JPWO2016047438A1 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JPWO2016047438A1 JPWO2016047438A1 JP2016550093A JP2016550093A JPWO2016047438A1 JP WO2016047438 A1 JPWO2016047438 A1 JP WO2016047438A1 JP 2016550093 A JP2016550093 A JP 2016550093A JP 2016550093 A JP2016550093 A JP 2016550093A JP WO2016047438 A1 JPWO2016047438 A1 JP WO2016047438A1
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Abstract
Description
図1は、実施の形態1に係る半導体装置の一例である、縦型のトレンチゲート型炭化珪素MOSFETの構造を模式的に示す平面俯瞰図である。そして、図2は図1のA−A’断面図であり、図3は図1のB−B’断面図であり、図4は図1のC−C’断面図である。なお、図1においては、ゲート配線引き出し部14の配置をより容易に理解する観点から一部の構成が省略されている。図3では、セル領域30においてソース領域5を断面に含む位置のユニットセル31aの周期構造の断面が示されている。図4では、ゲート配線引き出し14を含む位置の断面が示されている。
以下では、実施の形態1で説明した構成と同様の構成については同じ符号を付して図示し、その詳細な説明については適宜省略する。
以下では、実施の形態1又は2で説明した構成と同様の構成については同じ符号を付して図示し、その詳細な説明については適宜省略する。
実施の形態4に係る半導体装置の構成を説明する。図16は、実施の形態4の半導体装置としてのトレンチゲート型MOSFETの構造を模式的に示す平面図である。そして、図17は図16のA−A’断面図である。図16のB−B’断面図は図3と、図16のC−C’断面図は図4と、それぞれ同様であるため、再掲しない。
Claims (10)
- n型のドリフト層と、
セル領域内の前記ドリフト層の表層に形成されるp型のウェル領域と、
前記ウェル領域の表層に部分的に形成される、n型の第1の不純物領域と、
前記第1の不純物領域の表面から前記ウェル領域を貫通し、前記ドリフト層の内部まで達するゲートトレンチと、
前記ドリフト層内の、前記セル領域の外側に形成される外部トレンチと、
前記ゲートトレンチの内部にゲート絶縁膜を介して形成されるゲート電極と、
前記外部トレンチの内部に絶縁膜を介して形成されるゲート配線と、
前記外部トレンチの前記セル領域側の開口端の角部を覆うように、前記絶縁膜を介して形成され、前記ゲート電極と前記ゲート配線とを電気的に接続するゲート配線引き出し部と、
を備え、
前記角部に接する前記ドリフト層の表層に形成される第2の不純物領域は、p型であり、
前記第2の不純物領域は前記ウェル領域の一部であること
を特徴とする半導体装置。 - 第1導電型のドリフト層と、
セル領域内の前記ドリフト層の表層に形成される第2導電型のウェル領域と、
前記ウェル領域の表層に部分的に形成される、第1導電型の第1の不純物領域と、
前記第1の不純物領域の表面から前記ウェル領域を貫通し、前記ドリフト層の内部まで達するゲートトレンチと、
前記ドリフト層内の、前記セル領域の外側に形成される外部トレンチと、
前記ゲートトレンチの内部にゲート絶縁膜を介して形成されるゲート電極と、
前記外部トレンチの内部に絶縁膜を介して形成されるゲート配線と、
前記外部トレンチの前記セル領域側の開口端の角部を覆うように、前記絶縁膜を介して形成され、前記ゲート電極と前記ゲート配線とを電気的に接続するゲート配線引き出し部と、
を備え、
前記角部に接する前記ドリフト層の表層に形成される第2の不純物領域は、前記第1の不純物領域よりも抵抗が高いこと
を特徴とする半導体装置。 - 前記ウェル領域よりも深い位置に第2導電型の第1の電界緩和領域を備えたことを特徴とする請求項2に記載の半導体装置。
- 前記外部トレンチの底面に第2導電型の第2の電界緩和領域を備えたことを特徴とする請求項2又は3に記載の半導体装置。
- 前記第2の不純物領域は、前記ドリフト層の表層のうち、前記ゲート配線引き出し部が前記角部から前記セル領域側の端部まで前記絶縁膜を介して対向している領域であり、
前記第2の不純物領域は、前記第1の不純物領域よりも抵抗が高いこと
を特徴とする請求項1から4のいずれか1項に記載の半導体装置。 - 前記セル領域において、最外周セル内の前記ゲートトレンチの側面から前記外部トレンチの前記セル領域側の側面までの距離が、前記セル領域内の前記最外周セルよりも内側に配置されたユニットセルのセルピッチよりも短いこと
を特徴とする請求項1から5のいずれか1項に記載の半導体装置。 - 前記ゲート電極の上面は、前記第1の不純物領域の表面よりも深い位置にあること
を特徴とする請求項1から6のいずれか1項に記載の半導体装置。 - 表面に前記ドリフト層が形成される基板と、
前記基板の裏面に形成されるドレイン電極と、をさらに備え、
前記第1の不純物領域はソース領域であること
を特徴とする請求項1から7のいずれか1項に記載の半導体装置。 - 表面に前記ドリフト層が形成される基板と、
前記基板の裏面に形成されるコレクタ電極と、をさらに備え、
前記第1の不純物領域はエミッタ領域であること
を特徴とする請求項1から7のいずれか1項に記載の半導体装置。 - 前記ドリフト層は炭化珪素であること
を特徴とする請求項1から9のいずれか1項に記載の半導体装置。
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