KR100716485B1 - 불투명 석영유리의 제조 방법, 이 방법을 실행하기에적합한 ｓｉｏ2 과립재료 및 불투명 석영유리로 이루어진물품 - Google Patents

불투명 석영유리의 제조 방법, 이 방법을 실행하기에적합한 ｓｉｏ2 과립재료 및 불투명 석영유리로 이루어진물품 Download PDF

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KR100716485B1
KR100716485B1 KR1020027008182A KR20027008182A KR100716485B1 KR 100716485 B1 KR100716485 B1 KR 100716485B1 KR 1020027008182 A KR1020027008182 A KR 1020027008182A KR 20027008182 A KR20027008182 A KR 20027008182A KR 100716485 B1 KR100716485 B1 KR 100716485B1
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South Korea
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sio
quartz glass
granules
delete delete
opaque quartz
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Korean (ko)
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KR20020066333A (ko
Inventor
베르덱커발트라우트
파비안하인쯔
게르티그우도
라이스트요한
괴벨롤프
Original Assignee
헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지
신에쯔 세끼에이 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • C03C1/026—Pelletisation or prereacting of powdered raw materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/24—Doped silica-based glasses containing non-metals other than boron or halide containing nitrogen, e.g. silicon oxy-nitride glasses
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/26—Doped silica-based glasses containing non-metals other than boron or halide containing carbon
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/32—Doped silica-based glasses containing metals containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/10—Melting processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Silicon Compounds (AREA)
  • Glass Compositions (AREA)
KR1020027008182A 1999-12-22 2000-12-14 불투명 석영유리의 제조 방법, 이 방법을 실행하기에적합한 ｓｉｏ2 과립재료 및 불투명 석영유리로 이루어진물품 Expired - Lifetime KR100716485B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19962451A DE19962451C1 (de) 1999-12-22 1999-12-22 Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat
DE19962451.8 1999-12-22
PCT/EP2000/012687 WO2001046079A1 (de) 1999-12-22 2000-12-14 VERFAHREN FÜR DIE HERSTELLUNG VON OPAKEM QUARZGLAS, FÜR DIE DURCHFÜHRUNG DES VERFAHRENS GEEIGNETES SiO2-GRANULAT UND BAUTEIL AUS OPAKEM QUARZGLAS

Publications (2)

Publication Number Publication Date
KR20020066333A KR20020066333A (ko) 2002-08-14
KR100716485B1 true KR100716485B1 (ko) 2007-05-10

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KR1020027008182A Expired - Lifetime KR100716485B1 (ko) 1999-12-22 2000-12-14 불투명 석영유리의 제조 방법, 이 방법을 실행하기에적합한 ｓｉｏ2 과립재료 및 불투명 석영유리로 이루어진물품

Country Status (9)

Country Link
US (1) US6380110B1 (enExample)
EP (1) EP1240114B1 (enExample)
JP (1) JP4681189B2 (enExample)
KR (1) KR100716485B1 (enExample)
CN (1) CN1200896C (enExample)
CA (1) CA2395501A1 (enExample)
DE (2) DE19962451C1 (enExample)
TW (1) TW548246B (enExample)
WO (1) WO2001046079A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3248950A1 (de) * 2016-05-24 2017-11-29 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung eines poren enthaltenden, opaken quarzglases

