DE3889415T2 - Photoschablone für Siebdruck. - Google Patents

Photoschablone für Siebdruck.

Info

Publication number
DE3889415T2
DE3889415T2 DE19883889415 DE3889415T DE3889415T2 DE 3889415 T2 DE3889415 T2 DE 3889415T2 DE 19883889415 DE19883889415 DE 19883889415 DE 3889415 T DE3889415 T DE 3889415T DE 3889415 T2 DE3889415 T2 DE 3889415T2
Authority
DE
Germany
Prior art keywords
screen printing
photo stencil
stencil
photo
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE19883889415
Other languages
English (en)
Other versions
DE3889415D1 (de
Inventor
Ross Alexander Balfour
John Arthur Sperry
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Autotype Ltd
Original Assignee
Autotype International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB878724372A external-priority patent/GB8724372D0/en
Priority claimed from GB888804278A external-priority patent/GB8804278D0/en
Application filed by Autotype International Ltd filed Critical Autotype International Ltd
Publication of DE3889415D1 publication Critical patent/DE3889415D1/de
Application granted granted Critical
Publication of DE3889415T2 publication Critical patent/DE3889415T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
DE19883889415 1987-10-17 1988-09-22 Photoschablone für Siebdruck. Expired - Fee Related DE3889415T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB878724372A GB8724372D0 (en) 1987-10-17 1987-10-17 Photosensitive compositions
GB888804278A GB8804278D0 (en) 1988-02-24 1988-02-24 Photostencils for screenprinting

Publications (2)

Publication Number Publication Date
DE3889415D1 DE3889415D1 (de) 1994-06-09
DE3889415T2 true DE3889415T2 (de) 1994-09-01

Family

ID=26292916

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19883889415 Expired - Fee Related DE3889415T2 (de) 1987-10-17 1988-09-22 Photoschablone für Siebdruck.

Country Status (5)

Country Link
EP (1) EP0313221B1 (de)
JP (1) JPH02118575A (de)
AU (1) AU610263B2 (de)
CA (1) CA1330498C (de)
DE (1) DE3889415T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4004054C2 (de) * 1990-02-10 1994-08-18 Kissel & Wolf Gmbh Lagerstabile, UV-strahlungsempfindliche wasserentwickelbare Emulsion zur Herstellung von Siebdruckplatten
US5334485A (en) * 1991-11-05 1994-08-02 The Chromaline Corporation Acid soluble photo-resist comprising a photosensitive polymer
GB2263699B (en) * 1992-02-03 1995-11-29 Sericol Ltd Photopolymerizable alcohols and compositions containing them
JP3561061B2 (ja) * 1995-12-11 2004-09-02 東洋合成工業株式会社 ポリビニルアルコール系感光性樹脂および感光性樹脂組成物並びにそれを用いたパターン形成方法
TWI224715B (en) * 1998-08-05 2004-12-01 Toyo Gosei Kogyo Kk Photosensitive resin derived from saponified poly(vinyl acetate)
EP1783552B1 (de) 2005-11-03 2015-10-07 Kissel & Wolf GmbH Photopolymerisierbare Zusammensetzung zur Herstellung von Druckformen
US7781187B2 (en) * 2005-12-30 2010-08-24 Corning Incorporated Fluorescent dyes
US9389512B2 (en) 2014-09-30 2016-07-12 Eastman Kodak Company Forming conductive metal patterns using water-soluble polymers
FR3046072B1 (fr) 2015-12-23 2018-05-25 L'oreal Procede de traitement des matieres keratiniques au moyen d'une composition comprenant un polymere photodimerisable modifie
US11036135B2 (en) 2016-11-25 2021-06-15 Adeka Corporation Curable composition, cured product thereof, and curing method therefor
JPWO2018230564A1 (ja) * 2017-06-16 2020-04-30 株式会社Adeka コーティング組成物
FR3090364B1 (fr) 2018-12-21 2021-06-18 Oreal Composition comprenant un polymere photodimerisable modifie et un agent alcalin et/ou un derive amine d’alcoxysilane et procede de traitement mettant en œuvre la composition
FR3131200A1 (fr) 2021-12-23 2023-06-30 L'oreal Composition comprenant un polymère photoréticulable et un agent colorant
FR3131201A1 (fr) 2021-12-23 2023-06-30 L'oreal Procédé pour démaquiller des fibres kératiniques ayant été préalablement traitées par une composition comprenant un polymère photoréticulable
FR3131317A1 (fr) 2021-12-23 2023-06-30 L'oreal Polymères photodimérisables comprenant au moins un groupement polyoxyalkyléné, composition les comprenant et procédé de traitement cosmétique

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56147804A (en) * 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
JPS5917550A (ja) * 1982-07-21 1984-01-28 Mitsubishi Chem Ind Ltd 光架橋性感光材料
US4564580A (en) * 1983-06-30 1986-01-14 Kogyo Gijutsuin Photosensitive resin composition
EP0313220B1 (de) * 1987-10-17 1994-05-11 Autotype International Limited Photopolymere

Also Published As

Publication number Publication date
AU2379188A (en) 1989-04-20
CA1330498C (en) 1994-07-05
DE3889415D1 (de) 1994-06-09
JPH02118575A (ja) 1990-05-02
AU610263B2 (en) 1991-05-16
EP0313221A3 (en) 1990-04-18
EP0313221A2 (de) 1989-04-26
EP0313221B1 (de) 1994-05-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee