JPS56147804A - Photosensitive resin material for forming fluorescent surface of cathode ray tube - Google Patents

Photosensitive resin material for forming fluorescent surface of cathode ray tube

Info

Publication number
JPS56147804A
JPS56147804A JP5105680A JP5105680A JPS56147804A JP S56147804 A JPS56147804 A JP S56147804A JP 5105680 A JP5105680 A JP 5105680A JP 5105680 A JP5105680 A JP 5105680A JP S56147804 A JPS56147804 A JP S56147804A
Authority
JP
Japan
Prior art keywords
polyvinyl acetate
saponified polyvinyl
resin material
stilbazolium
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5105680A
Other languages
English (en)
Inventor
Kunihiro Ichimura
Osamu Takeuchi
Hideo Kusama
Kazuo Yamazaki
Akira Saka
Hiroshi Ito
Kunitaka Toyofuku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
New Oji Paper Co Ltd
Sony Corp
Original Assignee
Agency of Industrial Science and Technology
Sony Corp
Oji Paper Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Sony Corp, Oji Paper Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP5105680A priority Critical patent/JPS56147804A/ja
Priority to DE19813114468 priority patent/DE3114468A1/de
Priority to GB8111847A priority patent/GB2076826B/en
Priority to US06/254,062 priority patent/US4339524A/en
Priority to NL8101912A priority patent/NL8101912A/nl
Priority to FR8107723A priority patent/FR2483638B1/fr
Publication of JPS56147804A publication Critical patent/JPS56147804A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/44Preparation of metal salts or ammonium salts
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
JP5105680A 1980-04-17 1980-04-17 Photosensitive resin material for forming fluorescent surface of cathode ray tube Pending JPS56147804A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP5105680A JPS56147804A (en) 1980-04-17 1980-04-17 Photosensitive resin material for forming fluorescent surface of cathode ray tube
DE19813114468 DE3114468A1 (de) 1980-04-17 1981-04-09 Lichtempfindliche harzmaterialien
GB8111847A GB2076826B (en) 1980-04-17 1981-04-14 Photosensitive resinous materials
US06/254,062 US4339524A (en) 1980-04-17 1981-04-14 Photosensitive resinous materials containing stilbazolium groups
NL8101912A NL8101912A (nl) 1980-04-17 1981-04-16 Voor lichtgevoelig harsachtig materiaal.
FR8107723A FR2483638B1 (fr) 1980-04-17 1981-04-16 Matieres resineuses photosensibles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5105680A JPS56147804A (en) 1980-04-17 1980-04-17 Photosensitive resin material for forming fluorescent surface of cathode ray tube

Publications (1)

Publication Number Publication Date
JPS56147804A true JPS56147804A (en) 1981-11-17

Family

ID=12876139

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5105680A Pending JPS56147804A (en) 1980-04-17 1980-04-17 Photosensitive resin material for forming fluorescent surface of cathode ray tube

Country Status (6)

Country Link
US (1) US4339524A (ja)
JP (1) JPS56147804A (ja)
DE (1) DE3114468A1 (ja)
FR (1) FR2483638B1 (ja)
GB (1) GB2076826B (ja)
NL (1) NL8101912A (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58164677A (ja) * 1982-03-25 1983-09-29 Toshiba Corp 受像管螢光面形成用組成物及び受像管螢光面形成方法
JPS5979246A (ja) * 1982-10-29 1984-05-08 Toshiba Corp カラ−フイルタ−用レジスト組成物
JPS6187153A (ja) * 1984-09-11 1986-05-02 Agency Of Ind Science & Technol 感光性樹脂組成物
JPS61230138A (ja) * 1985-04-03 1986-10-14 Agency Of Ind Science & Technol 感光性樹脂組成物
EP0373537A1 (en) 1988-12-14 1990-06-20 THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY Photosensitive poly(vinyl alcohol) derivative
JPH0651522A (ja) * 1983-12-16 1994-02-25 Agency Of Ind Science & Technol 感光性樹脂を使用した透明着色画像
JP2016193985A (ja) * 2015-03-31 2016-11-17 株式会社Adeka 重合体及び光硬化性組成物

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010064B2 (ja) * 1982-02-16 1985-03-14 株式会社東芝 受像管螢光膜形成用組成物及び受像管螢光膜形成方法
EP0092901B1 (en) * 1982-04-23 1987-10-14 Autotype International Limited Photopolymers
US4564580A (en) * 1983-06-30 1986-01-14 Kogyo Gijutsuin Photosensitive resin composition
JPS6117138A (ja) * 1984-07-04 1986-01-25 Agency Of Ind Science & Technol プラスチツクフイルム塗布用感光性エマルジヨン
US5246815A (en) * 1984-07-04 1993-09-21 Gen. Director Of The Agency Of Industrial Science & Technology Photosensitive material for screen processing
JPS6166334A (ja) * 1984-09-06 1986-04-05 Sony Corp 陰極線管の製法及び感光性螢光体ペ−スト
US4746588A (en) * 1985-11-25 1988-05-24 Rca Corporation Method for preparing a photosensitive film on a glass surface
JPH0762048B2 (ja) * 1986-09-25 1995-07-05 工業技術院長 感光性樹脂
US4990417A (en) * 1987-02-23 1991-02-05 Sony Corporation Method of manufacturing a cathode ray tube
JPH0193027A (ja) * 1987-10-01 1989-04-12 Sony Corp カラー陰極線管の製造方法
DE3889518T2 (de) * 1987-10-17 1994-09-22 Autotype Int Ltd Photopolymere.
DE3889415T2 (de) * 1987-10-17 1994-09-01 Autotype Int Ltd Photoschablone für Siebdruck.
GB2226564B (en) * 1988-12-16 1993-03-17 Sericol Group Ltd Photopolymerisable polyvinyl alcohols and compositions containing them
DE3928825A1 (de) * 1989-08-31 1991-03-07 Hoechst Ag Pfropfpolymerisat mit ungesaettigten seitenketten, dieses enthaltendes lichtempfindliches gemisch sowie daraus hergestelltes aufzeichnungsmaterial
US5200291A (en) * 1989-11-13 1993-04-06 Hoechst Celanese Corporation Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin
CA2026018A1 (en) * 1989-11-13 1991-05-14 Stanley F. Wanat Photosensitive resin and element made therefrom
US5334485A (en) * 1991-11-05 1994-08-02 The Chromaline Corporation Acid soluble photo-resist comprising a photosensitive polymer
GB2263699B (en) * 1992-02-03 1995-11-29 Sericol Ltd Photopolymerizable alcohols and compositions containing them
JP3297929B2 (ja) * 1992-03-25 2002-07-02 ソニー株式会社 陰極線管の蛍光面の形成方法
US5358999A (en) * 1992-05-29 1994-10-25 Ulano Corporation Process for preparation of photosensitive compositions of stilbazolium quaternary
US5330877A (en) * 1992-05-29 1994-07-19 Ulano Corporation Photosensitive compositions containing stilbazolium groups
WO1996029312A1 (en) * 1995-03-20 1996-09-26 Orion Electric Co., Ltd. Stilbazolium salt, and preparation and use thereof
JP3561061B2 (ja) * 1995-12-11 2004-09-02 東洋合成工業株式会社 ポリビニルアルコール系感光性樹脂および感光性樹脂組成物並びにそれを用いたパターン形成方法
FR2747838B1 (fr) * 1996-04-18 1999-09-03 Futaba Denshi Kogyo Kk Composition formant un film fluorescent destine a un affichage et procede de formation d'un film fluorescent destine a un affichage
KR100229316B1 (ko) * 1996-10-14 1999-11-01 구자홍 칼라음극선관의 형광막 슬러리 조성물
KR100263860B1 (ko) * 1998-04-14 2000-08-16 김순택 적색 필터막 형성방법
US6797452B2 (en) * 1999-06-04 2004-09-28 Toyo Gosei Kogyo Co., Ltd. Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition
US6514661B1 (en) 1999-10-15 2003-02-04 E. I Du Pont De Nemours And Company Process for forming a colored image having a dominant attribute
ES2625177T3 (es) 2010-12-20 2017-07-18 L'oréal Composición líquida y estéril para el relleno de las arrugas
US8609074B2 (en) 2011-12-30 2013-12-17 L'oreal Methods for making up a keratinous substrate
WO2013190469A2 (en) 2012-06-19 2013-12-27 L'oreal Cosmetic process for making up and/or caring for the lips
WO2013190464A2 (en) 2012-06-19 2013-12-27 L'oreal Cosmetic process for making up and/or caring for a skin surface
WO2013190466A2 (en) 2012-06-19 2013-12-27 L'oreal Cosmetic process for making up the eyes
WO2013190465A2 (en) 2012-06-19 2013-12-27 L'oreal Cosmetic process for forming a coating on the surface of a nail or false nail
FR3035588B1 (fr) 2015-04-29 2017-05-19 Oreal Composition topique pour ameliorer la duree dans le temps d'un effet immediat de maquillage et/ou de soin
FR3046072B1 (fr) 2015-12-23 2018-05-25 L'oreal Procede de traitement des matieres keratiniques au moyen d'une composition comprenant un polymere photodimerisable modifie
FR3090364B1 (fr) 2018-12-21 2021-06-18 Oreal Composition comprenant un polymere photodimerisable modifie et un agent alcalin et/ou un derive amine d’alcoxysilane et procede de traitement mettant en œuvre la composition
CN116348817B (zh) 2020-10-13 2024-05-07 昭和化工株式会社 聚乙酸乙烯酯基光敏聚合物
FR3131317A1 (fr) 2021-12-23 2023-06-30 L'oreal Polymères photodimérisables comprenant au moins un groupement polyoxyalkyléné, composition les comprenant et procédé de traitement cosmétique
FR3131200A1 (fr) 2021-12-23 2023-06-30 L'oreal Composition comprenant un polymère photoréticulable et un agent colorant
FR3131201A1 (fr) 2021-12-23 2023-06-30 L'oreal Procédé pour démaquiller des fibres kératiniques ayant été préalablement traitées par une composition comprenant un polymère photoréticulable

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54138091A (en) * 1978-04-18 1979-10-26 Sekisui Chem Co Ltd Photosensitive resin composition
JPS5523163A (en) * 1978-08-09 1980-02-19 Agency Of Ind Science & Technol Polyvinyl alcohol type photosensitive resin and its preparation

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3649269A (en) * 1964-04-30 1972-03-14 Tokyo Shibaura Electric Co Method of forming fluorescent screens
AU416519B1 (en) * 1966-04-18 1971-08-24 Balm Paints Limited Aqueous coating compositions
JPS508658B1 (ja) * 1970-06-19 1975-04-05
US4086210A (en) * 1976-05-10 1978-04-25 Eastman Kodak Company Radiation sensitive polymeric o-nitrophenyl acetals
US4272620A (en) * 1978-08-09 1981-06-09 Agency Of Industrial Science And Technology Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof
JPS5562905A (en) * 1978-11-06 1980-05-12 Agency Of Ind Science & Technol Photo-insolubilized resin and its preparation

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54138091A (en) * 1978-04-18 1979-10-26 Sekisui Chem Co Ltd Photosensitive resin composition
JPS5523163A (en) * 1978-08-09 1980-02-19 Agency Of Ind Science & Technol Polyvinyl alcohol type photosensitive resin and its preparation

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58164677A (ja) * 1982-03-25 1983-09-29 Toshiba Corp 受像管螢光面形成用組成物及び受像管螢光面形成方法
JPH0216910B2 (ja) * 1982-03-25 1990-04-18 Tokyo Shibaura Electric Co
JPS5979246A (ja) * 1982-10-29 1984-05-08 Toshiba Corp カラ−フイルタ−用レジスト組成物
JPH0651522A (ja) * 1983-12-16 1994-02-25 Agency Of Ind Science & Technol 感光性樹脂を使用した透明着色画像
JPS6187153A (ja) * 1984-09-11 1986-05-02 Agency Of Ind Science & Technol 感光性樹脂組成物
JPH0336423B2 (ja) * 1984-09-11 1991-05-31 Kogyo Gijutsu Incho
JPS61230138A (ja) * 1985-04-03 1986-10-14 Agency Of Ind Science & Technol 感光性樹脂組成物
EP0373537A1 (en) 1988-12-14 1990-06-20 THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY Photosensitive poly(vinyl alcohol) derivative
JP2016193985A (ja) * 2015-03-31 2016-11-17 株式会社Adeka 重合体及び光硬化性組成物

Also Published As

Publication number Publication date
DE3114468A1 (de) 1982-03-04
GB2076826B (en) 1984-04-04
DE3114468C2 (ja) 1992-03-12
GB2076826A (en) 1981-12-09
NL8101912A (nl) 1981-11-16
US4339524A (en) 1982-07-13
FR2483638B1 (fr) 1987-12-18
FR2483638A1 (fr) 1981-12-04

Similar Documents

Publication Publication Date Title
JPS56147804A (en) Photosensitive resin material for forming fluorescent surface of cathode ray tube
JPS5562446A (en) Photosensitive resin composition for screen printing plate
GB786119A (en) Improvements in or relating to polymers and their uses
JPS57185034A (en) Photosensitive resin composition
JPS5590445A (en) Laminated glass
JPS5523163A (en) Polyvinyl alcohol type photosensitive resin and its preparation
JPS5562905A (en) Photo-insolubilized resin and its preparation
JPS5643353A (en) Hardening method of gelatine
JPS54138090A (en) Photosensitive resin composition
JPS56103159A (en) Preparation of novel peroxy ester
JPS532587A (en) Preparation of curable polymer
JPS5665838A (en) Preparation of beta-alkoxymethoxymethyl halide
JPS5686978A (en) Aqueous adhesive composition
JPS5759850A (en) Polyfluoroallyl ether and its preparation and use
JPS5643305A (en) Production of maleinized polyvinyl alcohol
JPS5437185A (en) Preparation of reactive aqueous emulsion
JPS5593155A (en) Electrophotographic receptor
JPS5675482A (en) Novel acrylic or methacrylic ester
JPS5710666A (en) Adhesive composition
JPS56113736A (en) Preparation of 2-arylalkanoic acid
JPS5587142A (en) Positive type resist polymer composition
JPS54132690A (en) Preparation of vinyl ester resin
JPS5564596A (en) Preparation of alkylmethyl-3-dialkoxy-propylphosphinate
JPS57114585A (en) Preparation of polyalkyl-2-(2,4-dihydroxyphenyl)-7- hydroxy-chroman
JPS554307A (en) Preparation of phthalic ester