KR100790859B1 - 수직 나노튜브를 이용한 비휘발성 메모리 소자 - Google Patents

수직 나노튜브를 이용한 비휘발성 메모리 소자 Download PDF

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Publication number
KR100790859B1
KR100790859B1 KR1020020071041A KR20020071041A KR100790859B1 KR 100790859 B1 KR100790859 B1 KR 100790859B1 KR 1020020071041 A KR1020020071041 A KR 1020020071041A KR 20020071041 A KR20020071041 A KR 20020071041A KR 100790859 B1 KR100790859 B1 KR 100790859B1
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KR
South Korea
Prior art keywords
memory device
nanotube
nanotubes
silicon
film
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Expired - Lifetime
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KR1020020071041A
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English (en)
Korean (ko)
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KR20040043043A (ko
Inventor
최원봉
이조원
강호규
김정우
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삼성전자주식회사
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Priority to KR1020020071041A priority Critical patent/KR100790859B1/ko
Priority to CNB2003101138152A priority patent/CN1317768C/zh
Priority to DE60300477T priority patent/DE60300477T2/de
Priority to EP03257104A priority patent/EP1420414B1/en
Priority to JP2003384459A priority patent/JP4047797B2/ja
Priority to US10/713,214 priority patent/US6930343B2/en
Publication of KR20040043043A publication Critical patent/KR20040043043A/ko
Priority to JP2007211348A priority patent/JP5307993B2/ja
Application granted granted Critical
Publication of KR100790859B1 publication Critical patent/KR100790859B1/ko
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/02—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using elements whose operation depends upon chemical change
    • G11C13/025—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using elements whose operation depends upon chemical change using fullerenes, e.g. C60, or nanotubes, e.g. carbon or silicon nanotubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/69—IGFETs having charge trapping gate insulators, e.g. MNOS transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/69—IGFETs having charge trapping gate insulators, e.g. MNOS transistors
    • H10D30/691—IGFETs having charge trapping gate insulators, e.g. MNOS transistors having more than two programming levels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/69—IGFETs having charge trapping gate insulators, e.g. MNOS transistors
    • H10D30/693—Vertical IGFETs having charge trapping gate insulators
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
    • H10K85/221—Carbon nanotubes
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/10—Resistive cells; Technology aspects
    • G11C2213/16—Memory cell being a nanotube, e.g. suspended nanotube
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/10—Resistive cells; Technology aspects
    • G11C2213/17—Memory cell being a nanowire transistor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/902—Specified use of nanostructure
    • Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
    • Y10S977/943—Information storage or retrieval using nanostructure

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
KR1020020071041A 2002-11-15 2002-11-15 수직 나노튜브를 이용한 비휘발성 메모리 소자 Expired - Lifetime KR100790859B1 (ko)

Priority Applications (7)

Application Number Priority Date Filing Date Title
KR1020020071041A KR100790859B1 (ko) 2002-11-15 2002-11-15 수직 나노튜브를 이용한 비휘발성 메모리 소자
CNB2003101138152A CN1317768C (zh) 2002-11-15 2003-11-04 利用垂直纳米管的非易失性存储装置
EP03257104A EP1420414B1 (en) 2002-11-15 2003-11-11 Nonvolatile memory device utilising vertical nanotube
DE60300477T DE60300477T2 (de) 2002-11-15 2003-11-11 Nichtflüchtige Speichervorrichtung mit vertikalen Nanoröhren
JP2003384459A JP4047797B2 (ja) 2002-11-15 2003-11-14 垂直ナノチューブを利用した不揮発性メモリ素子
US10/713,214 US6930343B2 (en) 2002-11-15 2003-11-17 Nonvolatile memory device utilizing a vertical nanotube
JP2007211348A JP5307993B2 (ja) 2002-11-15 2007-08-14 垂直ナノチューブを利用した不揮発性メモリ素子

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020020071041A KR100790859B1 (ko) 2002-11-15 2002-11-15 수직 나노튜브를 이용한 비휘발성 메모리 소자

Publications (2)

Publication Number Publication Date
KR20040043043A KR20040043043A (ko) 2004-05-22
KR100790859B1 true KR100790859B1 (ko) 2008-01-03

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KR1020020071041A Expired - Lifetime KR100790859B1 (ko) 2002-11-15 2002-11-15 수직 나노튜브를 이용한 비휘발성 메모리 소자

Country Status (6)

Country Link
US (1) US6930343B2 (https=)
EP (1) EP1420414B1 (https=)
JP (2) JP4047797B2 (https=)
KR (1) KR100790859B1 (https=)
CN (1) CN1317768C (https=)
DE (1) DE60300477T2 (https=)

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KR100666187B1 (ko) * 2004-08-04 2007-01-09 학교법인 한양학원 나노선을 이용한 수직형 반도체 소자 및 이의 제조 방법
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Also Published As

Publication number Publication date
EP1420414A1 (en) 2004-05-19
CN1501503A (zh) 2004-06-02
JP4047797B2 (ja) 2008-02-13
EP1420414B1 (en) 2005-04-06
KR20040043043A (ko) 2004-05-22
JP5307993B2 (ja) 2013-10-02
US20040095837A1 (en) 2004-05-20
DE60300477D1 (de) 2005-05-12
JP2007329500A (ja) 2007-12-20
US6930343B2 (en) 2005-08-16
JP2004172616A (ja) 2004-06-17
CN1317768C (zh) 2007-05-23
DE60300477T2 (de) 2006-02-23

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