JPWO2023067739A5 - - Google Patents
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- Publication number
- JPWO2023067739A5 JPWO2023067739A5 JP2023507498A JP2023507498A JPWO2023067739A5 JP WO2023067739 A5 JPWO2023067739 A5 JP WO2023067739A5 JP 2023507498 A JP2023507498 A JP 2023507498A JP 2023507498 A JP2023507498 A JP 2023507498A JP WO2023067739 A5 JPWO2023067739 A5 JP WO2023067739A5
- Authority
- JP
- Japan
- Prior art keywords
- beryllium
- layer
- nitride
- protective layer
- transmittance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052790 beryllium Inorganic materials 0.000 description 16
- 239000010410 layer Substances 0.000 description 13
- -1 beryllium nitride Chemical class 0.000 description 9
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 7
- 239000011241 protective layer Substances 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024064701A JP7598504B2 (ja) | 2021-10-20 | 2024-04-12 | Ｅｕｖ透過膜 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2021/038811 WO2023067739A1 (ja) | 2021-10-20 | 2021-10-20 | Ｅｕｖ透過膜 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024064701A Division JP7598504B2 (ja) | 2021-10-20 | 2024-04-12 | Ｅｕｖ透過膜 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023067739A1 JPWO2023067739A1 (https=) | 2023-04-27 |
| JPWO2023067739A5 true JPWO2023067739A5 (https=) | 2023-09-21 |
| JP7492649B2 JP7492649B2 (ja) | 2024-05-29 |
Family
ID=86058073
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023507498A Active JP7492649B2 (ja) | 2021-10-20 | 2021-10-20 | Ｅｕｖ透過膜 |
| JP2023515782A Active JP7498855B2 (ja) | 2021-10-20 | 2022-09-15 | Ｅｕｖ透過膜 |
| JP2024064701A Active JP7598504B2 (ja) | 2021-10-20 | 2024-04-12 | Ｅｕｖ透過膜 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023515782A Active JP7498855B2 (ja) | 2021-10-20 | 2022-09-15 | Ｅｕｖ透過膜 |
| JP2024064701A Active JP7598504B2 (ja) | 2021-10-20 | 2024-04-12 | Ｅｕｖ透過膜 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US12591172B2 (https=) |
| EP (3) | EP4194948A4 (https=) |
| JP (3) | JP7492649B2 (https=) |
| KR (2) | KR102891816B1 (https=) |
| CN (2) | CN118076920A (https=) |
| TW (1) | TW202328806A (https=) |
| WO (2) | WO2023067739A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024057499A1 (ja) * | 2022-09-15 | 2024-03-21 | 日本碍子株式会社 | Ｅｕｖ透過膜 |
| EP4636488A1 (en) * | 2024-02-29 | 2025-10-22 | Ngk Insulators, Ltd. | Euv transmissive film, method for processing same, and light exposure method |
| KR20250134066A (ko) * | 2024-02-29 | 2025-09-09 | 엔지케이 인슐레이터 엘티디 | Euv 투과막, 펠리클 및 노광 방법 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62114738A (ja) | 1985-11-14 | 1987-05-26 | Toshikazu Okuno | コイリングマシン |
| JPH01162332A (ja) * | 1987-12-18 | 1989-06-26 | Sharp Corp | Ｘ線リソグラフィ用マスクメンブレン |
| JPH10340843A (ja) * | 1997-06-06 | 1998-12-22 | Nikon Corp | 照明装置および露光装置 |
| JP2000338299A (ja) | 1999-05-28 | 2000-12-08 | Mitsubishi Electric Corp | Ｘ線露光装置、ｘ線露光方法、ｘ線マスク、ｘ線ミラー、シンクロトロン放射装置、シンクロトロン放射方法および半導体装置 |
| JP2001221689A (ja) * | 2000-02-08 | 2001-08-17 | Yokogawa Electric Corp | 赤外線光源及び赤外線ガス分析計 |
| US7456932B2 (en) * | 2003-07-25 | 2008-11-25 | Asml Netherlands B.V. | Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby |
| JP4928494B2 (ja) | 2008-05-02 | 2012-05-09 | 信越化学工業株式会社 | ペリクルおよびペリクルの製造方法 |
| JP6308592B2 (ja) * | 2014-04-02 | 2018-04-11 | 信越化学工業株式会社 | Ｅｕｖ用ペリクル |
| KR102604554B1 (ko) | 2014-07-04 | 2023-11-22 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 내에서 사용하는 멤브레인 및 이러한멤브레인을 포함한 리소그래피 장치 |
| KR102186010B1 (ko) * | 2016-01-26 | 2020-12-04 | 한양대학교 산학협력단 | Euv 펠리클 구조체, 및 그 제조 방법 |
| JP6518801B2 (ja) * | 2017-03-10 | 2019-05-22 | エスアンドエス テック カンパニー リミテッド | 極紫外線リソグラフィ用ペリクル及びその製造方法 |
| EP3404487B1 (en) | 2017-05-15 | 2021-12-01 | IMEC vzw | Method for forming a carbon nanotube pellicle membrane |
| CN118707800A (zh) * | 2017-11-06 | 2024-09-27 | Asml荷兰有限公司 | 用于降低应力的金属硅氮化物 |
| EP3724721A1 (en) | 2017-12-12 | 2020-10-21 | ASML Netherlands B.V. | Apparatus and method for determining a condition associated with a pellicle |
| NL2023932B1 (en) * | 2018-10-15 | 2020-08-19 | Asml Netherlands Bv | Method of manufacturing a membrane assembly |
| NL2027098B1 (en) | 2020-01-16 | 2021-10-14 | Asml Netherlands Bv | Pellicle membrane for a lithographic apparatus |
| WO2024057499A1 (ja) * | 2022-09-15 | 2024-03-21 | 日本碍子株式会社 | Ｅｕｖ透過膜 |
-
2021
- 2021-10-20 EP EP21954413.7A patent/EP4194948A4/en active Pending
- 2021-10-20 JP JP2023507498A patent/JP7492649B2/ja active Active
- 2021-10-20 WO PCT/JP2021/038811 patent/WO2023067739A1/ja not_active Ceased
- 2021-10-20 EP EP24203173.0A patent/EP4465129A3/en active Pending
- 2021-10-20 CN CN202180055382.6A patent/CN118076920A/zh active Pending
- 2021-10-20 KR KR1020237002844A patent/KR102891816B1/ko active Active
-
2022
- 2022-09-15 KR KR1020237006160A patent/KR102947881B1/ko active Active
- 2022-09-15 CN CN202280007294.3A patent/CN118140177A/zh active Pending
- 2022-09-15 WO PCT/JP2022/034590 patent/WO2023067957A1/ja not_active Ceased
- 2022-09-15 JP JP2023515782A patent/JP7498855B2/ja active Active
- 2022-09-15 EP EP22883267.1A patent/EP4227736A4/en active Pending
- 2022-09-20 TW TW111135499A patent/TW202328806A/zh unknown
-
2023
- 2023-02-24 US US18/173,955 patent/US12591172B2/en active Active
- 2023-05-02 US US18/310,609 patent/US20230305192A1/en active Pending
-
2024
- 2024-04-12 JP JP2024064701A patent/JP7598504B2/ja active Active
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