KR100613952B1 - 비수전해질 이차전지용 음극 및 그 제조방법 및비수전해질 이차전지 - Google Patents
비수전해질 이차전지용 음극 및 그 제조방법 및비수전해질 이차전지 Download PDFInfo
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Abstract
Description
| 실시예 | 음극구성 | 전지특성 | 안전성 | ||||
| SiOx 두께 (㎛) | 집전체 시트의 금속 | 수지심재 | 초기용량 (mAh) | 부피에너지밀도 (Wh/dm3) | 유지율 (%) | 최고온도(℃) | |
| 1 | 20 | Cu | - | 44.3 | 186 | 90 | 38 |
| 2 | 10 | Cu | - | 22.1 | 134 | 93 | 36 |
| 3 | 5 | Cu | - | 11 | 86 | 94 | 27 |
| 4 | 3 | Cu | - | 6.6 | 58 | 96 | 23 |
| 5 | 0.5 | Cu | - | 1.1 | 11 | 98 | 23 |
| 6 | 10 | Ni | - | 23.0 | 140 | 93 | 35 |
| 7 | 30 | Cu | - | 62.2 | 200 | 78 | 43 |
| 8 | 10 | Al | - | 15.5 | 94 | 56 | 23 |
| 9 | 20 | 증착Cu | PET | 42.9 | 179 | 88 | 33 |
| 10 | 10 | 증착Cu | PET | 21.0 | 126 | 91 | 26 |
| 11 | 5 | 증착Cu | PET | 11.0 | 84 | 93 | 23 |
| 12 | 3 | 증착Cu | PET | 6.6 | 57 | 95 | 22 |
| 13 | 0.5 | 증착Cu | PET | 1.1 | 11 | 98 | 22 |
| 14 | 10 | 증착Ni | PET | 22.3 | 131 | 88 | 27 |
| 15 | 10 | 증착Cu | 폴리이미드 | 22.1 | 133 | 92 | 26 |
| 16 | 10 | 증착Cu | 폴리프로필렌 | 19.4 | 116 | 68 | 26 |
| 비교예 | 음극구성단자 | 전지특성 | 안전성 | ||||
| 음극재료 | 집전체 시트의 금속 | 수지심재 | 초기용량 (mAh) | 부피에너지밀도 (Wh/dm3) | 유지율 (%) | 최고온도(℃) | |
| 1 | 탄소재료 | Cu | - | 29.4 | 123 | 90 | 55 |
| 2 | 분말SiO | Cu | - | 43.0 | 171 | 73 | 50 |
| 3 | 분말SiO | Cu | - | 42.5 | 162 | 78 | 53 |
| 4 | 분말SiO | Ni | - | 44.0 | 175 | 72 | 48 |
| 5 | 분말SiO | Al | - | 29.0 | 115 | 39 | 42 |
| 실시예 | SiOx 두께 (㎛) | 금속 | 탄소층 | 결착제 | 탄소층두께 (㎛) | 초기용량 (mAh) | 부피에너지밀도(Wh/dm3) | 레이트특성 (%) | 유지율(%) | 최고온도(℃) |
| 17 | 10 | Cu | AB | PVdF10% | 0.5 | 22.1 | 134 | 90 | 96 | 38 |
| 18 | 10 | Cu | AB | PVdF10% | 1 | 22.1 | 133 | 92 | 97 | 38 |
| 19 | 10 | Cu | AB | PVdF10% | 2 | 22.1 | 133 | 95 | 97 | 39 |
| 20 | 10 | Cu | AB | PVdF10% | 5 | 22.1 | 130 | 95 | 96 | 42 |
| 21 | 10 | Cu | AB | PVdF10% | 10 | 22.1 | 127 | 94 | 94 | 46 |
| 22 | 10 | Cu | VGCF | PVdF4% | 5 | 24.9 | 147 | 97 | 98 | 38 |
| 23 | 10 | Cu | FG | PVdF4% | 5 | 25.3 | 149 | 90 | 95 | 43 |
| 24 | 10 | Cu | MCMB | PVdF4% | 5 | 25.1 | 148 | 91 | 94 | 42 |
| 25 | 10 | Cu | MAG | PVdF4% | 5 | 25.3 | 149 | 90 | 94 | 42 |
| 26 | 10 | Cu | MCF | PVdF4% | 5 | 25.1 | 148 | 93 | 94 | 45 |
| 27 | 10 | Cu | FG | SBR | 5 | 25.3 | 149 | 92 | 96 | 44 |
| 2 | 10 | Cu | 없음 | 없음 | - | 22.1 | 134 | 82 | 93 | 36 |
| 실시예 | SiOx | SiOx 두께 (㎛) | 초기용량 (mAh) | 부피에너지밀도 (Wh/dm3) | 유지율 (통상)(%) | 최고온도 (℃) | 유지율(심방전특성 (℃) |
| 비교예 6 | SiO0.3 | 20 | 53.4 | 207 | 77 | 41 | 57 |
| 비교예 7 | SiO0.5 | 20 | 49.5 | 198 | 84 | 41 | 66 |
| 28 | SiO0.7 | 20 | 47.3 | 195 | 86 | 38 | 85 |
| 29 | SiO0.9 | 20 | 44.9 | 189 | 90 | 38 | 90 |
| 30 | SiO1.1 | 20 | 44.3 | 186 | 91 | 37 | 92 |
| 31 | SiO1.3 | 20 | 43.8 | 181 | 89 | 36 | 91 |
| 비교예 8 | SiO1.5 | 20 | 41.2 | 174 | 88 | 36 | 70 |
| 비교예 9 | SiO1.7 | 20 | 40.8 | 172 | 88 | 36 | 67 |
| 비교예 10 | Si | 20 | 81 | 335 | 65 | 43 | 43 |
| 비교예 11 | SiO2 | 20 | 0 | 0 | - | - | - |
| 비교예 | 활물질 | 초기용량 (mAh) | 부피에너지밀도 (Wh/dm3) | 유지율 (통상)(%) | 최고온도(℃) | 유지율(심방전특성(℃) |
| 12 | Si | 77.2 | 295 | 60 | 57 | 31 |
| 13 | SiO0.5 | 45.3 | 170 | 72 | 54 | 52 |
| 14 | SiO | 42.5 | 162 | 78 | 53 | 61 |
| 15 | SiO1.5 | 38.7 | 145 | 75 | 50 | 36 |
| 16 | SiO2 | 0 | 0 | - | - | - |
Claims (25)
- 집전체시트 및 그 표면에 담지된 활물질층으로 이루어지고,상기 활물질층이, 0.7≤x≤1.3을 만족하는 SiOx로 이루어지며, 또한 결착제를 포함하지 않은 비수전해질 이차전지용 음극.
- 제 1 항에 있어서, 상기 집전체시트가, 금속박으로 이루어지는 음극.
- 제 2 항에 있어서, 상기 금속박의 표면이, 탄소재료를 포함하는 층으로 피복되는 음극.
- 제 3 항에 있어서, 상기 탄소재료가, 카본블랙 및 흑연으로 이루어진 군으로부터 선택되는 적어도 1종인 음극.
- 제 4 항에 있어서, 상기 카본블랙이, 아세틸렌블랙 및 케첸블랙으로 이루어지는 군으로부터 선택되는 적어도 1종인 음극.
- 제 4 항에 있어서, 상기 흑연이, 비늘조각형상 그래파이트, 둥근형상 그래파이트, 덩어리형상 그래파이트 및 섬유형상 그래파이트로 이루어지는 군으로부터 선 택되는 적어도 1종인 음극.
- 제 1 항에 있어서, 상기 집전체시트가, 수지심재 및 그 표면을 피복하는 금속층으로 이루어지는 음극.
- 제 2 항 또는 제 7 항에 있어서, 상기 금속이, 금, 은, 동, 철, 니켈, 아연 및 알루미늄으로 이루어지는 군으로부터 선택되는 적어도 1종으로 이루어지는 음극.
- 제 7 항에 있어서, 상기 수지심재가, 폴리에틸렌테레프탈레이트, 폴리카보네이트, 아라미드수지, 폴리이미드수지, 페놀수지, 폴리에테르설폰수지, 폴리에테르에테르케톤수지 및 폴리아미드수지로 이루어지는 군으로부터 선택되는 적어도 1종으로 이루어지는 음극.
- 제 7 항 또는 제 9 항에 있어서, 상기 수지심재는, 20MPa 이상의 인장강도를 가진 음극.
- 제 7 항 또는 제 9 항에 있어서, 상기 수지심재의 두께는, 3∼100㎛ 인 음극.
- 제 1 항, 제 2 항, 제 3 항, 제 4 항, 제 5 항, 제 6 항, 제 7 항 또는 제 9 항 중의 어느 한 항에 있어서, 상기 활물질층의 두께가, 0.5㎛ 이상 20㎛ 이하인 음극.
- 제 1 항, 제 2 항, 제 3 항, 제 4 항, 제 5 항, 제 6 항, 제 7 항 또는 제 9 항 중의 어느 한 항에 있어서의 음극, 양극 및 비수전해질로 이루어지는 이차전지.
- 집전체시트상에 증착에 의해 0.7≤x≤1.3을 만족하는 SiOx를 퇴적시켜 활물질층을 형성하는 공정을 포함하는 비수전해질 이차전지용 음극의 제조방법.
- 제 14 항에 있어서, 상기 집전체시트가, 금속박으로 이루어지는 제조방법.
- 제 15 항에 있어서, 상기 금속박의 표면이, 탄소를 포함하는 층으로 피복되는 제조방법.
- 제 16 항에 있어서, 상기 탄소재료가, 카본블랙 및 흑연으로 이루어진 군에서 선택되는 적어도 1종인 제조방법.
- 제 17 항에 있어서, 상기 카본블랙이, 아세틸렌블랙 및 케첸블랙으로 이루어 지는 군으로부터 선택되는 적어도 1종인 제조방법.
- 제 17 항에 있어서, 상기 흑연이, 비늘조각형상 그래파이트, 둥근형상 그래파이트, 덩어리형상 그래파이트 및 섬유형상 그래파이트로 이루어지는 군으로부터 선택되는 적어도 1종인 제조방법.
- 제 14 항에 있어서, 상기 집전체시트가, 수지심재 및 그 표면을 피복하는 금속층으로 이루어지는 제조방법.
- 제 14 항 또는 제 20 항에 있어서, 상기 금속이, 금, 은, 동, 철, 니켈, 아연 및 알루미늄으로 이루어지는 군으로부터 선택되는 적어도 1종으로 이루어지는 제조방법.
- 제 20 항에 있어서, 상기 수지심재가, 폴리에틸렌테레프탈레이트, 폴리카보네이트아라미드수지, 폴리이미드수지, 페놀수지, 폴리에테르설폰수지, 폴리에테르에테르케톤수지 및 폴리아미드수지로 이루어지는 군으로부터 선택되는 적어도 1종으로 이루어지는 제조방법.
- 제 20 항 또는 제 22 항에 있어서, 상기 수지심재는, 20MPa 이상의 인장강도를 가진 제조방법.
- 제 20 항 또는 제 22 항에 있어서, 상기 수지심재의 두께는, 3∼100㎛인 제조방법.
- 제 14 항, 제 15 항, 제 16 항, 제 17 항, 제 18 항, 제 19 항, 제 20 항 또는 제 22 항 중의 어느 한 항에 있어서, 상기 활물질층의 두께가, 0.5㎛ 이상 20㎛ 이하인 제조방법.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2003-00305348 | 2003-08-28 | ||
| JP2003305348 | 2003-08-28 |
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| Publication Number | Publication Date |
|---|---|
| KR20050021892A KR20050021892A (ko) | 2005-03-07 |
| KR100613952B1 true KR100613952B1 (ko) | 2006-08-21 |
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| Application Number | Title | Priority Date | Filing Date |
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| KR1020040067833A Expired - Fee Related KR100613952B1 (ko) | 2003-08-28 | 2004-08-27 | 비수전해질 이차전지용 음극 및 그 제조방법 및비수전해질 이차전지 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US20050048369A1 (ko) |
| EP (1) | EP1511100A3 (ko) |
| KR (1) | KR100613952B1 (ko) |
| CN (3) | CN101399330A (ko) |
Families Citing this family (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070059601A1 (en) * | 2003-04-28 | 2007-03-15 | Yoshitake Natsume | Negative electrode for lithium secondary cell, lithium secondary cell employing the negative electrode, film deposition material b used for forming negative electrode, and process for producing negative electrode |
| JP4495994B2 (ja) * | 2004-03-29 | 2010-07-07 | 株式会社東芝 | 非水電解質二次電池 |
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| US20070059601A1 (en) * | 2003-04-28 | 2007-03-15 | Yoshitake Natsume | Negative electrode for lithium secondary cell, lithium secondary cell employing the negative electrode, film deposition material b used for forming negative electrode, and process for producing negative electrode |
| JP4519592B2 (ja) * | 2004-09-24 | 2010-08-04 | 株式会社東芝 | 非水電解質二次電池用負極活物質及び非水電解質二次電池 |
-
2004
- 2004-08-25 US US10/924,926 patent/US20050048369A1/en not_active Abandoned
- 2004-08-26 EP EP04020278A patent/EP1511100A3/en not_active Withdrawn
- 2004-08-27 CN CNA2008101738188A patent/CN101399330A/zh active Pending
- 2004-08-27 KR KR1020040067833A patent/KR100613952B1/ko not_active Expired - Fee Related
- 2004-08-27 CN CNA2007101286129A patent/CN101093883A/zh active Pending
- 2004-08-27 CN CNB200410064497XA patent/CN100438143C/zh not_active Expired - Fee Related
-
2005
- 2005-10-03 US US11/240,417 patent/US20060029862A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| CN100438143C (zh) | 2008-11-26 |
| CN101399330A (zh) | 2009-04-01 |
| CN1591932A (zh) | 2005-03-09 |
| US20050048369A1 (en) | 2005-03-03 |
| KR20050021892A (ko) | 2005-03-07 |
| EP1511100A3 (en) | 2006-10-04 |
| EP1511100A2 (en) | 2005-03-02 |
| US20060029862A1 (en) | 2006-02-09 |
| CN101093883A (zh) | 2007-12-26 |
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