JPS6144429A - 位置合わせ方法、及び位置合せ装置 - Google Patents

位置合わせ方法、及び位置合せ装置

Info

Publication number
JPS6144429A
JPS6144429A JP59167020A JP16702084A JPS6144429A JP S6144429 A JPS6144429 A JP S6144429A JP 59167020 A JP59167020 A JP 59167020A JP 16702084 A JP16702084 A JP 16702084A JP S6144429 A JPS6144429 A JP S6144429A
Authority
JP
Japan
Prior art keywords
wafer
chip
alignment
mark
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59167020A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0447968B2 (enrdf_load_stackoverflow
Inventor
Toshikazu Umadate
稔和 馬立
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP59167020A priority Critical patent/JPS6144429A/ja
Publication of JPS6144429A publication Critical patent/JPS6144429A/ja
Priority to US06/915,027 priority patent/US4780617A/en
Publication of JPH0447968B2 publication Critical patent/JPH0447968B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59167020A 1984-08-09 1984-08-09 位置合わせ方法、及び位置合せ装置 Granted JPS6144429A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59167020A JPS6144429A (ja) 1984-08-09 1984-08-09 位置合わせ方法、及び位置合せ装置
US06/915,027 US4780617A (en) 1984-08-09 1986-10-03 Method for successive alignment of chip patterns on a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59167020A JPS6144429A (ja) 1984-08-09 1984-08-09 位置合わせ方法、及び位置合せ装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP5201725A Division JPH0738376B2 (ja) 1993-08-13 1993-08-13 投影露光装置
JP6314725A Division JP2638528B2 (ja) 1994-12-19 1994-12-19 位置合わせ方法

Publications (2)

Publication Number Publication Date
JPS6144429A true JPS6144429A (ja) 1986-03-04
JPH0447968B2 JPH0447968B2 (enrdf_load_stackoverflow) 1992-08-05

Family

ID=15841900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59167020A Granted JPS6144429A (ja) 1984-08-09 1984-08-09 位置合わせ方法、及び位置合せ装置

Country Status (1)

Country Link
JP (1) JPS6144429A (enrdf_load_stackoverflow)

