KR102891816B1 - Euv 투과막 - Google Patents

Euv 투과막

Info

Publication number
KR102891816B1
KR102891816B1 KR1020237002844A KR20237002844A KR102891816B1 KR 102891816 B1 KR102891816 B1 KR 102891816B1 KR 1020237002844 A KR1020237002844 A KR 1020237002844A KR 20237002844 A KR20237002844 A KR 20237002844A KR 102891816 B1 KR102891816 B1 KR 102891816B1
Authority
KR
South Korea
Prior art keywords
beryllium
film
euv
layer
protective layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020237002844A
Other languages
English (en)
Korean (ko)
Other versions
KR20230058044A (ko
Inventor
도시카츠 가시와야
아츠오 곤도
히로키 차엔
다카시 다니무라
Original Assignee
엔지케이 인슐레이터 엘티디
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엔지케이 인슐레이터 엘티디 filed Critical 엔지케이 인슐레이터 엘티디
Publication of KR20230058044A publication Critical patent/KR20230058044A/ko
Application granted granted Critical
Publication of KR102891816B1 publication Critical patent/KR102891816B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
  • Optical Filters (AREA)
  • Physical Vapour Deposition (AREA)
KR1020237002844A 2021-10-20 2021-10-20 Euv 투과막 Active KR102891816B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/038811 WO2023067739A1 (ja) 2021-10-20 2021-10-20 Ｅｕｖ透過膜

Publications (2)

Publication Number Publication Date
KR20230058044A KR20230058044A (ko) 2023-05-02
KR102891816B1 true KR102891816B1 (ko) 2025-11-26

Family

ID=86058073

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020237002844A Active KR102891816B1 (ko) 2021-10-20 2021-10-20 Euv 투과막
KR1020237006160A Active KR102947881B1 (ko) 2021-10-20 2022-09-15 Euv 투과막

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020237006160A Active KR102947881B1 (ko) 2021-10-20 2022-09-15 Euv 투과막

Country Status (7)

Country Link
US (2) US12591172B2 (https=)
EP (3) EP4194948A4 (https=)
JP (3) JP7492649B2 (https=)
KR (2) KR102891816B1 (https=)
CN (2) CN118076920A (https=)
TW (1) TW202328806A (https=)
WO (2) WO2023067739A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024057499A1 (ja) * 2022-09-15 2024-03-21 日本碍子株式会社 Ｅｕｖ透過膜
EP4636488A1 (en) * 2024-02-29 2025-10-22 Ngk Insulators, Ltd. Euv transmissive film, method for processing same, and light exposure method
KR20250134066A (ko) * 2024-02-29 2025-09-09 엔지케이 인슐레이터 엘티디 Euv 투과막, 펠리클 및 노광 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000338299A (ja) 1999-05-28 2000-12-08 Mitsubishi Electric Corp Ｘ線露光装置、ｘ線露光方法、ｘ線マスク、ｘ線ミラー、シンクロトロン放射装置、シンクロトロン放射方法および半導体装置
JP2017522590A (ja) * 2014-07-04 2017-08-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置内で用いられる膜及びそのような膜を含むリソグラフィ装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62114738A (ja) 1985-11-14 1987-05-26 Toshikazu Okuno コイリングマシン
JPH01162332A (ja) * 1987-12-18 1989-06-26 Sharp Corp Ｘ線リソグラフィ用マスクメンブレン
JPH10340843A (ja) * 1997-06-06 1998-12-22 Nikon Corp 照明装置および露光装置
JP2001221689A (ja) * 2000-02-08 2001-08-17 Yokogawa Electric Corp 赤外線光源及び赤外線ガス分析計
US7456932B2 (en) * 2003-07-25 2008-11-25 Asml Netherlands B.V. Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby
JP4928494B2 (ja) 2008-05-02 2012-05-09 信越化学工業株式会社 ペリクルおよびペリクルの製造方法
JP6308592B2 (ja) * 2014-04-02 2018-04-11 信越化学工業株式会社 Ｅｕｖ用ペリクル
KR102186010B1 (ko) * 2016-01-26 2020-12-04 한양대학교 산학협력단 Euv 펠리클 구조체, 및 그 제조 방법
JP6518801B2 (ja) * 2017-03-10 2019-05-22 エスアンドエス テック カンパニー リミテッド 極紫外線リソグラフィ用ペリクル及びその製造方法
EP3404487B1 (en) 2017-05-15 2021-12-01 IMEC vzw Method for forming a carbon nanotube pellicle membrane
CN118707800A (zh) * 2017-11-06 2024-09-27 Asml荷兰有限公司 用于降低应力的金属硅氮化物
EP3724721A1 (en) 2017-12-12 2020-10-21 ASML Netherlands B.V. Apparatus and method for determining a condition associated with a pellicle
NL2023932B1 (en) * 2018-10-15 2020-08-19 Asml Netherlands Bv Method of manufacturing a membrane assembly
NL2027098B1 (en) 2020-01-16 2021-10-14 Asml Netherlands Bv Pellicle membrane for a lithographic apparatus
WO2024057499A1 (ja) * 2022-09-15 2024-03-21 日本碍子株式会社 Ｅｕｖ透過膜

