KR100376368B1 - 화학흡착물질 및 그 제조방법 - Google Patents
화학흡착물질 및 그 제조방법 Download PDFInfo
- Publication number
- KR100376368B1 KR100376368B1 KR10-1999-7002713A KR19997002713A KR100376368B1 KR 100376368 B1 KR100376368 B1 KR 100376368B1 KR 19997002713 A KR19997002713 A KR 19997002713A KR 100376368 B1 KR100376368 B1 KR 100376368B1
- Authority
- KR
- South Korea
- Prior art keywords
- delete delete
- group
- formula
- liquid crystal
- integer
- Prior art date
Links
- 239000000126 substance Substances 0.000 title claims description 224
- 238000000034 method Methods 0.000 title claims description 113
- 230000008569 process Effects 0.000 title claims description 30
- 239000000463 material Substances 0.000 claims abstract description 215
- 150000001875 compounds Chemical class 0.000 claims abstract description 58
- 238000001179 sorption measurement Methods 0.000 claims description 135
- 125000000524 functional group Chemical group 0.000 claims description 89
- 238000006243 chemical reaction Methods 0.000 claims description 63
- 238000004519 manufacturing process Methods 0.000 claims description 60
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 55
- DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical group C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 claims description 45
- 125000000217 alkyl group Chemical group 0.000 claims description 41
- 125000003545 alkoxy group Chemical group 0.000 claims description 39
- 125000004432 carbon atom Chemical group C* 0.000 claims description 29
- 150000002367 halogens Chemical group 0.000 claims description 28
- 229910052736 halogen Inorganic materials 0.000 claims description 26
- 239000012298 atmosphere Substances 0.000 claims description 21
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 19
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 18
- 239000005049 silicon tetrachloride Substances 0.000 claims description 18
- GVSPXQVUXHMUMA-MDWZMJQESA-N (e)-3-(3,5-ditert-butyl-4-hydroxyphenyl)-1-(4-methoxyphenyl)prop-2-en-1-one Chemical compound C1=CC(OC)=CC=C1C(=O)\C=C\C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 GVSPXQVUXHMUMA-MDWZMJQESA-N 0.000 claims description 16
- 150000001788 chalcone derivatives Chemical class 0.000 claims description 13
- UAHGNXFYLAJDIN-UHFFFAOYSA-N 4'-Hydroxychalcone Natural products C1=CC(O)=CC=C1C(=O)C=CC1=CC=CC=C1 UAHGNXFYLAJDIN-UHFFFAOYSA-N 0.000 claims description 12
- UAHGNXFYLAJDIN-IZZDOVSWSA-N 4'-hydroxychalcone Chemical compound C1=CC(O)=CC=C1C(=O)\C=C\C1=CC=CC=C1 UAHGNXFYLAJDIN-IZZDOVSWSA-N 0.000 claims description 12
- 239000003463 adsorbent Substances 0.000 claims description 12
- 239000011261 inert gas Substances 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 7
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 claims description 7
- 229910052794 bromium Inorganic materials 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- 230000002194 synthesizing effect Effects 0.000 claims description 5
- 238000005882 aldol condensation reaction Methods 0.000 claims description 4
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims description 4
- 238000005859 coupling reaction Methods 0.000 claims description 4
- 238000006297 dehydration reaction Methods 0.000 claims description 4
- 230000008878 coupling Effects 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 claims description 3
- 229910052740 iodine Inorganic materials 0.000 claims description 3
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims 2
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 297
- 239000010408 film Substances 0.000 abstract description 209
- 239000000758 substrate Substances 0.000 abstract description 207
- 239000010409 thin film Substances 0.000 abstract description 143
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 81
- 239000007788 liquid Substances 0.000 description 75
- 239000010410 layer Substances 0.000 description 61
- 239000002904 solvent Substances 0.000 description 51
- 230000010287 polarization Effects 0.000 description 49
- 239000000243 solution Substances 0.000 description 41
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical class CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 40
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 34
- 239000000470 constituent Substances 0.000 description 33
- -1 acryl Chemical group 0.000 description 31
- 150000002430 hydrocarbons Chemical class 0.000 description 31
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 27
- 238000010521 absorption reaction Methods 0.000 description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 26
- 238000001035 drying Methods 0.000 description 25
