JPWO2020184326A5 - - Google Patents
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- Publication number
- JPWO2020184326A5 JPWO2020184326A5 JP2020513935A JP2020513935A JPWO2020184326A5 JP WO2020184326 A5 JPWO2020184326 A5 JP WO2020184326A5 JP 2020513935 A JP2020513935 A JP 2020513935A JP 2020513935 A JP2020513935 A JP 2020513935A JP WO2020184326 A5 JPWO2020184326 A5 JP WO2020184326A5
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- resin composition
- general formula
- composition according
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011347 resin Substances 0.000 claims 12
- 229920005989 resin Polymers 0.000 claims 12
- 239000011342 resin composition Substances 0.000 claims 11
- 239000010410 layer Substances 0.000 claims 9
- 239000004642 Polyimide Substances 0.000 claims 6
- 125000006575 electron-withdrawing group Chemical group 0.000 claims 6
- 150000002989 phenols Chemical class 0.000 claims 6
- 229920001721 polyimide Polymers 0.000 claims 6
- 239000002243 precursor Substances 0.000 claims 6
- 150000001875 compounds Chemical class 0.000 claims 5
- 150000004985 diamines Chemical class 0.000 claims 5
- 125000005843 halogen group Chemical group 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 239000011229 interlayer Substances 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 125000000962 organic group Chemical group 0.000 claims 2
- 239000011241 protective layer Substances 0.000 claims 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical group C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 claims 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 claims 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 claims 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 claims 1
- 206010034972 Photosensitivity reaction Diseases 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 239000003086 colorant Substances 0.000 claims 1
- 125000004427 diamine group Chemical group 0.000 claims 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 230000036211 photosensitivity Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019046742 | 2019-03-14 | ||
| JP2019046742 | 2019-03-14 | ||
| PCT/JP2020/009104 WO2020184326A1 (ja) | 2019-03-14 | 2020-03-04 | 感光性樹脂組成物、感光性樹脂シート、硬化膜、硬化膜の製造方法、有機ｅｌ表示装置、および電子部品 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020184326A1 JPWO2020184326A1 (https=) | 2020-09-17 |
| JPWO2020184326A5 true JPWO2020184326A5 (https=) | 2022-12-19 |
| JP7517149B2 JP7517149B2 (ja) | 2024-07-17 |
Family
ID=72426446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020513935A Active JP7517149B2 (ja) | 2019-03-14 | 2020-03-04 | 感光性樹脂組成物、感光性樹脂シート、硬化膜、硬化膜の製造方法、有機ｅｌ表示装置、および電子部品 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11953830B2 (https=) |
| JP (1) | JP7517149B2 (https=) |
| KR (1) | KR102813261B1 (https=) |
| CN (1) | CN113544585B (https=) |
| TW (1) | TWI832989B (https=) |
| WO (1) | WO2020184326A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20240044383A (ko) * | 2021-08-06 | 2024-04-04 | 도레이 카부시키가이샤 | 크산텐 화합물, 수지 조성물, 경화물, 경화물의 제조 방법, 유기 el 표시 장치 및 표시 장치 |
| KR20230057969A (ko) | 2021-10-22 | 2023-05-02 | 주식회사 엘지화학 | 수지 중합 반응 장치 및 수지 토출 방법 |
| CN114890873B (zh) * | 2022-03-18 | 2024-03-19 | 上海邃铸科技有限公司 | 一种组合物以及提高酰亚胺化率的方法 |
| JP2024048223A (ja) * | 2022-09-27 | 2024-04-08 | Jsr株式会社 | 感光性樹脂組成物、レジストパターン膜の製造方法、およびメッキ造形物の製造方法 |
| CN119895367A (zh) * | 2022-12-20 | 2025-04-25 | 东丽株式会社 | 布线基板、遮光层形成用正型感光性树脂组合物、遮光层转印膜及布线基板的制造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5640413B2 (ja) * | 2010-03-19 | 2014-12-17 | 東レ株式会社 | ポジ型感光性樹脂組成物 |
| JP6212979B2 (ja) * | 2013-06-21 | 2017-10-18 | 東レ株式会社 | 樹脂組成物 |
| CN113820920B (zh) | 2016-03-31 | 2023-07-04 | 旭化成株式会社 | 感光性树脂组合物、固化浮雕图案的制造方法和半导体装置 |
| WO2017217292A1 (ja) * | 2016-06-16 | 2017-12-21 | 東レ株式会社 | 感光性樹脂組成物、感光性シート、硬化膜、素子、有機ｅｌ表示装置、半導体電子部品、半導体装置および有機ｅｌ表示装置の製造方法 |
| US11163234B2 (en) | 2016-08-22 | 2021-11-02 | Asahi Kasei Kabushiki Kaisha | Photosensitive resin composition and method for producing cured relief pattern |
| KR102341494B1 (ko) | 2016-11-02 | 2021-12-23 | 도레이 카부시키가이샤 | 수지 조성물, 수지 시트, 경화막, 유기 el 표시 장치, 반도체 전자 부품, 반도체 장치 및 유기 el 표시 장치의 제조 방법 |
-
2020
- 2020-03-04 JP JP2020513935A patent/JP7517149B2/ja active Active
- 2020-03-04 KR KR1020217027813A patent/KR102813261B1/ko active Active
- 2020-03-04 US US17/436,941 patent/US11953830B2/en active Active
- 2020-03-04 WO PCT/JP2020/009104 patent/WO2020184326A1/ja not_active Ceased
- 2020-03-04 CN CN202080018551.4A patent/CN113544585B/zh active Active
- 2020-03-11 TW TW109107947A patent/TWI832989B/zh active
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