JPS6159360U - - Google Patents
Info
- Publication number
- JPS6159360U JPS6159360U JP1985100415U JP10041585U JPS6159360U JP S6159360 U JPS6159360 U JP S6159360U JP 1985100415 U JP1985100415 U JP 1985100415U JP 10041585 U JP10041585 U JP 10041585U JP S6159360 U JPS6159360 U JP S6159360U
- Authority
- JP
- Japan
- Prior art keywords
- conductivity type
- power supply
- supply node
- memory cell
- integrated circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000000295 complement effect Effects 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 5
- 230000005669 field effect Effects 0.000 claims description 2
- 239000012535 impurity Substances 0.000 claims 9
- 239000000463 material Substances 0.000 claims 5
- 238000010586 diagram Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/41—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger
- G11C11/412—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger using field-effect transistors only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/535—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including internal interconnections, e.g. cross-under constructions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/07—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
- H01L27/0705—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
- H01L27/0727—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with diodes, or capacitors or resistors
- H01L27/0738—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with diodes, or capacitors or resistors in combination with resistors only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
- Static Random-Access Memory (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
Description
第1図は本考案に従つて構成されたメモリセル
を使用しているPAMの一部のブロツク回路図、
第2図は第1図のメモリセルの電気回路図、第3
図は第2図の回路の基板上の配置図、第4図は第
3図の−線における立断面図、第5図は本考
案のメモリセルに用いられる負荷インピーダンス
装置におけるゲート相互接続部の実施例の断面図
、第6図は負荷インピーダンス装置の他の実施例
によるゲート相互接続部の断面図、第7A図、第
7B図、第8A図、第8B図、第9A図、第9B
図、第10A図および第10B図は本考案に用い
られる負荷インピーダンス装置の他の実施例の断
面図である。 1,2…データノード、10…メモリセル、2
0…真性多結晶シリコン半導体層、22…第1導
電路、24…第2導電路、28…真性−外因性接
合、DD…ドレイン電源ノード、SS…ソー
ス電源ノード、R1,R2…インピーダンス装置
、Q1,Q2,Q3,Q4…絶縁ゲート電界効果
トランジスタ、D,…相補データバス、RA1
,RA2…行アドレス線。
を使用しているPAMの一部のブロツク回路図、
第2図は第1図のメモリセルの電気回路図、第3
図は第2図の回路の基板上の配置図、第4図は第
3図の−線における立断面図、第5図は本考
案のメモリセルに用いられる負荷インピーダンス
装置におけるゲート相互接続部の実施例の断面図
、第6図は負荷インピーダンス装置の他の実施例
によるゲート相互接続部の断面図、第7A図、第
7B図、第8A図、第8B図、第9A図、第9B
図、第10A図および第10B図は本考案に用い
られる負荷インピーダンス装置の他の実施例の断
面図である。 1,2…データノード、10…メモリセル、2
0…真性多結晶シリコン半導体層、22…第1導
電路、24…第2導電路、28…真性−外因性接
合、DD…ドレイン電源ノード、SS…ソー
ス電源ノード、R1,R2…インピーダンス装置
、Q1,Q2,Q3,Q4…絶縁ゲート電界効果
トランジスタ、D,…相補データバス、RA1
,RA2…行アドレス線。
Claims (1)
- 【実用新案登録請求の範囲】 (1) ドレイン電源ノードと、ソース電源ノード
と、第1と第2の相補データ入出力ノードと、第
1と第2の絶縁ゲート電界効果トランジスタを有
する集積回路2進メモリセルであつて、前記トラ