Cited By (100)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63232321A (ja) * 1987-03-20 1988-09-28 Canon Inc 位置合せ方法
JPS63232322A (ja) * 1987-03-20 1988-09-28 Canon Inc 位置合せ方法
JPS63232326A (ja) * 1987-03-20 1988-09-28 Canon Inc 位置合せ方法
JPS63299122A (ja) * 1987-05-29 1988-12-06 Canon Inc 露光装置の位置合せ方法
JPH01207604A (ja) * 1988-02-15 1989-08-21 Canon Inc マーク位置検出方法及びそれが適用される装置
JPH01243419A (ja) * 1988-03-25 1989-09-28 Hitachi Ltd 位置合わせ方法
JPH0432219A (ja) * 1990-05-29 1992-02-04 Canon Inc 位置合わせ方法
JPH04271109A (ja) * 1991-01-09 1992-09-28 Hitachi Ltd 半導体ウエハの位置合わせ方法
JPH08330394A (ja) * 1996-06-13 1996-12-13 Nikon Corp 位置合わせ方法
US5792580A (en) * 1995-11-17 1998-08-11 Mitsubishi Denki Kabushiki Kaisha Method of aligning reticle pattern
US5856054A (en) * 1996-09-03 1999-01-05 Mitsubishi Denki Kabushiki Kaisha Method of alignment in exposure step through array error and shot error determinations
WO1999028220A1 (fr) 1997-12-03 1999-06-10 Nikon Corporation Dispositif et procede de transfert de substrats
US6002487A (en) * 1995-06-20 1999-12-14 Nikon Corporation Alignment method for performing alignment between shot areas on a wafer
US6087053A (en) * 1997-05-09 2000-07-11 Canon Kabushiki Kaisha Device manufacturing method with transfer magnification adjustment to correct thermal distortion of substrate
US6171736B1 (en) 1997-07-23 2001-01-09 Nikon Corporation Projection-microlithography alignment method utilizing mask with separate mask substrates
US6204509B1 (en) 1997-11-11 2001-03-20 Nikon Corporation Projection-microlithography apparatus, masks, and related methods incorporating reticle-distortion measurement and correction
US6239858B1 (en) 1999-06-14 2001-05-29 Mitsubishi Denki Kabushiki Kaisha Exposure method, exposure apparatus and semiconductor device manufactured by using the exposure apparatus
US6304320B1 (en) 1999-02-26 2001-10-16 Nikon Corporation Stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same
US6359678B1 (en) 1997-11-14 2002-03-19 Nikon Corporation Exposure apparatus, method for producing the same, and exposure method
US6576919B1 (en) 1997-02-28 2003-06-10 Nikon Corporation Method of determining movement sequence and apparatus for realizing it
US6662145B1 (en) 1998-12-08 2003-12-09 Mitsubishi Denki Kabushiki Kaisha Method, equipment, and recording medium for controlling exposure accuracy
US6788385B2 (en) 2001-06-21 2004-09-07 Nikon Corporation Stage device, exposure apparatus and method
US6885908B2 (en) 1997-02-14 2005-04-26 Nikon Corporation Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method
US6885430B2 (en) 2000-11-16 2005-04-26 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
US6958808B2 (en) 2000-11-16 2005-10-25 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
JP2005328061A (ja) * 2004-05-14 2005-11-24 Asml Netherlands Bv アラインメントシステムおよび方法およびそれにより製造したデバイス
JP2006140204A (ja) * 2004-11-10 2006-06-01 Nikon Corp 計測条件の最適化方法、該最適化方法を使用した位置計測方法、該位置計測方法を使用した位置合わせ方法、該位置合わせ方法を使用したデバイス製造方法、計測条件の最適化システム、該最適化システムを使用した位置計測装置及び該位置計測装置を使用した露光装置
JP2006339303A (ja) * 2005-05-31 2006-12-14 Nikon Corp 露光装置、露光方法及びデバイスの製造方法
US7154583B2 (en) 2003-02-19 2006-12-26 Nikon Corporation Movement method, exposure method and exposure apparatus, and device manufacturing method
WO2007055237A1 (ja) 2005-11-09 2007-05-18 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
WO2007077925A1 (ja) 2005-12-28 2007-07-12 Nikon Corporation パターン形成方法及びパターン形成装置、並びにデバイス製造方法
WO2007083758A1 (ja) 2006-01-19 2007-07-26 Nikon Corporation 移動体駆動方法及び移動体駆動システム、パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法
WO2007094470A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
WO2007094431A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
WO2007094414A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
WO2007097466A1 (ja) 2006-02-21 2007-08-30 Nikon Corporation 測定装置及び方法、処理装置及び方法、パターン形成装置及び方法、露光装置及び方法、並びにデバイス製造方法
WO2007097380A1 (ja) 2006-02-21 2007-08-30 Nikon Corporation パターン形成装置及びパターン形成方法、移動体駆動システム及び移動体駆動方法、露光装置及び露光方法、並びにデバイス製造方法
WO2007097379A1 (ja) 2006-02-21 2007-08-30 Nikon Corporation パターン形成装置、マーク検出装置、露光装置、パターン形成方法、露光方法及びデバイス製造方法
WO2007113955A1 (ja) 2006-03-30 2007-10-11 Nikon Corporation 移動体装置、露光装置及び露光方法、微動体、並びにデバイス製造方法
WO2007135990A1 (ja) 2006-05-18 2007-11-29 Nikon Corporation 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法
WO2007136052A1 (ja) 2006-05-22 2007-11-29 Nikon Corporation 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法
WO2007142351A1 (ja) 2006-06-09 2007-12-13 Nikon Corporation 移動体装置、露光装置及び露光方法、並びにデバイス製造方法
JP2008004358A (ja) * 2006-06-22 2008-01-10 Tokki Corp アライメント方法及びアライメント装置並びに有機ｅｌ素子形成装置
WO2008026739A1 (fr) 2006-08-31 2008-03-06 Nikon Corporation Procédé d'entraînement de corps mobile et système d'entraînement de corps mobile, procédé et appareil de mise en forme de motif, procédé et appareil d'exposition et procédé de fabrication de dispositif
WO2008026742A1 (fr) 2006-08-31 2008-03-06 Nikon Corporation Procédé d'entraînement de corps mobile et système d'entraînement de corps mobile, procédé et appareil de mise en forme de motif, procédé et appareil d'exposition et procédé de fabrication de dispositif
WO2008026732A1 (fr) 2006-08-31 2008-03-06 Nikon Corporation Système d'entraînement de corps mobile et procédé d'entraînement de corps mobile, appareil et procédé de mise en forme de motif, appareil et procédé d'exposition, procédé de fabrication de dispositif et procédé de décision
WO2008029757A1 (en) 2006-09-01 2008-03-13 Nikon Corporation Mobile object driving method, mobile object driving system, pattern forming method and apparatus, exposure method and apparatus, device manufacturing method and calibration method
WO2008029758A1 (en) 2006-09-01 2008-03-13 Nikon Corporation Mobile body driving method, mobile body driving system, pattern forming method and apparatus, exposure method and apparatus and device manufacturing method
