JPWO2023223481A5 - - Google Patents

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Publication number
JPWO2023223481A5
JPWO2023223481A5 JP2023535740A JP2023535740A JPWO2023223481A5 JP WO2023223481 A5 JPWO2023223481 A5 JP WO2023223481A5 JP 2023535740 A JP2023535740 A JP 2023535740A JP 2023535740 A JP2023535740 A JP 2023535740A JP WO2023223481 A5 JPWO2023223481 A5 JP WO2023223481A5
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JP
Japan
Prior art keywords
gas
processing apparatus
plasma processing
exhaust
pressure
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JP2023535740A
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English (en)
Japanese (ja)
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JPWO2023223481A1 (https=
JP7543566B2 (ja
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Priority claimed from PCT/JP2022/020737 external-priority patent/WO2023223481A1/ja
Publication of JPWO2023223481A1 publication Critical patent/JPWO2023223481A1/ja
Publication of JPWO2023223481A5 publication Critical patent/JPWO2023223481A5/ja
Application granted granted Critical
Publication of JP7543566B2 publication Critical patent/JP7543566B2/ja
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JP2023535740A 2022-05-18 2022-05-18 プラズマ処理装置およびガスの排気方法 Active JP7543566B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/020737 WO2023223481A1 (ja) 2022-05-18 2022-05-18 プラズマ処理装置およびガスの排気方法

Publications (3)

Publication Number Publication Date
JPWO2023223481A1 JPWO2023223481A1 (https=) 2023-11-23
JPWO2023223481A5 true JPWO2023223481A5 (https=) 2024-04-25
JP7543566B2 JP7543566B2 (ja) 2024-09-02

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ID=88834910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023535740A Active JP7543566B2 (ja) 2022-05-18 2022-05-18 プラズマ処理装置およびガスの排気方法

Country Status (6)

Country Link
US (1) US20250069867A1 (https=)
JP (1) JP7543566B2 (https=)
KR (1) KR102864350B1 (https=)
CN (1) CN117425950A (https=)
TW (1) TWI864615B (https=)
WO (1) WO2023223481A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025136713A1 (en) * 2023-12-20 2025-06-26 Lam Research Corporation In-situ calibration of gas flows in substrate processing systems

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04180567A (ja) * 1990-11-15 1992-06-26 Nec Kyushu Ltd 半導体製造装置の材料ガス供給システム
JP3705204B2 (ja) * 2001-12-27 2005-10-12 ソニー株式会社 気相成長装置及び発光素子の製造装置
JP4606396B2 (ja) * 2006-09-15 2011-01-05 東京エレクトロン株式会社 処理ガス供給システム及び処理ガス供給方法
JP4961223B2 (ja) * 2007-01-31 2012-06-27 株式会社日立ハイテクノロジーズ プラズマ処理装置の圧力制御方法
JP5079902B1 (ja) * 2011-05-13 2012-11-21 シャープ株式会社 反応室開放方法、及び気相成長装置
JP6567951B2 (ja) * 2015-10-23 2019-08-28 株式会社日立ハイテクノロジーズ ガス排気方法
CN114256086A (zh) * 2020-09-24 2022-03-29 中国科学院微电子研究所 一种半导体反应腔的气路系统、控制方法及加工设备

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