ンジスタのチヤンネルはそれぞれ前記第1と第2
の相補データ入出力ノードを前記ソース電源ノー
ドに電気的に接続し、前記第1トランジスタのゲ
ートが前記第2相補データ入出力ノードに電気的
に結合され、前記第2トランジスタのゲートが前
記第1相補データ入出力ノードに電気的に結合さ
れている前記集積回路2進メモリセルにおいて、
前記第1、第2相補データノードをそれぞれ前記
ドレイン電源ノードと電気的に接続する第1と第
2のインピーダンス装置をそなえ、各該インピー
ダンス装置は導電路を画定する実質的に真性な半
導体材料の基体と、該真性基体の少なくとも1つ
の区画領域内に配置された外因性導電形不純物の
ドープ領域を含み、前記真性基体内に少なくとも
1つの真性−外因性接合が前記外因性ドープ領域
の境界により画定され、前記各インピーダンス装
置が少なくともその一部で前記ドレイン電源ノー
ドから前記相補データ入出力ノードの1つに至る
直列の電気的通路を形成していることを特徴とす
る集積回路2進メモリセル。 (2) 実用新案登録請求の範囲第1項において、
前記ドレイン電源ノードが充電時前記ソース電源
ノードの電位に対して正の電位を有し、かつ前記
外因性不純物ドープ領域がN導電形であり、前記
真性半導体材料がP導電形であることを特徴とす
る集積回路2進メモリセル。 (3) 実用新案登録請求の範囲第2項において、
実質的に真性な半導体材料の前記基体が全体に亘
りP導電形不純物のドープ領域を含み、前記P導
電形不純物濃度の大きさがN導電形不純物濃度の
大きさにくらべて小さいことを特徴とする集積回
路2進メモリセル。 (4) 実用新案登録請求の範囲第1項において、
前記ドレイン電源ノードが充電時前記ソース電源
ノードの電位に対して負の電位を有し、前記外因
性不純物ドープ領域がP導電形であり、前記実質
的真性半導体材料がN導電形であることを特徴と
する集積回路2進メモリセル。 (5) 実用新案登録請求の範囲第4項において、
前記実質的真性半導体材料の前記基体がその全体
に亘りN導電形不純物のドープ領域を含み、前記
N導電形不純物濃度の大きさがP導電形不純物濃
度の大きさにくらべ小さいことを特徴とする集積
回路2進メモリセル。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US74381076A | 1976-11-22 | 1976-11-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6159360U true JPS6159360U (ja) | 1986-04-21 |
Family
ID=24990283
Family Applications (6)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13978177A Pending JPS5389382A (en) | 1976-11-22 | 1977-11-21 | Ic memory and method of producing same |
JP57182678A Pending JPS5886763A (ja) | 1976-11-22 | 1982-10-18 | 半導体インピ−ダンス構造とその製作方法 |
JP1985060174U Pending JPS60181055U (ja) | 1976-11-22 | 1985-04-22 | 半導体インピーダンス構造 |
JP1985100415U Pending JPS6159360U (ja) | 1976-11-22 | 1985-07-01 | |
JP3200925A Expired - Lifetime JP2692439B2 (ja) | 1976-11-22 | 1991-08-09 | 集積回路2進メモリセル |
JP3200909A Expired - Lifetime JP2696110B2 (ja) | 1976-11-22 | 1991-08-09 | 半導体インピーダンス装置 |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13978177A Pending JPS5389382A (en) | 1976-11-22 | 1977-11-21 | Ic memory and method of producing same |
JP57182678A Pending JPS5886763A (ja) | 1976-11-22 | 1982-10-18 | 半導体インピ−ダンス構造とその製作方法 |
JP1985060174U Pending JPS60181055U (ja) | 1976-11-22 | 1985-04-22 | 半導体インピーダンス構造 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3200925A Expired - Lifetime JP2692439B2 (ja) | 1976-11-22 | 1991-08-09 | 集積回路2進メモリセル |
JP3200909A Expired - Lifetime JP2696110B2 (ja) | 1976-11-22 | 1991-08-09 | 半導体インピーダンス装置 |
Country Status (5)
Country | Link |
---|---|
JP (6) | JPS5389382A (ja) |
DE (1) | DE2751481C2 (ja) |
FR (2) | FR2382744A1 (ja) |
GB (2) | GB1597726A (ja) |
IT (1) | IT1090938B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4453175A (en) * | 1979-09-19 | 1984-06-05 | Tokyo Shibaura Denki Kabushiki Kaisha | MOS Static RAM layout with polysilicon resistors over FET gates |