US7375796B2 (en) 2004-04-01 2008-05-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1944654A2 (en) 1996-11-28 2008-07-16 Nikon Corporation An exposure apparatus and an exposure method
EP1995769A1 (en) 2003-08-07 2008-11-26 Nikon Corporation Exposure method and exposure apparatus, stage unit, and device manufacturing method
WO2009011356A1 (ja) 2007-07-18 2009-01-22 Nikon Corporation 計測方法、ステージ装置、及び露光装置
WO2009013905A1 (ja) 2007-07-24 2009-01-29 Nikon Corporation 位置計測システム、露光装置、位置計測方法、露光方法及びデバイス製造方法、並びに工具及び計測方法
US7557529B2 (en) 2005-01-11 2009-07-07 Nikon Corporation Stage unit and exposure apparatus
JP2009206143A (ja) * 2008-02-26 2009-09-10 Seiko Instruments Inc アライメント方法
US7728953B2 (en) 2004-03-01 2010-06-01 Nikon Corporation Exposure method, exposure system, and substrate processing apparatus
EP2221866A2 (en) 2004-01-07 2010-08-25 Nikon Corporation Stacking apparatus and method for stacking integrated circuit elements
US7852034B2 (en) 2004-04-09 2010-12-14 Nikon Corporation Drive method of moving body, stage unit, and exposure apparatus
EP2275869A2 (en) 2003-06-19 2011-01-19 Nikon Corporation Exposure apparatus and device manufacturing method
JP2011029458A (ja) * 2009-07-27 2011-02-10 Nikon Corp 積層型半導体素子の製造方法、及び積層型半導体素子の製造装置
EP2284614A2 (en) 2003-10-09 2011-02-16 Nikon Corporation Exposure apparatus, exposure method and device producing method
US8023106B2 (en) 2007-08-24 2011-09-20 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US8089608B2 (en) 2005-04-18 2012-01-03 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8089616B2 (en) 2007-07-13 2012-01-03 Nikon Corporation Pattern forming method and apparatus, exposure method and apparatus, and device manufacturing method and device
US8098362B2 (en) 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
US8125613B2 (en) 2006-04-21 2012-02-28 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8134681B2 (en) 2006-02-17 2012-03-13 Nikon Corporation Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
US8159650B2 (en) 2006-03-07 2012-04-17 Nikon Corporation Device manufacturing method, device manufacturing system, and measurement/inspection apparatus
US8164736B2 (en) 2007-05-29 2012-04-24 Nikon Corporation Exposure method, exposure apparatus, and method for producing device
US8208119B2 (en) 2004-02-04 2012-06-26 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8218129B2 (en) 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
US8237919B2 (en) 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
US8325326B2 (en) 2004-06-07 2012-12-04 Nikon Corporation Stage unit, exposure apparatus, and exposure method
EP2560192A2 (en) 2003-02-17 2013-02-20 Nikon Corporation Stage device, exposure apparatus, and method of manufacturing devices
US8400614B2 (en) 2005-12-28 2013-03-19 Nikon Corporation Pattern formation method and pattern formation apparatus, exposure method and exposure apparatus, and device manufacturing method
US8411271B2 (en) 2005-12-28 2013-04-02 Nikon Corporation Pattern forming method, pattern forming apparatus, and device manufacturing method
US8432534B2 (en) 2006-11-09 2013-04-30 Nikon Corporation Holding apparatus, position detection apparatus and exposure apparatus, moving method, position detection method, exposure method, adjustment method of detection system and device manufacturing method
EP2637061A1 (en) 2004-06-09 2013-09-11 Nikon Corporation Exposure apparatus, exposure method and method for producing a device
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8609301B2 (en) 2006-09-08 2013-12-17 Nikon Corporation Mask, exposure apparatus and device manufacturing method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8867022B2 (en) 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US8982320B2 (en) 2004-08-19 2015-03-17 Nikon Corporation Alignment information display method and its program, alignment method, exposure method, device production process, display system, display device, and program and measurement/inspection system
JP2015525477A (ja) * 2012-06-06 2015-09-03 エーファウ・グループ・エー・タルナー・ゲーエムベーハー 位置合わせ誤差を求めるための装置と方法
US9229333B2 (en) 2007-12-28 2016-01-05 Nikon Corporation Exposure apparatus, movable body drive system, pattern formation apparatus, exposure method, and device manufacturing method
US9304412B2 (en) 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9500960B2 (en) 2003-04-11 2016-11-22 Nikon Corporation Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
JP2017049456A (ja) * 2015-09-02 2017-03-09 キヤノン株式会社 ディストーション検出方法、露光装置、露光方法、およびデバイス製造方法
US9632431B2 (en) 2004-02-02 2017-04-25 Nikon Corporation Lithographic apparatus and method having substrate and sensor tables
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9746787B2 (en) 2011-02-22 2017-08-29 Nikon Corporation Holding apparatus, exposure apparatus and manufacturing method of device
JP2017183735A (ja) * 2017-05-10 2017-10-05 エーファウ・グループ・エー・タルナー・ゲーエムベーハー 位置合わせ誤差を求めるための装置と方法
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9915868B2 (en) 2011-11-30 2018-03-13 Canon Kabushiki Kaisha Imprint apparatus, imprint method, and article manufacturing method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US11947267B2 (en) 2021-10-01 2024-04-02 Canon Kabushiki Kaisha Method of obtaining array of plurality of shot regions on substrate, exposure method, exposure apparatus, method of manufacturing article, non-transitory computer-readable storage medium, and information processing apparatus
US12130562B2 (en) 2021-02-22 2024-10-29 Canon Kabushiki Kaisha Method of obtaining array of plurality of regions on substrate, exposure apparatus, method of manufacturing article, non-transitory storage medium, and information processing apparatus

