JP7492649B2 - Ｅｕｖ透過膜 - Google Patents

Ｅｕｖ透過膜 Download PDF

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Publication number
JP7492649B2
JP7492649B2 JP2023507498A JP2023507498A JP7492649B2 JP 7492649 B2 JP7492649 B2 JP 7492649B2 JP 2023507498 A JP2023507498 A JP 2023507498A JP 2023507498 A JP2023507498 A JP 2023507498A JP 7492649 B2 JP7492649 B2 JP 7492649B2
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JP
Japan
Prior art keywords
film
beryllium
euv
layer
protective layer
Prior art date
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JP2023507498A
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English (en)
Japanese (ja)
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JPWO2023067739A5 (https=
JPWO2023067739A1 (https=
Inventor
俊克 柏屋
厚男 近藤
弘基 茶園
昴 谷村
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NGK Insulators Ltd
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NGK Insulators Ltd
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Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
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Priority to JP2024064701A priority Critical patent/JP7598504B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
  • Optical Filters (AREA)
  • Physical Vapour Deposition (AREA)
JP2023507498A 2021-10-20 2021-10-20 Ｅｕｖ透過膜 Active JP7492649B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024064701A JP7598504B2 (ja) 2021-10-20 2024-04-12 Ｅｕｖ透過膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/038811 WO2023067739A1 (ja) 2021-10-20 2021-10-20 Ｅｕｖ透過膜

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024064701A Division JP7598504B2 (ja) 2021-10-20 2024-04-12 Ｅｕｖ透過膜

Publications (3)

Publication Number Publication Date
JPWO2023067739A1 JPWO2023067739A1 (https=) 2023-04-27
JPWO2023067739A5 JPWO2023067739A5 (https=) 2023-09-21
JP7492649B2 true JP7492649B2 (ja) 2024-05-29

Family

ID=86058073

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2023507498A Active JP7492649B2 (ja) 2021-10-20 2021-10-20 Ｅｕｖ透過膜
JP2023515782A Active JP7498855B2 (ja) 2021-10-20 2022-09-15 Ｅｕｖ透過膜
JP2024064701A Active JP7598504B2 (ja) 2021-10-20 2024-04-12 Ｅｕｖ透過膜

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2023515782A Active JP7498855B2 (ja) 2021-10-20 2022-09-15 Ｅｕｖ透過膜
JP2024064701A Active JP7598504B2 (ja) 2021-10-20 2024-04-12 Ｅｕｖ透過膜

Country Status (7)

Country Link
US (2) US12591172B2 (https=)
EP (3) EP4194948A4 (https=)
JP (3) JP7492649B2 (https=)
KR (2) KR102891816B1 (https=)
CN (2) CN118076920A (https=)
TW (1) TW202328806A (https=)
WO (2) WO2023067739A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024057499A1 (ja) * 2022-09-15 2024-03-21 日本碍子株式会社 Ｅｕｖ透過膜
EP4636488A1 (en) * 2024-02-29 2025-10-22 Ngk Insulators, Ltd. Euv transmissive film, method for processing same, and light exposure method
KR20250134066A (ko) * 2024-02-29 2025-09-09 엔지케이 인슐레이터 엘티디 Euv 투과막, 펠리클 및 노광 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000338299A (ja) 1999-05-28 2000-12-08 Mitsubishi Electric Corp Ｘ線露光装置、ｘ線露光方法、ｘ線マスク、ｘ線ミラー、シンクロトロン放射装置、シンクロトロン放射方法および半導体装置
JP2017522590A (ja) 2014-07-04 2017-08-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置内で用いられる膜及びそのような膜を含むリソグラフィ装置
JP2018151622A (ja) 2017-03-10 2018-09-27 エスアンドエス テック カンパニー リミテッド 極紫外線リソグラフィ用ペリクル及びその製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62114738A (ja) 1985-11-14 1987-05-26 Toshikazu Okuno コイリングマシン
JPH01162332A (ja) * 1987-12-18 1989-06-26 Sharp Corp Ｘ線リソグラフィ用マスクメンブレン
JPH10340843A (ja) * 1997-06-06 1998-12-22 Nikon Corp 照明装置および露光装置
JP2001221689A (ja) * 2000-02-08 2001-08-17 Yokogawa Electric Corp 赤外線光源及び赤外線ガス分析計
US7456932B2 (en) * 2003-07-25 2008-11-25 Asml Netherlands B.V. Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby
JP4928494B2 (ja) 2008-05-02 2012-05-09 信越化学工業株式会社 ペリクルおよびペリクルの製造方法
JP6308592B2 (ja) * 2014-04-02 2018-04-11 信越化学工業株式会社 Ｅｕｖ用ペリクル
KR102186010B1 (ko) * 2016-01-26 2020-12-04 한양대학교 산학협력단 Euv 펠리클 구조체, 및 그 제조 방법
EP3404487B1 (en) 2017-05-15 2021-12-01 IMEC vzw Method for forming a carbon nanotube pellicle membrane
CN118707800A (zh) * 2017-11-06 2024-09-27 Asml荷兰有限公司 用于降低应力的金属硅氮化物
EP3724721A1 (en) 2017-12-12 2020-10-21 ASML Netherlands B.V. Apparatus and method for determining a condition associated with a pellicle
NL2023932B1 (en) * 2018-10-15 2020-08-19 Asml Netherlands Bv Method of manufacturing a membrane assembly
NL2027098B1 (en) 2020-01-16 2021-10-14 Asml Netherlands Bv Pellicle membrane for a lithographic apparatus
WO2024057499A1 (ja) * 2022-09-15 2024-03-21 日本碍子株式会社 Ｅｕｖ透過膜

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000338299A (ja) 1999-05-28 2000-12-08 Mitsubishi Electric Corp Ｘ線露光装置、ｘ線露光方法、ｘ線マスク、ｘ線ミラー、シンクロトロン放射装置、シンクロトロン放射方法および半導体装置
JP2017522590A (ja) 2014-07-04 2017-08-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置内で用いられる膜及びそのような膜を含むリソグラフィ装置
JP2018151622A (ja) 2017-03-10 2018-09-27 エスアンドエス テック カンパニー リミテッド 極紫外線リソグラフィ用ペリクル及びその製造方法

Also Published As

Publication number Publication date
US12591172B2 (en) 2026-03-31
KR20230058055A (ko) 2023-05-02
TW202328806A (zh) 2023-07-16
EP4227736A1 (en) 2023-08-16
KR102947881B1 (ko) 2026-04-02
WO2023067957A1 (ja) 2023-04-27
EP4194948A4 (en) 2024-05-01
EP4194948A1 (en) 2023-06-14
EP4465129A3 (en) 2025-02-12
CN118140177A (zh) 2024-06-04
EP4465129A2 (en) 2024-11-20
US20230213848A1 (en) 2023-07-06
JPWO2023067957A1 (https=) 2023-04-27
JP2024088797A (ja) 2024-07-02
KR102891816B1 (ko) 2025-11-26
JP7598504B2 (ja) 2024-12-11
CN118076920A (zh) 2024-05-24
JPWO2023067739A1 (https=) 2023-04-27
EP4227736A4 (en) 2025-06-11
KR20230058044A (ko) 2023-05-02
JP7498855B2 (ja) 2024-06-12
US20230305192A1 (en) 2023-09-28
WO2023067739A1 (ja) 2023-04-27

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