CN1200896C - 石英玻璃的制造方法及所用的颗粒和由其构成的部件 - Google Patents
石英玻璃的制造方法及所用的颗粒和由其构成的部件 Download PDFInfo
- Publication number
- CN1200896C CN1200896C CNB008177104A CN00817710A CN1200896C CN 1200896 C CN1200896 C CN 1200896C CN B008177104 A CNB008177104 A CN B008177104A CN 00817710 A CN00817710 A CN 00817710A CN 1200896 C CN1200896 C CN 1200896C
- Authority
- CN
- China
- Prior art keywords
- sio
- particles
- particle
- density
- quartz glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/02—Pretreated ingredients
- C03C1/026—Pelletisation or prereacting of powdered raw materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1005—Forming solid beads
- C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
- C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/24—Doped silica-based glasses containing non-metals other than boron or halide containing nitrogen, e.g. silicon oxy-nitride glasses
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/26—Doped silica-based glasses containing non-metals other than boron or halide containing carbon
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/32—Doped silica-based glasses containing metals containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/10—Melting processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
- C03C2203/54—Heat-treatment in a dopant containing atmosphere
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19962451A DE19962451C1 (de) | 1999-12-22 | 1999-12-22 | Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat |
| DE19962451.8 | 1999-12-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1413175A CN1413175A (zh) | 2003-04-23 |
| CN1200896C true CN1200896C (zh) | 2005-05-11 |
Family
ID=7934123
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB008177104A Expired - Lifetime CN1200896C (zh) | 1999-12-22 | 2000-12-14 | 石英玻璃的制造方法及所用的颗粒和由其构成的部件 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6380110B1 (enExample) |
| EP (1) | EP1240114B1 (enExample) |
| JP (1) | JP4681189B2 (enExample) |
| KR (1) | KR100716485B1 (enExample) |
| CN (1) | CN1200896C (enExample) |
| CA (1) | CA2395501A1 (enExample) |
| DE (2) | DE19962451C1 (enExample) |
| TW (1) | TW548246B (enExample) |
| WO (1) | WO2001046079A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107417071A (zh) * | 2016-05-24 | 2017-12-01 | 贺利氏石英玻璃股份有限两合公司 | 制造含孔隙的不透明石英玻璃的方法 |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10019693B4 (de) * | 2000-04-20 | 2006-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben |
| DE10020955A1 (de) * | 2000-04-28 | 2001-11-22 | Fraunhofer Ges Forschung | Formkörper und Verfahren zur Herstellung |
| DE10055362C1 (de) * | 2000-11-08 | 2002-01-24 | Heraeus Quarzglas | Verfahren zur Herstellung eines SiO¶2¶-Rohlings und Vorrichtung zur Durchführung des Verfahrens |
| DE10055357C1 (de) * | 2000-11-08 | 2002-08-14 | Heraeus Quarzglas | Verfahren und Vorrichtung zur Herstellung eines SiO¶2¶-Rohlings |
| DE10159959A1 (de) * | 2001-12-06 | 2003-06-26 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
| DE10243953B4 (de) * | 2002-09-21 | 2005-11-17 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Bauteils aus opakem Quarzglas |
| EP1580170B1 (en) * | 2002-11-29 | 2019-01-16 | Heraeus Quarzglas GmbH & Co. KG | Method for producing synthetic quartz glass and synthetic quartz glass article |