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS531552A (en) * 1976-06-25 1978-01-09 Honda Motor Co Ltd Coordinate selffestimating calculation system with multiipoint measurement
JPS58103136A (ja) * 1981-12-16 1983-06-20 Nippon Kogaku Kk <Nikon> 基板の傾き設定装置
JPS5954225A (ja) * 1982-09-21 1984-03-29 Hitachi Ltd 投影露光方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS531552A (en) * 1976-06-25 1978-01-09 Honda Motor Co Ltd Coordinate selffestimating calculation system with multiipoint measurement
JPS58103136A (ja) * 1981-12-16 1983-06-20 Nippon Kogaku Kk <Nikon> 基板の傾き設定装置
JPS5954225A (ja) * 1982-09-21 1984-03-29 Hitachi Ltd 投影露光方法

Cited By (248)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63232321A (ja) * 1987-03-20 1988-09-28 Canon Inc 位置合せ方法
JPS63232322A (ja) * 1987-03-20 1988-09-28 Canon Inc 位置合せ方法
JPS63232326A (ja) * 1987-03-20 1988-09-28 Canon Inc 位置合せ方法
JPS63299122A (ja) * 1987-05-29 1988-12-06 Canon Inc 露光装置の位置合せ方法
JPH01207604A (ja) * 1988-02-15 1989-08-21 Canon Inc マーク位置検出方法及びそれが適用される装置
JPH01243419A (ja) * 1988-03-25 1989-09-28 Hitachi Ltd 位置合わせ方法
JPH0432219A (ja) * 1990-05-29 1992-02-04 Canon Inc 位置合わせ方法
JPH04271109A (ja) * 1991-01-09 1992-09-28 Hitachi Ltd 半導体ウエハの位置合わせ方法
US6002487A (en) * 1995-06-20 1999-12-14 Nikon Corporation Alignment method for performing alignment between shot areas on a wafer
US5792580A (en) * 1995-11-17 1998-08-11 Mitsubishi Denki Kabushiki Kaisha Method of aligning reticle pattern
JPH08330394A (ja) * 1996-06-13 1996-12-13 Nikon Corp 位置合わせ方法
US5856054A (en) * 1996-09-03 1999-01-05 Mitsubishi Denki Kabushiki Kaisha Method of alignment in exposure step through array error and shot error determinations
EP1944654A2 (en) 1996-11-28 2008-07-16 Nikon Corporation An exposure apparatus and an exposure method
US6885908B2 (en) 1997-02-14 2005-04-26 Nikon Corporation Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method
US6844917B2 (en) 1997-02-28 2005-01-18 Nikon Corporation Method of determining movement sequence and apparatus for realizing it
US6576919B1 (en) 1997-02-28 2003-06-10 Nikon Corporation Method of determining movement sequence and apparatus for realizing it
US6087053A (en) * 1997-05-09 2000-07-11 Canon Kabushiki Kaisha Device manufacturing method with transfer magnification adjustment to correct thermal distortion of substrate
US6180289B1 (en) 1997-07-23 2001-01-30 Nikon Corporation Projection-microlithography mask with separate mask substrates
US6171736B1 (en) 1997-07-23 2001-01-09 Nikon Corporation Projection-microlithography alignment method utilizing mask with separate mask substrates
US6204509B1 (en) 1997-11-11 2001-03-20 Nikon Corporation Projection-microlithography apparatus, masks, and related methods incorporating reticle-distortion measurement and correction
US6359678B1 (en) 1997-11-14 2002-03-19 Nikon Corporation Exposure apparatus, method for producing the same, and exposure method
WO1999028220A1 (fr) 1997-12-03 1999-06-10 Nikon Corporation Dispositif et procede de transfert de substrats
US6662145B1 (en) 1998-12-08 2003-12-09 Mitsubishi Denki Kabushiki Kaisha Method, equipment, and recording medium for controlling exposure accuracy
US6304320B1 (en) 1999-02-26 2001-10-16 Nikon Corporation Stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same
US6239858B1 (en) 1999-06-14 2001-05-29 Mitsubishi Denki Kabushiki Kaisha Exposure method, exposure apparatus and semiconductor device manufactured by using the exposure apparatus
US6958808B2 (en) 2000-11-16 2005-10-25 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
US6885430B2 (en) 2000-11-16 2005-04-26 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
US6788385B2 (en) 2001-06-21 2004-09-07 Nikon Corporation Stage device, exposure apparatus and method
EP3038138A1 (en) 2003-02-17 2016-06-29 Nikon Corporation Exposure apparatus, and method of manufacturing devices
EP2560192A2 (en) 2003-02-17 2013-02-20 Nikon Corporation Stage device, exposure apparatus, and method of manufacturing devices
EP3401947A1 (en) 2003-02-17 2018-11-14 Nikon Corporation Exposure apparatus, and method of manufacturing devices
US7154583B2 (en) 2003-02-19 2006-12-26 Nikon Corporation Movement method, exposure method and exposure apparatus, and device manufacturing method
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9500960B2 (en) 2003-04-11 2016-11-22 Nikon Corporation Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US9946163B2 (en) 2003-04-11 2018-04-17 Nikon Corporation Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US10007188B2 (en) 2003-06-19 2018-06-26 Nikon Corporation Exposure apparatus and device manufacturing method
EP2278401A2 (en) 2003-06-19 2011-01-26 Nikon Corporation Exposure apparatus and device manufacturing method
US9810995B2 (en) 2003-06-19 2017-11-07 Nikon Corporation Exposure apparatus and device manufacturing method
EP2275869A2 (en) 2003-06-19 2011-01-19 Nikon Corporation Exposure apparatus and device manufacturing method
US10191388B2 (en) 2003-06-19 2019-01-29 Nikon Corporation Exposure apparatus, and device manufacturing method
US9551943B2 (en) 2003-06-19 2017-01-24 Nikon Corporation Exposure apparatus and device manufacturing method
EP1995769A1 (en) 2003-08-07 2008-11-26 Nikon Corporation Exposure method and exposure apparatus, stage unit, and device manufacturing method
EP3410216A1 (en) 2003-10-09 2018-12-05 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP3206083A1 (en) 2003-10-09 2017-08-16 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP2937734A1 (en) 2003-10-09 2015-10-28 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP2284614A2 (en) 2003-10-09 2011-02-16 Nikon Corporation Exposure apparatus, exposure method and device producing method
EP3432073A1 (en) 2003-10-09 2019-01-23 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US10209623B2 (en) 2003-10-09 2019-02-19 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
EP2221865A2 (en) 2004-01-07 2010-08-25 Nikon Corporation Stacking apparatus and method for stacking integrated circuit elements
JP2014003342A (ja) * 2004-01-07 2014-01-09 Nikon Corp 積層装置
US8129201B2 (en) 2004-01-07 2012-03-06 Nikon Corporation Stacking apparatus and method for stacking integrated circuit elements
JP4935074B2 (ja) * 2004-01-07 2012-05-23 株式会社ニコン 積層装置及び集積回路素子の積層方法
EP2221866A2 (en) 2004-01-07 2010-08-25 Nikon Corporation Stacking apparatus and method for stacking integrated circuit elements
US8440472B2 (en) 2004-01-07 2013-05-14 Nikon Corporation Stacking apparatus and method for stacking integrated circuit elements
US9684248B2 (en) 2004-02-02 2017-06-20 Nikon Corporation Lithographic apparatus having substrate table and sensor table to measure a patterned beam
US10007196B2 (en) 2004-02-02 2018-06-26 Nikon Corporation Lithographic apparatus and method having substrate and sensor tables