- 238000004140 cleaning Methods 0.000 description 21
- 239000013078 crystal Substances 0.000 description 21
- 210000002858 crystal cell Anatomy 0.000 description 21
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 20
- 230000001678 irradiating effect Effects 0.000 description 20
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 19
- 238000004132 cross linking Methods 0.000 description 19
- 229920001721 polyimide Polymers 0.000 description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 17
- 239000003125 aqueous solvent Substances 0.000 description 17
- 239000005046 Chlorosilane Substances 0.000 description 16
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 16
- 239000004642 Polyimide Substances 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 15
- 230000008859 change Effects 0.000 description 15
- 238000010586 diagram Methods 0.000 description 15
- 239000003960 organic solvent Substances 0.000 description 15
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 14
- 238000005406 washing Methods 0.000 description 14
- 238000000862 absorption spectrum Methods 0.000 description 13
- 230000005540 biological transmission Effects 0.000 description 13
- 229910052799 carbon Inorganic materials 0.000 description 13
- 239000001257 hydrogen Substances 0.000 description 13
- 229910052739 hydrogen Inorganic materials 0.000 description 13
- 239000012528 membrane Substances 0.000 description 13
- 239000002356 single layer Substances 0.000 description 13
- YJLUBHOZZTYQIP-UHFFFAOYSA-N 2-[5-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NN=C(O1)CC(=O)N1CC2=C(CC1)NN=N2 YJLUBHOZZTYQIP-UHFFFAOYSA-N 0.000 description 12
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 11
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 210000004027 cell Anatomy 0.000 description 11
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 11
- 229910052753 mercury Inorganic materials 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 229910000077 silane Inorganic materials 0.000 description 11
- 238000011282 treatment Methods 0.000 description 11
- CONKBQPVFMXDOV-QHCPKHFHSA-N 6-[(5S)-5-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-2-oxo-1,3-oxazolidin-3-yl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C[C@H]1CN(C(O1)=O)C1=CC2=C(NC(O2)=O)C=C1 CONKBQPVFMXDOV-QHCPKHFHSA-N 0.000 description 10
- 239000004988 Nematic liquid crystal Substances 0.000 description 10
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- 239000000047 product Substances 0.000 description 10
- 125000001424 substituent group Chemical group 0.000 description 10
- 238000005481 NMR spectroscopy Methods 0.000 description 9
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 9
- 239000000741 silica gel Substances 0.000 description 9
- 229910002027 silica gel Inorganic materials 0.000 description 9
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 9
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 230000006870 function Effects 0.000 description 8
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 8
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 description 8
- 239000012312 sodium hydride Substances 0.000 description 8
- 229910000104 sodium hydride Inorganic materials 0.000 description 8
- 238000010183 spectrum analysis Methods 0.000 description 8
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical group ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 8
- KFXXHEXKMPXATK-UHFFFAOYSA-N 1-[4-(6-hydroxyhexoxy)phenyl]-3-phenylprop-2-en-1-one Chemical compound C1=CC(OCCCCCCO)=CC=C1C(=O)C=CC1=CC=CC=C1 KFXXHEXKMPXATK-UHFFFAOYSA-N 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 7
- 239000000010 aprotic solvent Substances 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 7
- 238000001816 cooling Methods 0.000 description 7
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 7
- 235000019341 magnesium sulphate Nutrition 0.000 description 7
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 235000005513 chalcones Nutrition 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 230000005684 electric field Effects 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 125000001033 ether group Chemical group 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 5
- APLNAFMUEHKRLM-UHFFFAOYSA-N 2-[5-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]-1-(3,4,6,7-tetrahydroimidazo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NN=C(O1)CC(=O)N1CC2=C(CC1)N=CN2 APLNAFMUEHKRLM-UHFFFAOYSA-N 0.000 description 5
- DQFBYFPFKXHELB-UHFFFAOYSA-N Chalcone Natural products C=1C=CC=CC=1C(=O)C=CC1=CC=CC=C1 DQFBYFPFKXHELB-UHFFFAOYSA-N 0.000 description 5
- 229920000620 organic polymer Polymers 0.000 description 5
- 229920006254 polymer film Polymers 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- KZEVSDGEBAJOTK-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[5-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CC=1OC(=NN=1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O KZEVSDGEBAJOTK-UHFFFAOYSA-N 0.000 description 4
- ZDVAWFQIVMCEHS-UHFFFAOYSA-N 3-phenyl-1-[4-(6-trichlorosilyloxyhexoxy)phenyl]prop-2-en-1-one Chemical compound C1=CC(OCCCCCCO[Si](Cl)(Cl)Cl)=CC=C1C(=O)C=CC1=CC=CC=C1 ZDVAWFQIVMCEHS-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 239000012043 crude product Substances 0.000 description 4
- 230000031700 light absorption Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000011356 non-aqueous organic solvent Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- 238000002211 ultraviolet spectrum Methods 0.000 description 4
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 3
- VTMSGTJACWSRBZ-UHFFFAOYSA-N 1-[4-(12-hydroxydodecoxy)phenyl]-3-phenylprop-2-en-1-one Chemical compound C1=CC(OCCCCCCCCCCCCO)=CC=C1C(=O)C=CC1=CC=CC=C1 VTMSGTJACWSRBZ-UHFFFAOYSA-N 0.000 description 3
- CCUVOVPBRSHILJ-UHFFFAOYSA-N 1-[4-(14-hydroxytetradecoxy)phenyl]-3-phenylprop-2-en-1-one Chemical compound C1=CC(OCCCCCCCCCCCCCCO)=CC=C1C(=O)C=CC1=CC=CC=C1 CCUVOVPBRSHILJ-UHFFFAOYSA-N 0.000 description 3
- QARCICQMPUBHRD-UHFFFAOYSA-N 1-[4-(3-hydroxypropoxy)phenyl]-3-phenylprop-2-en-1-one Chemical compound C1=CC(OCCCO)=CC=C1C(=O)C=CC1=CC=CC=C1 QARCICQMPUBHRD-UHFFFAOYSA-N 0.000 description 3
- IHCCLXNEEPMSIO-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 IHCCLXNEEPMSIO-UHFFFAOYSA-N 0.000 description 3
- OTFWMRJFPCKNDU-UHFFFAOYSA-N 3-phenyl-1-[4-(12-trichlorosilyloxydodecoxy)phenyl]prop-2-en-1-one Chemical compound C1=CC(OCCCCCCCCCCCCO[Si](Cl)(Cl)Cl)=CC=C1C(=O)C=CC1=CC=CC=C1 OTFWMRJFPCKNDU-UHFFFAOYSA-N 0.000 description 3
- JNTPTNNCGDAGEJ-UHFFFAOYSA-N 6-chlorohexan-1-ol Chemical compound OCCCCCCCl JNTPTNNCGDAGEJ-UHFFFAOYSA-N 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical class [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000033228 biological regulation Effects 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 238000002329 infrared spectrum Methods 0.000 description 3
- 230000002401 inhibitory effect Effects 0.000 description 3
- 230000000977 initiatory effect Effects 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 101150054634 melk gene Proteins 0.000 description 3
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 3
- 229920000768 polyamine Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 238000002371 ultraviolet--visible spectrum Methods 0.000 description 3
- RTCVAWRRHHSOCC-NYYWCZLTSA-N (e)-1-(4-hydroxyphenyl)-3-(4-methoxyphenyl)prop-2-en-1-one Chemical compound C1=CC(OC)=CC=C1\C=C\C(=O)C1=CC=C(O)C=C1 RTCVAWRRHHSOCC-NYYWCZLTSA-N 0.000 description 2
- SDMCGLBUFHAUEH-UHFFFAOYSA-N 3-phenyl-1-[4-(3-trichlorosilyloxypropoxy)phenyl]prop-2-en-1-one Chemical compound C1=CC(OCCCO[Si](Cl)(Cl)Cl)=CC=C1C(=O)C=CC1=CC=CC=C1 SDMCGLBUFHAUEH-UHFFFAOYSA-N 0.000 description 2
- TXFPEBPIARQUIG-UHFFFAOYSA-N 4'-hydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C=C1 TXFPEBPIARQUIG-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- FCMCSZXRVWDVAW-UHFFFAOYSA-N 6-bromo-1-hexanol Chemical compound OCCCCCCBr FCMCSZXRVWDVAW-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- WTDHULULXKLSOZ-UHFFFAOYSA-N Hydroxylamine hydrochloride Chemical compound Cl.ON WTDHULULXKLSOZ-UHFFFAOYSA-N 0.000 description 2
- 229910018557 Si O Inorganic materials 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- NOKSMMGULAYSTD-UHFFFAOYSA-N [SiH4].N=C=O Chemical group [SiH4].N=C=O NOKSMMGULAYSTD-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 230000000274 adsorptive effect Effects 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- DCAYPVUWAIABOU-NJFSPNSNSA-N hexadecane Chemical class CCCCCCCCCCCCCCC[14CH3] DCAYPVUWAIABOU-NJFSPNSNSA-N 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000012264 purified product Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000000638 stimulation Effects 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OHVLMTFVQDZYHP-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CN1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O OHVLMTFVQDZYHP-UHFFFAOYSA-N 0.000 description 1
- MJBHDNOMDYYFEK-UHFFFAOYSA-N 12-chlorododecan-1-ol Chemical compound OCCCCCCCCCCCCCl MJBHDNOMDYYFEK-UHFFFAOYSA-N 0.000 description 1
- AZWALNMPJIXDRE-UHFFFAOYSA-N 14-chlorotetradecan-1-ol Chemical compound OCCCCCCCCCCCCCCCl AZWALNMPJIXDRE-UHFFFAOYSA-N 0.000 description 1
- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 description 1
- JQMFQLVAJGZSQS-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-N-(2-oxo-3H-1,3-benzoxazol-6-yl)acetamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)NC1=CC2=C(NC(O2)=O)C=C1 JQMFQLVAJGZSQS-UHFFFAOYSA-N 0.000 description 1
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 1
- LAMUXTNQCICZQX-UHFFFAOYSA-N 3-chloropropan-1-ol Chemical compound OCCCCl LAMUXTNQCICZQX-UHFFFAOYSA-N 0.000 description 1
- ARIREUPIXAKDAY-UHFFFAOYSA-N 4-butylbenzaldehyde Chemical compound CCCCC1=CC=C(C=O)C=C1 ARIREUPIXAKDAY-UHFFFAOYSA-N 0.000 description 1
- UOQXIWFBQSVDPP-UHFFFAOYSA-N 4-fluorobenzaldehyde Chemical compound FC1=CC=C(C=O)C=C1 UOQXIWFBQSVDPP-UHFFFAOYSA-N 0.000 description 1
- 229940073735 4-hydroxy acetophenone Drugs 0.000 description 1
- WTFUTSCZYYCBAY-SXBRIOAWSA-N 6-[(E)-C-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-N-hydroxycarbonimidoyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C/C(=N/O)/C1=CC2=C(NC(O2)=O)C=C1 WTFUTSCZYYCBAY-SXBRIOAWSA-N 0.000 description 1
- DFGKGUXTPFWHIX-UHFFFAOYSA-N 6-[2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]acetyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)C1=CC2=C(NC(O2)=O)C=C1 DFGKGUXTPFWHIX-UHFFFAOYSA-N 0.000 description 1
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- FHPYFKLYNOOXPB-UHFFFAOYSA-N C1=CC=C(C=C1)C=CC(=O)C2=CC=C(C=C2)CCCO[Si](Cl)(Cl)Cl Chemical compound C1=CC=C(C=C1)C=CC(=O)C2=CC=C(C=C2)CCCO[Si](Cl)(Cl)Cl FHPYFKLYNOOXPB-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000004986 Cholesteric liquid crystals (ChLC) Substances 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 239000004985 Discotic Liquid Crystal Substance Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 241001499740 Plantago alpina Species 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 239000004990 Smectic liquid crystal Substances 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- 239000002152 aqueous-organic solution Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- LLCSWKVOHICRDD-UHFFFAOYSA-N buta-1,3-diyne Chemical group C#CC#C LLCSWKVOHICRDD-UHFFFAOYSA-N 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- TXWRERCHRDBNLG-UHFFFAOYSA-N cubane Chemical compound C12C3C4C1C1C4C3C12 TXWRERCHRDBNLG-UHFFFAOYSA-N 0.000 description 1
- IGARGHRYKHJQSM-UHFFFAOYSA-N cyclohexylbenzene Chemical compound C1CCCCC1C1=CC=CC=C1 IGARGHRYKHJQSM-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- ZVDBUOGYYYNMQI-UHFFFAOYSA-N dodec-1-yne Chemical compound CCCCCCCCCCC#C ZVDBUOGYYYNMQI-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000005262 ferroelectric liquid crystals (FLCs) Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 238000006358 imidation reaction Methods 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- QLOAVXSYZAJECW-UHFFFAOYSA-N methane;molecular fluorine Chemical group C.FF QLOAVXSYZAJECW-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000002052 molecular layer Substances 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000003954 pattern orientation Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000011827 silicon-based solvent Substances 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 1
- GZEDKDBFUBPZNG-UHFFFAOYSA-N tridec-1-yne Chemical compound CCCCCCCCCCCC#C GZEDKDBFUBPZNG-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
- G02F1/133719—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films with coupling agent molecules, e.g. silane
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/02—Alignment layer characterised by chemical composition
- C09K2323/023—Organic silicon compound, e.g. organosilicon
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nanotechnology (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
Abstract
Description
Claims (114)
- 삭제
- 하기 화학식1로 표시되는 화합물로 이루어지는 화학흡착물질.(화학식1)(여기서, R은 탄소수 1∼14의 알킬기 또는 페닐기, n은 1∼14의 정수를 나타내며, X는 할로겐 또는 이소시아네이트기, A는 Si에 결합된 1가의 관능기, m은 1 또는 2를 나타낸다.)
- 하기 화학식2로 표시되는 화합물로 이루어지는 화학흡착물질.(화학식2)(여기서, R은 탄소수 1∼14의 알킬기 또는 페닐기, n은 1∼14의 정수를 나타내며, X는 이소시아네이트기, A는 Si에 결합된 1가의 관능기, m은 1 또는 2를 나타낸다.)
- 하기 화학식3으로 표시되는 화합물로 이루어지는 화학흡착물질.(화학식3)(여기서, n은 1∼14의 정수를 나타내고, R은 탄소수 1 내지 14의 알킬기 또는 페닐기, X는 이소시아네이트기, A는 Si에 결합된 1가의 관능기, m은 1 또는 2를 나타낸다.)
- 하기 화학식4로 표시되는 화합물로 이루어지는 화학흡착물질.(화학식4)(여기서, R은 탄소수 1∼14의 알킬기 또는 페닐기, n은 1∼14의 정수를 나타내며, X는 이소시아네이트기, A는 Si에 결합된 1가의 관능기, m은 1 또는 2를 나타낸다.)
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 하기 (화학식2-1)로 표시되는 4'-치환 칼콘유도체로 이루어지는 화학흡착물질.(화학식2-1)여기서, R은 탄소수 1∼3의 알킬기 또는 탄소수 1∼3의 알콕시기, p는 0 이상 2 이하의 정수, A는 -(CH2)n- (여기서, n은 3 이상 14 이하의 정수를 나타낸다)를 나타낸다.
- 하기 (화학식2-2)로 표시되는 4'-히드록시칼콘과, 하기 (화학식2-3)으로 표시되는 화합물을 커플링시켜, 하기 (화학식2-4)로 표시되는 물질을 합성하는 제1 공정과,불활성 기체 분위기하에서 상기 (화학식2-4)로 표시되는 물질과, 사염화규소를 이용하여 탈염산반응시켜, 하기 (화학식2-5)로 표시되는 4'-치환 칼콘유도체를 합성하는 제2공정을 포함하는 것을 특징으로 하는 화학흡착물질의 제조방법.(화학식2-2)(화학식2-3)(여기서, Hal은 I, Br, 또는 Cl을 나타내고, n은 3 이상 14 이하의 정수를 나타낸다)(화학식2-4)(화학식2-5)
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 하기 (화학식5-1)로 표시되는 칼콘유도체로 이루어지는 화학흡착물질.(화학식5-1)(여기서, A1은 하기 화학식5-2 또는 화학식5-3으로 표시되는 특성기이고, A2는 2가의 관능기, X는 할로겐 또는 알콕시기, 또는 이소시아네이트기, A'는 알킬기 또는 알콕실기, n = 0∼3)(화학식5-2)(여기서, k는 1 이상 18 이하의 정수, m, n은 0 이상 37 이하의 정수로서, m+n = 2k+1, p는 0 또는 1, q = 0 또는 1)(화학식5-3)(여기서, k는 1 이상 18 이하의 정수, m, n은 0 이상 37 이하의 정수로서, m+n = 2k+1, q는 0 또는 1)
- 제55항에 있어서, 상기 (화학식5-1)의 A1은 칼콘골격의 벤젠환의 4 위치에 결합되어 있는 화학흡착물질.
- 제55항에 있어서, 상기 (화학식5-1)의 A2는 -(CH2)n-O- 또는 -0-(CH2)n-O- 또는 -CO-(CH2)n-O- (여기서, n은 2 이상 14 이하의 정수)로 표시되는 것인 화학흡착물질.
- 제57항에 있어서, 상기 (화학식5-1)의 A2는 칼콘골격의 벤젠환의 4 위치에 결합되어 있는 화학흡착물질.
- 제57항에 있어서, 상기 (화학식5-1)의 A1은 하기 (화학식5-4)로 표시되는 칼콘골격의 벤젠환의 4 위치에 결합되고, A2는 4' 위치에 결합되어 있는 화학흡착물질.(화학식5-4)
- 제59항에 있어서, 상기 (화학식5-1)의 A1은 하기 (화학식5-2) 또는 (화학식5-3)으로 표시되는 특성기이고, 상기 (화학식5-1)의 A2는 -(CH2)n-O- 또는 -0-(CH2)n-O- 또는 -CO-(CH2)n-O- (여기서, n은 2 이상 14 이하의 정수)로 표시되는 것인 화학흡착물질.(여기서, k는 1 이상 18 이하의 정수, m, n은 0 이상 37 이하의 정수로서, m+n = 2k+1, p는 0 또는 1, q = 0 또는 1)(화학식5-3)(여기서, k는 1 이상 18 이하의 정수, m, n은 0 이상 37 이하의 정수로서, m+n = 2k+1, q는 0 또는 1)
- 다음 공정을 구비하는, 하기 화학식으로 표시되는 화학흡착물질의 제조방법;적어도 4위치에 관능기를 갖는 칼콘골격기 및 Si를 갖는 분자의 상기 Si에, 불활성 기체 분위기중에서 할로겐을 결합시키므로써, -SiX3기를 갖는 칼콘유도체를 제조하는 공정.(여기서, A1은 칼콘골격의 벤젠환에 붙은 관능기, A2는 다른 하나의 벤젠환에 붙은 2가의 관능기, X는 할로겐, A'는 알킬기 또는 알콕시기, n = 0∼3)
- 삭제
- 다음 공정을 구비하는, 하기 화학식으로 표시되는 화학흡착물질의 제조방법;적어도 4위치에 관능기를 갖는 벤즈알데히드와 벤조일기를 갖는 화합물을 알돌축합반응시킨 후, 탈수반응을 행하므로써, 4위치에 관능기를 갖는 칼콘유도체를 제조하는 공정.(여기서, A1은 칼콘골격의 벤젠환에 붙은 관능기, A2는 다른 하나의 벤젠환에 붙은 2가의 관능기, X는 할로겐, A'는 알킬기 또는 알콕시기, n = 0∼3)
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 하기 화학식1'로 표시되는 화합물로 이루어지는 화학흡착물질.(화학식1')(여기서, R은 탄소수 1∼14의 알킬기 또는 페닐기, n은 1∼14의 정수를 나타내며, X는 할로겐 또는 이소시아네이트기, m은 3을 나타낸다.)
- 하기 화학식2'로 표시되는 화합물로 이루어지는 화학흡착물질.(화학식2')(여기서, R은 탄소수 1∼14의 알킬기 또는 페닐기, n은 1∼14의 정수를 나타내고, X는 이소시아네이트기, m은 3을 나타낸다.)
- 하기 화학식3'로 표시되는 화합물로 이루어지는 화학흡착물질.(화학식3')(여기서, R은 탄소수 1 내지 14의 알킬기 또는 페닐기, n은 1∼14의 정수를 나타내고, X는 이소시아네이트기, m은 3을 나타낸다)
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP97-205937 | 1997-07-31 | ||
JP20593797 | 1997-07-31 | ||
JP97-205938 | 1997-07-31 | ||
JP9205938A JPH1149781A (ja) | 1997-07-31 | 1997-07-31 | 4´−置換カルコン誘導体とその製造方法 |
JP29130897A JPH11125823A (ja) | 1997-10-23 | 1997-10-23 | 液晶配向膜とその製造方法およびそれを用いた液晶表示装置とその製造方法 |
JP97-291307 | 1997-10-23 | ||
JP29130797A JPH11125822A (ja) | 1997-10-23 | 1997-10-23 | 液晶配向膜用化学吸着物質とその製造方法 |
JP97-291308 | 1997-10-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20000068668A KR20000068668A (ko) | 2000-11-25 |
KR100376368B1 true KR100376368B1 (ko) | 2003-03-15 |
Family
ID=27476281
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-1999-7002713A KR100376368B1 (ko) | 1997-07-31 | 1998-07-31 | 화학흡착물질 및 그 제조방법 |
Country Status (6)
Country | Link |
---|---|
US (2) | US6495221B1 (ko) |
EP (1) | EP0962460A4 (ko) |
KR (1) | KR100376368B1 (ko) |
CN (1) | CN1113886C (ko) |
TW (1) | TW539901B (ko) |
WO (1) | WO1999006415A1 (ko) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW482932B (en) | 1999-07-05 | 2002-04-11 | Matsushita Electric Ind Co Ltd | Chemical adsorbate compound, organic film, liquid crystal alignment film, and liquid crystal display device utilizing the chemical adsorbate compound |
TW483929B (en) | 1999-07-05 | 2002-04-21 | Matsushita Electric Ind Co Ltd | Chemical adsorbate compound for forming a thin film and method of producing the same, organic thin film utilizing the chemical adsorbate and method of producing the same, liquid crystal alignment film utilizing the chemical adsorbate compound and method |
TW555790B (en) * | 2000-12-26 | 2003-10-01 | Matsushita Electric Ind Co Ltd | Conductive organic thin film, process for producing the same, and organic photoelectronic device, electric wire, and electrode aech employing the same |
WO2002086913A1 (fr) * | 2001-04-17 | 2002-10-31 | Matsushita Electric Industrial Co., Ltd. | Film mince organique conducteur et son procede de production, electrode et cable electrique utilisant ce film |
US7074344B2 (en) * | 2001-10-03 | 2006-07-11 | Jsr Corporation | Liquid crystal aligning agent and liquid crystal display element |
JP2004053896A (ja) * | 2002-07-19 | 2004-02-19 | Sharp Corp | 表示装置 |
JP2006317656A (ja) * | 2005-05-12 | 2006-11-24 | Dainippon Printing Co Ltd | 異方性光学素子 |
US7700000B2 (en) * | 2005-11-23 | 2010-04-20 | Lg Chem, Ltd. | Silicon derivative, liquid crystal composition comprising the same and compensation film using the same liquid crystal composition |
GB2456298A (en) | 2008-01-07 | 2009-07-15 | Anthony Ian Newman | Electroluminescent materials comprising oxidation resistant fluorenes |
GB0802916D0 (en) | 2008-02-18 | 2008-03-26 | Newman Anthony I | Materials |
US8865274B2 (en) * | 2010-04-02 | 2014-10-21 | Samsung Display Co., Ltd. | Liquid crystal display device, alignment film, and methods for manufacturing the same |
CN102643387B (zh) * | 2011-11-29 | 2014-09-10 | 北京京东方光电科技有限公司 | 一种液晶显示面板及其制备方法 |
CN102629031B (zh) * | 2012-04-24 | 2014-08-27 | 深圳市华星光电技术有限公司 | 改善基板pi不沾的方法及pi液 |
KR102014880B1 (ko) | 2012-12-28 | 2019-08-28 | 삼성디스플레이 주식회사 | 표시 장치 및 이의 제조방법 |
CN104777673B (zh) * | 2015-04-24 | 2018-03-13 | 深圳市华星光电技术有限公司 | 显示面板及其制造方法 |
TW201820009A (zh) * | 2016-11-28 | 2018-06-01 | 日商捷恩智股份有限公司 | 不具有配向膜的液晶顯示元件的製造方法以及顯示裝置 |
CN110109293A (zh) * | 2019-04-04 | 2019-08-09 | 深圳市华星光电技术有限公司 | 液晶无机配向薄膜的制造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53134085A (en) * | 1977-07-18 | 1978-11-22 | Dainippon Printing Co Ltd | Photopolymerizable composition |
JPH05186531A (ja) * | 1992-01-14 | 1993-07-27 | Matsushita Electric Ind Co Ltd | ポリアセチレン型共役ポリマーの製造方法 |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2153860C2 (de) * | 1970-10-29 | 1982-06-09 | Dai Nippon Printing Co., Ltd. | Verwendung von photopolymerisierbaren Gemischen zur Herstellung ätzmittelbeständiger Masken |
US3759968A (en) * | 1971-05-17 | 1973-09-18 | Gen Electric | Silyl maleates and polysiloxane maleates |
JPS5624320A (en) * | 1979-08-07 | 1981-03-07 | Seiko Epson Corp | Orientation treating method of liquid crystal display element |
JPS6257466A (ja) * | 1985-09-05 | 1987-03-13 | Tsutomu Shinoda | ビスアジド誘導体および該誘導体を含有する感光材料 |
EP0261712A1 (en) * | 1986-09-04 | 1988-03-30 | Koninklijke Philips Electronics N.V. | Picture display cell, method of forming an orientation layer on a substrate of the picture display cell and monomeric compounds for use in the orientation layer |
JPH0667816B2 (ja) * | 1988-11-11 | 1994-08-31 | 株式会社クラレ | 歯科用修復材 |
JPH02157727A (ja) | 1988-12-09 | 1990-06-18 | Hitachi Chem Co Ltd | 液晶配向膜用組成物、これを用いた液晶配向膜および液晶表示素子 |
JPH02214731A (ja) * | 1989-02-14 | 1990-08-27 | Nippon Oil & Fats Co Ltd | 高分子配向膜基板 |
JP2558903B2 (ja) | 1989-03-09 | 1996-11-27 | 松下電器産業株式会社 | 液晶配向膜とその製造方法およびそれを用いた液晶表示装置 |
US5133895A (en) | 1989-03-09 | 1992-07-28 | Matsushita Electric Industrial Co., Ltd. | Alignment film for liquid crystal and method for production thereof, as well as liquid crystal display device utilizing said alignment film and method for production thereof |
JP2686454B2 (ja) * | 1990-02-05 | 1997-12-08 | 信越化学工業株式会社 | 共役ジアセチレン結合含有ケイ素化合物およびその製造方法 |
DE69114600T2 (de) * | 1990-08-09 | 1996-10-24 | Sagami Chem Res | Mesogene Gruppen enthaltende Silanolverbindungen, mesogene Gruppen enthaltende polymerisierbare Monomere und mesogene Gruppen enthaltende Polymere. |
US5256456A (en) | 1990-09-17 | 1993-10-26 | Matsushita Electric Industrial Co., Ltd. | Liquid crystal alignment film and method of manufacturing the same |
JP2698717B2 (ja) | 1990-09-17 | 1998-01-19 | 松下電器産業株式会社 | 液晶配向膜及びその製造方法並びに液晶表示装置及びその製造方法 |
DE69121658T2 (de) | 1990-09-17 | 1997-01-23 | Matsushita Electric Ind Co Ltd | Flüssigkristallorientierungsschicht und ihr Herstellungsverfahren |
JPH04328569A (ja) * | 1991-04-30 | 1992-11-17 | Fuji Photo Film Co Ltd | 電子写真式平版印刷用原版 |
JP3007913B2 (ja) | 1991-05-27 | 2000-02-14 | 秋人 村上 | 栽培容器 |
JPH0553118A (ja) | 1991-08-29 | 1993-03-05 | Toshiba Corp | 液晶配向膜の製造方法 |
JPH05173135A (ja) | 1991-12-20 | 1993-07-13 | Fujitsu Ltd | 液晶表示装置 |
JP2692473B2 (ja) * | 1991-12-26 | 1997-12-17 | 信越化学工業株式会社 | 有機ケイ素化合物及び化粧料 |
JPH05257149A (ja) * | 1992-03-16 | 1993-10-08 | Toshiba Corp | 液晶表示素子 |
JP3334812B2 (ja) | 1993-01-29 | 2002-10-15 | 松下電器産業株式会社 | シラン系化学吸着化合物及びそれを用いた液晶配向膜並びに液晶表示装置 |
AU6292594A (en) * | 1993-04-20 | 1994-11-08 | Sagami Chemical Research Center | Copolymer having liquid crystal group in the side chain |
JP3141910B2 (ja) * | 1993-06-14 | 2001-03-07 | 富士ゼロックス株式会社 | 液晶・高分子複合材料よりなる電気光学素子およびその製造方法 |
JP3308356B2 (ja) | 1993-09-03 | 2002-07-29 | 旭硝子株式会社 | 液晶素子用配向膜付き基板およびその製造方法ならびに液晶素子 |
JPH07300586A (ja) * | 1994-03-09 | 1995-11-14 | Natoko Paint Kk | 液晶用スペーサ |
JP3075917B2 (ja) | 1994-05-27 | 2000-08-14 | シャープ株式会社 | 液晶表示装置、その製造方法およびその製造装置 |
JP2872628B2 (ja) | 1996-02-05 | 1999-03-17 | スタンレー電気株式会社 | 液晶表示素子の製造方法 |
EP0844248B1 (de) * | 1996-10-28 | 2002-07-10 | Rolic AG | Vernetzbare, photoaktive Silanderivate |
EP0857728B1 (de) * | 1997-02-05 | 2003-03-05 | Rolic AG | Photovernetzbare Silanderivate |
TW507106B (en) * | 1998-03-11 | 2002-10-21 | Matsushita Electric Ind Co Ltd | Method for producing an alignment chemisorption monomolecular film |
-
1998
- 1998-07-31 CN CN98801090A patent/CN1113886C/zh not_active Expired - Lifetime
- 1998-07-31 WO PCT/JP1998/003437 patent/WO1999006415A1/ja not_active Application Discontinuation
- 1998-07-31 TW TW087112664A patent/TW539901B/zh not_active IP Right Cessation
- 1998-07-31 KR KR10-1999-7002713A patent/KR100376368B1/ko not_active IP Right Cessation
- 1998-07-31 US US09/269,636 patent/US6495221B1/en not_active Expired - Lifetime
- 1998-07-31 EP EP98935322A patent/EP0962460A4/en not_active Withdrawn
-
2002
- 2002-10-21 US US10/274,152 patent/US20030104145A1/en not_active Abandoned
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53134085A (en) * | 1977-07-18 | 1978-11-22 | Dainippon Printing Co Ltd | Photopolymerizable composition |
JPH05186531A (ja) * | 1992-01-14 | 1993-07-27 | Matsushita Electric Ind Co Ltd | ポリアセチレン型共役ポリマーの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
EP0962460A1 (en) | 1999-12-08 |
WO1999006415A1 (fr) | 1999-02-11 |
TW539901B (en) | 2003-07-01 |
KR20000068668A (ko) | 2000-11-25 |
US6495221B1 (en) | 2002-12-17 |
CN1236368A (zh) | 1999-11-24 |
EP0962460A4 (en) | 2000-06-21 |
US20030104145A1 (en) | 2003-06-05 |
CN1113886C (zh) | 2003-07-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100376368B1 (ko) | 화학흡착물질 및 그 제조방법 | |
KR100483504B1 (ko) | 액정 조성물 및 액정 정렬층 | |
US20140009732A1 (en) | Liquid crystal display and method of manufacturing the same | |
KR19980701504A (ko) | 액정 조성물 및 정렬층(Liquid crystal composition and alignment layer) | |
Im et al. | Flexible and patterned thin film polarizer: photopolymerization of perylene-based lyotropic chromonic reactive mesogens | |
EP1819648B1 (en) | Photoreactive compound, liquid crystal alignment layer using the compound, method of manufacturing the alignment layer, and liquid crystal display device containing the alignment layer | |
KR100430120B1 (ko) | 박막형성용 화학흡착물질 및 그 제조방법 및 그 용도 | |
KR20010049640A (ko) | 화학흡착물질과 이것을 사용한 액정배향막 및 액정표시장치 | |
JP2950824B2 (ja) | 液晶配向膜とその製造方法およびそれを用いた液晶表示装置とその製造方法 | |
JP3302645B2 (ja) | 液晶配向膜およびこれを用いた液晶表示素子 | |
JP3537709B2 (ja) | 液晶配向膜およびこれを用いた液晶表示装置 | |
KR100634012B1 (ko) | 고분자 액정 배향제 및 이를 이용한 액정 배향막 | |
JP3497119B2 (ja) | 有機薄膜とその製造方法、液晶配向膜とその製造方法、並びに液晶表示装置とその製造方法 | |
JP3537713B2 (ja) | 液晶配向膜およびこれを用いた液晶表示装置 | |
JPH11125821A (ja) | 液晶配向膜とその製造方法およびそれを用いた液晶表示装置とその製造方法 | |
JP3301960B2 (ja) | 液晶配向膜、液晶配向膜の製造方法、液晶表示装置及び液晶表示装置の製造方法 | |
KR101128123B1 (ko) | 광배향 물질 | |
MXPA99000938A (en) | Liquid crystal composition and alignment layer | |
JP2001021897A (ja) | 薄膜形成用化学吸着物質及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
AMND | Amendment | ||
E902 | Notification of reason for refusal | ||
AMND | Amendment | ||
E801 | Decision on dismissal of amendment | ||
E601 | Decision to refuse application | ||
AMND | Amendment | ||
E902 | Notification of reason for refusal | ||
B701 | Decision to grant | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130219 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20140220 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20150224 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20160219 Year of fee payment: 14 |
|
FPAY | Annual fee payment |
Payment date: 20170221 Year of fee payment: 15 |
|
FPAY | Annual fee payment |
Payment date: 20180220 Year of fee payment: 16 |
|
EXPY | Expiration of term |