JPS6161694B2 - - Google Patents

Info

Publication number
JPS6161694B2
JPS6161694B2 JP55187238A JP18723880A JPS6161694B2 JP S6161694 B2 JPS6161694 B2 JP S6161694B2 JP 55187238 A JP55187238 A JP 55187238A JP 18723880 A JP18723880 A JP 18723880A JP S6161694 B2 JPS6161694 B2 JP S6161694B2
Authority
JP
Japan
Prior art keywords
film
light
resist film
opening
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55187238A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57112018A (en
Inventor
Akira Morishige
Takao Shida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18723880A priority Critical patent/JPS57112018A/ja
Publication of JPS57112018A publication Critical patent/JPS57112018A/ja
Publication of JPS6161694B2 publication Critical patent/JPS6161694B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP18723880A 1980-12-29 1980-12-29 Correction of pattern Granted JPS57112018A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18723880A JPS57112018A (en) 1980-12-29 1980-12-29 Correction of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18723880A JPS57112018A (en) 1980-12-29 1980-12-29 Correction of pattern

Publications (2)

Publication Number Publication Date
JPS57112018A JPS57112018A (en) 1982-07-12
JPS6161694B2 true JPS6161694B2 (enrdf_load_stackoverflow) 1986-12-26

Family

ID=16202466

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18723880A Granted JPS57112018A (en) 1980-12-29 1980-12-29 Correction of pattern

Country Status (1)

Country Link
JP (1) JPS57112018A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7489359B2 (ja) * 2021-08-04 2024-05-23 株式会社エスケーエレクトロニクス パターン修正方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5636227B2 (enrdf_load_stackoverflow) * 1973-10-17 1981-08-22
JPS5654439A (en) * 1979-10-11 1981-05-14 Fujitsu Ltd Hard mask correcting method
JPS5670554A (en) * 1979-11-15 1981-06-12 Fujitsu Ltd Mask pattern correction method

Also Published As

Publication number Publication date
JPS57112018A (en) 1982-07-12

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