| US7637126B2 (en) * | 2003-12-08 | 2009-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Method for the production of laser-active quartz glass and use thereof |
| DE102004038602B3 (de) * | 2004-08-07 | 2005-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Elektrogeschmolzenes, synthetisches Quarzglas, insbesondere für den Einsatz in der Lampen- und in der Halbleiterfertigung und Verfahren zur Herstellung desselben |
| DE102004052312A1 (de) * | 2004-08-23 | 2006-03-02 | Heraeus Quarzglas Gmbh & Co. Kg | Beschichtetes Bauteil aus Quarzglas sowie Verfahren zur Herstellung des Bauteils |
| DE102004051846B4 (de) * | 2004-08-23 | 2009-11-05 | Heraeus Quarzglas Gmbh & Co. Kg | Bauteil mit einer Reflektorschicht sowie Verfahren für seine Herstellung |
| US7563512B2 (en) * | 2004-08-23 | 2009-07-21 | Heraeus Quarzglas Gmbh & Co. Kg | Component with a reflector layer and method for producing the same |
| DE102006018711B4 (de) * | 2006-04-20 | 2008-09-25 | Heraeus Quarzglas Gmbh & Co. Kg | Werkstoff, insbesondere für ein optisches Bauteil zum Einsatz in der Mikrolithographie und Verfahren zur Herstellung eines Formkörpers aus dem Werkstoff |
| WO2008069194A1 (ja) * | 2006-12-05 | 2008-06-12 | Shin-Etsu Quartz Products Co., Ltd. | 合成不透明石英ガラス及びその製造方法 |
| DE102007017004A1 (de) * | 2007-02-27 | 2008-08-28 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils |
| JP5171098B2 (ja) * | 2007-04-24 | 2013-03-27 | 岩崎電気株式会社 | 石英ガラス製品の製造方法、それに用いるシリカ顆粒とその生成方法 |
| DE102009005446A1 (de) * | 2009-01-21 | 2010-07-22 | Schott Ag | Granulat, Verfahren zu dessen Herstellung sowie dessen Verwendung |
| KR101246157B1 (ko) * | 2010-12-09 | 2013-03-20 | 한국세라믹기술원 | 엔지니어드 스톤의 제조방법 |
| TWI652240B (zh) * | 2014-02-17 | 2019-03-01 | 日商東曹股份有限公司 | 不透明石英玻璃及其製造方法 |
| EP3000790B2 (de) | 2014-09-29 | 2023-07-26 | Heraeus Quarzglas GmbH & Co. KG | Verfahren für die Herstellung von Bauteilen aus synthetischem Quarzglas aus SiO2-Granulat |
| JP6558137B2 (ja) * | 2015-08-07 | 2019-08-14 | 東ソー株式会社 | 不透明シリカガラス製造用の高強度成形体 |
| CN108698895A (zh) * | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在悬挂式烧结坩埚中制备石英玻璃体 |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| CN108698894A (zh) * | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
| CN108698883A (zh) * | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| TW201731781A (zh) * | 2015-12-18 | 2017-09-16 | 何瑞斯廓格拉斯公司 | 於豎立式燒結坩堝中製備石英玻璃體 |
| KR20180095619A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 | 실리카 유리 제조 동안 규소 함량의 증가 |
| JP2019506349A (ja) * | 2015-12-18 | 2019-03-07 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 吊り下げ式金属シート坩堝内での石英ガラス体の調製 |
| KR20180094087A (ko) | 2015-12-18 | 2018-08-22 | 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 | 실리카 과립으로부터 실리카 유리 제품의 제조 |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| EP3185057A1 (de) * | 2015-12-22 | 2017-06-28 | Heraeus Quarzglas GmbH & Co. KG | Faseroptische streueinrichtung und herstellungsverfahren dafür |
| JP6878829B2 (ja) * | 2016-10-26 | 2021-06-02 | 東ソー株式会社 | シリカ粉末及び高流動性シリカ造粒粉末並びにその製造方法 |
| EP3476815B1 (en) | 2017-10-27 | 2023-11-29 | Heraeus Quarzglas GmbH & Co. KG | Production of a porous product including post-adapting a pore structure |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1567440B1 (de) | 1965-04-29 | 1971-02-25 | Degussa | Kugelfoermiges kieselsaeuregranulat |
| DE2557932A1 (de) * | 1975-12-22 | 1977-06-30 | Dynamit Nobel Ag | Verfahren zur herstellung von koernigem quarzglas |
| JPH02219814A (ja) * | 1989-02-21 | 1990-09-03 | Sumitomo Bakelite Co Ltd | エポキシ樹脂組成物 |
| JPH0326717A (ja) * | 1989-06-26 | 1991-02-05 | Sumitomo Bakelite Co Ltd | エポキシ樹脂組成物 |
| JPH07138015A (ja) * | 1993-06-15 | 1995-05-30 | Catalysts & Chem Ind Co Ltd | シリカ微小球状粒子およびその製造方法 |
| DE4338807C1 (de) * | 1993-11-12 | 1995-01-26 | Heraeus Quarzglas | Formkörper mit hohem Gehalt an Siliziumdioxid und Verfahren zur Herstellung solcher Formkörper |
| JP3368547B2 (ja) * | 1994-04-28 | 2003-01-20 | 信越石英株式会社 | 不透明石英ガラスおよびその製造方法 |
| DE4424044A1 (de) * | 1994-07-11 | 1996-01-18 | Heraeus Quarzglas | Verfahren zur Herstellung von Kieselsäuregranulat und Verwendung des so hergestellten Granulats |
| EP0725037B2 (de) * | 1995-02-04 | 2012-04-25 | Evonik Degussa GmbH | Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung |
| JPH0912325A (ja) * | 1995-06-29 | 1997-01-14 | Nitto Chem Ind Co Ltd | 高純度不透明石英ガラス及びその製造方法並びにその用途 |
| JP3471514B2 (ja) * | 1996-02-01 | 2003-12-02 | 水澤化学工業株式会社 | 半導体封止用樹脂組成物及びそれに用いる吸湿性充填剤 |
| JP3647959B2 (ja) * | 1996-02-01 | 2005-05-18 | 水澤化学工業株式会社 | 非晶質シリカ系定形粒子の製造方法 |
| DE69716822T2 (de) * | 1996-07-04 | 2003-09-11 | Tosoh Corp., Shinnanyo | Opakes Quarzglas und Verfahren zu dessen Herstellung |
| GB2316414B (en) * | 1996-07-31 | 2000-10-11 | Tosoh Corp | Abrasive shaped article, abrasive disc and polishing method |
| DE19729505A1 (de) * | 1997-07-10 | 1999-01-14 | Heraeus Quarzglas | Verfahren zur Herstellung von Si0¶2¶-Granulat |
| FR2766170B1 (fr) * | 1997-07-17 | 1999-09-24 | Alsthom Cge Alcatel | Procede ameliore de fabrication d'une poudre de silice |
-
1999
- 1999-12-22 DE DE19962451A patent/DE19962451C1/de not_active Expired - Fee Related
-
2000
- 2000-01-14 US US09/484,113 patent/US6380110B1/en not_active Expired - Lifetime
- 2000-12-14 WO PCT/EP2000/012687 patent/WO2001046079A1/de not_active Ceased
- 2000-12-14 CA CA002395501A patent/CA2395501A1/en not_active Abandoned
- 2000-12-14 JP JP2001546594A patent/JP4681189B2/ja not_active Expired - Lifetime
- 2000-12-14 DE DE50011832T patent/DE50011832D1/de not_active Expired - Lifetime
- 2000-12-14 CN CNB008177104A patent/CN1200896C/zh not_active Expired - Lifetime
- 2000-12-14 EP EP00993506A patent/EP1240114B1/de not_active Expired - Lifetime
- 2000-12-14 KR KR1020027008182A patent/KR100716485B1/ko not_active Expired - Lifetime
- 2000-12-22 TW TW089127771A patent/TW548246B/zh not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107417071A (zh) * | 2016-05-24 | 2017-12-01 | 贺利氏石英玻璃股份有限两合公司 | 制造含孔隙的不透明石英玻璃的方法 |
| CN107417071B (zh) * | 2016-05-24 | 2021-08-17 | 贺利氏石英玻璃股份有限两合公司 | 制造含孔隙的不透明石英玻璃的方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE19962451C1 (de) | 2001-08-30 |
| KR100716485B1 (ko) | 2007-05-10 |
| US6380110B1 (en) | 2002-04-30 |
| TW548246B (en) | 2003-08-21 |
| EP1240114A1 (de) | 2002-09-18 |
| KR20020066333A (ko) | 2002-08-14 |
| CN1413175A (zh) | 2003-04-23 |
| EP1240114B1 (de) | 2005-12-07 |
| JP2004500299A (ja) | 2004-01-08 |
| WO2001046079A1 (de) | 2001-06-28 |
| DE50011832D1 (de) | 2006-01-12 |
| JP4681189B2 (ja) | 2011-05-11 |
| CA2395501A1 (en) | 2001-06-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20050511 |
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| CX01 | Expiry of patent term |