US9665016B2 (en) 2004-02-02 2017-05-30 Nikon Corporation Lithographic apparatus and method having substrate table and sensor table to hold immersion liquid
US9632431B2 (en) 2004-02-02 2017-04-25 Nikon Corporation Lithographic apparatus and method having substrate and sensor tables
US10139737B2 (en) 2004-02-02 2018-11-27 Nikon Corporation Lithographic apparatus and method having substrate and sensor tables
EP3208658A1 (en) 2004-02-04 2017-08-23 Nikon Corporation Exposure apparatus, exposure method, and method for producing a device
US10048602B2 (en) 2004-02-04 2018-08-14 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP3093873A2 (en) 2004-02-04 2016-11-16 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8605252B2 (en) 2004-02-04 2013-12-10 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8208119B2 (en) 2004-02-04 2012-06-26 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP3267469A1 (en) 2004-02-04 2018-01-10 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP3252533A1 (en) 2004-02-04 2017-12-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing a device
US9316921B2 (en) 2004-02-04 2016-04-19 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP2765595A1 (en) 2004-02-04 2014-08-13 Nikon Corporation Exposure apparatus, exposure method, and method for producing a device
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US7728953B2 (en) 2004-03-01 2010-06-01 Nikon Corporation Exposure method, exposure system, and substrate processing apparatus
US7834977B2 (en) 2004-04-01 2010-11-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7375796B2 (en) 2004-04-01 2008-05-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7852034B2 (en) 2004-04-09 2010-12-14 Nikon Corporation Drive method of moving body, stage unit, and exposure apparatus
JP2009117872A (ja) * 2004-05-14 2009-05-28 Asml Netherlands Bv アラインメントシステム及び方法及びそれにより製造したデバイス
JP2009117870A (ja) * 2004-05-14 2009-05-28 Asml Netherlands Bv アラインメントシステム及び方法及びそれにより製造したデバイス
JP2005328061A (ja) * 2004-05-14 2005-11-24 Asml Netherlands Bv アラインメントシステムおよび方法およびそれにより製造したデバイス
US8325326B2 (en) 2004-06-07 2012-12-04 Nikon Corporation Stage unit, exposure apparatus, and exposure method
EP2637061A1 (en) 2004-06-09 2013-09-11 Nikon Corporation Exposure apparatus, exposure method and method for producing a device
EP3318928A1 (en) 2004-06-09 2018-05-09 Nikon Corporation Exposure apparatus and method for producing a device
US8705008B2 (en) 2004-06-09 2014-04-22 Nikon Corporation Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellant plate
US8982320B2 (en) 2004-08-19 2015-03-17 Nikon Corporation Alignment information display method and its program, alignment method, exposure method, device production process, display system, display device, and program and measurement/inspection system
JP2006140204A (ja) * 2004-11-10 2006-06-01 Nikon Corp 計測条件の最適化方法、該最適化方法を使用した位置計測方法、該位置計測方法を使用した位置合わせ方法、該位置合わせ方法を使用したデバイス製造方法、計測条件の最適化システム、該最適化システムを使用した位置計測装置及び該位置計測装置を使用した露光装置
US7557529B2 (en) 2005-01-11 2009-07-07 Nikon Corporation Stage unit and exposure apparatus
US8089608B2 (en) 2005-04-18 2012-01-03 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8724077B2 (en) 2005-04-18 2014-05-13 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2006339303A (ja) * 2005-05-31 2006-12-14 Nikon Corp 露光装置、露光方法及びデバイスの製造方法
WO2007055237A1 (ja) 2005-11-09 2007-05-18 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
CN102681368A (zh) * 2005-12-28 2012-09-19 株式会社尼康 图案形成方法及图案形成装置、以及元件制造方法
WO2007077925A1 (ja) 2005-12-28 2007-07-12 Nikon Corporation パターン形成方法及びパターン形成装置、並びにデバイス製造方法
US8411271B2 (en) 2005-12-28 2013-04-02 Nikon Corporation Pattern forming method, pattern forming apparatus, and device manufacturing method
US8400614B2 (en) 2005-12-28 2013-03-19 Nikon Corporation Pattern formation method and pattern formation apparatus, exposure method and exposure apparatus, and device manufacturing method
WO2007083758A1 (ja) 2006-01-19 2007-07-26 Nikon Corporation 移動体駆動方法及び移動体駆動システム、パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法
US7839485B2 (en) 2006-01-19 2010-11-23 Nikon Corporation Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method
EP3171220A1 (en) 2006-01-19 2017-05-24 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP3147710A1 (en) 2006-01-19 2017-03-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP2752714A1 (en) 2006-01-19 2014-07-09 Nikon Corporation Exposure apparatus and exposure method
US10133195B2 (en) 2006-01-19 2018-11-20 Nikon Corporation Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method
EP2765458A2 (en) 2006-01-19 2014-08-13 Nikon Corporation Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method
US9423703B2 (en) 2006-01-19 2016-08-23 Nikon Corporation Exposure apparatus and device manufacturing method measuring position of substrate stage using at least three of four encoder heads
US9423702B2 (en) 2006-01-19 2016-08-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method measuring position of substrate stage by switching between encoder and interferometer
EP2801864A2 (en) 2006-01-19 2014-11-12 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
EP3043208A1 (en) 2006-01-19 2016-07-13 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US9372414B2 (en) 2006-01-19 2016-06-21 Nikon Corporation Exposure method and device manufacturing method measuring position of substrate stage using at least three of four encoder heads
US10203613B2 (en) 2006-01-19 2019-02-12 Nikon Corporation Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method
EP2963498A1 (en) 2006-01-19 2016-01-06 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US10185228B2 (en) 2006-01-19 2019-01-22 Nikon Corporation Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method
US10185227B2 (en) 2006-01-19 2019-01-22 Nikon Corporation Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method
EP2857902A1 (en) 2006-01-19 2015-04-08 Nikon Corporation Immersion exposure apparatus, immersion exposure method, and device fabricating method
WO2007094431A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
US7714982B2 (en) 2006-02-16 2010-05-11 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8390779B2 (en) 2006-02-16 2013-03-05 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
WO2007094470A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
WO2007094414A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
US8134681B2 (en) 2006-02-17 2012-03-13 Nikon Corporation Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
US10088343B2 (en) 2006-02-21 2018-10-02 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
EP2813893A1 (en) 2006-02-21 2014-12-17 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US10409173B2 (en) 2006-02-21 2019-09-10 Nikon Corporation Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method
