KR100253026B1 - 실리콘 카바이드와 갈륨나이트라이드 사이의 버퍼구조와 이 구조로 형성되는 반도체 장치 - Google Patents
실리콘 카바이드와 갈륨나이트라이드 사이의 버퍼구조와 이 구조로 형성되는 반도체 장치 Download PDFInfo
- Publication number
- KR100253026B1 KR100253026B1 KR1019960703125A KR19960703125A KR100253026B1 KR 100253026 B1 KR100253026 B1 KR 100253026B1 KR 1019960703125 A KR1019960703125 A KR 1019960703125A KR 19960703125 A KR19960703125 A KR 19960703125A KR 100253026 B1 KR100253026 B1 KR 100253026B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- gallium nitride
- nitride
- aluminum nitride
- silicon carbide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
- H10H20/0133—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
- H10H20/01335—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/815—Bodies having stress relaxation structures, e.g. buffer layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/817—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
Landscapes
- Led Devices (AREA)
- Recrystallisation Techniques (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Semiconductor Lasers (AREA)
- Ceramic Products (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US8/166229 | 1993-12-13 | ||
| US08/166,229 US5393993A (en) | 1993-12-13 | 1993-12-13 | Buffer structure between silicon carbide and gallium nitride and resulting semiconductor devices |
| US166,229 | 1993-12-13 | ||
| PCT/US1994/013940 WO1995017019A1 (en) | 1993-12-13 | 1994-11-01 | Buffer structure between silicon carbide and gallium nitride and resulting semiconductor devices |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR960706696A KR960706696A (ko) | 1996-12-09 |
| KR100253026B1 true KR100253026B1 (ko) | 2000-04-15 |
Family
ID=22602363
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960703125A Expired - Lifetime KR100253026B1 (ko) | 1993-12-13 | 1994-11-01 | 실리콘 카바이드와 갈륨나이트라이드 사이의 버퍼구조와 이 구조로 형성되는 반도체 장치 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US5393993A (https=) |
| EP (1) | EP0734593B1 (https=) |
| JP (1) | JP2741705B2 (https=) |
| KR (1) | KR100253026B1 (https=) |
| CN (1) | CN1059755C (https=) |
| AT (1) | ATE176553T1 (https=) |
| AU (1) | AU1300295A (https=) |
| CA (1) | CA2177465C (https=) |
| DE (1) | DE69416427T2 (https=) |
| TW (1) | TW273051B (https=) |
| WO (1) | WO1995017019A1 (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101381056B1 (ko) | 2012-11-29 | 2014-04-14 | 주식회사 시지트로닉스 | Ⅲ-질화계 에피층이 성장된 반도체 기판 및 그 방법 |
| KR101922914B1 (ko) | 2016-11-01 | 2018-11-28 | (주)제니컴 | 에피텍셜 성장용 템플릿 |
| KR20200056022A (ko) * | 2018-11-14 | 2020-05-22 | 엘지이노텍 주식회사 | 탄화규소 에피 웨이퍼 |
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| US5281830A (en) * | 1990-10-27 | 1994-01-25 | Toyoda Gosei Co., Ltd. | Light-emitting semiconductor device using gallium nitride group compound |
| JP3160914B2 (ja) * | 1990-12-26 | 2001-04-25 | 豊田合成株式会社 | 窒化ガリウム系化合物半導体レーザダイオード |
| US5173751A (en) * | 1991-01-21 | 1992-12-22 | Pioneer Electronic Corporation | Semiconductor light emitting device |
| JPH088217B2 (ja) * | 1991-01-31 | 1996-01-29 | 日亜化学工業株式会社 | 窒化ガリウム系化合物半導体の結晶成長方法 |
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1993
- 1993-12-13 US US08/166,229 patent/US5393993A/en not_active Expired - Lifetime
-
1994
- 1994-11-01 EP EP95904227A patent/EP0734593B1/en not_active Expired - Lifetime
- 1994-11-01 CN CN94194481A patent/CN1059755C/zh not_active Expired - Lifetime
- 1994-11-01 CA CA002177465A patent/CA2177465C/en not_active Expired - Fee Related
- 1994-11-01 AT AT95904227T patent/ATE176553T1/de not_active IP Right Cessation
- 1994-11-01 KR KR1019960703125A patent/KR100253026B1/ko not_active Expired - Lifetime
- 1994-11-01 DE DE69416427T patent/DE69416427T2/de not_active Expired - Lifetime
- 1994-11-01 WO PCT/US1994/013940 patent/WO1995017019A1/en not_active Ceased
- 1994-11-01 AU AU13002/95A patent/AU1300295A/en not_active Abandoned
- 1994-11-01 JP JP7516809A patent/JP2741705B2/ja not_active Expired - Lifetime
- 1994-12-14 TW TW083111693A patent/TW273051B/zh not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05206513A (ja) * | 1992-01-28 | 1993-08-13 | Sharp Corp | 半導体発光素子 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101381056B1 (ko) | 2012-11-29 | 2014-04-14 | 주식회사 시지트로닉스 | Ⅲ-질화계 에피층이 성장된 반도체 기판 및 그 방법 |
| KR101922914B1 (ko) | 2016-11-01 | 2018-11-28 | (주)제니컴 | 에피텍셜 성장용 템플릿 |
| KR20200056022A (ko) * | 2018-11-14 | 2020-05-22 | 엘지이노텍 주식회사 | 탄화규소 에피 웨이퍼 |
| KR102681366B1 (ko) * | 2018-11-14 | 2024-07-05 | 주식회사 엘엑스세미콘 | 탄화규소 에피 웨이퍼 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2741705B2 (ja) | 1998-04-22 |
| ATE176553T1 (de) | 1999-02-15 |
| EP0734593B1 (en) | 1999-02-03 |
| CN1137331A (zh) | 1996-12-04 |
| US5393993A (en) | 1995-02-28 |
| KR960706696A (ko) | 1996-12-09 |
| CN1059755C (zh) | 2000-12-20 |
| CA2177465A1 (en) | 1995-06-22 |
| WO1995017019A1 (en) | 1995-06-22 |
| TW273051B (https=) | 1996-03-21 |
| DE69416427D1 (de) | 1999-03-18 |
| DE69416427T2 (de) | 1999-10-21 |
| EP0734593A1 (en) | 1996-10-02 |
| JPH09508751A (ja) | 1997-09-02 |
| CA2177465C (en) | 2000-10-10 |
| AU1300295A (en) | 1995-07-03 |
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