JPWO2023157888A5 - - Google Patents
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- Publication number
- JPWO2023157888A5 JPWO2023157888A5 JP2024501412A JP2024501412A JPWO2023157888A5 JP WO2023157888 A5 JPWO2023157888 A5 JP WO2023157888A5 JP 2024501412 A JP2024501412 A JP 2024501412A JP 2024501412 A JP2024501412 A JP 2024501412A JP WO2023157888 A5 JPWO2023157888 A5 JP WO2023157888A5
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- region
- pattern
- exposure pattern
- light modulator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 2
- 230000007261 regionalization Effects 0.000 claims 11
- 239000000758 substrate Substances 0.000 claims 9
- 238000005259 measurement Methods 0.000 claims 3
- 238000005286 illumination Methods 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 102100030341 Ethanolaminephosphotransferase 1 Human genes 0.000 description 1
- 101000938340 Homo sapiens Ethanolaminephosphotransferase 1 Proteins 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022022940 | 2022-02-17 | ||
| PCT/JP2023/005314 WO2023157888A1 (ja) | 2022-02-17 | 2023-02-15 | 露光方法、デバイス製造方法、露光装置、及び露光システム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023157888A1 JPWO2023157888A1 (https=) | 2023-08-24 |
| JPWO2023157888A5 true JPWO2023157888A5 (https=) | 2024-10-24 |
Family
ID=87578355
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024501412A Pending JPWO2023157888A1 (https=) | 2022-02-17 | 2023-02-15 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20240377754A1 (https=) |
| EP (1) | EP4481498A4 (https=) |
| JP (1) | JPWO2023157888A1 (https=) |
| KR (1) | KR20240135813A (https=) |
| CN (1) | CN118871862A (https=) |
| TW (1) | TW202338519A (https=) |
| WO (1) | WO2023157888A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI873898B (zh) * | 2023-10-05 | 2025-02-21 | 力晶積成電子製造股份有限公司 | 用於曝光製程的拼接方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0831404B2 (ja) * | 1988-02-24 | 1996-03-27 | 三菱電機株式会社 | 半導体装置の製造方法 |
| JPH05136020A (ja) * | 1991-11-11 | 1993-06-01 | Fujitsu Ltd | 半導体装置の露光方法 |
| JP3198310B2 (ja) | 1993-01-06 | 2001-08-13 | 株式会社ニコン | 露光方法及び装置 |
| US6624433B2 (en) | 1994-02-22 | 2003-09-23 | Nikon Corporation | Method and apparatus for positioning substrate and the like |
| JPH07249558A (ja) * | 1994-03-09 | 1995-09-26 | Nikon Corp | 位置合わせ方法 |
| US5637129A (en) | 1995-11-03 | 1997-06-10 | Owens-Brockway Glass Container Inc. | Glass melting furnace plunger needle set-up fixture |
| SE522531C2 (sv) * | 1999-11-24 | 2004-02-17 | Micronic Laser Systems Ab | Metod och anordning för märkning av halvledare |
| US20050015608A1 (en) | 2003-07-16 | 2005-01-20 | Pkware, Inc. | Method for strongly encrypting .ZIP files |
| JP4266079B2 (ja) * | 2001-04-09 | 2009-05-20 | 株式会社東芝 | 原版とその作製方法及びその原版を用いた露光方法 |
| JP2007199711A (ja) * | 2005-12-28 | 2007-08-09 | Nikon Corp | 露光システム、デバイス製造システム、露光方法及びデバイスの製造方法 |
| JP2008268578A (ja) * | 2007-04-20 | 2008-11-06 | Toppan Printing Co Ltd | 分割露光装置及び分割露光方法 |
| TWI443472B (zh) | 2007-07-13 | 2014-07-01 | 尼康股份有限公司 | Pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method and element |
| JP2011181715A (ja) * | 2010-03-02 | 2011-09-15 | Nikon Corp | 露光装置 |
| JP5703069B2 (ja) * | 2010-09-30 | 2015-04-15 | 株式会社Ｓｃｒｅｅｎホールディングス | 描画装置および描画方法 |
| KR102552792B1 (ko) | 2015-02-23 | 2023-07-06 | 가부시키가이샤 니콘 | 계측 장치, 리소그래피 시스템 및 노광 장치, 그리고 디바이스 제조 방법 |
| JP6664897B2 (ja) | 2015-07-22 | 2020-03-13 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| JP6601173B2 (ja) * | 2015-11-12 | 2019-11-06 | ウシオ電機株式会社 | 露光装置、基板製造システム、露光方法、および基板製造方法 |
| EP3598236A4 (en) | 2017-03-16 | 2021-01-20 | Nikon Corporation | CONTROL DEVICE AND CONTROL METHOD, EXPOSURE DEVICE AND EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, DATA GENERATING METHOD AND PROGRAM |
-
2023
- 2023-02-15 CN CN202380019504.5A patent/CN118871862A/zh active Pending
- 2023-02-15 WO PCT/JP2023/005314 patent/WO2023157888A1/ja not_active Ceased
- 2023-02-15 JP JP2024501412A patent/JPWO2023157888A1/ja active Pending
- 2023-02-15 KR KR1020247027066A patent/KR20240135813A/ko active Pending
- 2023-02-15 EP EP23756413.3A patent/EP4481498A4/en active Pending
- 2023-02-16 TW TW112105594A patent/TW202338519A/zh unknown
-
2024
- 2024-07-23 US US18/780,663 patent/US20240377754A1/en active Pending
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