EP3279739A1 (en) 2006-02-21 2018-02-07 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US10012913B2 (en) 2006-02-21 2018-07-03 Nikon Corporation Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
WO2007097466A1 (ja) 2006-02-21 2007-08-30 Nikon Corporation 測定装置及び方法、処理装置及び方法、パターン形成装置及び方法、露光装置及び方法、並びにデバイス製造方法
EP3270226A1 (en) 2006-02-21 2018-01-17 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US10132658B2 (en) 2006-02-21 2018-11-20 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
US10139738B2 (en) 2006-02-21 2018-11-27 Nikon Corporation Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
US8054472B2 (en) 2006-02-21 2011-11-08 Nikon Corporation Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method
US9329060B2 (en) 2006-02-21 2016-05-03 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
EP3267259A1 (en) 2006-02-21 2018-01-10 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8027021B2 (en) 2006-02-21 2011-09-27 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
EP3267258A1 (en) 2006-02-21 2018-01-10 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
EP3327507A1 (en) 2006-02-21 2018-05-30 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US9857697B2 (en) 2006-02-21 2018-01-02 Nikon Corporation Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method
US10234773B2 (en) 2006-02-21 2019-03-19 Nikon Corporation Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method
EP3293577A1 (en) 2006-02-21 2018-03-14 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US10088759B2 (en) 2006-02-21 2018-10-02 Nikon Corporation Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
US9690214B2 (en) 2006-02-21 2017-06-27 Nikon Corporation Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
US9989859B2 (en) 2006-02-21 2018-06-05 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
EP2541325A1 (en) 2006-02-21 2013-01-02 Nikon Corporation Exposure apparatus and exposure method
WO2007097380A1 (ja) 2006-02-21 2007-08-30 Nikon Corporation パターン形成装置及びパターン形成方法、移動体駆動システム及び移動体駆動方法、露光装置及び露光方法、並びにデバイス製造方法
WO2007097379A1 (ja) 2006-02-21 2007-08-30 Nikon Corporation パターン形成装置、マーク検出装置、露光装置、パターン形成方法、露光方法及びデバイス製造方法
US10345121B2 (en) 2006-02-21 2019-07-09 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
EP3115844A1 (en) 2006-02-21 2017-01-11 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US8159650B2 (en) 2006-03-07 2012-04-17 Nikon Corporation Device manufacturing method, device manufacturing system, and measurement/inspection apparatus
WO2007113955A1 (ja) 2006-03-30 2007-10-11 Nikon Corporation 移動体装置、露光装置及び露光方法、微動体、並びにデバイス製造方法
US7696653B2 (en) 2006-03-30 2010-04-13 Nikon Corporation Movable-body apparatus, exposure apparatus and methods comprising same, and device-manufacturing methods
US8125613B2 (en) 2006-04-21 2012-02-28 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8514366B2 (en) 2006-05-18 2013-08-20 Nikon Corporation Exposure method and apparatus, maintenance method and device manufacturing method
WO2007135990A1 (ja) 2006-05-18 2007-11-29 Nikon Corporation 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法
WO2007136052A1 (ja) 2006-05-22 2007-11-29 Nikon Corporation 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法
WO2007142351A1 (ja) 2006-06-09 2007-12-13 Nikon Corporation 移動体装置、露光装置及び露光方法、並びにデバイス製造方法
US8390780B2 (en) 2006-06-09 2013-03-05 Nikon Corporation Movable-body apparatus, exposure apparatus, exposure method, and device manufacturing method
JP2008004358A (ja) * 2006-06-22 2008-01-10 Tokki Corp アライメント方法及びアライメント装置並びに有機ｅｌ素子形成装置
EP3064999A1 (en) 2006-08-31 2016-09-07 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP3279738A1 (en) 2006-08-31 2018-02-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US10353302B2 (en) 2006-08-31 2019-07-16 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US10353301B2 (en) 2006-08-31 2019-07-16 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US10338482B2 (en) 2006-08-31 2019-07-02 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
EP3418807A1 (en) 2006-08-31 2018-12-26 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US10162274B2 (en) 2006-08-31 2018-12-25 Nikon Corporation Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method
WO2008026732A1 (fr) 2006-08-31 2008-03-06 Nikon Corporation Système d'entraînement de corps mobile et procédé d'entraînement de corps mobile, appareil et procédé de mise en forme de motif, appareil et procédé d'exposition, procédé de fabrication de dispositif et procédé de décision
EP2738608A1 (en) 2006-08-31 2014-06-04 Nikon Corporation Method and system for driving a movable body in an exposure apparatus
EP3067748A1 (en) 2006-08-31 2016-09-14 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US10101673B2 (en) 2006-08-31 2018-10-16 Nikon Corporation Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method
US10073359B2 (en) 2006-08-31 2018-09-11 Nikon Corporation Movable body drive system and movable body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision-making method
US10067428B2 (en) 2006-08-31 2018-09-04 Nikon Corporation Movable body drive system and movable body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision-making method
US8937710B2 (en) 2006-08-31 2015-01-20 Nikon Corporation Exposure method and apparatus compensating measuring error of encoder due to grating section and displacement of movable body in Z direction
WO2008026739A1 (fr) 2006-08-31 2008-03-06 Nikon Corporation Procédé d'entraînement de corps mobile et système d'entraînement de corps mobile, procédé et appareil de mise en forme de motif, procédé et appareil d'exposition et procédé de fabrication de dispositif
US8947639B2 (en) 2006-08-31 2015-02-03 Nikon Corporation Exposure method and apparatus measuring position of movable body based on information on flatness of encoder grating section
WO2008026742A1 (fr) 2006-08-31 2008-03-06 Nikon Corporation Procédé d'entraînement de corps mobile et système d'entraînement de corps mobile, procédé et appareil de mise en forme de motif, procédé et appareil d'exposition et procédé de fabrication de dispositif
US9983486B2 (en) 2006-08-31 2018-05-29 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US9958792B2 (en) 2006-08-31 2018-05-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
EP3312676A1 (en) 2006-08-31 2018-04-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP2988320A1 (en) 2006-08-31 2016-02-24 Nikon Corporation Exposure apparatus, exposure method, and device manufactuing method
EP2990872A2 (en) 2006-08-31 2016-03-02 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
EP3291010A1 (en) 2006-08-31 2018-03-07 Nikon Corporation Exposure apparatus and method, and device manufacturing method
EP2993688A2 (en) 2006-08-31 2016-03-09 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
EP2991101A2 (en) 2006-08-31 2016-03-02 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
EP3361317A1 (en) 2006-09-01 2018-08-15 Nikon Corporation Exposure apparatus and exposure method
