JPWO2018230564A1 - コーティング組成物 - Google Patents
コーティング組成物 Download PDFInfo
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- JPWO2018230564A1 JPWO2018230564A1 JP2019525461A JP2019525461A JPWO2018230564A1 JP WO2018230564 A1 JPWO2018230564 A1 JP WO2018230564A1 JP 2019525461 A JP2019525461 A JP 2019525461A JP 2019525461 A JP2019525461 A JP 2019525461A JP WO2018230564 A1 JPWO2018230564 A1 JP WO2018230564A1
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- DNYZBFWKVMKMRM-UHFFFAOYSA-N n-benzhydrylidenehydroxylamine Chemical compound C=1C=CC=CC=1C(=NO)C1=CC=CC=C1 DNYZBFWKVMKMRM-UHFFFAOYSA-N 0.000 description 1
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- KSCKTBJJRVPGKM-UHFFFAOYSA-N octan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCCCCCC[O-].CCCCCCCC[O-].CCCCCCCC[O-].CCCCCCCC[O-] KSCKTBJJRVPGKM-UHFFFAOYSA-N 0.000 description 1
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- 239000003973 paint Substances 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
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- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- GTCCGKPBSJZVRZ-UHFFFAOYSA-N pentane-2,4-diol Chemical compound CC(O)CC(C)O GTCCGKPBSJZVRZ-UHFFFAOYSA-N 0.000 description 1
- GXOHBWLPQHTYPF-UHFFFAOYSA-N pentyl 2-hydroxypropanoate Chemical compound CCCCCOC(=O)C(C)O GXOHBWLPQHTYPF-UHFFFAOYSA-N 0.000 description 1
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- 150000002989 phenols Chemical class 0.000 description 1
- JZDGWLGMEGSUGH-UHFFFAOYSA-M phenyl-(2,4,6-trimethylbenzoyl)phosphinate Chemical group CC1=CC(C)=CC(C)=C1C(=O)P([O-])(=O)C1=CC=CC=C1 JZDGWLGMEGSUGH-UHFFFAOYSA-M 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
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- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
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- 230000002335 preservative effect Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- FUPZEKMVZVPYLE-UHFFFAOYSA-N prop-2-enoic acid;prop-2-enylbenzene Chemical compound OC(=O)C=C.C=CCC1=CC=CC=C1 FUPZEKMVZVPYLE-UHFFFAOYSA-N 0.000 description 1
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- 239000001294 propane Substances 0.000 description 1
- TVCBSVKTTHLKQC-UHFFFAOYSA-M propanoate;zirconium(4+) Chemical compound [Zr+4].CCC([O-])=O TVCBSVKTTHLKQC-UHFFFAOYSA-M 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 150000003217 pyrazoles Chemical class 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
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- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 238000007767 slide coating Methods 0.000 description 1
- DVQHRBFGRZHMSR-UHFFFAOYSA-N sodium methyl 2,2-dimethyl-4,6-dioxo-5-(N-prop-2-enoxy-C-propylcarbonimidoyl)cyclohexane-1-carboxylate Chemical compound [Na+].C=CCON=C(CCC)[C-]1C(=O)CC(C)(C)C(C(=O)OC)C1=O DVQHRBFGRZHMSR-UHFFFAOYSA-N 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- JRQGFDPXVPTSJU-UHFFFAOYSA-L sodium zirconium(4+) sulfate Chemical compound [Na+].[Zr+4].[O-]S([O-])(=O)=O JRQGFDPXVPTSJU-UHFFFAOYSA-L 0.000 description 1
- IDOPRZMNYMUGCN-UHFFFAOYSA-K sodium;2-hydroxypropane-1,2,3-tricarboxylate;zirconium(4+) Chemical compound [Na+].[Zr+4].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O IDOPRZMNYMUGCN-UHFFFAOYSA-K 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
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- 230000002269 spontaneous effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
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- 238000003860 storage Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
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- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
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- 235000007586 terpenes Nutrition 0.000 description 1
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 description 1
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- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Substances [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
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- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium(IV) ethoxide Substances [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical group CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- HADKRTWCOYPCPH-UHFFFAOYSA-M trimethylphenylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C1=CC=CC=C1 HADKRTWCOYPCPH-UHFFFAOYSA-M 0.000 description 1
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- 150000003754 zirconium Chemical class 0.000 description 1
- 229910000166 zirconium phosphate Inorganic materials 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
- XJUNLJFOHNHSAR-UHFFFAOYSA-J zirconium(4+);dicarbonate Chemical compound [Zr+4].[O-]C([O-])=O.[O-]C([O-])=O XJUNLJFOHNHSAR-UHFFFAOYSA-J 0.000 description 1
- ZXAUZSQITFJWPS-UHFFFAOYSA-J zirconium(4+);disulfate Chemical compound [Zr+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O ZXAUZSQITFJWPS-UHFFFAOYSA-J 0.000 description 1
- OEERILNPOAIBKF-UHFFFAOYSA-J zirconium(4+);tetraformate Chemical compound [Zr+4].[O-]C=O.[O-]C=O.[O-]C=O.[O-]C=O OEERILNPOAIBKF-UHFFFAOYSA-J 0.000 description 1
- LEHFSLREWWMLPU-UHFFFAOYSA-B zirconium(4+);tetraphosphate Chemical compound [Zr+4].[Zr+4].[Zr+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LEHFSLREWWMLPU-UHFFFAOYSA-B 0.000 description 1
- LSWWNKUULMMMIL-UHFFFAOYSA-J zirconium(iv) bromide Chemical compound Br[Zr](Br)(Br)Br LSWWNKUULMMMIL-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/285—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/52—Amides or imides
- C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
- C08F220/56—Acrylamide; Methacrylamide
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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Abstract
Description
(1)ポリビニルアルコール、その変性体又はその誘導体
(2)ポリビニルピロリドン、その変性体又はその誘導体
Q1、Q2及びQ3は、それぞれ独立に感光性基を表し、
Anq-はq価のアニオンを表し、qは1又は2を表し、pは電荷を中性に保つ係数を表し、
*は結合手を意味する。)
上記光分解型光重合開始剤の中でも、IRGACURE 2959、IRGACURE 819DW(BASF社製)、ESACURE ONE、ESACURE 1001M、ESACURE KIP 150、ESACURE DP 250(Lamberti社)等の水溶性開始剤等が、水への親和性が高いので好ましい。
パターン状硬化物を製造する一つの態様は、工程(1)として、支持基体に、現像液に対する溶解性が互いに異なる複数の組成物からなる層を、一層塗布した後に乾燥することを繰り返して塗布し、続いて工程(2)として、膜の所定部分に活性エネルギー線を照射して露光し、さらに工程(3)として、膜を複数の現像液で繰り返し処理するものである。
パターン状硬化物を製造する別の態様は、工程(1)、工程(2)及び工程(3)を行う一連の流れを複数回繰り返すもので、工程(1)における組成物は、前記一連の流れごとに、現像液に対する溶解性がそれぞれに異なるものであり、工程(3)において現像に用いる現像液は、前記一連の流れごとにそれぞれ異なるものを用いる。
パターン状硬化物を製造する別の態様は、工程(1)として、支持基体に、組成物からなる下層を塗布した後に乾燥し、続いて上層として、組成物から得られるフィルムを積層して膜を形成するもので、上層と下層を構成する組成物は、現像液に対する溶解性が互いに異なるものである。続いて工程(2)として、膜の所定部分に活性エネルギー線を照射して露光し、さらに工程(3)として、膜を複数の現像液で繰り返し処理を行う。
加熱は、ホットプレート上に積層物を載せ昇温したり、サーマルヘッド、クリーン・オーブン等の加熱装置を使用して、プロキシミティ方式や吸着方式、コンベア方式等があり、またそれらを組み合わせることにより行うことができる。
