TW202328806A - Ｅｕｖ透射膜 - Google Patents

Ｅｕｖ透射膜 Download PDF

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Publication number
TW202328806A
TW202328806A TW111135499A TW111135499A TW202328806A TW 202328806 A TW202328806 A TW 202328806A TW 111135499 A TW111135499 A TW 111135499A TW 111135499 A TW111135499 A TW 111135499A TW 202328806 A TW202328806 A TW 202328806A
Authority
TW
Taiwan
Prior art keywords
euv
layer
film
main layer
transmissive film
Prior art date
Application number
TW111135499A
Other languages
English (en)
Chinese (zh)
Inventor
柏屋俊克
近藤厚男
茶園弘基
谷村昴
強力尚紀
Original Assignee
日商日本碍子股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日本碍子股份有限公司 filed Critical 日商日本碍子股份有限公司
Publication of TW202328806A publication Critical patent/TW202328806A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
  • Optical Filters (AREA)
  • Physical Vapour Deposition (AREA)
TW111135499A 2021-10-20 2022-09-20 Ｅｕｖ透射膜 TW202328806A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
WOPCT/JP2021/038811 2021-10-20
PCT/JP2021/038811 WO2023067739A1 (ja) 2021-10-20 2021-10-20 Ｅｕｖ透過膜

Publications (1)

Publication Number Publication Date
TW202328806A true TW202328806A (zh) 2023-07-16

Family

ID=86058073

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111135499A TW202328806A (zh) 2021-10-20 2022-09-20 Ｅｕｖ透射膜

Country Status (7)

Country Link
US (2) US12591172B2 (https=)
EP (3) EP4194948A4 (https=)
JP (3) JP7492649B2 (https=)
KR (2) KR102891816B1 (https=)
CN (2) CN118076920A (https=)
TW (1) TW202328806A (https=)
WO (2) WO2023067739A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024057499A1 (ja) * 2022-09-15 2024-03-21 日本碍子株式会社 Ｅｕｖ透過膜
EP4636488A1 (en) * 2024-02-29 2025-10-22 Ngk Insulators, Ltd. Euv transmissive film, method for processing same, and light exposure method
KR20250134066A (ko) * 2024-02-29 2025-09-09 엔지케이 인슐레이터 엘티디 Euv 투과막, 펠리클 및 노광 방법

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62114738A (ja) 1985-11-14 1987-05-26 Toshikazu Okuno コイリングマシン
JPH01162332A (ja) * 1987-12-18 1989-06-26 Sharp Corp Ｘ線リソグラフィ用マスクメンブレン
JPH10340843A (ja) * 1997-06-06 1998-12-22 Nikon Corp 照明装置および露光装置
JP2000338299A (ja) 1999-05-28 2000-12-08 Mitsubishi Electric Corp Ｘ線露光装置、ｘ線露光方法、ｘ線マスク、ｘ線ミラー、シンクロトロン放射装置、シンクロトロン放射方法および半導体装置
JP2001221689A (ja) * 2000-02-08 2001-08-17 Yokogawa Electric Corp 赤外線光源及び赤外線ガス分析計
US7456932B2 (en) * 2003-07-25 2008-11-25 Asml Netherlands B.V. Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby
JP4928494B2 (ja) 2008-05-02 2012-05-09 信越化学工業株式会社 ペリクルおよびペリクルの製造方法
JP6308592B2 (ja) * 2014-04-02 2018-04-11 信越化学工業株式会社 Ｅｕｖ用ペリクル
KR102604554B1 (ko) 2014-07-04 2023-11-22 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 내에서 사용하는 멤브레인 및 이러한멤브레인을 포함한 리소그래피 장치
KR102186010B1 (ko) * 2016-01-26 2020-12-04 한양대학교 산학협력단 Euv 펠리클 구조체, 및 그 제조 방법
JP6518801B2 (ja) * 2017-03-10 2019-05-22 エスアンドエス テック カンパニー リミテッド 極紫外線リソグラフィ用ペリクル及びその製造方法
EP3404487B1 (en) 2017-05-15 2021-12-01 IMEC vzw Method for forming a carbon nanotube pellicle membrane
CN118707800A (zh) * 2017-11-06 2024-09-27 Asml荷兰有限公司 用于降低应力的金属硅氮化物
EP3724721A1 (en) 2017-12-12 2020-10-21 ASML Netherlands B.V. Apparatus and method for determining a condition associated with a pellicle
NL2023932B1 (en) * 2018-10-15 2020-08-19 Asml Netherlands Bv Method of manufacturing a membrane assembly
NL2027098B1 (en) 2020-01-16 2021-10-14 Asml Netherlands Bv Pellicle membrane for a lithographic apparatus
WO2024057499A1 (ja) * 2022-09-15 2024-03-21 日本碍子株式会社 Ｅｕｖ透過膜

Also Published As

Publication number Publication date
US12591172B2 (en) 2026-03-31
KR20230058055A (ko) 2023-05-02
EP4227736A1 (en) 2023-08-16
KR102947881B1 (ko) 2026-04-02
WO2023067957A1 (ja) 2023-04-27
EP4194948A4 (en) 2024-05-01
EP4194948A1 (en) 2023-06-14
EP4465129A3 (en) 2025-02-12
JP7492649B2 (ja) 2024-05-29
CN118140177A (zh) 2024-06-04
EP4465129A2 (en) 2024-11-20
US20230213848A1 (en) 2023-07-06
JPWO2023067957A1 (https=) 2023-04-27
JP2024088797A (ja) 2024-07-02
KR102891816B1 (ko) 2025-11-26
JP7598504B2 (ja) 2024-12-11
CN118076920A (zh) 2024-05-24
JPWO2023067739A1 (https=) 2023-04-27
EP4227736A4 (en) 2025-06-11
KR20230058044A (ko) 2023-05-02
JP7498855B2 (ja) 2024-06-12
US20230305192A1 (en) 2023-09-28
WO2023067739A1 (ja) 2023-04-27

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