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000338299A (ja) 1999-05-28 2000-12-08 Mitsubishi Electric Corp Ｘ線露光装置、ｘ線露光方法、ｘ線マスク、ｘ線ミラー、シンクロトロン放射装置、シンクロトロン放射方法および半導体装置
JP2017522590A (ja) * 2014-07-04 2017-08-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置内で用いられる膜及びそのような膜を含むリソグラフィ装置

Also Published As

Publication number Publication date
US12591172B2 (en) 2026-03-31
KR20230058055A (ko) 2023-05-02
TW202328806A (zh) 2023-07-16
EP4227736A1 (en) 2023-08-16
KR102947881B1 (ko) 2026-04-02
WO2023067957A1 (ja) 2023-04-27
EP4194948A4 (en) 2024-05-01
EP4194948A1 (en) 2023-06-14
EP4465129A3 (en) 2025-02-12
JP7492649B2 (ja) 2024-05-29
CN118140177A (zh) 2024-06-04
EP4465129A2 (en) 2024-11-20
US20230213848A1 (en) 2023-07-06
JPWO2023067957A1 (https=) 2023-04-27
JP2024088797A (ja) 2024-07-02
JP7598504B2 (ja) 2024-12-11
CN118076920A (zh) 2024-05-24
JPWO2023067739A1 (https=) 2023-04-27
EP4227736A4 (en) 2025-06-11
KR20230058044A (ko) 2023-05-02
JP7498855B2 (ja) 2024-06-12
US20230305192A1 (en) 2023-09-28
WO2023067739A1 (ja) 2023-04-27

Similar Documents

Publication Publication Date Title
JP7598504B2 (ja) Ｅｕｖ透過膜
US8580465B2 (en) Multilayer mirror for EUV lithography and process for its production
KR102867083B1 (ko) Euv 투과막
KR102301568B1 (ko) 탄화규소 층을 포함하는 극자외선용 펠리클의 제조방법
JP7724362B2 (ja) Ｅｕｖ透過膜の製造方法及びペリクル
JP7583961B2 (ja) ペリクルの製造に用いられるためのＳｉメンブレン構造体、及びペリクルの製造方法
JP7554368B2 (ja) Ｅｕｖ透過膜及びその使用方法、並びに露光方法
US20250278032A1 (en) Euv transmissive membrane, processing method thereof, and exposure method
US20250278031A1 (en) Euv transmissive membrane, pellicle, and exposure method

Legal Events

Date Code Title Description
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

D22 Grant of ip right intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D22-EXM-PE0701 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

F11 Ip right granted following substantive examination

Free format text: ST27 STATUS EVENT CODE: A-2-4-F10-F11-EXM-PR0701 (AS PROVIDED BY THE NATIONAL OFFICE)

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

U12 Designation fee paid

Free format text: ST27 STATUS EVENT CODE: A-2-2-U10-U12-OTH-PR1002 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

Q13 Ip right document published

Free format text: ST27 STATUS EVENT CODE: A-4-4-Q10-Q13-NAP-PG1601 (AS PROVIDED BY THE NATIONAL OFFICE)

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301