EP0032608A1 (en) * | 1980-01-22 | 1981-07-29 | Mostek Corporation | Column line powered static ram cell |
JPS57130461A (en) * | 1981-02-06 | 1982-08-12 | Hitachi Ltd | Semiconductor memory storage |
US4446613A (en) * | 1981-10-19 | 1984-05-08 | Intel Corporation | Integrated circuit resistor and method of fabrication |
JPS61134054A (ja) * | 1984-12-04 | 1986-06-21 | Nec Corp | 半導体装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5011644A (ja) * | 1973-06-01 | 1975-02-06 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3576478A (en) * | 1969-07-22 | 1971-04-27 | Philco Ford Corp | Igfet comprising n-type silicon substrate, silicon oxide gate insulator and p-type polycrystalline silicon gate electrode |
GB1318856A (en) * | 1971-03-18 | 1973-05-31 | Ferranti Ltd | Semiconductor devices |
JPS5710578B2 (ja) * | 1972-06-20 | 1982-02-26 | ||
GB1391959A (en) * | 1972-07-20 | 1975-04-23 | Ferranti Ltd | Semiconductor devices |
GB1501114A (en) * | 1974-04-25 | 1978-02-15 | Rca Corp | Method of making a semiconductor device |
CH581904A5 (ja) * | 1974-08-29 | 1976-11-15 | Centre Electron Horloger | |
DE2760086C2 (ja) * | 1976-07-26 | 1988-02-18 | Hitachi, Ltd., Tokio/Tokyo, Jp |
-
1977
- 1977-11-18 DE DE2751481A patent/DE2751481C2/de not_active Expired
- 1977-11-21 JP JP13978177A patent/JPS5389382A/ja active Pending
- 1977-11-21 GB GB39787/78A patent/GB1597726A/en not_active Expired
- 1977-11-21 GB GB48383/77A patent/GB1597725A/en not_active Expired
- 1977-11-21 IT IT51886/77A patent/IT1090938B/it active
- 1977-11-22 FR FR7735027A patent/FR2382744A1/fr active Granted
-
1978
- 1978-06-21 FR FR7818586A patent/FR2382771A1/fr active Granted
-
1982
- 1982-10-18 JP JP57182678A patent/JPS5886763A/ja active Pending
-
1985
- 1985-04-22 JP JP1985060174U patent/JPS60181055U/ja active Pending
- 1985-07-01 JP JP1985100415U patent/JPS6159360U/ja active Pending
-
1991
- 1991-08-09 JP JP3200925A patent/JP2692439B2/ja not_active Expired - Lifetime
- 1991-08-09 JP JP3200909A patent/JP2696110B2/ja not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5011644A (ja) * | 1973-06-01 | 1975-02-06 |
Also Published As
Publication number | Publication date |
---|---|
FR2382771B1 (ja) | 1985-04-19 |
GB1597725A (en) | 1981-09-09 |
DE2751481C2 (de) | 1986-10-23 |
GB1597726A (en) | 1981-09-09 |
FR2382744A1 (fr) | 1978-09-29 |
JPS5886763A (ja) | 1983-05-24 |
JPH06188389A (ja) | 1994-07-08 |
JP2696110B2 (ja) | 1998-01-14 |
FR2382744B1 (ja) | 1984-01-06 |
JP2692439B2 (ja) | 1997-12-17 |
FR2382771A1 (fr) | 1978-09-29 |
IT1090938B (it) | 1985-06-26 |
JPS5389382A (en) | 1978-08-05 |
JPS60181055U (ja) | 1985-12-02 |
JPH0613577A (ja) | 1994-01-21 |
DE2751481A1 (de) | 1978-06-08 |
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