加熱は、50〜200℃で数秒〜1時間行う。
<水溶性重合体水溶液の調製>
まず、イオン交換水900.0gを室温で撹拌しているところに、下記A−1〜A−6いずれかの水溶性重合体100.0gを徐々に添加した。室温で10分間撹拌した後に、内温が85〜90℃になるまで加熱し、その温度で1時間撹拌を継続した。溶解を確認した後、室温まで冷却した。調製した水溶液を1μmフィルターでろ過して、下記PV−1〜PV−6の水溶性重合体水溶液を得た。
A−1:日本合成化学工業製 ゴーセノールNL−05(けん化度99)
A−2:日本合成化学工業製 ゴーセノールGL−05(けん化度87)
A−3:日本合成化学工業製 ゴーセネックス Z−200(けん化度98)
A−4:日本合成化学工業製 ゴーセネックス Z−300(けん化度98)
A−5:日本合成化学工業製 ゴーセネックス Z−100(けん化度99)
A−6:日本合成化学工業製 ゴーセネックス Z−220(けん化度92)
PV−1:A−1の水溶液
PV−2:A−2の水溶液
PV−3:A−3の水溶液
PV−4:A−4の水溶液
PV−5:A−5の水溶液
PV−6:A−6の水溶液
下記の表1〜6に示す各成分を混合し、室温で1時間撹拌後、1μmフィルターでろ過し、実施例及び比較例のコーティング組成物を得た。なお、表1〜表6中の各成分の詳細は下記の通りである。各成分の配合量及び合計量は質量基準である。ただし、PV−1〜PV−11の配合量は、固形分換算した量である。
PV−7:ポリビニルピロリドンK−90(日本触媒製)の10質量%水溶液
PV−8:ゴーセノールGL−05にN−メチロールアクリルアミドをポリビニルアルコールの水酸基量に対して3.0mol%となるように反応させて固形分を10質量%に調整した水溶液
PV−9:G−Polymer OKS−1083にN−メチロールアクリルアミドをポリビニルアルコールの水酸基量に対して2.5mol%となるように反応させて固形分を10質量%に調整した水溶液
PV−10:G−Polymer OKS−1083にホルミルスチリルピリジニウムをポリビニルアルコールの水酸基量に対して3.4mol%となるように反応させて固形分を10質量%に調整した水溶液
PV−11:ゴーセノールGL−05にホルミルスチリルピリジニウムをポリビニルアルコールの水酸基量に対して3.4mol%となるように反応させて固形分を10質量%に調整した水溶液
B−1:オルガチックスTA−10(マツモトファインケミカル社製;テトライソプロピルチタネート、成分濃度99%、Ti含有量17%)
B−2:オルガチックスTC−100(マツモトファインケミカル社製;チタンアセチルアセトネート,2−プロパノール溶液(溶剤系キレート)、成分濃度75%、Ti含有量10%)
B−3:オルガチックスTC−315(マツモトファインケミカル社製;チタンラクテート,水溶液(水系キレート)、成分濃度44%、Ti含有量8%)
B−4:オルガチックスZC−700(マツモトファインケミカル社製;ジルコニウムテトラアセチルアセトネートのトルエン/メタノール溶液(溶剤系キレート)、成分濃度20%、Zr含有量4%)
B−5:オルガチックスZC−126(マツモトファインケミカル社製;オキシ塩化ジルコニウムの水溶液(水系キレート)、成分濃度30%、Zr含有量11%)
B−6:ジルコゾールZN(第一稀元素化学工業社製;オキシ硝酸ジルコニウムの水溶液、成分濃度 46%、Zr含有量25%)
B−7:ジルコゾールAC−7(第一稀元素化学工業社製;炭酸ジルコニウムアンモニウムの水溶液、成分濃度30%、Zr含有量13%)
B−8:ジルコゾールZA−20(第一稀元素化学工業社製;オキシ酢酸ジルコニウムの水溶液、成分濃度35%、Zr含有量20%)
B−9:オルガチックスWS−700(マツモトファインケミカル製;有機チタン変性ポリエチレンイミン、成分濃度15%、Ti含有量5%)
B−10:日本触媒製、エポクロスWS−700(オキサゾリン化合物、固形分25質量%)
C−1:DL−乳酸
C−2:クエン酸
C−3:酢酸
C−4:グリコール酸
D−1:5%アンモニア水
D−2:トリエチルアミン
D−3:2.38%TMAH水溶液
D−4:ポリエチレンイミン70000(純正化学製、30%水溶液)
E−1:ヒドロキシプロピルセルロースNISSO HPC L(日本曹達製)の10%水溶液
E−2:高松油脂製、ペスレジンA−690(親水基:COOH、固形分20質量%、酸価50mgKOH/g)
E−3:日本合成化学工業製、ポリエスターW−1031(親水基:COOH、固形分30質量%、酸価80mgKOH/g)
F−1:新中村化学工業社製 NKエステル A−600(水溶性多官能アクリレート)
F−2:新中村化学工業社製 NKエステル A−GLY−20E(水溶性多官能アクリレート)
F−3:新中村化学工業社製 NKエコノマー A−PG5054E(水溶性多官能アクリレート)
F−4:富士フィルム社製 FFM−3(水溶性多官能アクリルアミド)
F−5:KJケミカルズ社製 ヒドロキシエチルアクリルアミド(HEAA)(水溶性単官能アクリルアミド)
G−1:BASF社製 IRGACURE 2959
G−2:N,N−ビス(2−ヒドロキシエチル)ブタン−1−アミニウム=フェニル(2,4,6−トリメチルベンゾイル)ホスフィネート
上記実施例1〜31で得られたコーティング組成物及び比較例1〜7で得られた比較コーティング組成物について、下記評価を行った。評価結果を表1〜6に示す。
実施例1〜31で得られたコーティング組成物及び比較例1〜7で得られた比較コーティング組成物の状態を目視で確認した。判定基準は下記の通りである。
○:透明で均一
△:白濁
×:相溶せず(相分離)
<実施例1〜26、29〜31及び比較例1、3、4、6、7>
a1)塗膜の作製
各コーティング組成物を、ガラス基板上にスピンコーターを用いて塗布し、90℃のホットプレートで5分間のプリベークを行った後、140℃で15分間加熱を行うことで評価用基板を作製した。スピンコートの条件は、触針式形状測定器(アルバック製Dektak150)により膜厚が5.0〜5.5μmとなるように調整した。
b1)塗膜の状態
作製した基板上の塗膜について、目視で表面の状態を確認すると同時に、ヘイズ測定によって評価を行った。測定には日本電色製ヘイズメーターNDH5000を使用し、判定基準は下記の通りとした。
○:塗膜が均一、ヘイズ1未満
△:塗膜が均一、ヘイズ1以上3未満
×:塗膜が白化あるいはムラが認められ且つヘイズ3以上
××:塗膜の一部が剥離、あるいは溶出
<実施例27、28及び比較例2、5>
a2)塗膜の作製
各コーティング組成物を、ガラス基板上にスピンコーターを用いて塗布し、90℃のホットプレートで5分間のプリベークを行った後、高圧水銀ランプを用い、365nmの波長を含む光を500mJ/cm2照射し、更に140℃で15分間加熱を行うことで評価用基板を作製した。スピンコートの条件は、触針式形状測定器(アルバック製Dektak150)により膜厚が5.0〜5.5μmとなるように調整した。
b2)塗膜の状態
作製した基板上の塗膜について、目視で表面の状態を確認すると同時に、ヘイズ測定によって評価を行った。測定には日本電色製ヘイズメーターNDH5000を使用し、判定基準は下記の通りとした。
○:塗膜が均一、ヘイズ1未満
△:塗膜が均一、ヘイズ1以上3未満
×:塗膜が白化あるいはムラが認められ且つヘイズ3以上
上記a1)及びa2)で作製した基板を85℃、85%RHの条件で24時間放置した後の塗膜の表面状態を確認すると同時に、ヘイズ測定によって評価を行った。測定には日本電色製ヘイズメーターNDH5000を使用し、判定基準は下記の通りとした。
○:塗膜が均一、ヘイズ1未満
△:塗膜が均一、ヘイズ1以上3未満
×:塗膜が白化あるいはムラが認められ且つヘイズ3以上
××:塗膜の一部が剥離、あるいは溶出
上記a1)及びa2)で作製した基板の塗膜上に、下記液晶化合物No.1〜No.11よりなる液晶組成物を60℃で24時間接触させた後、液晶組成物を取り出した。接触前後における液晶組成物の電圧保持率(VHR:Voltage Holding Ratio)をそれぞれ測定し、VHRの低下率((接触前のVHR−接触後のVHR)/接触前のVHR×100%)を求め、下記基準により評価を行った。評価は、液晶組成物を液晶評価用TNセル(セル厚5μm、電極面積8mm×8mm配向膜JALS2096)に注入し、VHRをVHR−1A(東陽テクニカ製)を用い測定した。測定条件は、パルス電圧幅:60μs、フレーム周期:16.7ms、波高:±5V、測定温度:25℃とした。
○:VHRの低下率が1%未満
△:VHRの低下率が1〜3%
×:VHRの低下率が3%超
各コーティング組成物をガラス基板上にスピンコーターを用いて塗布し、90℃のホットプレートで5分間のプリベークを行った後、高圧水銀ランプを用い、365nmの波長を含む光を500mJ/cm2照射し、更に140℃で15分間加熱を行うことで評価用基板を作製した。スピンコートの条件は、触針式形状測定器(アルバック製Dektak150)により膜厚が5.0〜5.5μmとなるように調整した。評価用基板の紫外可視吸収(UV−Vis)スペクトルを日本分光製紫外可視吸光度計V−670にて測定した。ガラス基板をリファレンスとし、塗膜の400nmにおける透過率を算出した。
各コーティング組成物をガラス基板上にスピンコーターを用いて塗布し、90℃のホットプレートで5分間のプリベークを行った後、高圧水銀ランプを用い、365nmの波長を含む光を500mJ/cm2照射し、更に140℃で15分間加熱を行うことで評価用基板を作製した。スピンコートの条件は、触針式形状測定器(アルバック製Dektak150)により膜厚が5.0〜5.5μmとなるように調整した。評価用基板の500nmにおける面内位相差R0の値を大塚電子社製 RETS−100にて測定した。
実施例27及び28で得られたコーティング組成物をガラス基板上に、触針式形状測定器(アルバック製Dektak150)により膜厚が5.0〜5.5μmとなるように条件を調整したスピンコーターを用いて塗布した後、90℃のホットプレートで10分間のプリベークを行なった。その後、室温まで冷却し、フォトマスク(Line/Space=50μm/50μm)を介し、高圧水銀ランプを用い、365nmの波長を含む光を500mJ/cm2照射し、23℃のイオン交換水に1分間浸漬した後、エアーガンで付着した水を除去し、基板を140℃のオーブン内で30分間乾燥させた。
乾燥後のパターンをレーザー顕微鏡で確認したところ、いずれのコーティング組成物で作製した基板においても、パターン状硬化物のパターン幅が50±3μm以内であり、良好なパターンが得られた。
(光導波路の作製)
焼成シリコン基板に、下記表7に示すコーティング組成物を各クラッド材料としてスピンコート法により30μmの厚さで積層し、光量10mW/cm2の紫外線を200秒照射後、120℃にて15分間加熱して硬化物を形成した。次いで、形成された硬化物上に、下記表7に示すコーティング組成物を各コア材料としてスピンコート法により20μmの厚さで積層し、ネガ型のフォトマスクを使用して、光量10mW/cm2の紫外線を40秒照射した。水で現像し、140℃で30分間加熱硬化させ、線幅20μmのパターン状硬化物を形成した。更に、下記表7に示すコーティング組成物を各クラッド材料としてスピンコート法によりパターン状硬化物の上面から30μmの厚さとなるように積層し、光量10mW/cm2の紫外線を200秒間照射後、140℃にて30分間加熱することで、シリコン基板上に光導波路を作製した。
波長850nmのアイソレータ付ASE(Amplified Spontaneous Emission)光源を用い、カットバック法により測定した伝送損失から接続損失を差し引いて光伝送損失を算出した。測定結果を表7に示す。光伝送損失が小さいほど、長距離伝送に適しているといえる。
(コーティング紙の作製)
トイレットペーパー(春日製紙工業株式会社製 コアユース)に下記表8に示すコーティング組成物を含侵させて、2枚張り合わせ、90℃において1時間乾燥した。乾燥後、光量10mW/cm2の紫外線を200秒照射後、120℃にて15分間加熱し、コーティング紙を得た。5cm×5cmの大きさに裁断したコーティング紙を200mLのイオン交換水に投下し、メカニカルスターラーで5分間攪拌し、コーティング紙の耐水性を評価した。判定基準は下記の通りとした。評価結果を表8に示す。なお、表中のUV照射なしは、上記コーティング紙の作製において、光量10mW/cm2の紫外線を照射しなかったことを意味する。また、表中の−は、未評価を意味する。
〇:2枚のトイレットペーパーが接着された状態を維持していた
△:2枚のトイレットペーパーが剥離したが、形状を維持していた
×:2枚のトイレットペーパーが剥離し、更に、形状を維持できなかった
Claims (16)
- 下記(1)及び(2)からなる群から選ばれる水溶性重合体を含有するコーティング組成物。
(1)ポリビニルアルコール、その変性体又はその誘導体
(2)ポリビニルピロリドン、その変性体又はその誘導体 - ジルコニウム化合物、チタン化合物、ビスアジド化合物、ブロックイソシアネート及びエポキシ化合物からなる群から選ばれる一種以上の架橋剤をさらに含有する請求項1に記載のコーティング組成物。
- 水溶性多官能(メタ)アクリレート及び水溶性多官能(メタ)アクリルアミドからなる群から選ばれる少なくとも1種をさらに含有する請求項1又は2に記載のコーティング組成物。
- カルボキシル基及び/又はカルボキシル基の塩を置換基として有する水溶性ポリエステルをさらに含有する請求項1に記載のコーティング組成物。
- 前記水溶性重合体が、側鎖にアセト酢酸エステル基又は感光性基を有するポリビニルアルコールである請求項1〜6のいずれか一項に記載のコーティング組成物。
- 上記一般式(IIIα)、(IIIβ)及び(IIIγ)におけるQ1、Q2及びQ3、並びに上記一般式(IV)におけるQ4及びQ5が、スチルバゾリウム基、シンナモイル基、ビニル基、アクリル基、メタクリル基、アクリルアミド基又はメタアクリルアミド基、シンナミル基、シンナミリデン基、シンナミリデンアセチル基、カルコン基、クマリン基、イソクマリン基、2,5−ジメトキシスチルベン基、マレイミド基、α−フェニルマレイミド基、2−ピロン基、アジド基、チミン基、キノン基、マレイミド基、ウラシル基、ピリミジン基、スチリルピリジニウム基、又はスチリルキノリウム基から選択される請求項8又は9に記載のコーティング組成物。
- 布又は紙に含浸される請求項1〜10のいずれか一項に記載のコーティング組成物。
- 光学素子に使用される請求項1〜10のいずれか一項に記載のコーティング組成物。
- 請求項1〜12のいずれか一項に記載のコーティング組成物の硬化物。
- 請求項1〜12のいずれか一項に記載のコーティング組成物を硬化させる工程を有する硬化物の製造方法。
- 請求項1〜12のいずれか一項に記載のコーティング組成物のパターン状硬化物。
- 請求項1〜12のいずれか一項に記載のコーティング組成物をパターン状に硬化させる工程を有するパターン状硬化物の製造方法。
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