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DE10019693B4 (de) * 2000-04-20 2006-01-19 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben
DE10020955A1 (de) * 2000-04-28 2001-11-22 Fraunhofer Ges Forschung Formkörper und Verfahren zur Herstellung
DE10055362C1 (de) * 2000-11-08 2002-01-24 Heraeus Quarzglas Verfahren zur Herstellung eines SiO¶2¶-Rohlings und Vorrichtung zur Durchführung des Verfahrens
DE10055357C1 (de) * 2000-11-08 2002-08-14 Heraeus Quarzglas Verfahren und Vorrichtung zur Herstellung eines SiO¶2¶-Rohlings
DE10159959A1 (de) * 2001-12-06 2003-06-26 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil und Verwendung desselben
DE10243953B4 (de) * 2002-09-21 2005-11-17 Heraeus Quarzglas Gmbh & Co. Kg Verfahren für die Herstellung eines Bauteils aus opakem Quarzglas
EP1580170B1 (en) * 2002-11-29 2019-01-16 Heraeus Quarzglas GmbH & Co. KG Method for producing synthetic quartz glass and synthetic quartz glass article
US7637126B2 (en) * 2003-12-08 2009-12-29 Heraeus Quarzglas Gmbh & Co. Kg Method for the production of laser-active quartz glass and use thereof
DE102004038602B3 (de) * 2004-08-07 2005-12-29 Heraeus Quarzglas Gmbh & Co. Kg Elektrogeschmolzenes, synthetisches Quarzglas, insbesondere für den Einsatz in der Lampen- und in der Halbleiterfertigung und Verfahren zur Herstellung desselben
DE102004052312A1 (de) * 2004-08-23 2006-03-02 Heraeus Quarzglas Gmbh & Co. Kg Beschichtetes Bauteil aus Quarzglas sowie Verfahren zur Herstellung des Bauteils
DE102004051846B4 (de) * 2004-08-23 2009-11-05 Heraeus Quarzglas Gmbh & Co. Kg Bauteil mit einer Reflektorschicht sowie Verfahren für seine Herstellung
US7563512B2 (en) * 2004-08-23 2009-07-21 Heraeus Quarzglas Gmbh & Co. Kg Component with a reflector layer and method for producing the same
DE102006018711B4 (de) * 2006-04-20 2008-09-25 Heraeus Quarzglas Gmbh & Co. Kg Werkstoff, insbesondere für ein optisches Bauteil zum Einsatz in der Mikrolithographie und Verfahren zur Herstellung eines Formkörpers aus dem Werkstoff
WO2008069194A1 (ja) * 2006-12-05 2008-06-12 Shin-Etsu Quartz Products Co., Ltd. 合成不透明石英ガラス及びその製造方法
DE102007017004A1 (de) * 2007-02-27 2008-08-28 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils
JP5171098B2 (ja) * 2007-04-24 2013-03-27 岩崎電気株式会社 石英ガラス製品の製造方法、それに用いるシリカ顆粒とその生成方法
DE102009005446A1 (de) * 2009-01-21 2010-07-22 Schott Ag Granulat, Verfahren zu dessen Herstellung sowie dessen Verwendung
KR101246157B1 (ko) * 2010-12-09 2013-03-20 한국세라믹기술원 엔지니어드 스톤의 제조방법
TWI652240B (zh) * 2014-02-17 2019-03-01 日商東曹股份有限公司 不透明石英玻璃及其製造方法
EP3000790B2 (de) 2014-09-29 2023-07-26 Heraeus Quarzglas GmbH & Co. KG Verfahren für die Herstellung von Bauteilen aus synthetischem Quarzglas aus SiO2-Granulat
JP6558137B2 (ja) * 2015-08-07 2019-08-14 東ソー株式会社 不透明シリカガラス製造用の高強度成形体
CN108698895A (zh) * 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在悬挂式烧结坩埚中制备石英玻璃体
CN109153593A (zh) 2015-12-18 2019-01-04 贺利氏石英玻璃有限两合公司 合成石英玻璃粉粒的制备
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JP2019506349A (ja) * 2015-12-18 2019-03-07 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 吊り下げ式金属シート坩堝内での石英ガラス体の調製
KR20180094087A (ko) 2015-12-18 2018-08-22 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 과립으로부터 실리카 유리 제품의 제조
WO2017103153A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
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JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
EP3185057A1 (de) * 2015-12-22 2017-06-28 Heraeus Quarzglas GmbH & Co. KG Faseroptische streueinrichtung und herstellungsverfahren dafür
JP6878829B2 (ja) * 2016-10-26 2021-06-02 東ソー株式会社 シリカ粉末及び高流動性シリカ造粒粉末並びにその製造方法
EP3476815B1 (en) 2017-10-27 2023-11-29 Heraeus Quarzglas GmbH & Co. KG Production of a porous product including post-adapting a pore structure

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US3532473A (en) 1965-04-29 1970-10-06 Degussa Process for producing a spherical granulated silica material
JPH07300341A (ja) * 1994-04-28 1995-11-14 Shinetsu Quartz Prod Co Ltd 不透明石英ガラスおよびその製造方法
US5643347A (en) 1994-07-11 1997-07-01 Heraeus Quarzglas Gmbh Process for manufacture of silica granules
EP0890555A1 (de) * 1997-07-10 1999-01-13 Heraeus Quarzglas GmbH Verfahren zur Herstellung von SiO2-Granulat

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Publication number Priority date Publication date Assignee Title
US3532473A (en) 1965-04-29 1970-10-06 Degussa Process for producing a spherical granulated silica material
JPH07300341A (ja) * 1994-04-28 1995-11-14 Shinetsu Quartz Prod Co Ltd 不透明石英ガラスおよびその製造方法
US5643347A (en) 1994-07-11 1997-07-01 Heraeus Quarzglas Gmbh Process for manufacture of silica granules
EP0890555A1 (de) * 1997-07-10 1999-01-13 Heraeus Quarzglas GmbH Verfahren zur Herstellung von SiO2-Granulat

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3248950A1 (de) * 2016-05-24 2017-11-29 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung eines poren enthaltenden, opaken quarzglases
US10358373B2 (en) 2016-05-24 2019-07-23 Heraeus Quarzglas Gmbh & Co. Kg Method for producing a pore-containing opaque quartz glass

Also Published As

Publication number Publication date
DE19962451C1 (de) 2001-08-30
US6380110B1 (en) 2002-04-30
TW548246B (en) 2003-08-21
EP1240114A1 (de) 2002-09-18
KR20020066333A (ko) 2002-08-14
CN1413175A (zh) 2003-04-23
EP1240114B1 (de) 2005-12-07
JP2004500299A (ja) 2004-01-08
WO2001046079A1 (de) 2001-06-28
DE50011832D1 (de) 2006-01-12
JP4681189B2 (ja) 2011-05-11
CA2395501A1 (en) 2001-06-28
CN1200896C (zh) 2005-05-11

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