JPS54138091A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS54138091A
JPS54138091A JP4617378A JP4617378A JPS54138091A JP S54138091 A JPS54138091 A JP S54138091A JP 4617378 A JP4617378 A JP 4617378A JP 4617378 A JP4617378 A JP 4617378A JP S54138091 A JPS54138091 A JP S54138091A
Authority
JP
Japan
Prior art keywords
aldehyde
degree
monoaldehyde
equivalent
combination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4617378A
Other languages
Japanese (ja)
Other versions
JPS5917730B2 (en
Inventor
Hirofumi Mori
Hitoshi Hori
Susumu Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP4617378A priority Critical patent/JPS5917730B2/en
Publication of JPS54138091A publication Critical patent/JPS54138091A/en
Publication of JPS5917730B2 publication Critical patent/JPS5917730B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

PURPOSE: Title composition with high adhesion to base sheets that is mainly composed of a polyvinyl acetal resin prepred by acetalization of a polyvinyl alcohol resin with a specific plymerization and saponification degrees with a combination of unsaturated and saturated aldehydes to a prescribed degree.
CONSTITUTION: A polyvinyl alcohol with a polymerization degree of 300 W 3000 and a saponification degree of 70 W 100 mole% is acetalized by a combination of a monoaldehyde with 1 or more unsaturated groups in the molecule (aldehyde A) such as crotonaldehyde or acrolein, and a saturated monoaldehyde (aldehyde B) such as acetaldehyde or formaldehyde to a degree of 20 W 40 equivalent% by the aldehyde A and of 2 W 30 equivalent% by the aldehyde B. The resulting polyvinyl acetal resin is incorporated with a photocuring agent or compound to produce said photosensitive composition.
COPYRIGHT: (C)1979,JPO&Japio
JP4617378A 1978-04-18 1978-04-18 Photosensitive resin composition Expired JPS5917730B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4617378A JPS5917730B2 (en) 1978-04-18 1978-04-18 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4617378A JPS5917730B2 (en) 1978-04-18 1978-04-18 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS54138091A true JPS54138091A (en) 1979-10-26
JPS5917730B2 JPS5917730B2 (en) 1984-04-23

Family

ID=12739625

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4617378A Expired JPS5917730B2 (en) 1978-04-18 1978-04-18 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS5917730B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56147804A (en) * 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
US4743409A (en) * 1986-05-27 1988-05-10 Sekisui Kagaku Kogyo Kabushiki Kaisha Process for preparing a substrate for optical recording media
US4844828A (en) * 1985-09-27 1989-07-04 Kao Corporation Detergent dispenser pouch made of cold water-soluble PVA containing acetalized units
US5100957A (en) * 1986-12-26 1992-03-31 Tosoh Corporation Protective dust cover for photomask or reticle
WO2006048132A1 (en) * 2004-11-04 2006-05-11 Wacker Polymer Systems Gmbh & Co. Kg Polyvinyl acetals containing unsaturated acetal units
JP2017105997A (en) * 2015-12-04 2017-06-15 日本酢ビ・ポバール株式会社 Dispersion assistant for suspension polymerization, manufacturing method of vinyl polymer using the same and vinyl chloride resin

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56147804A (en) * 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
US4844828A (en) * 1985-09-27 1989-07-04 Kao Corporation Detergent dispenser pouch made of cold water-soluble PVA containing acetalized units
US4743409A (en) * 1986-05-27 1988-05-10 Sekisui Kagaku Kogyo Kabushiki Kaisha Process for preparing a substrate for optical recording media
US5100957A (en) * 1986-12-26 1992-03-31 Tosoh Corporation Protective dust cover for photomask or reticle
WO2006048132A1 (en) * 2004-11-04 2006-05-11 Wacker Polymer Systems Gmbh & Co. Kg Polyvinyl acetals containing unsaturated acetal units
JP2017105997A (en) * 2015-12-04 2017-06-15 日本酢ビ・ポバール株式会社 Dispersion assistant for suspension polymerization, manufacturing method of vinyl polymer using the same and vinyl chloride resin

Also Published As

Publication number Publication date
JPS5917730B2 (en) 1984-04-23

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