US9846374B2 (en) 2006-09-01 2017-12-19 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
EP2993523A2 (en) 2006-09-01 2016-03-09 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US9874822B2 (en) 2006-09-01 2018-01-23 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US9625834B2 (en) 2006-09-01 2017-04-18 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US10289010B2 (en) 2006-09-01 2019-05-14 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US10289012B2 (en) 2006-09-01 2019-05-14 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
WO2008029758A1 (en) 2006-09-01 2008-03-13 Nikon Corporation Mobile body driving method, mobile body driving system, pattern forming method and apparatus, exposure method and apparatus and device manufacturing method
WO2008029757A1 (en) 2006-09-01 2008-03-13 Nikon Corporation Mobile object driving method, mobile object driving system, pattern forming method and apparatus, exposure method and apparatus, device manufacturing method and calibration method
US9740114B2 (en) 2006-09-01 2017-08-22 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US9971253B2 (en) 2006-09-01 2018-05-15 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US9760021B2 (en) 2006-09-01 2017-09-12 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US10197924B2 (en) 2006-09-01 2019-02-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US9377698B2 (en) 2006-09-01 2016-06-28 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
EP2993524A2 (en) 2006-09-01 2016-03-09 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US9563116B2 (en) 2006-09-08 2017-02-07 Nikon Corporation Mask, exposure apparatus and device manufacturing method
US8609301B2 (en) 2006-09-08 2013-12-17 Nikon Corporation Mask, exposure apparatus and device manufacturing method
US8432534B2 (en) 2006-11-09 2013-04-30 Nikon Corporation Holding apparatus, position detection apparatus and exposure apparatus, moving method, position detection method, exposure method, adjustment method of detection system and device manufacturing method
US8164736B2 (en) 2007-05-29 2012-04-24 Nikon Corporation Exposure method, exposure apparatus, and method for producing device
US8098362B2 (en) 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
US8089616B2 (en) 2007-07-13 2012-01-03 Nikon Corporation Pattern forming method and apparatus, exposure method and apparatus, and device manufacturing method and device
US9239525B2 (en) 2007-07-13 2016-01-19 Nikon Corporation Pattern forming method and apparatus, exposure method and apparatus, and device manufacturing method and device
EP2933683A1 (en) 2007-07-18 2015-10-21 Nikon Corporation Measuring method, stage apparatus, and exposure apparatus
EP2818927A2 (en) 2007-07-18 2014-12-31 Nikon Corporation Measurement method, stage apparatus, and exposure apparatus
WO2009011356A1 (ja) 2007-07-18 2009-01-22 Nikon Corporation 計測方法、ステージ装置、及び露光装置
US9316917B2 (en) 2007-07-18 2016-04-19 Nikon Corporation Measuring method, stage apparatus, and exposure apparatus
US9372410B2 (en) 2007-07-18 2016-06-21 Nikon Corporation Measuring method, stage apparatus, and exposure apparatus
EP2818926A2 (en) 2007-07-18 2014-12-31 Nikon Corporation Measurement method, stage apparatus, and exposure apparatus
US9804506B2 (en) 2007-07-18 2017-10-31 Nikon Corporation Measuring method, stage apparatus, and exposure apparatus
EP3447582A1 (en) 2007-07-18 2019-02-27 Nikon Corporation Measuring method, stage apparatus, and exposure apparatus
EP3246755A1 (en) 2007-07-18 2017-11-22 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
JPWO2009013905A1 (ja) * 2007-07-24 2010-09-30 株式会社ニコン 位置計測システム、露光装置、位置計測方法、露光方法及びデバイス製造方法、並びに工具及び計測方法
WO2009013905A1 (ja) 2007-07-24 2009-01-29 Nikon Corporation 位置計測システム、露光装置、位置計測方法、露光方法及びデバイス製造方法、並びに工具及び計測方法
US8243257B2 (en) 2007-07-24 2012-08-14 Nikon Corporation Position measurement system, exposure apparatus, position measuring method, exposure method and device manufacturing method, and tool and measuring method
US8023106B2 (en) 2007-08-24 2011-09-20 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US8767182B2 (en) 2007-08-24 2014-07-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US8218129B2 (en) 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
US9304412B2 (en) 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
US8237919B2 (en) 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
US8867022B2 (en) 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US10310384B2 (en) 2007-12-28 2019-06-04 Nikon Corporation Exposure apparatus, movable body drive system, pattern formation apparatus, exposure method, and device manufacturing method
US10274831B2 (en) 2007-12-28 2019-04-30 Nikon Corporation Exposure apparatus, movable body drive system, pattern formation apparatus, exposure method, and device manufacturing method
US9229333B2 (en) 2007-12-28 2016-01-05 Nikon Corporation Exposure apparatus, movable body drive system, pattern formation apparatus, exposure method, and device manufacturing method
US9690205B2 (en) 2007-12-28 2017-06-27 Nikon Corporation Exposure apparatus, movable body drive system, pattern formation apparatus, exposure method, and device manufacturing method
JP2009206143A (ja) * 2008-02-26 2009-09-10 Seiko Instruments Inc アライメント方法
JP2011029458A (ja) * 2009-07-27 2011-02-10 Nikon Corp 積層型半導体素子の製造方法、及び積層型半導体素子の製造装置
US10416573B2 (en) 2011-02-22 2019-09-17 Nikon Corporation Holding apparatus, exposure apparatus and manufacturing method of device
US9746787B2 (en) 2011-02-22 2017-08-29 Nikon Corporation Holding apparatus, exposure apparatus and manufacturing method of device
US9915868B2 (en) 2011-11-30 2018-03-13 Canon Kabushiki Kaisha Imprint apparatus, imprint method, and article manufacturing method
US10410896B2 (en) 2012-06-06 2019-09-10 Ev Group E. Thallner Gmbh Apparatus and method for ascertaining orientation errors
JP2015525477A (ja) * 2012-06-06 2015-09-03 エーファウ・グループ・エー・タルナー・ゲーエムベーハー 位置合わせ誤差を求めるための装置と方法
US10134622B2 (en) 2012-06-06 2018-11-20 Ev Group E. Thallner Gmbh Apparatus and method for ascertaining orientation errors
JP2017049456A (ja) * 2015-09-02 2017-03-09 キヤノン株式会社 ディストーション検出方法、露光装置、露光方法、およびデバイス製造方法
JP2017183735A (ja) * 2017-05-10 2017-10-05 エーファウ・グループ・エー・タルナー・ゲーエムベーハー 位置合わせ誤差を求めるための装置と方法
US12130562B2 (en) 2021-02-22 2024-10-29 Canon Kabushiki Kaisha Method of obtaining array of plurality of regions on substrate, exposure apparatus, method of manufacturing article, non-transitory storage medium, and information processing apparatus
US11947267B2 (en) 2021-10-01 2024-04-02 Canon Kabushiki Kaisha Method of obtaining array of plurality of shot regions on substrate, exposure method, exposure apparatus, method of manufacturing article, non-transitory computer-readable storage medium, and information processing apparatus

