GB1479462A - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
GB1479462A
GB1479462A GB3621974A GB3621974A GB1479462A GB 1479462 A GB1479462 A GB 1479462A GB 3621974 A GB3621974 A GB 3621974A GB 3621974 A GB3621974 A GB 3621974A GB 1479462 A GB1479462 A GB 1479462A
Authority
GB
United Kingdom
Prior art keywords
photo
resist
specified
polymers
photoresist composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3621974A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of GB1479462A publication Critical patent/GB1479462A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

1479462 Photo-resist materials HITACHI Ltd 16 Aug 1974 [24 Oct 1973] 36219/74 Heading G2C A photo-resist composition comprises a watersoluble polymer, a bis-aziole photocross-linking agent, and a water-soluble aliphatic alcohol having 4-6 carbon atoms and 4-6 hydroxyl groups. Specified polymers are acrylic and vinyl polymers and copolymers and gelatine and specified alcohols are erythritols, pestritols such as arabitol or xylitol, and hexitols such as sorbitol, dulcitol and mannitol. The photo-resist may contain a silane to improve adhesion to the support.
GB3621974A 1973-10-24 1974-08-16 Photoresist composition Expired GB1479462A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11900773A JPS5234967B2 (en) 1973-10-24 1973-10-24

Publications (1)

Publication Number Publication Date
GB1479462A true GB1479462A (en) 1977-07-13

Family

ID=14750674

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3621974A Expired GB1479462A (en) 1973-10-24 1974-08-16 Photoresist composition

Country Status (3)

Country Link
JP (1) JPS5234967B2 (en)
FR (1) FR2249363B1 (en)
GB (1) GB1479462A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5641432U (en) * 1979-09-06 1981-04-16
JPS59160139A (en) * 1983-03-04 1984-09-10 Hitachi Ltd Photosensitive polymer composition
JPS62247354A (en) * 1986-04-17 1987-10-28 Daicel Chem Ind Ltd Photosensitive resin composition for making screen plate
US4950583A (en) * 1986-09-17 1990-08-21 Brewer Science Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith
JPS63285824A (en) * 1987-05-18 1988-11-22 Matsushita Electric Ind Co Ltd Switch

Also Published As

Publication number Publication date
DE2439449B2 (en) 1976-07-29
FR2249363A1 (en) 1975-05-23
JPS5070104A (en) 1975-06-11
JPS5234967B2 (en) 1977-09-06
DE2439449A1 (en) 1975-05-07
FR2249363B1 (en) 1977-03-25

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19940815