 日揮触媒化成株式会社 表面改質金属酸化物微粒子、薄膜形成用の塗布液、薄膜付き基材、光電気セル、及び表面改質金属酸化物微粒子の製造方法
CN105045451B (zh) * 2015-08-14 2019-03-26 昆山国显光电有限公司 触控显示面板及其制造方法
JP6647820B2 (ja) * 2015-09-04 2020-02-14 日揮触媒化成株式会社 透明被膜形成用塗布液、透明被膜形成用塗布液の製造方法、透明被膜付基材、および透明被膜付基材の製造方法
CN106483709A (zh) * 2017-01-03 2017-03-08 京东方科技集团股份有限公司 彩膜基板、阵列基板和显示装置

Citations (3)

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KR20010014143A (ko) * 1998-04-24 2001-02-26 우츠미 오사무 저유전율 실리카계 피막 형성용 도포액 및 저유전율피막으로 도포된 기재
KR20010016614A (ko) * 1999-12-28 2001-03-05 오사무 우쭈미 투명 필름 형성용 코팅 액제, 투명 필름으로 코팅된 기재및 디스플레이 장치
JP4247427B2 (ja) * 2001-12-08 2009-04-02 株式会社ハイニックスセミコンダクター メモリ装置

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JPH07119386B2 (ja) * 1987-06-05 1995-12-20 セイコーエプソン株式会社 コ−ティング用組成物
JP2906472B2 (ja) * 1989-09-01 1999-06-21 旭硝子株式会社 透明成形体
JP2751478B2 (ja) * 1989-10-30 1998-05-18 東レ株式会社 低屈折率ハードコート膜
JP2967944B2 (ja) * 1991-02-01 1999-10-25 触媒化成工業株式会社 透明被膜形成用塗布液、被膜付基材および液晶表示セル
JP3143975B2 (ja) * 1991-09-05 2001-03-07 松下電器産業株式会社 スピーカ接続装置
JP3342170B2 (ja) * 1994-04-18 2002-11-05 日本板硝子株式会社 撥水被膜の形成方法
JP3984292B2 (ja) * 1996-06-24 2007-10-03 触媒化成工業株式会社 透明被膜形成用塗布液、対明被膜付基材およびその用途
JP3563236B2 (ja) * 1996-09-26 2004-09-08 触媒化成工業株式会社 透明導電性被膜形成用塗布液、透明導電性被膜付基材およびその製造方法、表示装置
JP3973808B2 (ja) * 1999-10-18 2007-09-12 株式会社ソフト９９コーポレーション １液式水系撥水処理剤及び２液式水系撥水処理剤並びに無機材表面の撥水処理方法
JP2001139883A (ja) * 1999-11-10 2001-05-22 Catalysts & Chem Ind Co Ltd 透明被膜形成用塗布液、透明被膜付基材および表示装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010014143A (ko) * 1998-04-24 2001-02-26 우츠미 오사무 저유전율 실리카계 피막 형성용 도포액 및 저유전율피막으로 도포된 기재
KR20010016614A (ko) * 1999-12-28 2001-03-05 오사무 우쭈미 투명 필름 형성용 코팅 액제, 투명 필름으로 코팅된 기재및 디스플레이 장치
JP4247427B2 (ja) * 2001-12-08 2009-04-02 株式会社ハイニックスセミコンダクター メモリ装置

Also Published As

Publication number Publication date
JP2011059692A (ja) 2011-03-24
KR20070029291A (ko) 2007-03-13
CN101101400B (zh) 2010-06-02
TW200502654A (en) 2005-01-16
JP4860263B2 (ja) 2012-01-25
CN101101400A (zh) 2008-01-09
KR100829054B1 (ko) 2008-05-16
WO2004108845A1 (ja) 2004-12-16
KR20060002011A (ko) 2006-01-06
CN1795244A (zh) 2006-06-28
JPWO2004108845A1 (ja) 2006-07-20
TWI257412B (en) 2006-07-01
CN100410341C (zh) 2008-08-13

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