Also Published As

Publication number Publication date
JPH0447968B2 (enrdf_load_stackoverflow) 1992-08-05

Similar Documents

Publication Publication Date Title
JPS6144429A (ja) 位置合わせ方法、及び位置合せ装置
US4780617A (en) Method for successive alignment of chip patterns on a substrate
KR100397653B1 (ko) 노광 방법, 노광 장치, 및 디바이스 제조방법
US5298761A (en) Method and apparatus for exposure process
JP2610815B2 (ja) 露光方法
JPH0669017B2 (ja) 位置合わせ方法
JP3451607B2 (ja) 位置合わせ方法及び装置、並びに露光方法及び装置
JP2638528B2 (ja) 位置合わせ方法
JP3651074B2 (ja) 露光方法、それを用いた半導体集積回路又は液晶表示素子の製造方法、及び露光装置
JP2629659B2 (ja) 回路パターン形成方法
JPH04324615A (ja) 位置合わせ装置及び位置合わせ方法
JP3491206B2 (ja) 位置合わせ方法及び装置、並びに露光方法及び装置
JPH0992591A (ja) 位置合わせ方法
JP2626637B2 (ja) 位置合わせ方法
JPS59161815A (ja) 投影露光装置
JP2794593B2 (ja) 投影露光装置
JP2926331B2 (ja) 露光方法
JPH06188171A (ja) 投影露光装置
JPH1152545A (ja) レチクルおよびそれによって転写されたパターンならびにレチクルと半導体ウエハとの位置合わせ方法
JP2967974B2 (ja) 回路パターンの形成方法
JPH1064808A (ja) マスクの位置合わせ方法及び投影露光方法
JP3042529B2 (ja) 回路パタ―ン形成方法、及び露光装置
JPH0722099B2 (ja) 精度検査方法及び該検査機能を有する露光装置
JPH0782390B2 (ja) ステージ位置決め方法
JPH07122473A (ja) 露光方法

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees