JPWO2023067739A1 - - Google Patents
Info
- Publication number
- JPWO2023067739A1 JPWO2023067739A1 JP2023507498A JP2023507498A JPWO2023067739A1 JP WO2023067739 A1 JPWO2023067739 A1 JP WO2023067739A1 JP 2023507498 A JP2023507498 A JP 2023507498A JP 2023507498 A JP2023507498 A JP 2023507498A JP WO2023067739 A1 JPWO2023067739 A1 JP WO2023067739A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Laminated Bodies (AREA)
- Optical Filters (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024064701A JP7598504B2 (ja) | 2021-10-20 | 2024-04-12 | Ｅｕｖ透過膜 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2021/038811 WO2023067739A1 (ja) | 2021-10-20 | 2021-10-20 | Ｅｕｖ透過膜 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024064701A Division JP7598504B2 (ja) | 2021-10-20 | 2024-04-12 | Ｅｕｖ透過膜 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023067739A1 true JPWO2023067739A1 (https=) | 2023-04-27 |
| JPWO2023067739A5 JPWO2023067739A5 (https=) | 2023-09-21 |
| JP7492649B2 JP7492649B2 (ja) | 2024-05-29 |
Family
ID=86058073
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023507498A Active JP7492649B2 (ja) | 2021-10-20 | 2021-10-20 | Ｅｕｖ透過膜 |
| JP2023515782A Active JP7498855B2 (ja) | 2021-10-20 | 2022-09-15 | Ｅｕｖ透過膜 |
| JP2024064701A Active JP7598504B2 (ja) | 2021-10-20 | 2024-04-12 | Ｅｕｖ透過膜 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023515782A Active JP7498855B2 (ja) | 2021-10-20 | 2022-09-15 | Ｅｕｖ透過膜 |
| JP2024064701A Active JP7598504B2 (ja) | 2021-10-20 | 2024-04-12 | Ｅｕｖ透過膜 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US12591172B2 (https=) |
| EP (3) | EP4194948A4 (https=) |
| JP (3) | JP7492649B2 (https=) |
| KR (2) | KR102891816B1 (https=) |
| CN (2) | CN118076920A (https=) |
| TW (1) | TW202328806A (https=) |
| WO (2) | WO2023067739A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024057499A1 (ja) * | 2022-09-15 | 2024-03-21 | 日本碍子株式会社 | Ｅｕｖ透過膜 |
| EP4636488A1 (en) * | 2024-02-29 | 2025-10-22 | Ngk Insulators, Ltd. | Euv transmissive film, method for processing same, and light exposure method |
| KR20250134066A (ko) * | 2024-02-29 | 2025-09-09 | 엔지케이 인슐레이터 엘티디 | Euv 투과막, 펠리클 및 노광 방법 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10340843A (ja) * | 1997-06-06 | 1998-12-22 | Nikon Corp | 照明装置および露光装置 |
| JP2000338299A (ja) * | 1999-05-28 | 2000-12-08 | Mitsubishi Electric Corp | Ｘ線露光装置、ｘ線露光方法、ｘ線マスク、ｘ線ミラー、シンクロトロン放射装置、シンクロトロン放射方法および半導体装置 |
| JP2017522590A (ja) * | 2014-07-04 | 2017-08-10 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置内で用いられる膜及びそのような膜を含むリソグラフィ装置 |
| JP2018151622A (ja) * | 2017-03-10 | 2018-09-27 | エスアンドエス テック カンパニー リミテッド | 極紫外線リソグラフィ用ペリクル及びその製造方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62114738A (ja) | 1985-11-14 | 1987-05-26 | Toshikazu Okuno | コイリングマシン |
| JPH01162332A (ja) * | 1987-12-18 | 1989-06-26 | Sharp Corp | Ｘ線リソグラフィ用マスクメンブレン |
| JP2001221689A (ja) * | 2000-02-08 | 2001-08-17 | Yokogawa Electric Corp | 赤外線光源及び赤外線ガス分析計 |
| US7456932B2 (en) * | 2003-07-25 | 2008-11-25 | Asml Netherlands B.V. | Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby |
| JP4928494B2 (ja) | 2008-05-02 | 2012-05-09 | 信越化学工業株式会社 | ペリクルおよびペリクルの製造方法 |
| JP6308592B2 (ja) * | 2014-04-02 | 2018-04-11 | 信越化学工業株式会社 | Ｅｕｖ用ペリクル |
| KR102186010B1 (ko) * | 2016-01-26 | 2020-12-04 | 한양대학교 산학협력단 | Euv 펠리클 구조체, 및 그 제조 방법 |
| EP3404487B1 (en) | 2017-05-15 | 2021-12-01 | IMEC vzw | Method for forming a carbon nanotube pellicle membrane |
| CN118707800A (zh) * | 2017-11-06 | 2024-09-27 | Asml荷兰有限公司 | 用于降低应力的金属硅氮化物 |
| EP3724721A1 (en) | 2017-12-12 | 2020-10-21 | ASML Netherlands B.V. | Apparatus and method for determining a condition associated with a pellicle |
| NL2023932B1 (en) * | 2018-10-15 | 2020-08-19 | Asml Netherlands Bv | Method of manufacturing a membrane assembly |
| NL2027098B1 (en) | 2020-01-16 | 2021-10-14 | Asml Netherlands Bv | Pellicle membrane for a lithographic apparatus |
| WO2024057499A1 (ja) * | 2022-09-15 | 2024-03-21 | 日本碍子株式会社 | Ｅｕｖ透過膜 |
-
2021
- 2021-10-20 EP EP21954413.7A patent/EP4194948A4/en active Pending
- 2021-10-20 JP JP2023507498A patent/JP7492649B2/ja active Active
- 2021-10-20 WO PCT/JP2021/038811 patent/WO2023067739A1/ja not_active Ceased
- 2021-10-20 EP EP24203173.0A patent/EP4465129A3/en active Pending
- 2021-10-20 CN CN202180055382.6A patent/CN118076920A/zh active Pending
- 2021-10-20 KR KR1020237002844A patent/KR102891816B1/ko active Active
-
2022
- 2022-09-15 KR KR1020237006160A patent/KR102947881B1/ko active Active
- 2022-09-15 CN CN202280007294.3A patent/CN118140177A/zh active Pending
- 2022-09-15 WO PCT/JP2022/034590 patent/WO2023067957A1/ja not_active Ceased
- 2022-09-15 JP JP2023515782A patent/JP7498855B2/ja active Active
- 2022-09-15 EP EP22883267.1A patent/EP4227736A4/en active Pending
- 2022-09-20 TW TW111135499A patent/TW202328806A/zh unknown
-
2023
- 2023-02-24 US US18/173,955 patent/US12591172B2/en active Active
- 2023-05-02 US US18/310,609 patent/US20230305192A1/en active Pending
-
2024
- 2024-04-12 JP JP2024064701A patent/JP7598504B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10340843A (ja) * | 1997-06-06 | 1998-12-22 | Nikon Corp | 照明装置および露光装置 |
| JP2000338299A (ja) * | 1999-05-28 | 2000-12-08 | Mitsubishi Electric Corp | Ｘ線露光装置、ｘ線露光方法、ｘ線マスク、ｘ線ミラー、シンクロトロン放射装置、シンクロトロン放射方法および半導体装置 |
| JP2017522590A (ja) * | 2014-07-04 | 2017-08-10 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置内で用いられる膜及びそのような膜を含むリソグラフィ装置 |
| JP2018151622A (ja) * | 2017-03-10 | 2018-09-27 | エスアンドエス テック カンパニー リミテッド | 極紫外線リソグラフィ用ペリクル及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US12591172B2 (en) | 2026-03-31 |
| KR20230058055A (ko) | 2023-05-02 |
| TW202328806A (zh) | 2023-07-16 |
| EP4227736A1 (en) | 2023-08-16 |
| KR102947881B1 (ko) | 2026-04-02 |
| WO2023067957A1 (ja) | 2023-04-27 |
| EP4194948A4 (en) | 2024-05-01 |
| EP4194948A1 (en) | 2023-06-14 |
| EP4465129A3 (en) | 2025-02-12 |
| JP7492649B2 (ja) | 2024-05-29 |
| CN118140177A (zh) | 2024-06-04 |
| EP4465129A2 (en) | 2024-11-20 |
| US20230213848A1 (en) | 2023-07-06 |
| JPWO2023067957A1 (https=) | 2023-04-27 |
| JP2024088797A (ja) | 2024-07-02 |
| KR102891816B1 (ko) | 2025-11-26 |
| JP7598504B2 (ja) | 2024-12-11 |
| CN118076920A (zh) | 2024-05-24 |
| EP4227736A4 (en) | 2025-06-11 |
| KR20230058044A (ko) | 2023-05-02 |
| JP7498855B2 (ja) | 2024-06-12 |
| US20230305192A1 (en) | 2023-09-28 |
| WO2023067739A1 (ja) | 2023-04-27 |
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